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    • 81. 发明授权
    • Contacting an optical waveguide to a device under test
    • 将光波导接触到被测设备
    • US06907166B2
    • 2005-06-14
    • US10446214
    • 2003-05-28
    • Peter ThomaEmmerich Mueller
    • Peter ThomaEmmerich Mueller
    • G02B6/24G02B6/26G02B6/30G02B6/36G02B6/42
    • G02B6/241G02B6/262G02B6/30G02B6/3604G02B6/4203G02B6/4207G02B6/4212G02B6/4225
    • A setup for providing an optical contact adapted for guiding an optical signal comprises an optical waveguide being adapted for guiding the optical signal and comprising a tip on an end of the waveguide, wherein the tip comprises a transparent elastic material covering the end. A detector is provided for detecting a substantial alignment between the waveguide and an optical path within a device under test, and a first moving unit is used to move the waveguide laterally relative to a longitudinal direction of the waveguide and the device under test until the detector substantially detects the alignment. A second moving unit is adapted to reduce the distance between the tip and the device under test until the tip comes in physical contact with the device under test when the detector has detected alignment.
    • 用于提供适于引导光信号的光学接触器的设置包括适于引导光信号并包括在波导端部上的尖端的光波导,其中尖端包括覆盖端部的透明弹性材料。 提供了一种检测器,用于检测波导与被测器件内的光路之间的实质对准,并且使用第一移动单元相对于波导和被测器件的纵向横向移动波导,直到检测器 基本上检测到对准。 第二移动单元适于减小尖端与待测设备之间的距离,直到检测器检测到对准时,尖端与被测器件物理接触。
    • 88. 发明授权
    • Optical fiber block photo mask for loss reduction
    • 光纤阻挡光罩用于减少损耗
    • US06850676B2
    • 2005-02-01
    • US10193433
    • 2002-07-11
    • Jong-Youl KimSeung-Jin BaekJae-Wan Kim
    • Jong-Youl KimSeung-Jin BaekJae-Wan Kim
    • G02B6/24G02B6/12G02B6/30G02B6/36G03F1/00G03F1/70G02B6/00G03F9/00
    • G02B6/3636G02B6/3652G02B6/3692G03F1/38G03F1/80
    • A photomask is disclosed for the fabrication of an optical fiber block including a first section provided with slit arrays adapted to form an optical fiber alignment region of the optical fiber block while having a uniform slit pitch, partition portions arranged between adjacent ones of the slit arrays while having a pitch larger than the slit pitch, and end portions arranged outside the slit arrays while having a pitch larger than the slit pitch. The photomask also includes a second section adapted to form a stress-reducing recessed region of the optical fiber block etched to a desired depth from the level of the optical fiber alignment region. The photomask also includes auxiliary slit arrays arranged at an interface between the first and second sections. The auxiliary slit array includes at least one slit.
    • 公开了一种用于制造光纤块的光掩模,该光纤块包括:第一部分,其设置有狭缝阵列,该狭缝阵列适于形成光纤块的光纤对准区域,同时具有均匀的狭缝间距;分隔部分布置在相邻的狭缝阵列之间 同时具有大于狭缝间距的间距,以及设置在狭缝阵列外侧的端部,同时具有大于狭缝间距的间距。 光掩模还包括第二部分,其适于形成从光纤对准区域的水平面蚀刻到期望深度的光纤块的应力减小凹陷区域。 光掩模还包括布置在第一和第二部分之间的界面处的辅助狭缝阵列。 辅助狭缝阵列包括至少一个狭缝。
    • 90. 发明授权
    • Tapered amplitude optical absorber for waveguide photodetectors and
electro-absorption modulators
    • 用于波导光电探测器和电吸收调制器的锥形振幅光吸收器
    • US06167172A
    • 2000-12-26
    • US264374
    • 1999-03-05
    • Elizabeth T. KunkeeTimothy A. Vang
    • Elizabeth T. KunkeeTimothy A. Vang
    • G02B6/12G02B6/122G02B6/24G02B6/28G02B6/42H01L31/105G02B6/26
    • H01L31/105G02B6/122G02B6/243G02B6/2813G02B6/42G02B2006/12126
    • An optical waveguide device (30) that limits the peak optical intensity applied to an optical absorbing device (36), such as a photodetector or electro-absorption modulator. The optical waveguide device (30) includes a single mode input waveguide (34) coupled to a multi-mode, waveguide interference coupler (32). A single mode output waveguide (38) collects the light from the interference coupler (32). The absorbing device (36) is defined in the waveguide coupler (32) by a reverse-biased p-i-n diode structure. A voltage potential applied to the diode structure creates an electric field across the waveguide coupler (32) that causes the waveguide coupler (32) to absorb. Light entering the interference coupler (32) from the single mode waveguide (34) expands into other propagation modes that interact to constructively and destructively interfere. Because the light expands in the coupler (32), the amplitude of the light decreases even though the overall power remains substantially the same. When the light recombines as it approaches the output waveguide (38), the amplitude of the light returns to the input amplitude. The absorbing device (36) is defined in the waveguide coupler (32) between the area of interference (24) and the output waveguide (38). The absorption in the absorbing device (36) is exponential; the most light is absorbed at first and then progressively less light along the device.
    • 限制施加到光吸收装置(36)的峰值光强度的光波导装置(30),例如光电检测器或电吸收调制器。 光波导器件(30)包括耦合到多模式波导干涉耦合器(32)的单模输入波导(34)。 单模输出波导(38)收集来自干涉耦合器(32)的光。 吸收装置(36)通过反向偏置的p-i-n二极管结构限定在波导耦合器(32)中。 施加到二极管结构的电压电势在波导耦合器(32)两端产生导致波导耦合器(32)吸收的电场。 从单模波导(34)进入干涉耦合器(32)的光扩展到与建设性和破坏性干扰相互作用的其他传播模式。 由于光在耦合器(32)中扩展,所以即使总功率保持大致相同,光的幅度也减小。 当光在接近输出波导(38)时重新组合,光的幅度返回到输入幅度。 吸收装置(36)在干涉区域(24)和输出波导(38)之间的波导耦合器(32)中被限定。 吸收装置(36)中的吸收是指数的; 最初的光线首先被吸收,然后沿设备逐渐吸收光线。