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61. 发明授权

US08539906B2 Substrate liquid processing apparatus 有权
标题翻译：基板液体处理装置
公开(公告)号：US08539906B2
公开(公告)日：2013-09-24
申请号：US13151665
申请日：2011-06-02
申请人： Nobuhiro Ogata , Shuichi Nagamine
发明人： Nobuhiro Ogata , Shuichi Nagamine
IPC分类号： B05B1/28 , B05B13/02 , B05C11/02
CPC分类号： H01L21/67051 , H01L21/6708
摘要： A substrate liquid processing apparatus of the present invention includes a guide rotary cup configured to guide a process-liquid scattering from a substrate rotating and being held by a substrate holding table and a guide cup configured to guide downward the process-liquid guided by the guide rotary cup. The guide cup includes a downward extension portion extending downward from an inner peripheral end portion of a guide cup body and an inner peripheral extension portion extending inward from the inner peripheral end portion more than the downward extension portion. The inner peripheral extension portion is configured to form a gas guide space together with the guide rotary cup and the downward extension portion so that a gas turning by the rotation of the guide rotary cup can be guided downward.
摘要翻译：本发明的基板液体处理装置包括：引导旋转杯，其构造成引导来自旋转并由基板保持台保持的基板的处理液体散射;以及引导杯，其构造成向下引导由引导件引导的处理液旋转杯引导杯包括从引导杯体的内周端部向下延伸的向下延伸部分和从内周端部向内延伸的内延伸部分，而不是向下延伸部分。内周延伸部构造成与导向旋转杯和向下延伸部一起形成气体导向空间，从而可以将导向旋转杯的旋转转动的气体向下引导。

62. 发明授权

US08534936B2 Coating and developing apparatus 有权
标题翻译：涂装显影装置
公开(公告)号：US08534936B2
公开(公告)日：2013-09-17
申请号：US13178037
申请日：2011-07-07
申请人： Nobuaki Matsuoka , Akira Miyata , Shinichi Hayashi , Suguru Enokida
发明人： Nobuaki Matsuoka , Akira Miyata , Shinichi Hayashi , Suguru Enokida
IPC分类号： G03D5/00 , G03B27/52 , B05C11/02 , B05C13/02
CPC分类号： G03F7/708 , H01L21/6715
摘要： A coating and developing apparatus includes a processing block having at least one coating film-forming unit block stack and a vertically stacked developing unit block stack. Each unit block stack includes vertically stacked unit blocks, and each unit block includes processing modules containing liquid processing modules and heating modules. Each unit block includes a transport mechanism moveable along a transport passage from a carrier block side to an interface block side, to transport a substrate between the processing modules belonging to the unit block. Transfer units are provided on the carrier block sides of the coating film-forming unit blocks and the developing unit blocks respectively, for transferring a substrate to and from the transport mechanism of the associated coating film-forming or developing unit blocks. A first transfer mechanism transfers a substrate removed from a carrier to one of the transfer units associated with the coating film-forming unit blocks.
摘要翻译：涂覆和显影装置包括具有至少一个涂膜形成单元块堆叠和垂直堆叠的显影单元块堆叠的处理块。每个单元块堆叠包括垂直堆叠的单元块，并且每个单元块包括包含液体处理模块和加热模块的处理模块。每个单元块包括可沿着运输通道从承载块侧移动到接口块侧的运输机构，以在属于单元块的处理模块之间输送基板。分别在涂膜形成单元块和显影单元块的承载块侧设置传送单元，用于将基板传送到相关的涂膜形成或显影单元块的传送机构。第一传送机构将从载体移除的基板传送到与涂膜形成单元块相关联的转印单元之一。

63. 发明授权

US08505479B2 Resist coating apparatus 有权
标题翻译：抗蚀涂层设备
公开(公告)号：US08505479B2
公开(公告)日：2013-08-13
申请号：US12877187
申请日：2010-09-08
申请人： Kousuke Yoshihara , Tomohiro Iseki
发明人： Kousuke Yoshihara , Tomohiro Iseki
IPC分类号： B05C11/00 , B05C11/02
CPC分类号： H01L21/6715 , G03F7/162
摘要： A resist coating apparatus supplies a resist solution to substantially the center of a target substrate to be processed while rotating the target substrate at a first rotational speed, then decelerates the rotation of the substrate to a second rotational speed lower than the first rotational speed, or until rotational halt, makes the deceleration smaller in the deceleration step as the rotational speed becomes closer to the second rotational speed or the rotational halt, and accelerates the rotation of the substrate to a third rotational speed higher than the second rotational speed to spin off a residue of the resist solution.
摘要翻译：抗蚀涂层装置在以第一转速旋转目标基板的同时将抗蚀剂溶液基本上提供到待加工的目标基板的中心，然后使基板的旋转减速到低于第一转速的第二转速，或直到旋转停止，随着转速变得更接近于第二转速或转动停止，减速步骤中的减速度变小，并且将基板的旋转加速到高于第二转速的第三转速，以使其脱离抗蚀剂溶液的残留物。

