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71. 发明申请

US20210265130A1 Ion Milling Device 有权
公开(公告)号：US20210265130A1
公开(公告)日：2021-08-26
申请号：US17252997
申请日：2018-06-22
申请人： Hitachi High-Tech Corporation
发明人： Asako KANEKO , Hisayuki TAKASU
IPC分类号： H01J37/20 , H01J37/305 , H01J37/08 , H01J37/09 , H01J37/147
摘要： An ion milling device capable of high-speed milling is realized even for a specimen containing a material having an imide bond. Therefore, the ion milling device includes: a vacuum chamber 6 configured to hold a specimen 3 in a vacuum atmosphere; an ion gun 1 configured to irradiate the specimen with a non-focused ion beam 2; a vaporization container 17 configured to store a mixed solution 13 of a water-soluble ionic liquid and water; and nozzles 11, 12 configured to supply water vapor obtained by vaporizing the mixed solution to a vicinity of a surface of the specimen processed by the ion beam.

72. 发明申请

US20210257179A1 SHADOW MASK APPARATUS AND METHODS FOR VARIABLE ETCH DEPTHS 有权
公开(公告)号：US20210257179A1
公开(公告)日：2021-08-19
申请号：US16789591
申请日：2020-02-13
申请人： Applied Materials, Inc.
发明人： Joseph C. Olson , Morgan Evans , Thomas Soldi , Rutger Meyer Timmerman Thijssen , Maurice Emerson Peploski
IPC分类号： H01J37/08 , H01J37/305 , H01J37/20 , H01J29/07
摘要： Methods of producing grating materials with variable height are provided. In one example, a method may include providing a grating material atop a substrate, and positioning a shadow mask between the grating material and an ion source, wherein the shadow mask is separated from the grating material by a distance. The method may further include etching the grating material using an ion beam passing through a set of openings of the shadow mask, wherein a first depth of a first portion of the grating material is different than a second depth of a second portion of the grating material.

73. 发明申请

US20210233739A1 Charged Particle Beam Apparatus and Adjustment Method for Charged Particle Beam Apparatus 有权
公开(公告)号：US20210233739A1
公开(公告)日：2021-07-29
申请号：US17155308
申请日：2021-01-22
申请人： JEOL Ltd.
发明人： Kazuya Yamazaki
IPC分类号： H01J37/20 , H01J37/18 , H01J37/28 , H01J37/244 , H01J37/26
摘要： A charged particle apparatus includes: a specimen chamber which is maintained at vacuum and in which a specimen is disposed; a preliminary exhaust chamber that is connected to the specimen chamber via a vacuum gate valve; an exhaust device that exhausts the preliminary exhaust chamber; charged particle beam source an optical system; a detector; a transporting device that transports the specimen from the preliminary exhaust chamber to the specimen chamber; and a control unit. The control unit performs: adjustment processing in which at least one of the optical system and the detector is adjusted in a state where the specimen is housed in the preliminary exhaust chamber; and transporting processing which is performed after the adjustment processing and in which the vacuum gate valve is opened and the transporting device transports the specimen to the specimen chamber.

74. 发明授权

US11075055B2 Automated multi-grid handling apparatus 有权
公开(公告)号：US11075055B2
公开(公告)日：2021-07-27
申请号：US16611935
申请日：2018-05-11
申请人： Richard Joseph Pickreign
发明人： Richard Joseph Pickreign
IPC分类号： H01J37/20 , H01L21/683
摘要： An automated grid handling apparatus for an electron microscope including a transport module having a multistage shuttle comprising a first shuttle stage having a single degree of freedom of motion and a second shuttle stage having a single degree of freedom of motion independent of the first stage, an end effector connected to at least one of the first and second shuttle stages, the end effector configured to hold a grid carrier and transport the grid carrier into and out of an electron microscope through a transport interface that communicates with a multi-axis positioning stage port of the microscope, the end effector having a range of motion defined by the first and second stage degrees of freedom of motions and the multi-axis positioning stage internal to the electron microscope, and an automated loading module connected to the frame and communicating with the transport module, the automated loading module including a load port module through which grids are loaded into the automated loading and transport modules.

75. 发明申请

US20210193436A1 SETTLING TIME DETERMINATION METHOD AND MULTI CHARGED PARTICLE BEAM WRITING METHOD 有权
公开(公告)号：US20210193436A1
公开(公告)日：2021-06-24
申请号：US17102551
申请日：2020-11-24
申请人： NuFlare Technology, Inc.
发明人： Tomoo MOTOSUGI
IPC分类号： H01J37/317 , H01J37/302 , H01J37/147 , H01J37/20
摘要： In one embodiment, a settling time determination method includes deflecting a charged particle beam by applying a voltage outputted from an amplifier to a first deflector while changing a deflection settling time, and writing an evaluation pattern, measuring a position of the evaluation pattern, and determining a position displacement amount of the measured position from a design position, performing fitting of the position displacement amount for the deflection settling time on a first output waveform of the amplifier, and determining a deflection settling time in which the position displacement amount is within a predetermined range.

