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1. 发明申请

US20150034591A1 METHOD FOR PRODUCING A DIFFRACTION GRATING 有权
标题翻译：用于生产衍射光栅的方法
公开(公告)号：US20150034591A1
公开(公告)日：2015-02-05
申请号：US14124002
申请日：2012-06-07
申请人： Henri Johannes Petrus Vink , Huibert Visser , Aaldert Hide Van Amerongen
发明人： Henri Johannes Petrus Vink , Huibert Visser , Aaldert Hide Van Amerongen
IPC分类号： G02B27/42 , G02B5/18 , H01S3/08 , H01S3/092 , H01S3/0933 , G01J3/18 , H01S3/16
CPC分类号： G02B27/4244 , G01J3/18 , G01J3/1804 , G01J3/24 , G02B5/008 , G02B5/1828 , G02B5/1852 , G02B5/1857 , G02B5/1866 , H01S3/08009 , H01S3/092 , H01S3/0933 , H01S3/1636
摘要： A manufacturing method for a grating is disclosed for the angular dispersion of light impinging the grating. The grating comprises tapered structures and cavities. A cavity width and/or corrugation amplitude is varied for achieving a desired grating efficiency according to calculation. A method is disclosed for conveniently creating gratings with variable cavity width and/or corrugation amplitude. The method comprises the step of anisotropically etching a groove pattern into a grating master. Optionally a replica is produced that is complementary to the grating master. By variation of an etching resist pattern, the cavity width of the grating may be varied allowing the optimization towards different efficiency goals.
摘要翻译：公开了一种用于光入射光栅的光的角度色散的光栅的制造方法。光栅包括锥形结构和空腔。根据计算，改变空腔宽度和/或波纹幅度以实现期望的光栅效率。公开了一种方便地创建具有可变腔宽度和/或波纹幅度的光栅的方法。该方法包括将凹槽图案各向异性蚀刻成光栅母板的步骤。可选地，产生与光栅母板互补的复制品。通过蚀刻抗蚀剂图案的变化，可以改变光栅的腔宽度，从而实现不同效率目标的优化。

2. 发明授权

US07738079B2 Radiation beam pulse trimming 失效
公开(公告)号：US07738079B2
公开(公告)日：2010-06-15
申请号：US11598837
申请日：2006-11-14
申请人： Oscar Franciscus Jozephus Noordman , Henri Johannes Petrus Vink , Huibert Visser
发明人： Oscar Franciscus Jozephus Noordman , Henri Johannes Petrus Vink , Huibert Visser
IPC分类号： G03B27/72 , G03B27/42 , G03B27/54 , G03B27/32 , G02F1/00 , G02F1/01
CPC分类号： G03F7/70558 , G03F7/70041
摘要： A system is used to perform fast and slow applications, for example fast application can be pulse trimming. The system includes a radiation source, an electro-optical modulator, and a beam splitter. The radiation source is configured to generate a polarized beam of radiation. The electro-optical modulator, formed of crystalline quartz, is configured to modulate the beam of radiation. The beam splitter is configured to direct a first portion of the beam to a beam dump and to form an output beam from a second portion of the beam.

3. 发明授权

US07714986B2 Laser beam conditioning system comprising multiple optical paths allowing for dose control 有权
标题翻译：激光束调节系统包括允许剂量控制的多个光路
公开(公告)号：US07714986B2
公开(公告)日：2010-05-11
申请号：US11753390
申请日：2007-05-24
申请人： Huibert Visser , Pieter Willem Herman De Jager , Henri Johannes Petrus Vink , Marcus Gerhardus Hendrikus Meijerink
发明人： Huibert Visser , Pieter Willem Herman De Jager , Henri Johannes Petrus Vink , Marcus Gerhardus Hendrikus Meijerink
IPC分类号： G03B27/54
CPC分类号： G03F7/70558 , G03F7/70041
摘要： A radiation beam conditioning system comprising at least three optical paths in which the radiation is conditioned.
摘要翻译：一种辐射束调节系统，包括至少三个光路，其中辐射被调节。

