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61. 发明授权

US07737418B2 Debris mitigation system and lithographic apparatus 失效
标题翻译：碎片缓解系统和光刻设备
公开(公告)号：US07737418B2
公开(公告)日：2010-06-15
申请号：US11645808
申请日：2006-12-27
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer
IPC分类号： G03F7/20
CPC分类号： H05G2/003 , G03F7/70916
摘要： A debris mitigation system for trapping debris coming from a tin debris-generating radiation source is provided. The debris mitigating system includes a debris barrier comprising a plurality of foils, and a cleaning system constructed and arranged to clean the foils. The cleaning system includes a supply unit to provide a liquid alloy to the foils to dissolve and flush trapped debris from the foils. The alloy includes gallium, indium, tin, or any combination thereof.
摘要翻译：提供了用于捕获来自产生锡屑的辐射源的碎片的碎片缓解系统。碎片减轻系统包括包括多个箔片的碎片屏障，以及构造和布置成清洁箔片的清洁系统。清洁系统包括供应单元，以向箔提供液体合金以溶解和冲洗来自箔的被捕获的碎屑。合金包括镓，铟，锡或其任何组合。

62. 发明授权

US07615767B2 Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby 失效
标题翻译：辐射发生器件，光刻设备，器件制造方法和由此制造的器件
公开(公告)号：US07615767B2
公开(公告)日：2009-11-10
申请号：US11798037
申请日：2007-05-09
申请人： Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen
发明人： Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005
摘要： A device constructed to generate radiation includes a liquid bath, and a pair of electrodes. At least a part of one of the electrodes is formed by a cable part moveable with respect to the liquid bath. The device also includes an actuator arranged to move the cable part from a liquid-adhering position to an ignition position, and an ignition source configured to trigger a discharge produced radiating plasma from the liquid adherent to the cable part, when the cable part is in the ignition position, by a discharge between the electrodes. The liquid-adhering position is a position for adhering a liquid from the bath to the part of the electrode.
摘要翻译：构造成产生辐射的装置包括液槽和一对电极。电极中的至少一部分由可相对于液槽移动的电缆部分形成。该装置还包括致动器，其被布置成将电缆部分从液体粘附位置移动到点火位置，并且点火源被配置为触发从电极附着于电缆部分的液体辐射等离子体的放电，当电缆部分处于点火位置，通过电极之间的放电。液体粘附位置是将液体从熔池粘附到电极的一部分的位置。

63. 发明申请

US20080277599A1 Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby 失效
标题翻译：辐射发生器件，光刻设备，器件制造方法和由此制造的器件
公开(公告)号：US20080277599A1
公开(公告)日：2008-11-13
申请号：US11798037
申请日：2007-05-09
申请人： Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen
发明人： Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen
IPC分类号： H01J35/04 , G03B27/32
CPC分类号： H05G2/003 , H05G2/005
摘要： A device constructed to generate radiation includes a liquid bath, and a pair of electrodes. At least a part of one of the electrodes is formed by a cable part moveable with respect to the liquid bath. The device also includes an actuator arranged to move the cable part from a liquid-adhering position to an ignition position, and an ignition source configured to trigger a discharge produced radiating plasma from the liquid adherent to the cable part, when the cable part is in the ignition position, by a discharge between the electrodes. The liquid-adhering position is a position for adhering a liquid from the bath to the part of the electrode.
摘要翻译：构造成产生辐射的装置包括液槽和一对电极。电极中的至少一部分由可相对于液槽移动的电缆部分形成。该装置还包括致动器，其被布置成将电缆部分从液体粘附位置移动到点火位置，并且点火源被配置为触发从电极附着于电缆部分的液体辐射等离子体的放电，当电缆部分处于点火位置，通过电极之间的放电。液体粘附位置是将液体从熔池粘附到电极的一部分的位置。

64. 发明申请

US20130114059A1 Components for EUV Lithographic Apparatus, EUV Lithographic Apparatus Including Such Components and Method for Manufacturing Such Components 审中-公开
标题翻译： EUV平版印刷设备的组件，包含这些组件的EUV平版印刷设备以及制造这些部件的方法
公开(公告)号：US20130114059A1
公开(公告)日：2013-05-09
申请号：US13808636
申请日：2011-06-06
申请人： Martin Jacobus Johan Jak , Vadim Yevgenyevich Banine , Wouter Anthon Soer , Andrei Mikhailovich Yakunn , Maarten Van Kampen , Gerard Frans Jozef Schasfoort
发明人： Martin Jacobus Johan Jak , Vadim Yevgenyevich Banine , Wouter Anthon Soer , Andrei Mikhailovich Yakunn , Maarten Van Kampen , Gerard Frans Jozef Schasfoort
IPC分类号： C09D5/08 , B32B15/01 , G02B5/20 , G03F7/20
CPC分类号： C09D5/08 , B32B15/01 , B32B15/018 , G02B5/208 , G03F7/70191 , G03F7/70308 , G03F7/70858 , G03F7/70908 , G03F7/70916 , G21K1/10 , H05G2/008 , Y10T428/12736 , Y10T428/12778 , Y10T428/12806 , Y10T428/12986 , Y10T428/31678
摘要： A metal component (262M, 300M) is designed for use in an EUV lithography apparatus, for example as a spectral purity filter (260) or a heating element (300) in a hydrogen radical generator. An exposed surface of the metal is treated (262P, 300P) to inhibit the formation of an oxide of said metal in an air environment prior to operation. This prevents contamination of optical components by subsequent evaporation of the oxide during operation of the component at elevated temperatures.
摘要翻译：金属部件（262M，300M）被设计用于EUV光刻设备中，例如作为氢自由基发生器中的光谱纯度过滤器（260）或加热元件（300）。处理金属的暴露表面（262P，300P）以在操作之前在空气环境中抑制所述金属的氧化物的形成。这防止了在组件在升高的温度下操作期间随后氧化物的蒸发而污染光学部件。

