专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

81. 发明公开

US20230192599A1 METHOD FOR PREPARING AZO COMPOUND 审中-公开
公开(公告)号：US20230192599A1
公开(公告)日：2023-06-22
申请号：US18171366
申请日：2023-02-19
申请人： DONGJIN SEMICHEM CO., LTD.
发明人： Min Seung Shin , Young Gi Kim , Sok Kyun Choi , Su Min Son
IPC分类号： C07C241/02 , C07C281/20
CPC分类号： C07C241/02 , C07C281/20
摘要： A method for preparing an azo compound includes a first step for producing an Xb molecule by electrolyzing, in a reaction system, a first solution including a hydrazo compound and at least one type of MaXb; a second step for oxidizing the hydrazo compound with the generated Xb molecule to obtain a second solution including an azo compound, MaXb, and HX; a third step for discharging the second solution outside the reaction system, and separating therefrom a third solution including MaXb and HX to obtain a solid azo compound; and a fourth step for introducing the third solution and an additional hydrazo compound equivalent to the hydrazo compound into the reaction system, and electrolyzing a fourth solution including the additional hydrazo compound, MaXb, and HX to produce an Xb molecule.

82. 发明申请

US20220342309A1 PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY DEVICE COMPRISING SAME 有权
公开(公告)号：US20220342309A1
公开(公告)日：2022-10-27
申请号：US17724888
申请日：2022-04-20
申请人： DONGJIN SEMICHEM CO., LTD.
发明人： Seung Han JEON , Hyoc Min YOUN , Jin Sun KIM , Jong Ho JEONG , Eui Soon KIM , Young Jun RYU , Chang Hwan AHN
IPC分类号： G03F7/075 , C08G77/20
摘要： Proposed is a photosensitive resin composition including a siloxane copolymer having both a thermosetting functional group and a photocurable functional group. The composition, according to this disclosure, is capable of both thermal curing and photo-curing and thus can form a stable cured film in a flexible display process where a low-temperature process of 150° C. or less is essential.

83. 发明申请

US20190245003A1 PROTECTIVE FILM COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR PACKAGE BY USING THE SAME 审中-公开
公开(公告)号：US20190245003A1
公开(公告)日：2019-08-08
申请号：US16229972
申请日：2018-12-21
申请人： SAMSUNG ELECTRONICS CO., LTD.
发明人： Myoung-chul Eum , Hye-kyoung Lee , Chang-kun Kang , Jae-hyun Kim , Kyeong-il Oh , Seung-keun Oh , Chi-hwan Lee
IPC分类号： H01L27/146 , H01L21/683 , H01L21/78 , C09D133/08 , C09D133/14 , C08F220/18 , C08F220/28 , C08F220/30
CPC分类号： H01L27/14687 , C08F220/18 , C08F220/28 , C08F220/30 , C08F2220/1841 , C08F2220/185 , C08F2220/1858 , C08F2220/1875 , C08F2220/1891 , C08F2220/281 , C08F2220/282 , C08F2220/301 , C08F2220/302 , C08F2220/305 , C09D133/08 , C09D133/14 , H01L21/6835 , H01L21/78 , H01L27/14627 , H01L27/14645 , H01L27/14685 , H01L2221/68327 , H01L2221/6834
摘要： A protective film composition includes a polymer having the following formula: each of a, b, and c is a mole fraction; a+b+c=1; 0.05≤a/(a+b+c)≤0.3; 0.1≤b/(a+b+c)≤0.6; 0.1≤c/(a+b+c)≤0.6; each of R1, R2, and R3 is a hydrogen atom or a methyl group; R4 is a hydrogen atom, a butyrolactonyl group, or a substituted or unsubstituted C3 to C30 alicyclic hydrocarbon group; and R5 is a substituted or unsubstituted C6 to C30 linear or cyclic hydrocarbon group. A method of manufacturing a semiconductor package includes forming a sawing protective film on a semiconductor structure by using the protective film composition and sawing the sawing protective film and the semiconductor structure from the sawing protective film.

