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    • 3. 发明申请
    • Method of Investigating and Correcting Aberrations in a Charged-Particle Lens System
    • 调查和纠正带电粒子透镜系统中的畸变的方法
    • US20140061464A1
    • 2014-03-06
    • US14016997
    • 2013-09-03
    • FEI Company
    • Ivan LazicGijs van DuinenPeter Christiaan Tiemeijer
    • H01J37/153
    • H01J37/153H01J2237/1534
    • A system of investigating aberrations in a charged-particle lens system, which lens system has an object space comprising an object plane and an image space comprising an image plane, includes: Selecting a fixed pivot point on said object plane; Directing a charged-particle beam through said pivot point, entrance pupil and lens system and onto said image plane, said beam having a relatively small cross-sectional area relative to the area of the entrance pupil; Changing the orientation of said beam through said pivot point, so as to trace out an entrance figure on said entrance pupil and a corresponding image figure on said image plane; Registering said image figure; Repeating this procedure at a series of different focus settings of the lens system, thus acquiring a set of registered image figures at different focus settings; Analyzing said set so as to derive lens aberrations therefrom.
    • 一种调查带电粒子透镜系统中的像差的系统,该透镜系统具有包括物平面的对象空间和包括图像平面的图像空间,包括:在所述物平面上选择固定的枢转点; 使带电粒子束通过所述枢转点,入射光瞳和透镜系统并引导到所述图像平面上,所述光束相对于入射光瞳的面积具有相对小的横截面积; 通过所述枢转点改变所述光束的方向,以便在所述图像平面上绘制所述入射光瞳上的入射图和对应的图像图; 注册图像图; 在镜头系统的一系列不同焦点设置下重复此过程,从而以不同的焦点设置获取一组注册的图像数字; 分析所述集合以从中导出透镜像差。