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1. 发明授权

US08160350B2 Method and system for evaluating a variation in a parameter of a pattern 有权
标题翻译：用于评估图案参数变化的方法和系统
公开(公告)号：US08160350B2
公开(公告)日：2012-04-17
申请号：US11994412
申请日：2007-02-01
申请人： Michael Ben Yishai , Mark Wagner , Avishai Bartov , Gadi Greenberg , Lior Shoval , Ophir Gvirtzer
发明人： Michael Ben Yishai , Mark Wagner , Avishai Bartov , Gadi Greenberg , Lior Shoval , Ophir Gvirtzer
IPC分类号： G06K9/00
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： A method and system are presented for evaluating a variation of a parameter of a pattern. The method includes processing data indicative of an aerial intensity image of at least a portion of a patterned article, and determining values of a certain functional of the aerial image intensity for predetermined regions within the at least portion of the patterned article. The values of the aerial image intensity functional are indicative of a variation of at least one parameter of the pattern within the at least portion of the patterned article or are indicative of a variation of at least one parameter of a pattern manufactured by utilizing the patterned article.
摘要翻译：提出了一种用于评估模式参数变化的方法和系统。该方法包括处理指示图案制品的至少一部分的空间强度图像的数据，以及确定图案化物品的至少部分内的预定区域的空间图像强度的某一功能的值。空间图像强度函数的值表示图案制品的至少部分内的图案的至少一个参数的变化，或指示通过利用图案化制品制造的图案的至少一个参数的变化。

2. 发明授权

US08098926B2 Method and system for evaluating an evaluated pattern of a mask 有权
标题翻译：用于评估掩模的评估图案的方法和系统
公开(公告)号：US08098926B2
公开(公告)日：2012-01-17
申请号：US11971209
申请日：2008-01-08
申请人： Ishai Schwarzband , Shmoolik Mangan , Chaim Braude , Michael Ben-Yishai , Gadi Greenberg
发明人： Ishai Schwarzband , Shmoolik Mangan , Chaim Braude , Michael Ben-Yishai , Gadi Greenberg
IPC分类号： G06K9/00
CPC分类号： G06T7/0006 , G06T7/66 , G06T2207/30148
摘要： A method, system and a computer program product for evaluating an evaluated pattern of a mask, the method includes: receiving multiple moments that represent an image of the evaluated pattern; wherein a size of information required for representing the multiple moments is substantially smaller than a size of pixel information that form the image of the evaluated pattern; and processing the multiple moments in order to determine at least one shape parameter of the evaluated pattern.
摘要翻译：一种用于评估掩模的评估图案的方法，系统和计算机程序产品，所述方法包括：接收表示所评估图案的图像的多个时刻; 其中用于表示所述多个时刻所需的信息的大小显着小于形成所述评估图案的图像的像素信息的大小; 并且处理多个时刻以便确定评估图案的至少一个形状参数。

3. 发明申请

US20090021749A1 HIGH THROUGHPUT ACROSS-WAFER-VARIATION MAPPING 有权
标题翻译：高通量波变换映射
公开(公告)号：US20090021749A1
公开(公告)日：2009-01-22
申请号：US12173766
申请日：2008-07-15
申请人： Jeong Ho Yeo , Efrat Rosenman , Erez Ravid , Doron Meshulach , Gadi Greenberg , Kobi Kan , Yehuda Cohen , Shimon Levi
发明人： Jeong Ho Yeo , Efrat Rosenman , Erez Ravid , Doron Meshulach , Gadi Greenberg , Kobi Kan , Yehuda Cohen , Shimon Levi
IPC分类号： G01B11/24
CPC分类号： G01N21/9501 , G01N21/8851 , G01N2021/8825 , G01N2021/8848 , G03F7/70616
摘要： A method for characterizing a surface of a sample object, the method including dividing the surface into pixels which are characterized by a parameter variation, and defining blocks of the surface as respective groups of the pixels. The method further includes irradiating the pixels in multiple scans over the surface with radiation having different, respective types of polarization, and detecting returning radiation from the pixels in response to each of the scans. For each scan, respective block signatures of the blocks are constructed, in response to the returning radiation from the group of pixels in each block. Also for each scan, a block signature variation using the respective block signatures of the blocks is determined. In response to the block signature variation, one or more of the types of polarization for use in subsequent examination of a test object are selected.
摘要翻译：一种用于表征样本对象的表面的方法，所述方法包括将表面划分成由参数变化表征的像素，以及将表面的块定义为相应的像素组。所述方法还包括用具有不同类型的偏振的辐射在表面上以多次扫描照射像素，以及响应于每个扫描检测来自像素的返回辐射。对于每个扫描，响应于来自每个块中的像素组的返回辐射来构造块的相应块签名。同样对于每个扫描，确定使用块的相应块签名的块签名变化。响应于块签名变化，选择用于随后检查测试对象的一种或多种类型的偏振。

