专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US09594306B2 Lithographic apparatus, spectral purity filter and device manufacturing method 有权
标题翻译：平版印刷设备，光谱纯度滤光片和器件制造方法
公开(公告)号：US09594306B2
公开(公告)日：2017-03-14
申请号：US14002000
申请日：2011-12-21
申请人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
发明人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
IPC分类号： G03F7/20 , B82Y10/00 , G21K1/06 , H05G2/00
CPC分类号： G03F7/70191 , B82Y10/00 , G02B1/11 , G02B5/1838 , G02B5/281 , G02B5/283 , G03F7/70008 , G03F7/702 , G03F7/70308 , G03F7/70575 , G21K1/062 , G21K1/067 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
摘要翻译：一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度过滤器具有彼此不同的辐射过滤结构。

2. 发明申请

US20140253894A1 Radiation Source 有权
标题翻译：辐射源
公开(公告)号：US20140253894A1
公开(公告)日：2014-09-11
申请号：US14346530
申请日：2012-08-23
申请人： Jan Bernard Plechelmus Van Schoot , Hermanus Johannes Maria Kreuwel , Vadim Yevgenyevich Banine , Andrei Mikhailovich Yakunin , Johannes Hubertus Josephina Moors , Olav Waldimir Frijns , Gerardus Hubertus Petrus Maria Swinkels , Ivo Vanderhallen , Uwe Bruno Heini Stamm
发明人： Jan Bernard Plechelmus Van Schoot , Hermanus Johannes Maria Kreuwel , Vadim Yevgenyevich Banine , Andrei Mikhailovich Yakunin , Johannes Hubertus Josephina Moors , Olav Waldimir Frijns , Gerardus Hubertus Petrus Maria Swinkels , Ivo Vanderhallen , Uwe Bruno Heini Stamm
IPC分类号： H05G2/00 , G03F7/20
CPC分类号： G03F7/70058 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： A radiation source having a fuel stream generator (110) that generates and directs a fuel stream (102) along a trajectory towards a plasma formation location (104). A pre-pulse laser radiation assembly directs a first beam of laser radiation (100) at the fuel stream at the plasma formation location to generate a modified fuel target (106). A main pulse laser radiation assembly directs a second beam of laser radiation (108) at the modified fuel target at the plasma formation location to generate a radiation generating plasma (117). A collector (122) collects the radiation and directs it along an optical axis (105) of the radiation source. The first beam of laser radiation being directed toward the fuel stream substantially along the optical axis.
摘要翻译：一种具有燃料流发生器（110）的辐射源，其产生并引导燃料流（102）沿轨迹朝向等离子体形成位置（104）。预脉冲激光辐射组件将等离子体形成位置处的燃料流处的第一激光辐射束（100）引导以产生经修改的燃料靶（106）。主脉冲激光辐射组件在等离子体形成位置处引导在修改的燃料靶处的第二激光辐射束（108）以产生辐射产生等离子体（117）。收集器（122）收集辐射并沿辐射源的光轴（105）引导辐射。激光辐射的第一束基本上沿着光轴指向燃料流。

3. 发明申请

US20130057840A1 Multilayer Mirror 有权
标题翻译：多层镜
公开(公告)号：US20130057840A1
公开(公告)日：2013-03-07
申请号：US13698171
申请日：2011-04-06
申请人： Vadim Iourievich Timoshkov , Jan Bernard Plechelmus Van Schoot , Antonius Theodorus Wilhelmu Kempen , Andrei Mikhailovich Yakunin , Edgar Alberto Osorio Oliveros
发明人： Vadim Iourievich Timoshkov , Jan Bernard Plechelmus Van Schoot , Antonius Theodorus Wilhelmu Kempen , Andrei Mikhailovich Yakunin , Edgar Alberto Osorio Oliveros
IPC分类号： G02B1/10 , C23C14/14 , G03B27/70
CPC分类号： G03F7/70958 , B82Y10/00 , C23C14/48 , C23C14/586 , G21K1/062
摘要： There is provided a multilayer mirror (80) comprising a layer of a first material (84) and a layer of silicon (82). The layer of the first material and the layer of silicon form a stack of layers. An exposed region of the layer of silicon comprises a modification that is arranged to improve the robustness of the exposed region of silicon.
摘要翻译：提供了包括第一材料（84）和硅层（82）的层的多层反射镜（80）。第一材料层和硅层形成一叠层。硅层的暴露区域包括被设置为改善暴露的硅区域的鲁棒性的修改。