4. 发明授权

US07898646B2 Using an interferometer as a high speed variable attenuator 有权
标题翻译：使用干涉仪作为高速可变衰减器
公开(公告)号：US07898646B2
公开(公告)日：2011-03-01
申请号：US11866820
申请日：2007-10-03
申请人： Oscar Franciscus Jozephus Noordman , Justin L. Kreuzer , Henri Johannes Petrus Vink , Teunis Cornelis Van Den Dool , Daniel Perez Calero
发明人： Oscar Franciscus Jozephus Noordman , Justin L. Kreuzer , Henri Johannes Petrus Vink , Teunis Cornelis Van Den Dool , Daniel Perez Calero
IPC分类号： G01J1/36 , G01J1/32 , G03B27/74
CPC分类号： G03F7/70558 , G02B26/001 , G03F7/70041
摘要： A system and method provides high speed variable attenuators. The attenuators can be used within a lithographic apparatus to control intensity of radiation in one or more correction pulses used to correct a dose of the radiation following an initial pulse of radiation.
摘要翻译：系统和方法提供高速可变衰减器。衰减器可以在光刻设备中使用，以控制用于在初始辐射脉冲之后校正辐射剂量的一个或多个校正脉冲中的辐射强度。

5. 发明授权

US07880875B2 Apparatus and method for inspecting circuit structures 失效
标题翻译：用于检查电路结构的装置和方法
公开(公告)号：US07880875B2
公开(公告)日：2011-02-01
申请号：US12280922
申请日：2007-02-28
申请人： Kees Moddemeyer , Henri Johannes Petrus Vink , Pieter Willem Herman de Jager
发明人： Kees Moddemeyer , Henri Johannes Petrus Vink , Pieter Willem Herman de Jager
IPC分类号： G01N21/00
CPC分类号： G01N21/8806 , G01N21/956
摘要： An apparatus is described for scanning a circuit structure. The apparatus has a linear sensor (16) for detecting light intensity as a function of position along the sensor. A transport mechanism (12) moves a circuit structure (10), such as a PCB or a wafer relative to the sensor. The circuit structure is illuminated with an illumination system (14) that comprises a hollow cylinder (144) with a mainly diffusively and/or specularly reflecting inner wall surface. The cylinder is arranged in parallel with the sensor and has a first slit (40) and a second slit (42) located so that a virtual plane runs through the sensor, the first and second slit to a location for the circuit structure under inspection. The illumination system furthermore comprises a linear light source (146) in the cylinder or the inner wall of the cylinder. In an embodiment the illumination system comprises a splitting mirror (22) in the cylinder to reflect light to the circuit structure.
摘要翻译：描述了用于扫描电路结构的装置。该装置具有用于根据传感器检测作为位置的函数的光强度的线性传感器（16）。传送机构（12）相对于传感器移动诸如PCB或晶片的电路结构（10）。电路结构用包括具有主要扩散和/或镜面反射的内壁表面的中空圆柱体（144）的照明系统（14）照亮。气缸与传感器平行布置，并且具有第一狭缝（40）和第二狭缝（42），第一狭缝（40）和第二狭缝（42）定位成使得虚拟平面穿过传感器，第一和第二狭缝到被检查的电路结构的位置。照明系统还包括气缸中的线性光源（146）或气缸的内壁。在一个实施例中，照明系统包括在气缸中的反射镜（22）以将光反射到电路结构。

6. 发明申请

US20090091734A1 Illumination System 有权
标题翻译：照明系统
公开(公告)号：US20090091734A1
公开(公告)日：2009-04-09
申请号：US12328251
申请日：2008-12-04
申请人： Huibert VISSER , Jacob Fredrik Friso Klinkhamer , Lev Ryzhikov , Scott D. Coston , Adel Joobeur , Henri Johannes Petrus Vink , Yevgeniy Konstantinovich Shmarev
发明人： Huibert VISSER , Jacob Fredrik Friso Klinkhamer , Lev Ryzhikov , Scott D. Coston , Adel Joobeur , Henri Johannes Petrus Vink , Yevgeniy Konstantinovich Shmarev
IPC分类号： G03B27/54 , G02B27/10
CPC分类号： G03F7/70583 , G02B27/0905 , G03F7/70075
摘要： A coherence remover is provided. In an embodiment the coherence remover includes a first mirror and a second mirror coupled to the first mirror. The coherence remover is configured to receive an input beam. Each of the first and second mirrors is configured to reflect a respective portion of the input beam to produce respective one or more intermediate beams. The intermediate beams collectively form an output beam that has a reduced coherence compared to the input beam.
摘要翻译：提供了一个相干去除器。在一个实施例中，相干去除器包括耦合到第一反射镜的第一反射镜和第二反射镜。相干去除器被配置为接收输入光束。第一和第二反射镜中的每一个被配置为反射输入光束的相应部分以产生相应的一个或多个中间光束。与输入光束相比，中间光束共同形成具有减小的相干性的输出光束。

