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    • 1. 发明申请
    • Liquid crystal display device and method for fabricating the same
    • 液晶显示装置及其制造方法
    • US20090284677A1
    • 2009-11-19
    • US12318263
    • 2008-12-23
    • Woo Sup ShinJoo Soo LimHeung Lyul ChoHee Young Kwack
    • Woo Sup ShinJoo Soo LimHeung Lyul ChoHee Young Kwack
    • G02F1/1368H01L21/02
    • G02F1/134363G02F2001/13606G02F2001/136231G02F2201/124G02F2201/40H01L27/124H01L27/1288
    • A liquid crystal display device includes a gate line on a substrate; a data line crossing the gate line with a gate insulating film interposed between the gate line and the data line to define a pixel region; a thin film transistor at the crossing of the gate line and the data line; a pixel electrode connected to the thin film transistor; a common electrode forming a horizontal electric field with the pixel electrode in the pixel region; a gate pad connected to the gate line; and a data pad connected to the data line, wherein the gate pad and the data pad includes a lower pad in the same layer as the gate line and made of the same material as the gate line, a lower contact hole through the gate insulating film to expose the lower pad, an upper pad in the same layer as the data line, made of the same material as the data line, and connected to the lower pad through the lower contact hole, and an upper contact hole through a passivation film protecting the thin film transistor to expose the upper pad, and a semiconductor layer of the thin film transistor overlaps with the gate electrode of the thin film transistor, and has a width smaller than that of a gate electrode of the thin film transistor.
    • 液晶显示装置包括在基板上的栅极线; 与栅极线交叉的数据线和插入在栅极线与数据线之间的栅极绝缘膜,以限定像素区域; 栅极线与数据线交叉的薄膜晶体管; 连接到薄膜晶体管的像素电极; 与像素电极在像素区域中形成水平电场的公共电极; 连接到栅极线的栅极焊盘; 以及连接到数据线的数据焊盘,其中栅极焊盘和数据焊盘包括与栅极线相同的层并且由与栅极线相同的材料制成的下焊盘,通过栅极绝缘膜的下部接触孔 以与数据线相同的材料制成的下焊盘,与数据线相同的层中的上焊盘露出,并通过下接触孔连接到下焊盘,以及通过钝化膜保护的上接触孔 所述薄膜晶体管暴露所述上焊盘,所述薄膜晶体管的半导体层与所述薄膜晶体管的栅电极重叠,并且具有比所述薄膜晶体管的栅电极的宽度小的宽度。
    • 2. 发明申请
    • TFT array substrate and method for fabricating the same
    • TFT阵列基板及其制造方法
    • US20070152220A1
    • 2007-07-05
    • US11643793
    • 2006-12-22
    • Hee Young Kwack
    • Hee Young Kwack
    • H01L29/04
    • G02F1/1362G02F2001/136236G02F2001/136295G02F2201/40H01L27/12H01L27/124H01L27/1288H01L29/78633
    • A four-mask process thin film transistor (TFT) array substrate and a method for fabricating the same is disclosed, which prevents a semiconductor tail from being formed. An open area is thus obtained and wavy noise is prevented from occurring. The method of fabricating a TFT array substrate comprises: forming a gate line, a gate electrode and a pad electrode on a substrate; sequentially depositing a gate insulation layer, a silicon layer and a metal layer on an entire surface of the substrate including the gate line; forming an open area in the pad electrode; forming a semiconductor layer, data line and source/drain electrodes by patterning the silicon layer and the metal layer; and forming a pixel electrode connected with the drain electrode and a transparent conductive layer connected with the pad electrode by depositing and patterning a transparent conductive material on the entire surface of the substrate including the data line, and simultaneously defining a channel region by separating the source and drain electrodes from each other.