4. 发明申请

US20120327381A1 Radiation Source, Lithographic Apparatus and Device Manufacturing Method 审中-公开
标题翻译：辐射源，平版印刷设备和器件制造方法
公开(公告)号：US20120327381A1
公开(公告)日：2012-12-27
申请号：US13582261
申请日：2011-01-31
申请人： Dzmitry Labetski , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Andrei Mikhailovich Yakunin
发明人： Dzmitry Labetski , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Andrei Mikhailovich Yakunin
IPC分类号： G03B27/52
CPC分类号： H05G2/008 , G02B5/00 , G02B19/00 , G02B19/0023 , G02B19/0028 , G02B19/0047 , G02B19/0095 , G03F7/70908 , G03F7/70916 , G03F7/70933 , H05G2/003
摘要： A radiation source for generating extreme ultraviolet radiation for a lithographic apparatus has a debris mitigation device comprising a nozzle arranged at or near an intermediate focus (IF) of the beam of radiation. The nozzle serves to direct a flow of gas (330) towards the radiation source or collector optic in order to deflect particulate debris (43) emitted by the radiation source.
摘要翻译：用于产生用于光刻设备的极紫外辐射的辐射源具有碎片减轻装置，其包括布置在辐射束的中间焦点（IF）处或其附近的喷嘴。喷嘴用于引导气体（330）流向辐射源或收集器光学元件，以便偏转由辐射源发射的颗粒物（43）。

5. 发明申请

US20120320354A1 MULTILAYER MIRROR AND LITHOGRAPHIC APPARATUS 有权
标题翻译：多层镜像和平面设备
公开(公告)号：US20120320354A1
公开(公告)日：2012-12-20
申请号：US13438337
申请日：2012-04-03
申请人： Andrei Mikhailovich YAKUNIN
发明人： Andrei Mikhailovich YAKUNIN
IPC分类号： G03B27/70 , G02B1/10 , B05D5/06 , G02B5/08
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , C03C17/3642 , C03C17/3663 , G02B5/0891 , G21K1/062 , G21K2201/061
摘要： A multilayer mirror constructed to reflect radiation having a wavelength in the range of 6.4 nm to 7.2 nm. The multilayer mirror has alternating layers, including a first layer and a second layer. The first and second layers are selected from the group consisting of: U, or a compound or nitride thereof, and B4C layers; Th, or a compound or nitride thereof, and B4C layers; La, or a compound or nitride thereof, and B9C layers; La, or a compound or nitride thereof, and B4C layers; U, or a compound or nitride thereof, and B9C layers; Th, or a compound or nitride thereof, and B9C layers; La, or a compound or nitride thereof, and B layers; U, or a compound or nitride thereof, and B layers; C, or a compound or nitride thereof, and B layers; Th, or a compound or nitride thereof, and B layers.
摘要翻译：构造成反射波长在6.4nm至7.2nm范围内的辐射的多层反射镜。多层反射镜具有交替层，包括第一层和第二层。第一层和第二层选自：U或其化合物或氮化物和B4C层; Th或其化合物或氮化物，以及B4C层; La或其化合物或氮化物和B9C层; La或其化合物或氮化物，以及B4C层; U或其化合物或氮化物，以及B9C层; Th或其化合物或氮化物和B9C层; La或其化合物或氮化物，以及B层; U或其化合物或氮化物，和B层; C或其化合物或氮化物，和B层; Th或其化合物或氮化物，以及B层。