7. 发明申请

US20080291417A1 Laser Beam Conditioning System Comprising Multiple Optical Paths Allowing for Dose Control 有权
标题翻译：包括允许剂量控制的多个光路的激光束调节系统
公开(公告)号：US20080291417A1
公开(公告)日：2008-11-27
申请号：US11753390
申请日：2007-05-24
申请人： Huibert Visser , Pieter Willem Herman De Jager , Henri Johannes Petrus Vink , Marcus Gerhardus Hendrikus Meijerink
发明人： Huibert Visser , Pieter Willem Herman De Jager , Henri Johannes Petrus Vink , Marcus Gerhardus Hendrikus Meijerink
IPC分类号： G03B27/54 , G21K5/04
CPC分类号： G03F7/70558 , G03F7/70041
摘要： A radiation beam conditioning system comprising at least three optical paths in which the radiation is conditioned.
摘要翻译：一种辐射束调节系统，包括至少三个光路，其中辐射被调节。

8. 发明授权

US07342644B2 Methods and systems for lithographic beam generation 有权
标题翻译：光刻光束生成的方法和系统
公开(公告)号：US07342644B2
公开(公告)日：2008-03-11
申请号：US11023628
申请日：2004-12-29
申请人： Johannes Jacobus Matheus Baselmans , Anastasius Jacobus Anicetus Bruinsma , Pieter Willem Herman De Jager , Robert-Han Munnig Schmidt , Henri Johannes Petrus Vink
发明人： Johannes Jacobus Matheus Baselmans , Anastasius Jacobus Anicetus Bruinsma , Pieter Willem Herman De Jager , Robert-Han Munnig Schmidt , Henri Johannes Petrus Vink
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/7005
摘要： A lithographic illumination apparatus and method includes receiving a plurality of source radiation beams from a plurality of corresponding radiation sources, deflecting the plurality of source radiation beams along a common beam path, thereby generating a projection beam of radiation, imparting the projection beam of radiation with a cross-section pattern, and projecting the patterned projection beam of radiation onto a target portion of a substrate.
摘要翻译：光刻照明装置和方法包括从多个对应的辐射源接收多个源辐射束，沿着公共光束路径偏转多个源辐射束，从而产生投影辐射束，将辐射束投射到横截面图案，以及将图案化的投影辐射束投影到基板的目标部分上。

9. 发明授权

US07079225B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07079225B2
公开(公告)日：2006-07-18
申请号：US10939947
申请日：2004-09-14
申请人： Johannes Jacobus Matheus Baselmans , Anastasius Jacobus Anicetus Bruinsma , Pieter Willem Herman De Jager , Henri Johannes Petrus Vink
发明人： Johannes Jacobus Matheus Baselmans , Anastasius Jacobus Anicetus Bruinsma , Pieter Willem Herman De Jager , Henri Johannes Petrus Vink
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70058 , G03F7/70291 , G03F7/70583
摘要： Use of a refraction grating to divide a beam of radiation into a plurality of sub-beams that are each directed onto an array of individually controllable elements, modulated thereby and projected onto a substrate as an array of spots.
摘要翻译：使用折射光栅将辐射束划分成多个子光束，每个子光束被引导到独立可控元件的阵列上，由此调制，并作为点阵列投影到基板上。

10. 发明申请

US20080112030A1 Radiation beam pulse trimming 失效
标题翻译：辐射束脉冲修整
公开(公告)号：US20080112030A1
公开(公告)日：2008-05-15
申请号：US11598837
申请日：2006-11-14
申请人： Oscar Franciscus Jozephus Noordman , Henri Johannes Petrus Vink , Huibert Visser
发明人： Oscar Franciscus Jozephus Noordman , Henri Johannes Petrus Vink , Huibert Visser
IPC分类号： G02F1/01 , G02F1/00
CPC分类号： G03F7/70558 , G03F7/70041
摘要： A system is used to perform fast and slow applications, for example fast application can be pulse trimming. The system includes a radiation source, an electro-optical modulator, and a beam splitter. The radiation source is configured to generate a polarized beam of radiation. The electro-optical modulator, formed of crystalline quartz, is configured to modulate the beam of radiation. The beam splitter is configured to direct a first portion of the beam to a beam dump and to form an output beam from a second portion of the beam.
摘要翻译：一个系统用于执行快速和慢速的应用，例如快速应用可以进行脉冲修整。该系统包括辐射源，电光调制器和分束器。辐射源被配置为产生偏振的辐射束。由结晶石英形成的电光调制器被配置成调制辐射束。分束器被配置为将光束的第一部分引导到光束倾倒并且形成来自光束的第二部分的输出光束。

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