84. 发明授权

US10280336B2 Coating method for preventing bending phenomenon of substrate 有权
公开(公告)号：US10280336B2
公开(公告)日：2019-05-07
申请号：US15129416
申请日：2015-03-31
申请人： DONGJIN SEMICHEM. CO., LTD
发明人： Kyu Soon Shin , Hee Jung Jung , Seung Sock Choi
IPC分类号： C09D183/04 , B05D7/04 , B05D7/00 , C03C17/30 , C08J7/04 , C03C17/32 , C03C17/34 , B05D5/00
摘要： The present invention relates to a coating method for preventing warpage of a substrate, and more specifically, to a coating method for preventing substrate warpage comprising forming two or more coating layers by coating the surface of a substrate with coating compositions having different densities, wherein at least one layer of the two or more coating layers is coated and cured with a coating composition containing a silsesquioxane composite polymer represented by a specific chemical formula, thereby not only preventing substrate warpage but also providing high surface hardness, excellent transparency, scratch resistance, water repellent characteristics, anti-fouling characteristics, anti-fingerprint property, thermal stability and gloss characteristics to the surface of the substrate.

85. 发明申请

US20180079647A1 FUNCTIONALIZED GRAPHENE COMPRISING TWO OR MORE TYPES OF AMINES, AND PREPARATION METHOD THEREFOR 审中-公开
公开(公告)号：US20180079647A1
公开(公告)日：2018-03-22
申请号：US15822795
申请日：2017-11-27
申请人： Dongjin Semichem Co., Ltd.
发明人： Sunchan Park , Hyeonseong Choe , Soo Yeon Lee , Seon Yeong Gong
IPC分类号： C01B32/194 , C01B32/198 , C07C211/03 , C07C211/09 , C08K3/04
CPC分类号： C01B32/194 , C01B32/198 , C01B2204/30 , C07C211/03 , C07C211/09 , C07C211/18 , C07C211/51 , C07C2601/14 , C08J2300/22 , C08J2300/24 , C08K3/042 , C08K2201/001 , C08L67/02
摘要： Disclosed is a functionalized graphene containing two or more amines having excellent electrical, thermal and mechanical properties by allowing good interfacial bonding force and uniform dispersion with a thermoplastic polymer, and a method for preparing the functional graphene. The functionalized graphene comprises a carbon material selected from the group consisting of graphene, reduced graphene, graphene oxide, and mixture thereof; and a monovalent amine group and a bivalent or higher amine group which are bonded to the carbon material.

86. 发明授权

US09170495B2 Phenol monomer, polymer for forming a resist underlayer film including same, and composition for a resist underlayer film including same 有权
标题翻译：苯酚单体，用于形成其包含其的抗蚀剂下层膜的聚合物，以及包含其的抗蚀剂下层膜的组合物
公开(公告)号：US09170495B2
公开(公告)日：2015-10-27
申请号：US14354978
申请日：2012-11-01
申请人： DONGJIN SEMICHEM CO., LTD.
发明人： Jeong-Sik Kim , Jae-Woo Lee , Jae-Hyun Kim
IPC分类号： G03F7/11 , G03F7/09 , C08G61/12 , C07D311/86 , C07D495/10 , C07D491/107 , C08G8/20 , C09D161/12
CPC分类号： G03F7/094 , C07D311/86 , C07D491/107 , C07D495/10 , C08G8/20 , C08G61/122 , C08G2261/344 , C09D161/12 , G03F7/091 , G03F7/11
摘要： A phenolic monomer used in the lithographic process for semiconductor fabrication, a polymer for preparing a resist under-layer comprising the same, and a resist under-layer composition comprising the same, are disclosed. The phenolic monomer is represented by the formula 1 of the specification, in Formula 1, R1, R2, R3, and R4 are independently a hydrogen atom, or a straight-chain, branched, monocyclic or polycyclic saturated or unsaturated hydrocarbon group having 1 to 20 carbon atoms with or without a hetero atom; A is a monocyclic or polycyclic aromatic hydrocarbon group having 4 to 20 carbon atoms; X is an oxygen atom (O) or a sulfur atom (S); and Y is a single bond, a methylene group (—CH2-), an oxygen atom (O), a sulfur atom (S), an amino group (—NH—), or two isolated hydrogen atoms, wherein A, R1, R2, R3, and R4 can be substituted with a straight-chain, branched, monocyclic or polycyclic saturated or unsaturated hydrocarbon group having 1 to 20 carbon atoms with or without a hetero atom; and either R1 and R2 or R3 and R4 are independently linked to each other to form a ring.
摘要翻译：公开了用于半导体制造的光刻工艺中使用的酚单体，用于制备含有它的抗蚀剂底层的聚合物和包含该酚醛单体的抗蚀剂底层组合物。酚类单体由式1的式1表示，式1中，R 1，R 2，R 3和R 4独立地为氢原子或直链，支链，单环或多环饱和或不饱和烃基，其具有1〜具有或不具有杂原子的20个碳原子; A是具有4-20个碳原子的单环或多环芳族烃基; X是氧原子（O）或硫原子（S）; Y为单键，亚甲基（-CH 2 - ），氧原子（O），硫原子（S），氨基（-NH-）或两个分离的氢原子，其中A， R 2，R 3和R 4可以被具有或不具有杂原子的具有1至20个碳原子的直链，支链，单环或多环饱和或不饱和烃基取代; 并且R 1和R 2或R 3和R 4彼此独立地连接形成环。

