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1. 发明授权

US08163185B1 Method and apparatus for lifting off photoresist beneath an overlayer 有权
标题翻译：用于剥离覆盖层下面的光致抗蚀剂的方法和装置
公开(公告)号：US08163185B1
公开(公告)日：2012-04-24
申请号：US12059903
申请日：2008-03-31
申请人： Hai Sun , Liubo Hong , Rowena Schmidt , Lijie Zhao , Winnie Yu , Hongping Yuan
发明人： Hai Sun , Liubo Hong , Rowena Schmidt , Lijie Zhao , Winnie Yu , Hongping Yuan
IPC分类号： B44C1/22
CPC分类号： G11B5/3163 , Y10T29/49032
摘要： A method of lifting off photoresist beneath an overlayer includes providing a structure including photoresist and depositing an overlayer impenetrable to a liftoff solution over the photoresist and a field region around the structure. The method also includes forming a mask over the structure and ion milling to remove the overlayer in the field region not covered by the mask. The method then includes lifting off the photoresist using the liftoff solution.
摘要翻译：提供覆盖层下面的光致抗蚀剂的方法包括提供包括光致抗蚀剂的结构，以及沉积在光致抗蚀剂上的不透气的覆盖层和围绕结构的场区域的覆盖层。该方法还包括在结构上形成掩模和离子研磨以去除未被掩模覆盖的场区域中的覆盖层。该方法然后包括使用提升溶液提取光致抗蚀剂。

2. 发明授权

US08081403B1 Magnetic element having a smaller critical dimension of the free layer 有权
标题翻译：具有较小临界尺寸的自由层的磁性元件
公开(公告)号：US08081403B1
公开(公告)日：2011-12-20
申请号：US12170619
申请日：2008-07-10
申请人： Benjamin Chen , Hongping Yuan , Danning Yang , Wei Zhang , Hugh C. Hiner , Lei Wang , Yingjian Chen , Brant Nease
发明人： Benjamin Chen , Hongping Yuan , Danning Yang , Wei Zhang , Hugh C. Hiner , Lei Wang , Yingjian Chen , Brant Nease
IPC分类号： G11B5/39
CPC分类号： H01L43/12 , B82Y10/00 , B82Y25/00 , G11B5/3906 , G11B5/3909
摘要： A magnetic element includes a pinned layer, a nonferromagnetic spacer layer, and a free layer. The nonferromagnetic spacer layer resides between the pinned layer and the free layer. The free layer has a track width of not more than 0.08 micron.
摘要翻译：磁性元件包括钉扎层，非铁磁隔离层和自由层。非铁磁间隔层位于被钉扎层和自由层之间。自由层的轨道宽度不大于0.08微米。

3. 发明申请

US20100290157A1 Damascene coil processes and structures 审中-公开
标题翻译：大马士革线圈工艺和结构
公开(公告)号：US20100290157A1
公开(公告)日：2010-11-18
申请号：US12466353
申请日：2009-05-14
申请人： Jinqiu Zhang , Hongping Yuan , Hai Sun , Ming Zhao
发明人： Jinqiu Zhang , Hongping Yuan , Hai Sun , Ming Zhao
IPC分类号： G11B5/17 , B05D3/00 , B44C1/22 , C25D5/34
CPC分类号： G11B5/3123 , C25D7/123 , G11B5/17
摘要： A magnetic recording head is provided. The magnetic recording head comprises a write pole and a write coil structure configured to generate a magnetic field in the write pole. The write coil structure comprises a substrate layer and a coil material disposed within the substrate layer. The write coil structure is substantially free of photoresist. A method for forming a write coil structure is also provided. The method comprises the steps of providing a substrate layer, forming a photoresist pattern mask over the substrate layer, opening a damascene trench in the substrate layer by reactive ion etching, and disposing a coil material into the damascene trench in the substrate layer.
摘要翻译：提供磁记录头。磁记录头包括写极和写线圈结构，其被配置为在写极中产生磁场。写入线圈结构包括衬底层和设置在衬底层内的线圈材料。写入线圈结构基本上不含光致抗蚀剂。还提供了一种用于形成写入线圈结构的方法。该方法包括以下步骤：提供衬底层，在衬底层上形成光致抗蚀剂图案掩模，通过反应离子蚀刻在衬底层中打开镶嵌沟槽，以及将线圈材料设置在衬底层中的镶嵌沟槽中。