    • 公开了一种四掩模工艺薄膜晶体管(TFT)阵列基板及其制造方法,其防止形成半导体尾部。 由此获得开放区域并防止发生波浪噪声。 制造TFT阵列基板的方法包括:在基板上形成栅极线,栅电极和焊盘电极; 在包括栅极线的基板的整个表面上依次沉积栅极绝缘层,硅层和金属层; 在所述焊盘电极中形成开放区域; 通过图案化硅层和金属层形成半导体层,数据线和源极/漏极; 以及通过在包括所述数据线的所述基板的整个表面上沉积和图案化透明导电材料来形成与所述漏电极连接的像素电极和透明导电层,所述透明导电层与所述焊盘电极连接,并且通过分离所述源 和漏电极。
    • 3. 发明授权
    • Liquid crystal display device with reflection and transmission regions
    • 具有反射和透射区域的液晶显示装置
    • US08115893B2
    • 2012-02-14
    • US12000746
    • 2007-12-17
    • Tae Yong JungJi No LeeHee Young Kwack
    • Tae Yong JungJi No LeeHee Young Kwack
    • G02F1/1335
    • G02F1/133555G02F1/1362G02F2001/136231
    • A liquid crystal display device includes a first substrate, a second substrate and a liquid crystal layer between the first and second substrates. The liquid crystal display device further includes a gate line on the first substrate, a first insulation film on the gate line, a data line crossing the gate line such that the data line and the gate line define a pixel region with a transmission area and a reflection area, a thin film transistor connected to the gate line and the data line, a storage capacitor including a storage line crossing the data line and an upper storage electrode connected to the thin film transistor, a second insulation film on the thin film transistor with a transmission hole defined through the second insulation film, a reflection electrode disposed on the second insulation film in the reflection area and connected to a portion of the upper storage electrode through the transmission hole, and a pixel electrode disposed in the pixel region and connected to the reflection electrode.
    • 液晶显示装置包括第一基板,第二基板和第一基板与第二基板之间的液晶层。 液晶显示装置还包括在第一基板上的栅极线,栅极线上的第一绝缘膜,与栅极线交叉的数据线,使得数据线和栅极线限定具有透射区域的像素区域和 反射区域,连接到栅极线和数据线的薄膜晶体管,包括与数据线交叉的存储线的存储电容器和连接到薄膜晶体管的上部存储电极,在薄膜晶体管上的第二绝缘膜,具有 通过第二绝缘膜限定的透射孔,反射区域中设置在第二绝缘膜上并通过透射孔与上部存储电极的一部分连接的反射电极,以及设置在像素区域中并连接到 反射电极。
    • 4. 发明授权
    • Liquid crystal display device and method of fabricating the same
    • 液晶显示装置及其制造方法
    • US08053802B2
    • 2011-11-08
    • US12880817
    • 2010-09-13
    • Hee-Young Kwack
    • Hee-Young Kwack
    • H01L33/00
    • G02F1/136286G02F2001/136295H01L27/1288
    • A method of fabricating an LCD device includes forming a gate line, a gate electrode, a gate pad electrode at an end of the gate line, and a common line on a substrate; forming a gate insulating layer on the gate electrode; forming an active layer on the gate insulating layer; forming an etch stopper on the active layer; forming first and second ohmic contact layers spaced apart from each other on the active layer and an impurity-doped amorphous silicon pattern contacting the gate insulating layer therebelow, outer sides of the first and second ohmic contact layers being outside the active layer; forming a data line crossing the gate line to define a pixel region, a data pad electrode at an end of the data line, and source and drain electrodes on the first and second ohmic contact layers, respectively; forming a pixel electrode and a common electrode in the pixel region to induce an in-plane electric field; and forming a gate pad terminal electrode on the gate pad electrode. At least one of the data line, the pixel electrode and the common electrode contacts the impurity-doped amorphous silicon pattern therebelow.
