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    • 72. 发明申请
    • Protective Layer for Large-Scale Production of Thin-Film Solar Cells
    • 薄膜太阳能电池大规模生产保护层
    • US20110318868A1
    • 2011-12-29
    • US13230305
    • 2011-09-12
    • Chris SchmidtJohn Corson
    • Chris SchmidtJohn Corson
    • H01L31/0264
    • H01L31/022425H01L31/022466H01L31/0392H01L31/03928H01L31/056Y02E10/52Y02E10/541
    • A solar cell includes a substrate, a protective layer located over a first surface of the substrate, a first electrode located over a second surface of the substrate, at least one p-type semiconductor absorber layer located over the first electrode, an n-type semiconductor layer located over the p-type semiconductor absorber layer, and a second electrode over the n-type semiconductor layer. The p-type semiconductor absorber layer includes a copper indium selenide (CIS) based alloy material, and the second electrode is transparent and electrically conductive. The protective layer has an emissivity greater than 0.25 at a wavelength of 2 μm, has a reactivity with a selenium-containing gas lower than that of the substrate, and may differ from the first electrode in at least one of composition, thickness, density, emissivity, conductivity or stress state. The emissivity profile of the protective layer may be uniform or non-uniform.
    • 太阳能电池包括基板,位于基板的第一表面上的保护层,位于基板的第二表面上的第一电极,位于第一电极上方的至少一个p型半导体吸收层,n型 半导体层位于p型半导体吸收体层上方,第二电极位于n型半导体层的上方。 p型半导体吸收层包括基于铜铟硒(CIS)的合金材料,第二电极是透明和导电的。 保护层的波长为2μm时的发射率大于0.25,与含有硒的气体的反应性低于衬底的反应性,并且与第一电极的组成,厚度,密度, 发射率,电导率或应力状态。 保护层的发射率曲线可以是均匀的或不均匀的。
    • 74. 发明申请
    • Manufacturing Apparatus and Method for Large-Scale Production of Thin-Film Solar Cells
    • 薄膜太阳能电池大规模生产的制造装置和方法
    • US20110259418A1
    • 2011-10-27
    • US13173507
    • 2011-06-30
    • Dennis R. Hollars
    • Dennis R. Hollars
    • H01L31/0224H01L31/18H01L31/0264
    • H01L31/18C23C14/0057C23C14/3414C23C14/352C23C14/562H01L31/022425H01L31/0322H01L31/0336Y02E10/541Y02P70/521
    • A method of manufacturing improved thin-film solar cells entirely by sputtering includes a high efficiency back contact/reflecting multi-layer containing at least one barrier layer consisting of a transition metal nitride. A copper indium gallium diselenide (Cu(InXGa1-X)Se2) absorber layer (X ranging from 1 to approximately 0.7) is co-sputtered from specially prepared electrically conductive targets using dual cylindrical rotary magnetron technology. The band gap of the absorber layer can be graded by varying the gallium content, and by replacing the gallium partially or totally with aluminum. Alternately the absorber layer is reactively sputtered from metal alloy targets in the presence of hydrogen selenide gas. RF sputtering is used to deposit a non-cadmium containing window layer of ZnS. The top transparent electrode is reactively sputtered aluminum doped ZnO. A unique modular vacuum roll-to-roll sputtering machine is described. The machine is adapted to incorporate dual cylindrical rotary magnetron technology to manufacture the improved solar cell material in a single pass.