6. 发明申请

US20110170083A1 Lithographic Apparatus and Device Manufacturing Method 审中-公开
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20110170083A1
公开(公告)日：2011-07-14
申请号：US12904626
申请日：2010-10-14
申请人： Luigi Scaccabarozzi , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Andrei Mikhailovich Yakunin
发明人： Luigi Scaccabarozzi , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Andrei Mikhailovich Yakunin
IPC分类号： G03B27/72
CPC分类号： G03F1/84 , G03F7/7085 , G03F7/70908 , G03F7/70916
摘要： A system and method are used to detect thermal radiation from a mask. Debris particles on the mask heat up, but do not cool down as quickly as the surrounding mask. Due to the temperature difference, the wavelength of radiation emitted by particles and the mask differs. Thus by detecting the thermal radiation, it is possible to detect the presence of particles deposited on the mask. If particles are detected, the mask can be cleaned.
摘要翻译：使用系统和方法来检测来自掩模的热辐射。面具上的碎屑颗粒加热，但不要像周围的面具一样冷却下来。由于温度差异，颗粒和掩模发射的辐射波长不同。因此，通过检测热辐射，可以检测沉积在掩模上的颗粒的存在。如果检测到颗粒，则可以清洁面罩。

7. 发明申请

US20100328639A1 SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER 审中-公开
标题翻译：光谱滤光片，光刻设备和制造光谱滤光片的方法
公开(公告)号：US20100328639A1
公开(公告)日：2010-12-30
申请号：US12826459
申请日：2010-06-29
申请人： Martin Jacobus Johan Jak , Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer , Denis Alexandrovich Glushkov , Andrei Mikhailovich Yakunin
发明人： Martin Jacobus Johan Jak , Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer , Denis Alexandrovich Glushkov , Andrei Mikhailovich Yakunin
IPC分类号： G03B27/72 , G02B5/20 , B29D11/00
CPC分类号： G03B27/72 , G02B5/204 , G02B5/208 , G03F7/70191 , G03F7/70575
摘要： A transmissive spectral purity filter is configured to transmit extreme ultraviolet radiation. The spectral purity filter includes a filter part having a plurality of apertures to transmit extreme ultraviolet radiation and to suppress transmission of a second type of radiation. The apertures may be manufactured in carrier material such as silicon by an anisotropic etching process and topped with a reflective layer such as Mo metal, Ru metal, TiN or RuO. A diffusion barrier layer such as silicon nitride Si3N4, or silicon dioxide SiO2 is provided between the metal and the semiconductor to prevent diffusion and silicidation of the metal at elevated temperatures. The diffusion barrier layer may also serve as a hydrogen-resistant layer on parts of the semiconductor which are not beneath the reflective layer, and/or enhance emissivity for removal of heat from the structure.
摘要翻译：透射光谱纯度滤光器被配置为透射极紫外辐射。光谱纯度滤光器包括具有多个孔以便透射极紫外辐射并抑制第二类辐射的透射的滤光器部分。孔可以通过各向异性蚀刻工艺在诸如硅的载体材料中制成，并且覆盖有诸如Mo金属，Ru金属，TiN或RuO的反射层。在金属和半导体之间设置有诸如氮化硅Si 3 N 4或二氧化硅SiO 2的扩散阻挡层，以防止金属在升高的温度下扩散和硅化。扩散阻挡层还可以在半导体的不在反射层下面的部分上用作耐氢层，和/或增加用于从结构去除热量的发射率。

8. 发明授权

US09897930B2 Optical element comprising oriented carbon nanotube sheet and lithographic apparatus comprising such optical element 有权
公开(公告)号：US09897930B2
公开(公告)日：2018-02-20
申请号：US13057583
申请日：2009-07-22
申请人： Leonid Aizikovitch Sjmaenok , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Denis Alexandrovich Glushkov , Andrei Mikhailovich Yakunin
发明人： Leonid Aizikovitch Sjmaenok , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Denis Alexandrovich Glushkov , Andrei Mikhailovich Yakunin
IPC分类号： G03F7/20
CPC分类号： G03F7/70958 , G03F7/70191 , G03F7/702 , G03F7/70308 , G03F7/70575 , G03F7/70916
摘要： A lithographic apparatus includes an optical element that includes an oriented carbon nanotube sheet. The optical element has an element thickness in the range of about 20-500 nm and has a transmission for EUV radiation having a wavelength in the range of about 1-20 nm of at least about 20% under perpendicular irradiation with the EUV radiation.