65. 发明授权

US09726989B2 Spectral purity filter 有权
公开(公告)号：US09726989B2
公开(公告)日：2017-08-08
申请号：US13643265
申请日：2011-02-22
申请人： Wouter Anthon Soer , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Andrei Mikhailovich Yakunin , Martin Jacobus Johan Jak
发明人： Wouter Anthon Soer , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Andrei Mikhailovich Yakunin , Martin Jacobus Johan Jak
IPC分类号： G02B5/20 , G03F7/20
CPC分类号： G03F7/70891 , G02B5/208 , G03F7/70191 , G03F7/70575
摘要： A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The body of material is formed from a material having a bulk reflectance of substantially greater than or equal to 70% at the first wavelength of radiation. The material has a melting point above 1000° C.

66. 发明申请

US20130038926A1 SPECTRAL PURITY FILTER 有权
标题翻译：光谱滤光片
公开(公告)号：US20130038926A1
公开(公告)日：2013-02-14
申请号：US13643265
申请日：2011-02-22
申请人： Wouter Anthon Soer , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Andrei Mikhailovich Yakunin , Martin Jacobus Johan Jak
发明人： Wouter Anthon Soer , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Andrei Mikhailovich Yakunin , Martin Jacobus Johan Jak
IPC分类号： G02B27/42 , B29C39/02 , B44C1/22 , B82B1/00
CPC分类号： G03F7/70891 , G02B5/208 , G03F7/70191 , G03F7/70575
摘要： A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The body of material is formed from a material having a bulk reflectance of substantially greater than or equal to 70% at the first wavelength of radiation. The material has a melting point above 1000° C.
摘要翻译：光谱纯度滤光器包括一组材料，多个孔通过它们延伸。孔被布置成抑制具有第一波长的辐射并且允许具有第二波长的辐射的至少一部分透射通过孔。辐射的第二波长比辐射的第一波长短。材料体在第一波长辐射下由体积反射率基本上大于或等于70％的材料形成。该材料的熔点高于1000℃

67. 发明申请

US20130010275A1 LITHOGRAPHIC APPARATUS AND SPECTRAL PURITY FILTER 审中-公开
标题翻译：光刻设备和光谱滤光片
公开(公告)号：US20130010275A1
公开(公告)日：2013-01-10
申请号：US13634179
申请日：2011-02-03
申请人： Viacheslav Medvedev , Vadim Yevgenyevich Banine , Vladimir Mihailovitch Krivtsun , Wouter Anthon Soer , Andrei Mikhailovich Yakunin
发明人： Viacheslav Medvedev , Vadim Yevgenyevich Banine , Vladimir Mihailovitch Krivtsun , Wouter Anthon Soer , Andrei Mikhailovich Yakunin
IPC分类号： G02B5/28 , G03B27/72
CPC分类号： G03F7/70575 , B82Y10/00 , G21K1/062 , G21K2201/061
摘要： A reflector includes a multi layer mirror structure configured to reflect radiation at a first wavelength, and one or more additional layers. The absorbance and refractive index at a second wavelength of the multi layer mirror structure and the one or more additional layers, and the thickness of the multi layer mirror structure and the one or more additional layers, are configured such that radiation of the second wavelength which is reflected from a surface of the reflector interferes in a destructive manner with radiation of the second wavelength which is reflected from within the reflector.
摘要翻译：反射器包括被配置为反射第一波长的辐射和一个或多个附加层的多层反射镜结构。在多层反射镜结构和一个或多个附加层的第二波长处的吸光度和折射率以及多层反射镜结构和一个或多个附加层的厚度被配置为使得第二波长的辐射从反射器的表面反射以破坏性的方式干扰从反射器内反射的第二波长的辐射。