64. 发明申请

US20130203100A1 OPPOSABLES AND AUTOMATED SPECIMEN PROCESSING SYSTEMS WITH OPPOSABLES 有权
标题翻译： OPPOSABLES和自动化样品处理系统与OPPOSABLES
公开(公告)号：US20130203100A1
公开(公告)日：2013-08-08
申请号：US13831255
申请日：2013-03-14
申请人： VENTANA MEDICAL SYSTEMS, INC.
发明人： Michael Otter , Brian Howard Kram , Carl David Martin , Jessica Jones , Kevin David Marshall , Christine Tse
IPC分类号： B05C11/02 , B05D3/12
CPC分类号： B05C11/028 , B01L3/0293 , B01L3/502 , B01L2200/025 , B01L2300/0822 , B01L2300/0877 , B05D3/12 , G01N1/312 , G01N35/00029 , G01N35/1002 , G01N2035/00138 , G01N2035/00534 , G01N2035/1037 , G02B21/34 , Y10T436/112499
摘要： A specimen processing system is capable of processing specimens carried on slides. The specimen processing system can sequentially deliver slides and opposables to specimen processing stations. The specimen processing stations can use the opposables to apply a series of liquids to the specimens. The applied liquid can be moved along the slide using capillary action while the specimen processing stations control the processing temperatures. The applied liquid can be in a fluid-carrying gap. The opposable can contact the slide to vary a cross section of the fluid-carrying gap.
摘要翻译：样品处理系统能够处理载玻片上的标本。样品处理系统可以将样品处理站的幻灯片和对象顺序传送。样品处理站可以使用对象物将一系列液体施加到样品上。使用毛细管作用的涂抹液体可以沿着载玻片移动，而样品处理站控制加工温度。所施加的液体可以在流体携带间隙中。相对的可以接触滑块以改变流体承载间隙的横截面。

65. 发明授权

US08453599B2 Resist solution supply apparatus, resist solution supply method, and computer storage medium 有权
标题翻译：抗蚀剂溶液供应装置，抗蚀剂溶液供应方法和计算机存储介质
公开(公告)号：US08453599B2
公开(公告)日：2013-06-04
申请号：US12850876
申请日：2010-08-05
申请人： Kosuke Yoshihara , Yusuke Yamamoto
发明人： Kosuke Yoshihara , Yusuke Yamamoto
IPC分类号： B05C11/00 , B05C11/02
CPC分类号： H01L21/6715 , G03F7/162 , H01L21/67178 , H01L21/67184
摘要： A resist solution supply apparatus of the present invention includes: a resist solution supply source storing a resist solution therein; a supply tube for supplying the resist solution from the resist solution supply source to a coating nozzle; a filter provided in the supply tube for removing foreign matter in the resist solution; and a heating unit provided along the supply tube at a position closer to the resist solution supply source than the filter, for heating the resist solution in the supply tube to a predetermined temperature higher than room temperature to make a resist gel to aggregate to become coarse so that the coarse resist gel can be collected and removed by the filter.
摘要翻译：本发明的抗蚀剂溶液供给装置包括：其中存储抗蚀剂溶液的抗蚀剂溶液供给源; 供给管，用于将抗蚀剂溶液从抗蚀剂溶液供给源供给到涂布喷嘴; 设置在所述供给管中的用于去除所述抗蚀剂溶液中的异物的过滤器; 以及加热单元，其沿着供给管设置在比过滤器更靠近抗蚀剂溶液供给源的位置处，用于将供给管中的抗蚀剂溶液加热到高于室温的预定温度，以使抗凝胶凝集成粗糙从而可以通过过滤器收集和去除粗糙的抗蚀剂凝胶。