4. 发明授权

US07330249B2 Qualification of a mask 有权
标题翻译：面具资格
公开(公告)号：US07330249B2
公开(公告)日：2008-02-12
申请号：US11554309
申请日：2006-10-30
申请人： Avishai Barotv , Gadi Greenberg , Chaim Braude
发明人： Avishai Barotv , Gadi Greenberg , Chaim Braude
IPC分类号： G01N21/00
CPC分类号： H04W4/18 , H04L51/066 , H04L51/24 , H04L67/02 , H04W8/18
摘要： A method for qualifying printability of a mask, including performing a first inspection of the mask with an optical assembly at a first numerical aperture of collection (NAC) of radiation from the mask, and determining, in response to the first inspection, a first possible defect in the mask and a first location of the first possible defect. The method also includes performing a second inspection of the mask with the optical assembly at a second NAC of radiation from the mask, different from the first NAC, and determining, in response thereto, a second possible defect in the mask and a second location of the second possible defect. The method further includes performing a comparison of the first and second locations, and in response to the comparison, determining that the first and second possible defects represent a real defect if the first location matches the second location.
摘要翻译：一种用于限定掩模的可印刷性的方法，包括在来自掩模的辐射的第一数值孔径（NAC）下用光学组件执行掩模的第一次检查，并且响应于第一检查确定第一可能的掩模中的缺陷和第一可能缺陷的第一位置。该方法还包括在来自不同于第一NAC的掩模的第二NAC辐射下，用光学组件执行掩模的第二次检查，并且响应于此，确定掩模中的第二可能的缺陷和第二位置第二个可能的缺陷。该方法还包括执行第一和第二位置的比较，并且响应于比较，如果第一位置与第二位置匹配，则确定第一和第二可能缺陷代表实际缺陷。

5. 发明申请

US20070127017A1 QUALIFICATION OF A MASK 有权
标题翻译：面具资格
公开(公告)号：US20070127017A1
公开(公告)日：2007-06-07
申请号：US11554309
申请日：2006-10-30
申请人： AVISHAI BARTOV , Gadi Greenberg , Chaim Braude
发明人： AVISHAI BARTOV , Gadi Greenberg , Chaim Braude
IPC分类号： G01N21/88
CPC分类号： H04W4/18 , H04L51/066 , H04L51/24 , H04L67/02 , H04W8/18
摘要： A method for qualifying printability of a mask, including performing a first inspection of the mask with an optical assembly at a first numerical aperture of collection (NAC) of radiation from the mask, and determining, in response to the first inspection, a first possible defect in the mask and a first location of the first possible defect. The method also includes performing a second inspection of the mask with the optical assembly at a second NAC of radiation from the mask, different from the first NAC, and determining, in response thereto, a second possible defect in the mask and a second location of the second possible defect. The method further includes performing a comparison of the first and second locations, and in response to the comparison, determining that the first and second possible defects represent a real defect if the first location matches the second location.
摘要翻译：一种用于限定掩模的可印刷性的方法，包括在来自掩模的辐射的第一数值孔径（NAC）下用光学组件执行掩模的第一次检查，并且响应于第一检查确定第一可能的掩模中的缺陷和第一可能缺陷的第一位置。该方法还包括在来自不同于第一NAC的掩模的第二NAC辐射下，用光学组件执行掩模的第二次检查，并且响应于此，确定掩模中的第二可能的缺陷和第二位置第二个可能的缺陷。该方法还包括执行第一和第二位置的比较，并且响应于比较，如果第一位置与第二位置匹配，则确定第一和第二可能缺陷代表实际缺陷。