    • 一种制造LCD器件的方法包括在栅极线的一端形成栅极线,栅极电极,栅极焊盘电极和在基板上的公共线; 在栅电极上形成栅极绝缘层; 在栅极绝缘层上形成有源层; 在所述有源层上形成蚀刻停止层; 在所述有源层上形成彼此间隔开的第一和第二欧姆接触层,以及与其下面的栅极绝缘层接触的杂质掺杂的非晶硅图案,所述第一和第二欧姆接触层的外侧在所述有源层的外部; 形成与栅极线交叉以限定像素区域的数据线,数据线末端的数据焊盘电极以及第一和第二欧姆接触层上的源极和漏极电极; 在像素区域中形成像素电极和公共电极以引起平面内电场; 以及在栅极焊盘电极上形成栅极焊盘端子电极。 数据线,像素电极和公共电极中的至少一个接触其下面的杂质掺杂非晶硅图案。
    • 5. 发明授权
    • Liquid crystal display device and fabrication method thereof
    • 液晶显示装置及其制造方法
    • US08045077B2
    • 2011-10-25
    • US12003650
    • 2007-12-28
    • Joo-Soo LimHee-Young Kwack
    • Joo-Soo LimHee-Young Kwack
    • G02F1/136
    • H01L27/1288G02F1/1362G02F2001/136236G02F2202/103H01L27/1214H01L27/124H01L27/1255
    • A method for fabricating a liquid crystal display includes: providing an array substrate and a color filter substrate facing the array substrate; forming a gate electrode and a gate line formed of a first conductive film on the array substrate through a first masking process; forming a second conductive film pattern at an upper portion of the gate electrode, a storage capacitor preliminary pattern at a partial upper region of the gate electrode and a data line substantially crossing the gate line to define a pixel region, the second conductive film pattern, the storage capacitor preliminary pattern and the data line being formed of a second conductive film through a second masking process; forming an opaque insulation film surrounding the data line; forming a transparent third conductive film on the entire surface of the array substrate with the opaque insulation film interposed therebetween; patterning the second conductive film pattern and a third conductive film through a third masking process to form a source electrode, a drain electrode separated from the source electrode, a pixel electrode contacting with the drain electrode, and a storage capacitor pattern contacting with a partial lower region of the pixel electrode; and attaching the array substrate and the color filter substrate.
    • 一种制造液晶显示器的方法包括:提供面向阵列基板的阵列基板和滤色器基板; 通过第一掩蔽工艺在阵列基板上形成栅电极和由第一导电膜形成的栅极线; 在栅电极的上部形成第二导电膜图案,在栅电极的部分上部区域设有保持电容器预备图案,基本上与栅极线交叉以形成像素区域的数据线,第二导电膜图案, 存储电容器初步图案和数据线通过第二掩蔽处理由第二导电膜形成; 形成围绕数据线的不透明绝缘膜; 在阵列基板的整个表面上形成透明的第三导电膜,其间具有不透明绝缘膜; 通过第三掩蔽处理来形成第二导电膜图案和第三导电膜以形成源电极,从源电极分离的漏电极,与漏极接触的像素电极,以及与部分下电极接触的保持电容器图案 像素电极的区域; 并且连接阵列基板和滤色器基板。
    • 6. 发明授权
    • Liquid crystal display device and method of fabricating same
    • 液晶显示装置及其制造方法
    • US07817231B2
    • 2010-10-19
    • US12458959
    • 2009-07-28
    • Byung Chul AhnTae Yong JungJi No LeeHee Young Kwack
    • Byung Chul AhnTae Yong JungJi No LeeHee Young Kwack
    • G02F1/1335
    • G02F1/133555G02F1/1362G02F2001/136231
    • A liquid crystal display device is provided that comprises a gate line; a first insulating film on the gate line; a data line crossing the gate line to define a pixel region, the pixel region having a transmissive area and a reflective area; a thin film transistor connected to the gate line and the data line; a pixel electrode formed in the pixel region; a second insulating film on the thin film transistor; a storage capacitor including a storage upper electrode overlapping the gate line; a transmission hole exposing at least a portion of the pixel electrode, and a reflective electrode formed in the reflective area of the pixel region, the reflective electrode connecting the pixel electrode with thin film transistor and the storage upper electrode, wherein the gate line and the pixel electrode include a first transparent conductive layer.
