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    • 76. 发明申请
    • LARGE FIELD PROJECTION OBJECTIVE FOR LITHOGRAPHY
    • 大图现场投影目标
    • US20130293859A1
    • 2013-11-07
    • US13976353
    • 2011-12-07
    • Heng WuLing HuangGuogan Liu
    • Heng WuLing HuangGuogan Liu
    • G03F7/20
    • G03F7/7015G02B13/14G03F7/70241
    • A lithography projection objective (30) for focusing and imaging a pattern of a reticle onto a wafer including, from the reticle and along an optical axis: a first lens group G31 having a positive refractive power; a second lens group G32 having a positive refractive power; a third lens group G33 having a positive refractive power; and a fourth lens group G34 having a positive refractive power. These four lens groups form a 2× magnification design which has a partial field of view of not smaller than 100 mm; a wavelength band of I-line±5 nm can ensure a sufficient exposure light intensity. Moreover, the present invention also achieves, with a relatively simple structure, the demanded millimeter-level resolution as well as the correction of distortions, field curvatures, astigmatisms and chromatic aberrations in a large field.
    • 一种用于将掩模版图案聚焦并成像到晶片上的光刻投影物镜(30),包括从光掩模和沿着光轴:具有正折光力的第一透镜组G31; 具有正折射光焦度的第二透镜组G32; 具有正折射光焦度的第三透镜组G33; 以及具有正折光力的第四透镜组G34。 这四个透镜组形成2×放大倍率设计,其部分视场不小于100mm; I线±5nm的波长带可以确保足够的曝光光强度。 此外,本发明还通过相对简单的结构实现了所需的毫米级分辨率以及在大场中校正失真,场曲率,像散和色差。
    • 79. 发明授权
    • Large-field unit-magnification projection optical system
    • 大场单位放大投影光学系统
    • US07746571B2
    • 2010-06-29
    • US12302824
    • 2006-12-04
    • Tiejun LiLing HuangJun Wei
    • Tiejun LiLing HuangJun Wei
    • G02B9/60G02B17/00
    • G02B17/08G02B13/26G03F7/70225G03F7/70791
    • The present invention discloses a large-field unit-magnification projection optical system. The optical system includes an optical axis, a spherical concave reflection mirror; a lens group with positive refracting power arranged adjacent the mirror with an air space therebetween. The lens group includes a first plano-convex lens, a negative meniscus lens adjacent the plano-convex lens, a positive lens adjacent the negative meniscus lens, a negative double-convex lens spaced apart far from the positive lens, and a second plano-convex lens. The optical system further includes a pair of prisms each having respective first and second surface. The second surfaces are arranged adjacent the flat surface of the plano-convex lens element on opposite sides of the optical axis and the first surfaces are arranged adjacent object planes and image planes, respectively. Each lens in the lens group and the pair of prisms provide chromatic aberration correction in a spectral region that contains at least g, h and i-line wavelengths. In this projection optical system, the object plane is parallel to the image plane.
    • 本发明公开了一种大视场单位放大投影光学系统。 光学系统包括光轴,球面凹面反射镜; 具有正反射功率的透镜组,其布置在反射镜附近,其间具有空气空间。 透镜组包括第一平凸透镜,与平凸透镜相邻的负弯月透镜,邻近负弯月透镜的正透镜,与正透镜间隔开的负双凸透镜,以及第二平凸透镜, 凸透镜 光学系统还包括一对棱镜,每个棱镜具有相应的第一和第二表面。 第二面与光轴的相对侧的平凸透镜元件的平面相邻配置,第一面与物平面和像面分别配置。 透镜组中的每个透镜和一对棱镜在包含至少g,h和i线波长的光谱区域中提供色差校正。 在该投影光学系统中,物平面与图像平面平行。