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81. 发明授权

US10267817B2 Automatic analysis apparatus 有权
公开(公告)号：US10267817B2
公开(公告)日：2019-04-23
申请号：US15326820
申请日：2015-06-10
申请人： Hitachi High-Technologies Corporation
发明人： Tatsuya Sakai , Akihisa Makino , Minoru Sano , Chie Yabutani
IPC分类号： G01N35/02 , G01N35/00 , G01N35/10 , G01N33/86 , G01N35/04
摘要： Provided is an automatic analysis apparatus for inspecting blood coagulation, which is capable of miniaturizing device configuration and reducing device costs. The automatic analysis apparatus includes: a reaction container in which a specimen and a reagent are mixed with each other and the mixed solution is reacted; a sample dispensing mechanism which dispenses the specimen into the reaction container; a blood coagulation time measuring unit in which the reaction container is mounted to measure a coagulation time of the mixed solution within the reaction container; a reaction container accommodating unit which accommodates a plurality of reaction containers provided to the blood coagulation measuring unit; a reaction container transfer mechanism which grasps the reaction container and transfers the reaction container to the blood coagulation measuring unit; and a control unit which controls the reaction container transfer mechanism.

82. 发明授权

US10267745B2 Defect detection method and defect detection device and defect observation device provided with same 有权
公开(公告)号：US10267745B2
公开(公告)日：2019-04-23
申请号：US15673582
申请日：2017-08-10
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Yuko Otani , Takehiro Tachizaki , Masahiro Watanabe , Shunichi Matsumoto
IPC分类号： G01N21/00 , G01N21/88 , G01N21/21 , G01N21/95 , G01N21/47 , G01N21/94 , G01N21/956
摘要： The disclosed device, which, using an electron microscope or the like, minutely observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, can reliably insert a defect to be observed into the field of an electron microscope or the like, and can be a device of smaller scale. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration incorporating an optimal microscope that re-detects defects, and a spatial filter and a distribution polarization element are inserted at the pupil plane when making dark-field observations using this optical microscope. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration incorporating an optimal microscope that re-detects defects, and a distribution filter is inserted at the pupil plane when making dark-field observations using this optical microscope.

83. 外观设计

USD846138S1 Clinical analyzer 有权
公开(公告)号：USD846138S1
公开(公告)日：2019-04-16
申请号：US29627767
申请日：2017-11-29
申请人： Hitachi High-Technologies Corporation
设计人： Ai Masuda , Hiroyuki Noda , Mitsuru Oonuma , Tetsuji Kawahara , Takamichi Mori

84. 发明授权

US10262835B2 Plasma processing equipment and plasma generation equipment 有权
公开(公告)号：US10262835B2
公开(公告)日：2019-04-16
申请号：US15392060
申请日：2016-12-28
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Ryoji Nishio
IPC分类号： H01J37/32
摘要： A plasma processing equipment includes a vacuum processing chamber, an insulating material, a gas inlet, a high frequency induction antenna provided at an upper outside of the vacuum processing chamber, a magnetic field coil, a yoke for controlling distribution of a magnetic field in the vacuum processing chamber, a high frequency power supply for generating plasma and supplying a high frequency current to the antenna, and a power supply for supplying power to the magnetic field coil. The antenna is divided into n high frequency induction antenna elements are arranged in tandem on one circle so that a high frequency current delayed sequentially by λ (wavelength of high frequency power supply)/n flows clockwise through the antenna elements arranged in tandem via a delay unit, and a magnetic field is applied from the magnetic field coil to generate electron cyclotron resonance (ECR) phenomenon.

85. 发明授权

US10254235B2 Defect inspecting method and defect inspecting apparatus 有权
公开(公告)号：US10254235B2
公开(公告)日：2019-04-09
申请号：US15806937
申请日：2017-11-08
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Toshiyuki Nakao , Shigenobu Maruyama , Akira Hamamatsu , Yuta Urano
IPC分类号： G01N21/00 , G01N21/95 , G01N21/88 , H01L21/66
摘要： A defect inspecting method and apparatus for inspecting a surface state including a defect on a wafer surface, in which a polarization state of a laser beam irradiated onto the wafer surface is connected into a specified polarization state, the converted laser beam having the specified polarization state is inserted onto the wafer surface, and a scattering light occurring from an irradiated region where the laser beam having the specified polarization state is irradiated, is separated into a first scattering light occurring due to a defect on the wafer and a second scattering light occurring due to a surface roughness on the wafer. An optical element for optical path division separates the first and second scattering lights approximately at the same time.