66. 发明申请

US20130101739A1 FORMED SHEET MEMBRANE ELEMENT AND FILTRATION SYSTEM 审中-公开
标题翻译：成形薄膜元件和过滤系统
公开(公告)号：US20130101739A1
公开(公告)日：2013-04-25
申请号：US13654918
申请日：2012-10-18
申请人： Fibracast Ltd.
发明人： Ionel John TOMESCU , Rafael SIMON
IPC分类号： B05D3/12 , B29C53/24 , B05C11/02
CPC分类号： B01D61/18 , B01D63/06 , B01D63/081 , B01D67/0013 , B01D69/06 , B01D2315/06 , B01D2323/42 , B29C53/24 , B29C65/06 , B29C65/08 , B29C65/16 , B29C65/168 , B29C65/4815 , B29C65/483 , B29C65/526 , B29C66/112 , B29C66/131 , B29C66/1312 , B29C66/21 , B29C66/5414 , B29C66/543 , B29C66/547 , B29C66/63 , B29C66/71 , B29C66/7294 , B29C66/934 , B29L2031/14 , B29L2031/601 , B29L2031/755 , C02F1/442 , C02F1/444 , B29K2067/003
摘要： A piece of substrate material is formed under heat and pressure by a roller against a cavity or platen into a shaped substrate sheet having one or more depressions. Two substrate sheets are bonded together to form a substrate wherein the one or more depressions form one or more interior channels. The substrate is coated with a dope in a casting device having a guide portion corresponding to the shape of the substrate sheets and quenched to form a filtering membrane.
摘要翻译：一块衬底材料在热和压力下通过辊子抵靠空腔或压板形成具有一个或多个凹陷的成形衬底片材。将两个基片粘合在一起以形成基底，其中一个或多个凹陷形成一个或多个内部通道。将基材涂布在具有对应于基板的形状的引导部分的铸造装置中并骤冷以形成过滤膜。

67. 发明授权

US08425973B2 Three-dimensional fabrication 有权
标题翻译：三维制作
公开(公告)号：US08425973B2
公开(公告)日：2013-04-23
申请号：US12744751
申请日：2008-11-26
申请人： Patrick C. Dunne
发明人： Patrick C. Dunne
IPC分类号： A61K6/083 , A61C5/10 , B05D3/00 , B05C11/00 , B05C11/02 , B05C13/00 , B05C13/02 , B05C21/00 , B21F43/00 , B23P13/00 , G06F19/00 , B23K26/00
CPC分类号： A61C13/0004 , A61C5/77 , A61C13/0018 , A61C13/0019 , B29C64/00 , B29C2793/009 , B29L2031/753 , B29L2031/7536 , B33Y30/00 , B33Y80/00 , Y10T29/49567
摘要： Systems and methods disclosed herein employ various modes of material deposition and material removal to build a complex, three-dimensional structure upon a rotating base. The systems and methods may be usefully employed to fabricate geometrically and aesthetically accurate dental articles from digital models.
摘要翻译：本文公开的系统和方法采用各种模式的材料沉积和材料去除以在旋转底座上构建复杂的三维结构。系统和方法可以有用地用于从数字模型制造几何和美观的牙科用品。

68. 发明授权

US08353255B2 Device for coating a substrate 有权
标题翻译：用于涂覆基材的装置
公开(公告)号：US08353255B2
公开(公告)日：2013-01-15
申请号：US12658077
申请日：2010-02-02
申请人： Ralph Beyer , Stefan Lutter , Rainer Targus
发明人： Ralph Beyer , Stefan Lutter , Rainer Targus
IPC分类号： B05C11/02 , B05C13/00
CPC分类号： H01L21/6715 , H01L21/68 , H01L21/68785
摘要： By means of the device for coating a substrate (2; 102) according to the present invention, a homogeneous coating of the substrate (2; 102) can be achieved. The device comprises a holding and rotating means for holding and rotating the substrate (2; 102) about an axis (A). A disk (3) is provided below the substrate (2; 102). Said disk (3) is arranged coaxially with respect to the substrate (2; 102), has at least the same diameter as the substrate (2; 102) and is able to rotate synchronously with the substrate (2; 102). By means of the disk (3), air swirls at the edge of and below the substrate (2; 102) are avoided during coating of the substrate (2; 102). Thus, it is possible to obtain a homogeneous coating. For being able to load and unload a substrate (2; 102) into and out of the device by means of a conventional gripper system (6), the distance between substrate (2; 102) and disk (3) is increased during loading and unloading.
摘要翻译：通过根据本发明的用于涂覆基底（2; 102）的装置，可以实现基底（2; 102）的均匀涂层。该装置包括用于围绕轴线（A）保持和旋转基底（2; 102）的保持和旋转装置。在所述基板（2; 102）的下方设置有盘（3）。所述盘（3）相对于所述基底（2; 102）同轴布置，具有与所述基底（2; 102）至少相同的直径并且能够与所述基底（2; 102）同步旋转。通过盘（3），在衬底（2; 102）的涂覆期间避免在衬底（2; 102）的边缘和下方的空气涡流。因此，可以获得均匀的涂层。为了能够通过传统的夹具系统（6）将衬底（2; 102）装载和卸载到装置中，衬底（2; 102）和盘（3）之间的距离在装载期间增加，并且卸货