9. 发明授权

US09395630B2 Lithographic apparatus and method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US09395630B2
公开(公告)日：2016-07-19
申请号：US13704222
申请日：2011-03-17
申请人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Harmen Klaas Van Der Schoot , Lucas Henricus Johannes Stevens , Maarten Van Kampen
发明人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Harmen Klaas Van Der Schoot , Lucas Henricus Johannes Stevens , Maarten Van Kampen
IPC分类号： G03F7/20 , B82Y10/00 , B82Y40/00 , C01B31/04 , G02B5/08 , G02B5/20 , G02B27/00 , G03F1/24 , G03F1/62 , G21K1/06 , H01B1/04 , H01B1/24 , G03B27/54
CPC分类号： G03F1/64 , B82Y10/00 , B82Y40/00 , C01B32/20 , G02B5/0816 , G02B5/0891 , G02B5/204 , G02B5/208 , G02B27/0006 , G03B27/54 , G03F1/24 , G03F1/62 , G03F7/70058 , G03F7/702 , G03F7/70916 , G03F7/70958 , G03F7/70983 , G21K1/062 , G21K2201/061 , H01B1/04 , H01B1/24
摘要： A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles through the membrane. A particle trapping structure is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles from inside the chamber to outside the chamber.
摘要翻译：光刻设备包括被配置为产生辐射束的辐射源和被配置为支撑图案形成装置的支撑件。图案形成装置被配置为使辐射束具有图案以形成图案化的辐射束。腔室位于辐射源和图案形成装置之间。所述腔室包括被配置为反射辐射束的至少一个光学部件，并且被配置为允许来自辐射源的辐射通过。膜被配置为允许辐射束的通过，并且防止污染颗粒通过膜的通过。颗粒捕获结构被配置为允许气体沿着室内的间接路径流动到室外。间接路径被配置为基本上防止污染颗粒从腔室内部通到室外。

10. 发明授权

US09285690B2 Mirror, lithographic apparatus and device manufacturing method 有权
标题翻译：镜面，光刻设备和器件制造方法
公开(公告)号：US09285690B2
公开(公告)日：2016-03-15
申请号：US13002854
申请日：2009-07-16
申请人： Vadim Yevgenyevich Banine , Leonid Aizikovitch Sjmaenok , Andrei Mikhailovich Yakunin
发明人： Vadim Yevgenyevich Banine , Leonid Aizikovitch Sjmaenok , Andrei Mikhailovich Yakunin
IPC分类号： G03B27/54 , G03F7/20 , B82Y10/00 , G21K1/06
CPC分类号： G03F7/70958 , B82Y10/00 , G03F7/70575 , G21K1/062
摘要： Embodiments of the invention relate to a mirror (30). The mirror includes a mirroring surface and a profiled coating layer (32a) having an outer surface, wherein one or more wedged elements are formed by the outer surface with respect to the mirroring surface, and wherein the one or more wedged elements having a wedge angle (ø) in a range of approximately 10-200 mrad. The profiled coating layer may have a curved outer surface. The profiled coating layer may be formed from at least one of the following materials: Be, B, C, P, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Ru, Nb, Mo, Ba, La, Ce, Pr, Pa and U.
摘要翻译：本发明的实施例涉及一种反射镜（30）。反射镜包括镜面和具有外表面的成型涂层（32a），其中一个或多个楔形元件相对于镜面由外表面形成，并且其中一个或多个楔形元件具有楔角（ø）在约10-200 mrad的范围内。成型涂层可以具有弯曲的外表面。成型涂层可以由以下材料中的至少一种形成：Be，B，C，P，K，Ca，Sc，Br，Rb，Sr，Y，Zr，Ru，Nb，Mo，Ba，La， Ce，Pr，Pa和U.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式