6. 发明授权

US07072502B2 Alternating phase-shift mask inspection method and apparatus 有权
公开(公告)号：US07072502B2
公开(公告)日：2006-07-04
申请号：US09876955
申请日：2001-06-07
申请人： Shirley Hemar , Alex Goldenshtein , Gadi Greenberg , Mula Friedman , Boaz Kenan
发明人： Shirley Hemar , Alex Goldenshtein , Gadi Greenberg , Mula Friedman , Boaz Kenan
IPC分类号： G06K9/00
CPC分类号： G03F7/70483 , G01N21/95607 , G03F1/30 , G03F1/84
摘要： A reticle inspection system and method for complete and fast inspection of phase shift mask reticles, both for incoming inspection and for periodic and pre-exposure inspection tool, is employable by facilities such as mask shops as an inspection tool compatible to the mask shop's customers. The inventive system and method detect phase errors in an aerial image by acquiring the image of the phase shift mask under the same optical conditions as the exposure conditions (i.e. wavelength, numerical aperture, sigma, and illumination aperture type). Images are acquired at a positive out-of-focus and a negative out-of-focus, and are compared in order to enhance possible phase error. The term “phase error” refers to the acceptable range of the phase deviation from the programmed 180° on the phase shift mask, by using the exposure system to achieve the image on the photoresist, satisfying the requirements of the wafer specification.

7. 发明授权

US09715723B2 Optimization of unknown defect rejection for automatic defect classification 有权
公开(公告)号：US09715723B2
公开(公告)日：2017-07-25
申请号：US13451500
申请日：2012-04-19
申请人： Vladimir Shlain , Gadi Greenberg , Idan Kaizerman , Efrat Rozenman
发明人： Vladimir Shlain , Gadi Greenberg , Idan Kaizerman , Efrat Rozenman
IPC分类号： G06T7/00 , G06K9/03 , G06K9/62
CPC分类号： G06T7/0004 , G06K9/033 , G06K9/6269 , G06K9/6284 , G06T2207/10061 , G06T2207/20076 , G06T2207/20081 , G06T2207/30148
摘要： A method for defect classification includes storing, in a computer system, a definition of a region in a feature space. The definition is associated with a class of defects and comprises a kernel function comprising a parameter. The parameter determines a shape of the region. A confidence threshold for automatic classification of at least one defect associated with the class is received. A value of the parameter associated with the confidence threshold is selected. Inspection data for a plurality of defects detected in one or more samples under inspection is received. The plurality of defects for the class are automatically classified using the kernel function and the selected value of the parameter.

8. 发明申请

US20130279794A1 INTEGRATION OF AUTOMATIC AND MANUAL DEFECT CLASSIFICATION 审中-公开
标题翻译：自动和手动缺陷分类的整合
公开(公告)号：US20130279794A1
公开(公告)日：2013-10-24
申请号：US13451496
申请日：2012-04-19
申请人： Gadi Greenberg , Idan Kaizerman , Efrat Rozenman
发明人： Gadi Greenberg , Idan Kaizerman , Efrat Rozenman
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06K9/033 , G06K9/6269 , G06K9/6284 , G06T2207/10061 , G06T2207/30148
摘要： A method for defect classification includes storing definitions of defect classes in terms of a classification rules in a multi-dimensional feature space. Inspection data associated with defects detected in one or more samples under inspection is received. A plurality of first classification results is generated by applying an automatic classifier to the inspection data based on the definitions, the plurality of first classification results comprising a class label and a corresponding confidence level for a defect. Upon determining that a confidence level for a defect is below a predetermined confidence threshold, a plurality of second classification results are generated by applying at least one inspection modality to the defect. A report is generated comprising a distribution of the defects among the defect classes by combining the plurality of first classification results and the plurality of second classification results.
摘要翻译：一种用于缺陷分类的方法包括根据多维特征空间中的分类规则存储缺陷类的定义。接收与在检查中的一个或多个样品中检测到的缺陷有关的检查数据。通过基于定义应用自动分类器来生成多个第一分类结果，多个第一分类结果包括类别标签和相应的缺陷置信度。在确定缺陷的置信水平低于预定置信度阈值时，通过对缺陷应用至少一种检查模式来生成多个第二分类结果。通过组合多个第一分类结果和多个第二分类结果，生成包括缺陷类别中的缺陷的分布的报告。

