专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

81. 发明申请

US20210142982A1 Plasma Processing Method 有权
公开(公告)号：US20210142982A1
公开(公告)日：2021-05-13
申请号：US16754402
申请日：2018-09-26
申请人： Tokyo Electron Limited
发明人： Shinya IWASHITA , Takamichi KIKUCHI , Naotaka NORO , Toshio HASEGAWA , Tsuyoshi MORIYA
IPC分类号： H01J37/32 , H01J37/20
摘要： A plasma processing method according to an embodiment is performed in a state in which a substrate is placed on a support stage in an internal space of a chamber body. In the plasma processing method, a plasma treatment is performed on the substrate. Subsequently, a phase of a voltage of a lower electrode is relatively adjusted with respect to a phase of a voltage of an upper electrode by a phase adjustment circuit, such that a thickness of a sheath between the support stage and plasma without extinguishing the plasma generated in order to perform the plasma treatment. Thereafter, in a state in which supply of a high-frequency power is stopped, gases and particles in the internal space of the chamber body are discharged using an exhaust device.

82. 发明申请

US20210142976A1 MULTIBEAMLET CHARGED PARTICLE DEVICE AND METHOD 有权
公开(公告)号：US20210142976A1
公开(公告)日：2021-05-13
申请号：US16676717
申请日：2019-11-07
申请人： Applied Materials, Inc.
发明人： Mehdi VAEZ-IRAVANI , Christopher Dennis BENCHER , Krishna SREERAMBHATLA , Hussein FAWAZ , Lior ENGEL , Robert PERLMUTTER
IPC分类号： H01J37/20 , H01J37/317 , H01J37/21 , H01J37/147 , H01J37/09 , H01J37/04 , H01L21/027 , G03F7/20
摘要： A method of method of operating a multibeamlet charged particle device is disclosed. In the method, a target attached to a stage is translated, and each step of selecting beamlets, initializing beamlets, and exposing the target is repeated. The step of selecting beamlets includes passing a reconfigurable plurality of selected beamlets through the blanking circuit. The step of initializing beamlets includes pointing each of the selected beamlets in an initial direction. The step of exposing the target includes scanning each of the selected beamlets from the initial direction to a final direction, and irradiating a plurality of regions of the target on the stage with the selected beamlets.

83. 发明授权

US11004651B2 Tomography-assisted TEM prep with requested intervention automation workflow 有权
公开(公告)号：US11004651B2
公开(公告)日：2021-05-11
申请号：US16576565
申请日：2019-09-19
申请人： FEI Company
发明人： Roger Louis Alvis , Trevan R. Landin , Greg Clark
IPC分类号： H01J37/305 , H01J37/304 , H01J37/20 , H01J37/31 , H01J37/28 , H01J37/22
摘要： Provided is a process for lamella thinning and endpointing that substitutes a series of automated small angle tilts for the motions in the conventional endpointing sequence. STEM images or through-surface BSE scans are acquired at each tilt. The results are analyzed automatically to determine feature depths, and an intervention request is made requesting a user decision based on marked-up images and summary information displayed.

84. 发明申请

US20210118661A1 HIGH RESOLUTION IMAGING APPARATUS AND METHOD 有权
公开(公告)号：US20210118661A1
公开(公告)日：2021-04-22
申请号：US17253538
申请日：2019-06-18
申请人： Paul Corkum , Fluidigm Canada Inc.
发明人： Paul Corkum , Alexander V. Loboda
IPC分类号： H01J49/04 , H01J49/00 , H01J49/10 , H01J49/06 , H01J49/40 , H01J49/02 , G02B21/33 , H01J37/28 , H01J37/20 , G01N33/68
摘要： The present invention relates to the high resolution imaging of samples using imaging mass spectrometry (IMS) and to the imaging of biological samples by imaging mass cytometry (IMCTM) in which labelling atoms are detected by IMS. LA-ICP-MS (a form of IMS in which the sample is ablated by a laser, the ablated material is then ionised in an inductively coupled plasma before the ions are detected by mass spectrometry) has been used for analysis of various substances, such as mineral analysis of geological samples, analysis of archaeological samples, and imaging of biological substances. However, traditional LA-ICP-MS systems and methods may not provide high resolution. Described herein are methods and systems for high resolution IMS and IMC.

85. 发明申请

US20210118646A1 METHOD FOR LARGE-AREA 3D ANALYSIS OF SAMPLES USING GLANCING INCIDENCE FIB MILLING 有权
公开(公告)号：US20210118646A1
公开(公告)日：2021-04-22
申请号：US17074404
申请日：2020-10-19
申请人： FEI Company
发明人： Chad Rue , Jing Wang , Aurelien Philippe Jean Maclou Botman , Joe Christian , Kenny Mani , Gabriella Kiss
IPC分类号： H01J37/31 , H01J37/20
摘要： Methods and apparatuses disclosed herein for large-area 3D analysis of samples using glancing incidence FIB milling. An example method at least includes milling, with a focused ion beam, a sample at a shallow angle and at a plurality of rotational orientations to remove a layer of the sample and to expose a surface, and after milling, imaging, with a charged particle beam, the exposed surface of the sample.

