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    • 1. 发明授权
    • Visible light detecting semiconductor radiation detector
    • 可见光检测半导体辐射探测器
    • US08148760B2
    • 2012-04-03
    • US12087380
    • 2006-12-29
    • Artto Aurola
    • Artto Aurola
    • H01L31/062
    • H01L27/1446
    • A semiconductor radiation detector device, comprising a bulk layer (103) of semiconductor material, and on the first surface of the bulk layer (303) in the following order: a modified internal gate layer (104) of semiconductor material of second conductivity type, a barrier layer (305) of semiconductor material of first conductivity type and pixel dopings (131, 132, 133) of semiconductor material of the second conductivity type, adapted to be coupled to at least one pixel voltage in order to create pixels corresponding to pixel dopings, characterized in that the device comprises a first contact of first conductivity type and said pixel voltage is defined as the potential difference between the pixel doping and the first contact.
    • 一种半导体辐射检测器件,包括半导体材料的体层(103),并且按照以下顺序在体层(303)的第一表面上:第二导电类型的半导体材料的修改的内部栅极层(104) 第一导电类型的半导体材料的阻挡层(305)和第二导电类型的半导体材料的像素掺杂(131,132,133),适于耦合到至少一个像素电压,以便产生对应于像素的像素 掺杂,其特征在于,所述器件包括第一导电类型的第一接触,并且所述像素电压被定义为像素掺杂和第一接触之间的电势差。
    • 2. 发明申请
    • Semiconductor Radiation Detector Optimized for Detecting Visible Light
    • 半导体辐射检测器优化用于检测可见光
    • US20080315265A1
    • 2008-12-25
    • US12087359
    • 2006-02-17
    • Artto Aurola
    • Artto Aurola
    • H01L31/00H01L21/00
    • H01L27/14643H01L27/14601H01L27/1464H01L27/14645H01L27/14649H01L27/14679H01L27/14681
    • A semiconductor radiation detector comprises a bulk layer of semiconductor material, and on a first surface of the bulk layer in the following order: a modified internal gate layer of semiconductor of second conductivity type, a barrier layer of semiconductor of first conductivity type and pixel dopings of semiconductor of the second conductivity type. The pixel dopings are adapted to be coupled to at least one pixel voltage in order to create pixels corresponding to pixel dopings. The device comprises a first conductivity type first contact. Said pixel voltage is defined as a potential difference between the pixel doping and the first contact. The bulk layer is of the first conductivity type. On a second surface of the bulk layer opposite to the first surface, there is nonconductive back side layer that would transport secondary charges outside the active area of the device or function as the radiation entry window.
    • 半导体辐射检测器包括半导体材料的体层,并且在主体层的第一表面上按以下顺序:第二导电类型的半导体的修改的内部栅极层,第一导电类型的半导体的阻挡层和像素掺杂 的第二导电类型的半导体。 像素掺杂适于耦合到至少一个像素电压,以便产生对应于像素掺杂的像素。 该装置包括第一导电类型的第一接触。 所述像素电压被定义为像素掺杂和第一接触之间的电位差。 本体层是第一导电类型。 在与第一表面相对的体层的第二表面上,存在不导电的背侧层,其将辅助电荷输送到装置的有效区域外部或者用作辐射入口窗口。
    • 3. 发明授权
    • Semiconductor radiation detector optimized for detecting visible light
    • 半导体辐射探测器优化用于检测可见光
    • US08288837B2
    • 2012-10-16
    • US12087359
    • 2006-02-17
    • Artto Aurola
    • Artto Aurola
    • H01L21/00
    • H01L27/14643H01L27/14601H01L27/1464H01L27/14645H01L27/14649H01L27/14679H01L27/14681
    • A semiconductor radiation detector comprises a bulk layer of semiconductor material, and on a first surface of the bulk layer in the following order: a modified internal gate layer of semiconductor of second conductivity type, a barrier layer of semiconductor of first conductivity type and pixel dopings of semiconductor of the second conductivity type. The pixel dopings are adapted to be coupled to at least one pixel voltage in order to create pixels corresponding to pixel dopings. The device comprises a first conductivity type first contact. Said pixel voltage is defined as a potential difference between the pixel doping and the first contact. The bulk layer is of the first conductivity type. On a second surface of the bulk layer opposite to the first surface, there is nonconductive back side layer that would transport secondary charges outside the active area of the device or function as the radiation entry window.
