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1. 发明授权

US06347166B1 Device for superposing optical signals with different wavelengths 失效
标题翻译：用于叠加不同波长的光信号的装置
公开(公告)号：US06347166B1
公开(公告)日：2002-02-12
申请号：US09423991
申请日：1999-11-17
申请人： Berndt Kuhlow , Georges Przyrembel
发明人： Berndt Kuhlow , Georges Przyrembel
IPC分类号： G02B626
CPC分类号： G02B6/12016
摘要： The invention relates to a device for superposing optical signals of different wavelengths. The device is provided with a light guide grid disposed between an input free beam coupler and an output free beam coupler, the input free beam coupler being provided at its input side with at least two input light guide units and an output light guide unit including a plurality of output light guides being to the output side of the free beam coupler. The aperture areas of the input light guide units are arranged and dimensioned relative to the the aperture areas of the output light guides such that each output light guide is affected by at least two optical signals of different wavelengths from the input light guides.
摘要翻译：本发明涉及一种用于叠加不同波长的光信号的装置。该设备设置有布置在输入自由光束耦合器和输出自由光束耦合器之间的导光栅格，输入自由光束耦合器在其输入侧设置有至少两个输入光导单元和输出导光单元，其包括多个输出光导到自由光束耦合器的输出侧。输入光导单元的开口面积相对于输出光导的孔径区域布置和确定尺寸，使得每个输出光导受到与输入光导不同波长的至少两个光信号的影响。

2. 发明申请

US20060109445A1 Maskless lithography system and method 失效
标题翻译：无掩模光刻系统及方法
公开(公告)号：US20060109445A1
公开(公告)日：2006-05-25
申请号：US11260165
申请日：2005-10-28
申请人： Godehard Walf , Berndt Kuhlow
发明人： Godehard Walf , Berndt Kuhlow
IPC分类号： G03B27/54
CPC分类号： G03F7/70991 , G03F7/70291
摘要： In a lithographic system, data transmission is carried out by means of a powerful electro-optical free-beam connection system enabling optical pattern data to be guided from light exit places to light entrance places inside the vacuum chamber by means of free-space optical beams in order to produce control signals. The burden on the pattern production system is significantly reduced by the disappearance of mechanical and electrical contacts. The paths of the free-space optical beams and the particle beams can intersect each other in a non-influential manner. Active photodiodes acting as light exit places can be spatially disposed directly in the pattern production system. Passive light waveguides which can be bundled together to form multipolar fibre array plugs, or active transmission lasers, either of which can also act as light exit places, can be arranged outside the vacuum chamber.
摘要翻译：在光刻系统中，通过强大的电光自由光束连接系统进行数据传输，使得光学图案数据能够通过自由空间光束从光出射处引导到真空室内的光入口处以产生控制信号。机械和电气触点的消失显着减少了图案生产系统的负担。自由空间光束和粒子束的路径可以以非影响的方式彼此相交。作为光出射位置的活性光电二极管可以空间地直接设置在图案生产系统中。可以被捆扎在一起以形成多极纤维阵列插塞的主动传输激光器或其中也可以作为光出射处的主动传输激光器的被动光波导可以被布置在真空室的外部。

3. 发明授权

US07728313B2 Maskless lithography system and method using optical signals 失效
标题翻译：无掩模光刻系统和使用光信号的方法
公开(公告)号：US07728313B2
公开(公告)日：2010-06-01
申请号：US11260165
申请日：2005-10-28
申请人： Godhard Walf , Berndt Kuhlow
发明人： Godhard Walf , Berndt Kuhlow
IPC分类号： G21K5/10
CPC分类号： G03F7/70991 , G03F7/70291
摘要： In a lithographic system, data transmission is carried out by a powerful electro-optical free-beam connection system enabling optical pattern data to be guided from light exit places to light entrance places inside the vacuum chamber by free-space optical beams in order to produce control signals. The burden on the pattern production system is significantly reduced by the disappearance of mechanical and electrical contacts. The paths of the free-space optical beams and the particle beams can intersect each other in a non-influential manner. Active photodiodes acting as light exit places can be spatially disposed directly in the pattern production system. Passive light waveguides which can be bundled together to form multipolar fibre array plugs, or active transmission lasers, either of which can also act as light exit places, can be arranged outside the vacuum chamber.
摘要翻译：在光刻系统中，通过强大的电光自由光束连接系统进行数据传输，使得光学图案数据能够通过自由空间光束从光出射处引导到真空室内的光入口处，以便产生控制信号。机械和电气触点的消失显着减少了图案生产系统的负担。自由空间光束和粒子束的路径可以以非影响的方式彼此相交。作为光出射位置的活性光电二极管可以空间地直接设置在图案生产系统中。可以被捆扎在一起以形成多极纤维阵列插塞的主动传输激光器或其中也可以作为光出射处的主动传输激光器的被动光波导可以被布置在真空室的外部。

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