86. 发明申请

US20210118643A1 LIQUID CHIP FOR ELECTRON MICROSCOPE INCLUDING ELECTRODE 有权
公开(公告)号：US20210118643A1
公开(公告)日：2021-04-22
申请号：US16990083
申请日：2020-08-11
申请人： KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
发明人： Jongmin YUK , Kunmo KOO , Jaesang LEE
IPC分类号： H01J37/20 , H01J37/26 , H01J37/32
摘要： The present disclosure relates to a liquid chip for an electron microscope including a lower chip, an upper chip, and a waterway space part for supplying a liquid sample, and may attach a transmissive thin film layer made of a graphene material having an excellent bulging resistance property to a plurality of holes formed in a waterway space part to increase the thickness of a support not operating as a transmissive window to be larger than the conventional one, thereby supplying the liquid sample more stably and minimizing the loss of a spatial resolution and also suppressing the bulging phenomenon of the transmissive window.
To this end, according to the present disclosure, the lower chip includes a lower substrate formed with a lower cavity; a lower support disposed on the upper surface of the lower substrate, and formed with a plurality of lower holes in the lower cavity region; a spacer located on both ends of the lower support of the lower hole; and a lower transmissive thin film layer attached on the lower support so as to cover the lower hole, the upper chip includes an upper substrate formed with an upper cavity; an upper support disposed on the upper surface of the upper substrate, and formed with a plurality of upper holes in the upper cavity region; and an upper transmissive thin film layer having a constant bulging resistance property attached on the upper support so as to cover the plurality of upper holes, the waterway space part is formed by laminating the upper support disposed on the upper surface of the upper substrate on the spacer of the lower chip, and the transmissive thin film layer is located inside the waterway space part.

87. 发明授权

US10971326B2 Multi-electron-beam imaging apparatus with improved performance 有权
公开(公告)号：US10971326B2
公开(公告)日：2021-04-06
申请号：US16572114
申请日：2019-09-16
申请人： FEI Company
发明人： Ali Mohammadi-Gheidari , Peter Christiaan Tiemeijer , Erik Rene Kieft , Gerard Nicolaas Anne van Veen
IPC分类号： H01J37/153 , H01J37/09 , H01J37/10 , H01J37/28 , H01J37/147 , H01J37/20
摘要： A multi-electron beam imaging apparatus is disclosed herein. An example apparatus at least includes an electron source for producing a precursor electron beam, an aperture plate comprising an array of apertures for producing an array of electron beams from said precursor electron beam, an electron beam column for directing said array of electron beams onto a specimen, where the electron beam column is configured to have a length less than 300 mm, and where the electron beam column comprises a single individual beam crossover plane in which each of said electron beams forms an intermediate image of said electron source, and a single common beam crossover plane in which the electron beams in the array cross each other.

88. 发明申请

US20210090854A1 FOCUSED ION BEAM APPARATUS 有权
公开(公告)号：US20210090854A1
公开(公告)日：2021-03-25
申请号：US17028381
申请日：2020-09-22
申请人： HITACHI HIGH-TECH SCIENCE CORPORATION
发明人： Toshihiro MOCHIZUKI , Haruyuki ISHI , Atsushi UEMOTO
IPC分类号： H01J37/22 , H01J37/20 , H01J37/10
摘要： A focused ion beam apparatus (100) includes: a focused ion beam lens column (20); a sample table (51); a sample stage (50); a memory (6M) configured to store in advance three-dimensional data on the sample table and an irradiation axis of the focused ion beam, the three-dimensional data being associated with stage coordinates of the sample stage; a display (7); and a display controller (6A) configured to cause the display to display a virtual positional relationship between the sample table (51v) and the irradiation axis (20Av) of the focused ion beam, which is exhibited when the sample stage is operated to move the sample table to a predetermined position, based on the three-dimensional data on the sample table and the irradiation axis of the focused ion beam.

89. 发明申请

US20210090848A1 SAMPLE HOLDER AND CHARGED PARTICLE BEAM DEVICE 有权
公开(公告)号：US20210090848A1
公开(公告)日：2021-03-25
申请号：US17028461
申请日：2020-09-22
申请人： HITACHI HIGH-TECH SCIENCE CORPORATION
发明人： Toshiyuki IWAHORI
IPC分类号： H01J37/20
摘要： A sample holder (19) includes a base portion (41), a sample carrying portion (42), a rotation guide portion (43), a cooling stage (46), a connection member (47), a first support portion, and a fixing guide portion (48). The base portion (41) is configured to be fixed to a stage (12), which is configured to be driven to rotate by a stage driving mechanism (13). The rotation guide portion (43) is configured to guide synchronous rotation of the base portion (41) and the sample carrying portion (42). The cooling stage (46) is configured to cool a sample (S). The connection member (47) is configured to be connected to the cooling stage (46). The first support portion is configured to support the base portion (41), which is configured to be driven to rotate by the stage (12).

90. 发明申请

US20210082657A1 AUTOMATED MULTI-GRID HANDLING APPARATUS 有权
公开(公告)号：US20210082657A1
公开(公告)日：2021-03-18
申请号：US16611935
申请日：2018-05-11
申请人： RICHARD JOSEPH PICKREIGN
发明人： RICHARD JOSEPH PICKREIGN
IPC分类号： H01J37/20 , H01L21/683
摘要： An automated grid handling apparatus for an electron microscope including a transport module having a multistage shuttle comprising a first shuttle stage having a single degree of freedom of motion and a second shuttle stage having a single degree of freedom of motion independent of the first stage, an end effector connected to at least one of the first and second shuttle stages, the end effector configured to hold a grid carrier and transport the grid carrier into and out of an electron microscope through a transport interface that communicates with a multi-axis positioning stage port of the microscope, the end effector having a range of motion defined by the first and second stage degrees of freedom of motions and the multi-axis positioning stage internal to the electron microscope, and an automated loading module connected to the frame and communicating with the transport module, the automated loading module including a load port module through which grids are loaded into the automated loading and transport modules.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式