87. 发明授权

US09063424B2 Isocyanurate compound for forming organic anti-reflective layer and composition including same 有权
标题翻译：用于形成有机抗反射层的异氰脲酸酯化合物及包含其的组合物
公开(公告)号：US09063424B2
公开(公告)日：2015-06-23
申请号：US13393682
申请日：2010-09-14
申请人： Hyo-Jung Roh , Dong-Kyu Ju , Hyun-Jin Kim , Deog-Bae Kim
发明人： Hyo-Jung Roh , Dong-Kyu Ju , Hyun-Jin Kim , Deog-Bae Kim
IPC分类号： G03F7/09 , C07D251/06 , C08L81/00 , H01L31/0216 , C08F283/00 , C08G75/00 , C08K5/00 , B05D3/02 , G03F7/16 , H01L21/02 , H01L21/4757 , H01L21/027 , C08K5/42
CPC分类号： G03F7/091 , B05D3/02 , C07D251/06 , C08F283/00 , C08G75/00 , C08K5/0025 , C08K5/42 , C09D5/006 , G03F7/168 , H01L21/0201 , H01L21/0271 , H01L21/4757 , H01L31/02168 , H01L2924/0705 , H01L2924/364 , C08L81/00
摘要： An isocyanurate compound for forming an organic anti-reflective coating layer, which has superior stability and etch rate at a high temperature, and which has a high refractive index, is represented by following Formula 1. In Formula 1, R is independently a hydrogen atom or a methyl group, R1 is independently a chain type or ring type saturated or unsaturated hydrocarbyl group of 1 to 15 carbon atoms containing 0 to 6 of hetero atoms, and R2 independently a chain type or ring type saturated or unsaturated hydrocarbyl group of 1 to 15 carbon atoms containing 0 to 15 of hetero atoms, wherein, R1 can have at least two bonding parts, and in the case that R1 has at least two bonding parts, the rest parts except R1 of the compounds represented by Formula 1 can connect to the R1 to form a polymer structure.
摘要翻译：用于形成有机抗反射涂层的异氰脲酸酯化合物，其在高温下具有优异的稳定性和蚀刻速率，并且具有高折射率，由下式1表示。在式1中，R独立地为氢原子或甲基，R 1独立地为含有0〜6个杂原子的1〜15个碳原子的链型或环型饱和或不饱和烃基，R2独立地为1〜1的链型或环型饱和或不饱和烃基含有0〜15个杂原子的15个碳原子，其中，R1可以具有至少两个键合部分，并且在R1具有至少两个键合部分的情况下，由式1表示的化合物除了R1之外的其余部分可以连接到 R1形成聚合物结构。

88. 发明授权

US08687266B2 Display device driven by electric field 有权
标题翻译：显示设备由电场驱动
公开(公告)号：US08687266B2
公开(公告)日：2014-04-01
申请号：US13503937
申请日：2010-10-29
申请人： Chun-Hyuk Lee , Byung-Uk Kim , Mun-Pyo Hong , Hong Choi , Byung-Seong Bae
发明人： Chun-Hyuk Lee , Byung-Uk Kim , Mun-Pyo Hong , Hong Choi , Byung-Seong Bae
IPC分类号： G02B26/00
CPC分类号： G02F1/167 , G02F1/133512 , G02F2001/1676
摘要： The present invention relates to an electric-field drive display device. According to one embodiment of the present invention, the electric-field drive display device comprises: a first substrate; a first electrode which is formed on the first substrate; a second electrode which is formed on the first substrate and is disposed in parallel with the first electrode; a drive partition wall which is formed on the first electrode and the second electrode and has a plurality of opening and closing holes; and a plurality of drive bodies which are disposed inside each of the opening and closing holes. Consequently, the electric-field drive display device according to one embodiment of the present invention can adjust the amount of light transmitted and so display the desired image by adjusting the positions of the drive bodies in the horizontal direction through the use of electrical force.
摘要翻译：电场驱动显示装置技术领域本发明涉及电场驱动显示装置。根据本发明的一个实施例，电场驱动显示装置包括：第一基板; 形成在第一基板上的第一电极; 第二电极，形成在第一基板上并与第一电极平行设置; 驱动分隔壁，其形成在所述第一电极和所述第二电极上，并且具有多个开闭孔; 以及设置在每个所述开闭孔内的多个驱动体。因此，根据本发明的一个实施例的电场驱动显示装置可以通过使用电力调节驱动体在水平方向上的位置来调节透光量并从而显示所需图像。

