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    • 71. 发明授权
    • Substrate processing apparatus and substrate processing method
    • 基板加工装置及基板处理方法
    • US08268384B2
    • 2012-09-18
    • US12887019
    • 2010-09-21
    • Nobuaki MatsuokaYoshio KimuraAkira Miyata
    • Nobuaki MatsuokaYoshio KimuraAkira Miyata
    • B05C13/02B05C11/00B05C11/02B05D3/12H01L21/20
    • H01L21/67173H01L21/67178H01L21/67184H01L21/67276H01L21/67754
    • A substrate transfer system to reduce total processing time by transferring a substrate at a first delivery stage to a process block where processing can be carried out earliest. The substrate processing apparatus includes a first transfer device delivering a wafer with respect to a substrate carrier, and a second transfer device delivering a wafer between a plurality of process blocks and the first transfer device via a first delivery stage, to transfer the wafer with respect to the process blocks. The process block where there is no wafer or where processing of the last wafer within the relevant process block will be completed earliest is determined based on processing information of the wafers from the process blocks, and the wafer of the first delivery stage is transferred by the second transfer device to the relevant process block. This ensures smooth transfer of the wafer to the process block.
    • 一种基板转印系统,用于通过在第一递送阶段将基底转移到可以最早进行处理的工艺块来减少总处理时间。 衬底处理设备包括相对于衬底载体传送晶片的第一传输装置和经由第一传送级在多个处理块和第一传送装置之间传送晶片的第二传送装置,以相对于 到过程块。 基于来自处理块的晶片的处理信息,确定最早期完成相关处理块内没有晶片或最后晶片的处理块的处理块,并且第一传送阶段的晶片由 第二传输设备到相关进程块。 这确保晶片平滑地转移到处理块。
    • 72. 发明授权
    • Method and equipment for making abrasive particles in even distribution, array pattern and preferred orientation
    • 使研磨颗粒均匀分布,阵列图案和优选取向的方法和设备
    • US08262758B2
    • 2012-09-11
    • US12115474
    • 2008-05-05
    • Weixing Gao
    • Weixing Gao
    • B24D3/14C09C1/68C09K3/14B05C11/02
    • B24D18/00B22F2998/00C09K3/1409C22C2202/02B22F1/02
    • An equipment for making abrasive particles in even distribution, array pattern and preferred orientation comprises an adsorbing releasing apparatus being composed of a plurality of acicular soft magnetic metallic sticks, an upper and a lower stators, and a plurality of windings. Each winding forms an electric circuit through a electrical source, a resistance, and a switch a plurality of blind holes being distributed on face of the blind hole feeding tropism board. Using electric current to form magnetic field for the acicular soft magnetic metallic sticks absorb or release abrasive particles plated with soft magnetic materials. The equipment is simple, convenient in operation, high in efficiency and reliability. The equipment makes abrasive particles in matrix with an ideal state in distributing density, uniformity, arrange, and tropism. Thereby, the function of the abrasive materials is fully exerted and the life of products is prolonged.
    • 用于制造均匀分布,阵列图案和优选取向的磨粒的设备包括由多个针状软磁金属棒,上下定子和多个绕组组成的吸附释放装置。 每个绕组通过电源,电阻和开关形成电路,多个盲孔分布在盲孔馈电向对面板的表面上。 针对软磁金属棒使用电流形成磁场吸收或释放镀有软磁材料的磨料颗粒。 设备简单,操作方便,效率高,可靠性高。 该设备使磨料颗粒在分布密度,均匀性,排列和向性方面具有理想状态的基质。 从而充分发挥研磨材料的功能,延长产品的使用寿命。
    • 74. 发明授权
    • Device and method for wet treating plate-like-articles
    • 用于湿处理板状制品的装置和方法
    • US08231939B2
    • 2012-07-31
    • US12519232
    • 2007-11-19
    • Michael BruggerAlexander Schwarzfurtner
    • Michael BruggerAlexander Schwarzfurtner
    • B05D3/12B05C11/02B05C5/00
    • H01L21/68735G03F7/162H01L21/67023H01L21/6704H01L21/67051H01L21/67063H01L21/67075H01L21/6708H01L21/6715
    • A method and device for wet treatment of plate-like articles includes, a chuck for holding a single plate-like article having an upwardly facing surface for receiving liquid running off a plate-like article when being treated with liquid, wherein the chuck is outwardly bordered by a circumferential annular lip. The chuck has an outer diameter greater than the greatest diameter of the plate-like article to be treated, and a rotatable part with an upwardly facing ring-shaped surface for receiving liquid running off the circumferential lip of the chuck. The rotatable part is rotatable with respect to the chuck, the ring-shaped surface is coaxially arranged with respect to the circumferential annular lip, the inner diameter of the ring-shaped surface is smaller than the outer diameter of the chuck, and the distance d between the lip and the upwardly facing ring-shaped surface is in a range from 0.1 mm to 5 mm.
    • 用于板状制品的湿处理的方法和装置包括:用于保持单个板状制品的卡盘,其具有向上表面,用于在用液体处理时接收从板状物品流出的液体,其中卡盘向外 由圆周环形唇形边界。 卡盘具有大于待处理的板状物品的最大直径的外径,以及具有朝上的环形表面的可旋转部分,用于接收从卡盘的周缘移出的液体。 可旋转部分相对于卡盘可旋转,环形表面相对于周向环形唇缘同轴布置,环形表面的内径小于卡盘的外径,距离d 在唇缘和向上的环形表面之间的距离在0.1mm至5mm的范围内。
    • 77. 发明申请
    • Liquid jet head, liquid jet apparatus, and method of manufacturing a liquid jet head
    • 液体喷射头,液体喷射装置和液体喷射头的制造方法
    • US20120121797A1
    • 2012-05-17
    • US13373178
    • 2011-11-07
    • Osamu Koseki
    • Osamu Koseki
    • B05D5/12B05C11/02
    • B41J2/14209B41J2002/14491
    • A liquid jet head includes an actuator substrate having grooves, and a flexible substrate for supplying a drive signal to the actuator substrate. On a surface of the actuator substrate, in the vicinity of a rear end thereof, are formed a common extension electrode and an individual extension electrode connected to drive electrodes of a discharge channel and dummy channels, respectively. The common extension electrode and the individual extension electrode are connected to a common wiring electrode and an individual wiring electrode of the flexible substrate, respectively. In a common wiring intersection region in which the common wiring electrode of the flexible substrate intersects the drive electrodes of the actuator substrate, upper end portions of the drive electrodes on side surfaces of the dummy channels are formed deeper than the substrate surface.
    • 液体喷射头包括具有槽的致动器基板和用于向致动器基板提供驱动信号的柔性基板。 在致动器基板的表面上,在其后端附近形成有公共延伸电极和分别连接到放电通道和虚拟通道的驱动电极的单独的延伸电极。 公共延长电极和各个延伸电极分别连接到柔性基板的公共布线电极和单独的布线电极。 在柔性基板的公共布线电极与致动器基板的驱动电极相交的公共布线交叉区域中,虚拟通道的侧面的驱动电极的上端部形成为比基板表面更深。