9. 发明申请

US20080166038A1 METHOD AND SYSTEM FOR EVALUATING AN EVALUATED PATTERN OF A MASK 有权
标题翻译：用于评估掩模的评估图案的方法和系统
公开(公告)号：US20080166038A1
公开(公告)日：2008-07-10
申请号：US11971209
申请日：2008-01-08
申请人： Ishai Schwarzband , Shmoolik Mangan , Chaim Braude , Michael Ben-Yishai , Gadi Greenberg
发明人： Ishai Schwarzband , Shmoolik Mangan , Chaim Braude , Michael Ben-Yishai , Gadi Greenberg
IPC分类号： G06K9/00
CPC分类号： G06T7/0006 , G06T7/66 , G06T2207/30148
摘要： A method, system and a computer program product for evaluating an evaluated pattern of a mask, the method includes: receiving multiple moments that represent an image of the evaluated pattern; wherein a size of information required for representing the multiple moments is substantially smaller than a size of pixel information that form the image of the evaluated pattern; and processing the multiple moments in order to determine at least one shape parameter of the evaluated pattern.
摘要翻译：一种用于评估掩模的评估图案的方法，系统和计算机程序产品，所述方法包括：接收表示所评估图案的图像的多个时刻; 其中用于表示所述多个时刻所需的信息的大小显着小于形成所述评估图案的图像的像素信息的大小; 并且处理多个时刻以便确定评估图案的至少一个形状参数。

10. 发明授权

US06603873B1 Defect detection using gray level signatures 失效
标题翻译：使用灰度级别签名的缺陷检测
公开(公告)号：US06603873B1
公开(公告)日：2003-08-05
申请号：US09438577
申请日：1999-11-12
申请人： Naama Gordon , Gadi Greenberg
发明人： Naama Gordon , Gadi Greenberg
IPC分类号： G06K903
CPC分类号： G06T7/0006 , G01N2021/95676 , G06T2207/30148
摘要： A method and apparatus for inspecting isolated features on a reticle is provided wherein the isolated features are analyzed for defects globally as individual, whole features, rather than locally, pixel-by-pixel. In one embodiment, the reticle is imaged to produce pixels having a gray level, and an isolated feature is identified. An energy value for the isolated feature to be inspected is calculated by summing the gray levels of its pixels. A plurality of scatter values for the feature in different directions in the feature is calculated based on the equilibrium center of the feature to produce a unique “signature” for the inspected feature. The energy and scatter values of the inspected feature's signature are then compared with energy and scatter values associated with a corresponding reference feature to determine whether a defect exists in the inspected feature.
摘要翻译：提供了用于检查掩模版上的隔离特征的方法和装置，其中分离的特征被全局地分析为单独的，整体特征，而不是逐个像素的局部缺陷。在一个实施例中，将掩模版成像以产生具有灰度级的像素，并且识别孤立的特征。通过对其像素的灰度级进行求和来计算要检查的孤立特征的能量值。基于特征的平衡中心计算特征中不同方向上的特征的多个散射值，以产生用于被检查特征的唯一“签名”。然后将检查特征的签名的能量和散射值与与相应的参考特征相关联的能量和散射值进行比较，以确定检查特征中是否存在缺陷。

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