89. 发明授权

US08241375B1 Method for preparing chemical mechanical polishing slurry composition 有权
标题翻译：化学机械抛光浆料组合物的制备方法
公开(公告)号：US08241375B1
公开(公告)日：2012-08-14
申请号：US13433041
申请日：2012-03-28
申请人： Jong-Dai Park , Dong-Wan Kim
发明人： Jong-Dai Park , Dong-Wan Kim
IPC分类号： B24D3/02 , C09C1/68 , C09K3/14
CPC分类号： B24D3/02 , C09G1/02 , C09K3/1409 , C09K3/1463 , H01L21/3212
摘要： A method for preparing a chemical mechanical polishing slurry composition comprises the steps of preparing an aqueous iron salt solution by admixing an iron salt and cooled water of 5° C. or less; preparing an oxide containing silicon and iron as an additive by admixing and stirring a silicon salt and the aqueous iron salt solution for carrying out a reaction of the silicon salt and the aqueous iron salt solution to form an additive solution; and mixing the additive solution with at least one abrasive, at least one oxidizing agent and optionally at least one additional component to form the chemical mechanical polishing slurry composition.
摘要翻译：制备化学机械抛光浆料组合物的方法包括以下步骤：通过混合铁盐和5℃或更低的冷却水来制备铁盐水溶液; 通过混合和搅拌硅盐和铁盐水溶液来制备含有硅和铁的氧化物作为添加剂，以进行硅盐和铁盐水溶液的反应以形成添加剂溶液; 以及将添加剂溶液与至少一种研磨剂，至少一种氧化剂和任选的至少一种另外的组分混合以形成化学机械抛光浆料组合物。

90. 发明申请

US20120037270A1 APPARATUS FOR MONITORING A DYE SOLUTION TO BE ADSORBED TO A DYE-SENSITIZED SOLAR CELL, AND APPARATUS FOR ADJUSTING THE DYE SOLUTION 有权
标题翻译：用于监测要被吸收到透明的太阳能电池的染料溶液的装置和用于调节染料溶液的装置
公开(公告)号：US20120037270A1
公开(公告)日：2012-02-16
申请号：US13255451
申请日：2009-03-10
申请人： Chong-chan Lee , Yoon-Gil Yim
发明人： Chong-chan Lee , Yoon-Gil Yim
IPC分类号： B65B3/04 , G01N31/00 , G01N21/00
CPC分类号： G01N21/5907 , G01N2021/8416 , H01G9/2031 , H01G9/2059 , H01G9/2068 , H01L51/0086 , Y02E10/542
摘要： This disclosure relates to a dye solution monitoring device and a dye solution controlling device for a dye-sensitized solar cell, more particularly, to a dye solution monitoring device for a dye-sensitized solar cell comprising a light-absorption device for measuring absorbance of a dye solution for a dye-sensitized solar cell, and a pH measuring device for measuring pH of a dye solution for a dye-sensitized solar cell; and, a dye solution controlling device for a dye-sensitized solar cell further comprising a dye supply device supplying dye of high concentration, and an acid or base supply device for pH control, in addition to the monitoring device.According to the present invention, a dye adsorption process may be optimized in real time to manufacture a solar cell of high quality with high productivity, maximize utilization of expensive dye, and minimize the waste, thereby reducing production cost.
摘要翻译：本发明涉及一种用于染料敏化太阳能电池的染料溶液监测装置和染料溶液控制装置，更具体地涉及用于染料敏化太阳能电池的染料溶液监测装置，其包括用于测量吸光度的吸光装置用于染料敏化太阳能电池的染料溶液和用于测量染料敏化太阳能电池的染料溶液的pH的pH测量装置; 以及用于染料敏化太阳能电池的染料溶液控制装置，除了监测装置之外，还包括供给高浓度染料的染料供给装置和用于pH控制的酸或碱供应装置。根据本发明，可以实时优化染料吸附过程，以高生产率制造高质量的太阳能电池，最大限度地利用昂贵的染料，并最大限度地降低生产成本。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式