68. 发明授权

US09195152B2 Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter 有权
标题翻译：光谱纯度滤光片，光刻设备和制造光谱纯度滤光片的方法
公开(公告)号：US09195152B2
公开(公告)日：2015-11-24
申请号：US13119895
申请日：2009-08-26
申请人： Wouter Anthon Soer , Andrei Mikhailovich Yakunin , Martin Jacobus Johan Jak , Denny Mathew , Hendrik Jan Kettelarij , Fredericus Christiaan Van Den Heuvel , Petrus Elizabeth Maria Kuijpers
发明人： Wouter Anthon Soer , Andrei Mikhailovich Yakunin , Martin Jacobus Johan Jak , Denny Mathew , Hendrik Jan Kettelarij , Fredericus Christiaan Van Den Heuvel , Petrus Elizabeth Maria Kuijpers
IPC分类号： G03B27/72 , G03F7/20 , B82Y10/00 , G02B5/20 , G21K1/10
CPC分类号： G03F7/7095 , B82Y10/00 , G02B5/208 , G03F7/70191 , G03F7/70575 , G21K1/10 , G21K2201/061
摘要： A transmissive spectral purity filter is configured to transmit extreme ultraviolet radiation. The spectral purity filter includes a filter part having a plurality of apertures configured to transmit extreme ultraviolet radiation and to suppress transmission of a second type of radiation. Each aperture has been manufactured by an anisotropic etching process.
摘要翻译：透射光谱纯度滤光器被配置为透射极紫外辐射。光谱纯度滤光器包括具有多个孔的滤光器部分，其被配置为透射极紫外辐射并抑制第二类型辐射的透射。每个孔径均通过各向异性蚀刻工艺制造。

69. 发明申请

US20110257671A1 CONTACT DETECTION TUBES, METHODS AND SYSTEMS FOR MEDICAL PROCEDURES 审中-公开
标题翻译：接触检测管，医疗程序的方法和系统
公开(公告)号：US20110257671A1
公开(公告)日：2011-10-20
申请号：US13141350
申请日：2009-11-10
申请人： Karen Irene Trovato , Wouter Anthon Soer
发明人： Karen Irene Trovato , Wouter Anthon Soer
IPC分类号： A61B17/34
CPC分类号： A61B17/3421 , A61B17/3494 , A61B34/30 , A61B2017/00026 , A61B2017/003 , A61B2017/00991 , A61B2017/3443 , A61B2034/301 , A61B2090/0801
摘要： A contact detection method (70) involves a navigation of a contact detection tube (20′) within an open space of an anatomical region (50) of a body. The contact detection tube includes a tubular wall (21) having an interior surface (23) defining a working channel (24), and an electrode (30) integrated in the tubular wall (21). The electrode (30) electrically connects the contact detection tube (20′) to an electrically conductive object (41, 52) (e.g., biological tissue or a medical instrument/tool) in physical contact with an exterior surface (22) of the tubular wall (21) and electrically isolates the working channel (24) from any electrical connection of the tube (20′) to the object (41, 52). The method (70) further involves a determination of a contact status of the contact detection tube (20′) between an open state (i.e., no physical contact) and a closed state (i.e., physical contact).
摘要翻译：接触检测方法（70）涉及在身体的解剖区域（50）的开放空间内的接触检测管（20'）的导航。接触检测管包括具有限定工作通道（24）的内表面（23）和集成在管状壁（21）中的电极（30））的管状壁（21）。电极（30）将接触检测管（20'）电连接到与管状物的外表面（22）物理接触的导电物体（41,42）（例如，生物组织或医疗仪器/工具）壁（21）并且将工作通道（24）与管（20'）的任何电连接与物体（41,42）电隔离。方法（70）还包括在打开状态（即，没有物理接触）和闭合状态（即物理接触）之间确定接触检测管（20'）的接触状态。

70. 发明申请

US20110199600A1 COLLECTOR ASSEMBLY, RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：收集器组件，辐射源，平面设备和器件制造方法
公开(公告)号：US20110199600A1
公开(公告)日：2011-08-18
申请号：US13124501
申请日：2009-09-03
申请人： Wouter Anthon Soer
发明人： Wouter Anthon Soer
IPC分类号： G03B27/54
CPC分类号： G03F7/70825 , G03F7/70175 , G21K2201/06
摘要： A collector assembly includes a first collector mirror for reflecting radiation from a radiation emission point, such as an extreme ultraviolet radiation emission point, to an intermediate focus from where the radiation is used in the lithography apparatus for device manufacture. A second collector mirror, forward of the radiation emission point, collects additional radiation, reflecting it back to a third mirror and from there to the intermediate focus. The mirrors may allow radiation to be collected with high efficiency and without increase in the etendue. The collector assembly may reduce or remove non-uniformity in the collected radiation, for instance arising from obscuration of collected radiation by a laser beam stop used to prevent laser excitation radiation from entering the lithographic apparatus.
摘要翻译：收集器组件包括用于将来自辐射发射点（例如极紫外辐射发射点）的辐射反射到用于设备制造的光刻设备中的辐射的中间焦点的第一收集器镜。辐射发射点前方的第二个收集镜收集额外的辐射，将其反射回第三个反射镜并从那里到中间焦点。反射镜可以允许以高效率收集辐射，而不增加光密度。收集器组件可以减少或消除收集的辐射中的不均匀性，例如由于用于防止激光激发辐射进入光刻设备的激光束停止而收集的辐射的遮蔽而引起的。

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