86. 发明授权

US10249474B2 Charged particle beam device 有权
公开(公告)号：US10249474B2
公开(公告)日：2019-04-02
申请号：US15618203
申请日：2017-06-09
申请人： Hitachi High-Technologies Corporation
发明人： Toshiyuki Yokosuka , Chahn Lee , Hideyuki Kazumi , Hajime Kawano , Shahedul Hoque , Kumiko Shimizu , Hiroyuki Takahashi
IPC分类号： H01J37/20 , H01J37/22 , H01J37/28 , H01J37/147
摘要： The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.

87. 发明授权

US10243140B2 Manufacturing method of magnetoresistive element and vacuum processing apparatus 有权
公开(公告)号：US10243140B2
公开(公告)日：2019-03-26
申请号：US15251595
申请日：2016-08-30
申请人： Hitachi High-Technologies Corporation
发明人： Makoto Satake , Masaki Yamada , Kenetsu Yokogawa
IPC分类号： H01L43/12 , H01J37/32 , H01L27/22 , H01L43/02 , H01L43/08
摘要： The present invention is a manufacturing method for manufacturing a magnetoresistive element, including a first step for oxidizing or reducing a magnetic film constituting the magnetoresistive element and a metal oxidation film constituting the magnetoresistive element, and a second step performed after the first step, wherein in the second step, in a case where the magnetic film constituting the magnetoresistive element and the metal oxidation film constituting the magnetoresistive element are oxidized, the oxidized magnetic film constituting the magnetoresistive element or the oxidized metal oxidation film constituting the magnetoresistive element is selectively reduced, and in a case where the magnetic film constituting the magnetoresistive element and the metal oxidation film constituting the magnetoresistive element are reduced, the reduced magnetic film constituting the magnetoresistive element or the reduced metal oxidation film constituting the magnetoresistive element is selectively oxidized.

88. 发明授权

US10241062B2 Charged particle beam device, sample observation method, sample platform, observation system, and light emitting member 有权
公开(公告)号：US10241062B2
公开(公告)日：2019-03-26
申请号：US14774367
申请日：2014-01-22
申请人： Hitachi High-Technologies Corporation
发明人： Yusuke Ominami , Mitsugu Sato , Kenko Uchida , Sadamitsu Aso , Taku Sakazume , Hideo Morishita , Sukehiro Ito , Takashi Ohshima
IPC分类号： H01J37/20 , H01J37/28 , H01J37/244 , G01N23/22 , G01N23/2251 , G01N23/2204
摘要： The purpose of the present invention is to eliminate the effort in placement and extraction of samples in observations using transmitted charged particles. A charged particle beam device (601) is characterized by having: a charged particle optical lens tube that irradiates a sample (6) with a primary charged particle beam; a sample stage on which a light emitting member (500) that emits light because of charged particles that have come by transmission internally in the sample (6) or scattering therefrom or a sample platform (600) having the light emitting member (500) is attachably and detachably disposed; and a detector (503) that detects the light emitted by the light emitting member.

89. 发明授权

US10234416B2 Anion sensor 有权
公开(公告)号：US10234416B2
公开(公告)日：2019-03-19
申请号：US14896091
申请日：2014-04-21
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Akiko Suzuki , Tetsuyoshi Ono , Atsushi Kishioka
IPC分类号： G01N27/333 , G01N33/487
摘要： The present invention announces a method for extending the storage life of a test reagent for quantification of ionic components in samples by using an anion sensor. The purpose of the present invention is to provide an anion sensor, wherein the storage life of the anion sensor itself may be extended, to thereby extend the storage life of the anion sensor beyond that of conventional anion sensors. According to the present invention, through adjustment of the pH of the internal solution (internal gel liquid), it is possible to provide an anion sensor that maintains consistent performance, and has longer storage life.

90. 发明授权

US10217602B2 Charged particle beam apparatus and aberration corrector 有权
公开(公告)号：US10217602B2
公开(公告)日：2019-02-26
申请号：US15324124
申请日：2015-07-03
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Takaho Yoshida
IPC分类号： H01J37/153
摘要： High expectations are placed on aberration correctors to increase the resolving power of charged particle devices. Meanwhile, a far more complicated configuration and higher mechanical precision assembly in comparison to prior art aberration correctors are necessary in charged particle beam optical devices that use low-energy electron beams. A complex electromagnetic quadrupole part employed in the aberration corrector preferably has the forward extremities of the poles provided in a vacuum near an electron beam path and excitation coils disposed outside the vacuum, and this necessitates a structure that can achieve both electrical insulation and vacuum sealing for each of these poles. Such structural complexity generally conflicts with improving mechanical assembly precision. The complicated structure in the above problems can be simplified by: separating the electrodes and the magnetic poles in the complex electromagnetic multipole that had been used in prior art aberration correctors; and offsetting the positions of both, or ensuring that the widths of both do not match. Consequently, improvement of mechanical assembly precision can be achieved.

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