    • 半导体辐射检测器包括半导体材料的体层,并且在主体层的第一表面上按以下顺序:第二导电类型的半导体的修改的内部栅极层,第一导电类型的半导体的阻挡层和像素掺杂 的第二导电类型的半导体。 像素掺杂适于耦合到至少一个像素电压,以便产生对应于像素掺杂的像素。 该装置包括第一导电类型的第一接触。 所述像素电压被定义为像素掺杂和第一接触之间的电位差。 本体层是第一导电类型。 在与第一表面相对的体层的第二表面上,存在不导电的背侧层,其将辅助电荷输送到装置的有效区域外部或者用作辐射入口窗口。
    • 4. 发明申请
    • Semiconductor Device
    • 半导体器件
    • US20070222012A1
    • 2007-09-27
    • US11596054
    • 2005-05-10
    • Artto Aurola
    • Artto Aurola
    • H01L27/14
    • H01L27/14609H01L27/14603H01L27/14812H01L31/03529H01L31/109Y02E10/50
    • A semiconductor device, including a first region (100) of semiconductor material of a first conductivity type. The semiconductor device comprises an elongated spatial element (111, 112, 113) of semiconductor material of a second conductivity type protruding into a first region (100) of semiconductor material of a first conductivity type; and a bias voltage supply adjusted in operation to fully deplete the spatial element from majority carriers of the second conductivity type. A semiconductor device according to the invention is resistant to smear, has a fill factor equal to one, and due to low total capacitance provides improved sensitivity.
    • 一种半导体器件,包括第一导电类型的半导体材料的第一区域(100)。 半导体器件包括突出到第一导电类型的半导体材料的第一区域(100)中的第二导电类型的半导体材料的细长空间元件(111,112,113) 以及在操作中调节的偏置电压电源,以从第二导电类型的多数载流子中充分耗尽空间元件。 根据本发明的半导体器件耐污迹,填充因子等于1,并且由于低的总电容提供了改善的灵敏度。
    • 10. 发明申请
    • IMPROVED SEMICONDUCTOR RADIATION DETECTOR
    • 改进的半导体辐射探测器
    • US20160240720A1
    • 2016-08-18
    • US15033743
    • 2014-11-04
    • Artto AUROLA
    • Artto AUROLA
    • H01L31/113H01L27/146
    • H01L31/1136H01L27/1461H01L27/14616
    • A semiconductor radiation detector device includes a semiconductor substrate. On one surface of the substrate are a MIG layer (241) of semiconductor of second conductivity type, a barrier layer (251) of semiconductor of first conductivity type, and pixel dopings of semiconductor of the second conductivity type. The pixel dopings are adapted to be coupled to at least one pixel voltage in order to create a source and a drain of a pixel-specific transistor. The device further includes a first conductivity type first contact, so that the pixel voltage is a potential difference between one of the pixel dopings and the first conductivity type first contact. The location of a main gate (983) corresponds at least partly to the location of a channel between the source and the drain. The device includes at least one extra gate (981, 982) horizontally displaced from the main gate (983).
    • 半导体辐射检测器件包括半导体衬底。 在衬底的一个表面上是第二导电类型的半导体的MIG层(241),第一导电类型的半导体的阻挡层(251)和第二导电类型的半导体的像素掺杂。 像素掺杂适于耦合到至少一个像素电压,以便产生像素特定晶体管的源极和漏极。 该器件还包括第一导电类型的第一接触,使得像素电压是像素掺杂中的一个与第一导电类型的第一接触之间的电位差。 主门(983)的位置至少部分地对应于源极和漏极之间的通道的位置。 该装置包括从主门(983)水平移位的至少一个附加门(981,982)。