76. 发明申请

US20210166946A1 APPARATUS AND TECHNIQUES FOR SUBSTRATE PROCESSING USING INDEPENDENT ION SOURCE AND RADICAL SOURCE 有权
公开(公告)号：US20210166946A1
公开(公告)日：2021-06-03
申请号：US17093139
申请日：2020-11-09
申请人： APPLIED Materials, Inc.
发明人： Anthony Renau , Joseph C. Olson , Peter F. Kurunczi
IPC分类号： H01L21/265 , H01J37/20
摘要： A system may include a substrate stage to support a substrate, and a plurality of beam sources. The plurality of beam sources may include an ion beam source, the ion beam source arranged to direct an ion beam to the substrate, and a radical beam source, the radical beam source arranged to direct a radical beam to the substrate. The system may include a controller configured to control the ion beam source and the radical beam source to operate independently of one another, in at least one aspect, wherein the at least one aspect includes beam composition, beam angle of incidence, and relative scanning of a beam source with respect to the substrate.

77. 发明授权

US11021787B2 Coating arrangement and method 有权
公开(公告)号：US11021787B2
公开(公告)日：2021-06-01
申请号：US16509512
申请日：2019-07-12
申请人： VON ARDENNE Asset GmbH & Co. KG
发明人： Carsten Deus
IPC分类号： C23C14/30 , H01J37/305 , H01J37/20 , C23C14/50 , H01J37/06
摘要： In accordance with various embodiments, a coating arrangement may comprise: an electron beam gun for providing an electron beam; a beam trap for trapping the electron beam; a control device for driving the electron beam gun and/or the beam trap, wherein the control device is configured to switch over the driving between a plurality of configurations, of which: in a first configuration, the electron beam is directed onto the beam trap; and in a second configuration, the electron beam is directed past the beam trap.

78. 发明申请

US20210159112A1 LIFT APPARATUS AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME 有权
公开(公告)号：US20210159112A1
公开(公告)日：2021-05-27
申请号：US16895513
申请日：2020-06-08
申请人： SAMSUNG ELECTRONICS CO., LTD.
发明人： Byeongsang Kim , Keonwoo Kim , Wooram Kim , Eungsu Kim , Heewon Min , Sangwook Park , Seungwon Shin , Dongyun Yeo , Geunsik Oh , Hyanjung Lee
IPC分类号： H01L21/687 , H01L21/67 , H01L21/683 , H01J37/20
摘要： A lift apparatus for moving an object up and down in a substrate processing apparatus, the lift apparatus including a body configured to support the object while a lift hole, included in the body, is overlapped by the object in a vertical direction; a lift pin configured to move the object up and down by moving up and down in the lift hole; a bellows including an upper flange, a lower flange, and a flexible pipe; a connector combined with a lower portion of the lift pin in the flexible pipe and configured to interfere with downward movement of the lift pin and to allow at least one from among rotation, sliding, and tilting of the lift pin; a load sensor configured to measure vertical load generated in accordance with movement of the lift pin; and an actuator configured to move the lift pin up and down.

79. 发明申请

US20210159045A1 ADJUSTING MECHANISM FOR ADJUSTING DEFORMATION OF PANEL AND ELECTRON BEAM DETECTION APPARATUS COMPRISING THE SAME 有权
公开(公告)号：US20210159045A1
公开(公告)日：2021-05-27
申请号：US16730394
申请日：2019-12-30
申请人： Zhongke Jingyuan Electron Limited, Beijing (CN)
发明人： Lei JIANG
IPC分类号： H01J37/20 , H01J37/28 , H01J37/26
摘要： An adjusting mechanism for adjusting a deformation of a panel and an electron beam detection apparatus comprising the same are disclosed, the adjusting mechanism including: a support plate, which is provided opposite to the panel, with a periphery of the support plate being in positive fit with a periphery of the panel; and at least one screw set, each screw set comprising: at least one first screw, each first screw penetrating through the support plate, and in turn being connected to the panel by being screwed into the panel; and at least one second screw, each second screw being screwed to penetrate through the support plate and to abut against the panel; the support has its structural rigidity larger than a structural rigidity of the panel.

80. 发明申请

US20210151283A1 COMPOSITE CHARGED PARTICLE BEAM APPARATUS 有权
公开(公告)号：US20210151283A1
公开(公告)日：2021-05-20
申请号：US17129700
申请日：2020-12-21
申请人： HITACHI HIGH-TECH SCIENCE CORPORATION
发明人： Hiroyuki SUZUKI , Shinya KITAYAMA
IPC分类号： H01J37/20
摘要： A composite charged particle beam apparatus includes a first charged particle beam column that irradiates a thin sample with a first charged particle beam, and a second charged particle beam column that irradiates an irradiation position of the first charged particle beam on the thin sample with a second charged particle beam. A sample holder as a base stage disposed on a sample stage, a motor-driven rotation driving section, a rotation stand rotatable about a flip axis by the driving of the rotation driving section, and a TEM grid that holds the thin sample. The TEM grid is movable within a surface perpendicular to an observation surface of the thin sample together with the rotation stand by being reciprocally driven around the flip axis by the driving section.

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