    • 提供一种液晶显示装置,其包括栅极线; 栅极线上的第一绝缘膜; 穿过所述栅极线以限定像素区域的数据线,所述像素区域具有透射区域和反射区域; 连接到栅极线和数据线的薄膜晶体管; 形成在所述像素区域中的像素电极; 薄膜晶体管上的第二绝缘膜; 存储电容器,包括与栅极线重叠的存储上电极; 曝光所述像素电极的至少一部分的透射孔,以及形成在所述像素区域的反射区域中的反射电极,所述反射电极将所述像素电极与薄膜晶体管连接,并且所述存储上电极, 像素电极包括第一透明导电层。
    • 7. 发明申请
    • METHOD OF MANUFACTURING THIN FILM TRANSISTOR ARRAY SUBSTRATE
    • 制造薄膜晶体管阵列基板的方法
    • US20100047974A1
    • 2010-02-25
    • US12544429
    • 2009-08-20
    • Joo Soo LimHee Young Kwack
    • Joo Soo LimHee Young Kwack
    • H01L21/336
    • H01L27/1288H01L27/1214
    • A simplified method of manufacturing a thin film transistor array substrate is disclosed. The method includes: forming gate electrodes, gate lines and gate pads on a substrate with the use of a first mask; forming a gate insulation film, a semiconductor layer, and a metal layer on the substrate; forming a first photoresist pattern on the metal layer with the use of a second mask; forming first contact holes for the gate pads with the use of the first photoresist pattern; forming a second photoresist pattern, and providing patterns for data pads, data lines, and thin film transistors with the use of the second photoresist pattern; providing a third photoresist pattern, and forming contact holes for source/drain electrodes and second contact holes the gate pads with the use of the third photoresist pattern; forming a protective film on the substrate and providing a fourth photoresist pattern on the protective film with the use of a third mask; forming third contact holes for the gate pads, contact holes for the data pads, gate lines, and drain electrodes, and contact holes for pixel electrodes, with the use of the fourth photoresist pattern; and forming a transparent conduction film on the fourth photoresist pattern having the contact holes.
    • 公开了制造薄膜晶体管阵列基板的简化方法。 该方法包括:利用第一掩模在基板上形成栅电极,栅极线和栅极焊盘; 在基板上形成栅极绝缘膜,半导体层和金属层; 使用第二掩模在所述金属层上形成第一光致抗蚀剂图案; 通过使用第一光致抗蚀剂图形形成用于栅极焊盘的第一接触孔; 形成第二光致抗蚀剂图案,并且使用第二光致抗蚀剂图案提供用于数据焊盘,数据线和薄膜晶体管的图案; 提供第三光致抗蚀剂图案,并且使用第三光致抗蚀剂图案形成栅极焊盘的源/漏电极和第二接触孔的接触孔; 在基板上形成保护膜,并使用第三掩模在保护膜上提供第四光致抗蚀剂图案; 使用第四光致抗蚀剂图案,形成用于栅极焊盘的第三接触孔,数据焊盘的接触孔,栅极线和漏极电极以及用于像素电极的接触孔; 以及在具有接触孔的第四光致抗蚀剂图案上形成透明导电膜。
    • 10. 发明授权
    • Liquid crystal display device and method for fabricating the same
    • 液晶显示装置及其制造方法
    • US07408597B2
    • 2008-08-05
    • US11269817
    • 2005-11-09
    • Ji No LeeHee Young KwackChang Bin Lee
    • Ji No LeeHee Young KwackChang Bin Lee
    • G02F1/136
    • G02F1/136227G02F1/13458H01L27/12H01L27/1248H01L27/1288
    • A liquid crystal display device according to the present invention includes a gate line on a substrate; a data line crossing the gate line with a gate insulating film to define a pixel area; a thin film transistor connected to the gate line and the data line; a semiconductor pattern overlapped along the data line; a double layer passivation film covering the data line and the thin film transistor, wherein layers of the passivation film have different etching rates; and a pixel electrode formed in a pixel hole penetrating an upper passivation film of the double layer passivation film and connected to a drain electrode of the thin film transistor exposed through a drain contact hole, the pixel electrode forming a border with the upper passivation film surrounding the pixel hole.
    • 根据本发明的液晶显示装置包括在基板上的栅极线; 与栅极线交叉的数据线与栅极绝缘膜以限定像素区域; 连接到栅极线和数据线的薄膜晶体管; 半导体图案沿数据线重叠; 覆盖数据线和薄膜晶体管的双层钝化膜,其中钝化膜的层具有不同的蚀刻速率; 以及像素电极,其形成在贯穿双层钝化膜的上钝化膜的像素孔中,并连接到通过漏极接触孔露出的薄膜晶体管的漏电极,所述像素电极与上周钝化膜形成边界 像素孔。