    • 完全通过溅射制造改进的薄膜太阳能电池的方法包括含有由过渡金属氮化物组成的至少一个阻挡层的高效率背接触/反射多层。 使用双圆柱形旋转磁控管技术,由专门制备的导电靶共溅射铜铟镓二硒化物(Cu(In x Ga 1-x)Se 2)吸收层(X为1至约0.7)。 吸收层的带隙可以通过改变镓含量来分级,并且通过用铝部分或全部替换镓来分级。 或者,在硒化氢气体存在下,吸收层从金属合金靶反应溅射。 使用RF溅射沉积含有ZnS的不含镉的窗口层。 顶部透明电极是反应溅射的铝掺杂的ZnO。 描述了一种独特的模块化真空辊对辊溅射机。 该机器适用于采用双圆柱形旋转磁控管技术,以单程制造改进的太阳能电池材料。
    • 79. 发明申请
    • LAYER SYSTEM FOR SOLAR CELLS
    • 太阳能电池层系统
    • US20110168258A1
    • 2011-07-14
    • US12992199
    • 2009-05-19
    • Jorg Palm
    • Jorg Palm
    • H01L31/0272H01L31/0264H01L31/0376
    • H01L31/0322H01L31/0749Y02E10/541
    • The present invention relates to a layer system (1) for thin-film solar cells and solar modules based on CIS-absorbers (4). The layer system (1) according to the invention has a buffer layer (4) made of In2(S1−x,Sex)3+δ, wherein 0≦x≦1 and −1≦δ≦1. Additionally, the buffer layer (5) is amorphously designed. With this buffer layer (5), the disadvantages of CdS-buffers frequently used to date, namely toxicity and poor process integration, are overcome, whereby in addition to high efficiency, high long-term stability is also achieved; and thus again the disadvantages of conventional buffer layers alternative to CdS do not exist.
    • 本发明涉及一种用于薄膜太阳能电池的层系统(1)和基于CIS吸收体(4)的太阳能模块。 根据本发明的层系统(1)具有由In2(S1-x,Sex)3 +δ制成的缓冲层(4),其中0≦̸ x≦̸ 1和-1≦̸δ≦̸ 1。 此外,缓冲层(5)是无定形设计的。 对于这种缓冲层(5),克服了迄今为止经常使用的CdS缓冲液的缺点,即毒性和过程整合不良,除了高效率之外,还实现了高长期稳定性; 因此不再存在替代CdS的常规缓冲层的缺点。
    • 80. 发明申请
    • DEVICE FOR FABRICATING A PHOTOVOLTAIC ELEMENT WITH STABILISED EFFICIENCY
    • 用于制造具有稳定效率的光伏元件的装置
    • US20110162716A1
    • 2011-07-07
    • US12971232
    • 2010-12-17
    • Axel HerguthGunnar SchubertGiso HahnIhor MelnykMartin Käs
    • Axel HerguthGunnar SchubertGiso HahnIhor MelnykMartin Käs
    • H01L31/0264H01L31/18H05B3/68
    • H01L31/1864H01L31/1804Y02E10/547Y02P70/521
    • A method and device for fabricating a photovoltaic element with stabilized efficiency is proposed. The method comprises the following steps: preparing a boron-doped, oxygen-containing silicon substrate; forming an emitter layer on a surface of the silicon substrate; and a stabilization treatment step. The stabilization treatment step comprises keeping the temperature of the substrate during a treatment time within a selectable temperature range having a lower temperature limit of 50° C., preferably 90° C., more preferably 130° C. and even more preferably 160° C. and an upper temperature limit of 230° C., preferably 210° C., more preferably 190° C. and even more preferably 180° C., and generating excess minority carriers in the silicon substrate during the treatment time, for example, by illuminating the substrate or by applying an external voltage. This method can be used to fabricate a photovoltaic element, e.g. a solar cell or a solar module having an efficiency which is stable at a value higher than that of photovoltaic elements fabricated without the stabilization treatment step.
    • 提出了一种用于制造具有稳定效率的光电元件的方法和装置。 该方法包括以下步骤:制备硼掺杂的含氧硅衬底; 在所述硅衬底的表面上形成发射极层; 和稳定化处理步骤。 稳定化处理步骤包括将处理时间内的基板的温度保持在温度下限为50℃,优选为90℃,更优选为130℃,甚至更优选为160℃的可选温度范围内 并且上限温度为230℃,优选为210℃,更优选为190℃,甚至更优选为180℃,并且在处理时间内在硅衬底中产生过量的少数载流子,例如, 通过照射衬底或施加外部电压。 该方法可用于制造光电元件,例如, 太阳能电池或太阳能组件,其效率比在没有稳定化处理步骤的光电元件的值高的情况下是稳定的。