69. 发明授权

US08322025B2 Apparatus for forming a plurality of high-aspect ratio gridline structures 有权
标题翻译：用于形成多个高纵横比网格线结构的装置
公开(公告)号：US08322025B2
公开(公告)日：2012-12-04
申请号：US11555479
申请日：2006-11-01
申请人： David K. Fork , Thomas S. Zimmermann
发明人： David K. Fork , Thomas S. Zimmermann
IPC分类号： B05C11/02 , B28B21/52
CPC分类号： H01M14/005 , B29C47/0021 , B29C47/0023 , B29C47/0052 , B29C47/062 , B29C47/065 , B29C47/145 , H01L31/022425 , Y02E10/50 , Y10T29/5313 , Y10T29/532
摘要： Closely spaced, high aspect-ratio gridline structures are formed on the surface of a substrate using two or more co-extrusion heads that co-extrude gridline material and sacrificial material such that the deposited gridline material is compressed between opposing portions of the sacrificial material. The co-extrusion heads include three-channel cavity structures that converge to a relatively small outlet orifice that dispenses the gridline material with relatively fine features and a relatively high aspect ratio. The outlet orifices of the co-extrusion heads are disposed in a staggered arrangement such that gridlines extruded from the first co-extrusion head are disposed between two gridlines extruded from the second co-extrusion head. Photovoltaic cells are produced with metal gridlines formed in this manner.
摘要翻译：使用两个或更多个共挤出网格线材料和牺牲材料的共挤出头在衬底的表面上形成紧密间隔的高纵横比网格线结构，使得沉积的网格线材料在牺牲材料的相对部分之间被压缩。共挤出头包括三通道腔结构，其收敛到相对较小的出口孔，其分配具有相对较好特征和较高纵横比的网格线材料。共挤出头的出口孔布置成交错布置，使得从第一共挤出头挤出的网格线设置在从第二共挤出头挤出的两个网格线之间。以这种方式形成的金属网格线制造光伏电池。

70. 发明申请

US20120255489A1 QUARTZ TUBE LEVELING APPARATUS AND SYSTEMS FOR SIMULTANEOUS LEVELING AND PINNING OF RADIATION CURABLE INKS 有权
标题翻译： QUARTZ管子水平仪器和系统，用于同时测量和固定辐射固化油墨
公开(公告)号：US20120255489A1
公开(公告)日：2012-10-11
申请号：US13525232
申请日：2012-06-15
申请人： Bryan J. Roof , David J. Gervasi , Bin Zhang , James Padula
发明人： Bryan J. Roof , David J. Gervasi , Bin Zhang , James Padula
IPC分类号： B05C11/02
CPC分类号： B41J2/01 , B41J11/002
摘要： Systems for leveling UV-curable gel ink include a leveling member having a conformable surface. The leveling member is a quartz tube rotatable about a longitudinal axis, and connected to a mandrel, with conformable VITON O-rings interposing the mandrel and the quartz tube. A UV source is disposed within the quartz tube, and configured to emit light through the quartz tube and the conformable surface onto a surface of a substrate passing through a leveling or pressure nip defined by the quartz tube and a backing member or pressure belt.
摘要翻译：用于使UV固化凝胶油墨流平的系统包括具有适形表面的调平构件。流平构件是可围绕纵向轴线旋转并且连接到心轴的石英管，其具有插入心轴和石英管的适形VITON O形环。 UV源设置在石英管内，并且被配置为将光通过石英管和适形表面发射到通过由石英管和背衬构件或压力带限定的调平或压力压区的基板的表面上。

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