4. 发明授权

US07726009B1 Method of fabricating a perpendicular recording write head having a gap with two portions 失效
标题翻译：制造具有两部分间隙的垂直记录写头的方法
公开(公告)号：US07726009B1
公开(公告)日：2010-06-01
申请号：US11779218
申请日：2007-07-17
申请人： Yinshi Liu , Benjamin Chen , Kyusik Sin , Hongping Yuan
发明人： Yinshi Liu , Benjamin Chen , Kyusik Sin , Hongping Yuan
IPC分类号： G11B5/187
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/235 , G11B5/3163 , Y10T29/49039 , Y10T29/49043 , Y10T29/49052
摘要： A method of fabricating a write head for perpendicular recording includes forming a pole layer on an undercoat layer, forming a mask over at least a portion of the pole layer, and forming the pole by removing material from the pole layer. The method further includes forming a first gap portion of a gap along a first side and a second side of the pole, forming a protective layer over at least a portion of the first gap portion, removing the mask, and removing the protective layer. The method further includes forming a second gap portion of the gap over at least a top surface of the pole and forming a shield over at least the second gap portion.
摘要翻译：制造用于垂直记录的写头的方法包括在底涂层上形成极层，在极层的至少一部分上形成掩模，并通过从极层去除材料形成极。所述方法还包括沿着所述极的第一侧和第二侧形成间隙的第一间隙部分，在所述第一间隙部分的至少一部分上形成保护层，去除所述掩模，以及去除所述保护层。该方法还包括在极的至少顶表面上形成间隙的第二间隙部分，并在至少第二间隙部分上形成屏蔽。

5. 发明授权

US08649123B1 Method to eliminate reactive ion etching (RIE) loading effects for damascene perpendicular magnetic recording (PMR) fabrication 有权
标题翻译：消除用于大马士革垂直磁记录（PMR）制造的反应离子蚀刻（RIE）负载效应的方法
公开(公告)号：US08649123B1
公开(公告)日：2014-02-11
申请号：US12324519
申请日：2008-11-26
申请人： Jinqiu Zhang , Hai Sun , Hongping Yuan , Tsung Yuan Chen
发明人： Jinqiu Zhang , Hai Sun , Hongping Yuan , Tsung Yuan Chen
IPC分类号： G11B5/31
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3163
摘要： A method for providing a perpendicular magnetic recording (PMR) head is disclosed. The method comprises: providing an insulating layer; covering the insulating layer with a hard mask material; forming a pre-defined shape in the hard mask material; forming a pole trench and a yoke area in the insulating layer by a first reactive ion etching (RIE) process in which the yoke area includes a loading prevention pattern; performing a wet etching process to remove the hard mask material from the pole trench and the yoke area; performing a second RIE process to remove the loading prevention pattern of the yoke area, wherein the pole trench and the remainder of the yoke area are not removed and remain having similar side wall angles; and providing a PMR pole in which at least a portion of the PMR pole resides in the pole trench.
摘要翻译：公开了一种用于提供垂直磁记录（PMR）头的方法。该方法包括：提供绝缘层; 用硬掩模材料覆盖绝缘层; 在硬掩模材料中形成预定形状; 通过第一反应离子蚀刻（RIE）工艺在绝缘层中形成极沟和轭区，其中轭区包括负载防止图案; 执行湿蚀刻工艺以从磁极沟槽和磁轭区域去除硬掩模材料; 执行第二RIE处理以去除轭区域的负载防止图案，其中极沟槽和轭区域的其余部分不被去除并保持具有相似的侧壁角度; 以及提供PMR极，其中PMR极的至少一部分位于极沟中。

6. 发明授权

US08334093B2 Method and system for providing a perpendicular magnetic recording head 有权
标题翻译：用于提供垂直磁记录头的方法和系统
公开(公告)号：US08334093B2
公开(公告)日：2012-12-18
申请号：US12262572
申请日：2008-10-31
申请人： Jinqiu Zhang , Hai Sun , Hongping Yuan , Tsung Yuan Chen , Guanxiong Li
发明人： Jinqiu Zhang , Hai Sun , Hongping Yuan , Tsung Yuan Chen , Guanxiong Li
IPC分类号： H04R31/00
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/3116 , Y10T29/49041
摘要： A method and system for providing a PMR pole in a magnetic recording transducer including an intermediate layer are disclosed. The method and system include providing a mask on the intermediate layer. The mask includes a line having at least one side. A hard mask layer is provided on the mask. At least a portion of the hard mask layer resides on the side(s) of the line. At least part of the hard mask layer on the side(s) of the line is removed. Thus, at least a portion of the line is exposed. The line is then removed, providing an aperture in the hard mask corresponding to the line. The method also includes forming a trench in the intermediate layer under the aperture. The trench top is wider than its bottom. The method further includes providing a PMR pole, at least a portion of which resides in the trench.
摘要翻译：公开了一种用于在包括中间层的磁记录换能器中提供PMR极的方法和系统。该方法和系统包括在中间层上提供掩模。掩模包括具有至少一个侧面的线。在掩模上设置硬掩模层。硬掩模层的至少一部分位于线的一侧。除去线的侧面上的硬掩模层的至少一部分。因此，线的至少一部分被暴露。然后去除线，在对应于线的硬掩模中提供孔。该方法还包括在孔下方的中间层中形成沟槽。沟槽顶部比底部宽。该方法还包括提供PMR极，其至少一部分位于沟槽中。

7. 发明授权

US07736823B1 Method and system for providing optical proximity correction for structures such as a PMR nose 失效
标题翻译：用于为诸如PMR鼻子的结构提供光学邻近校正的方法和系统
公开(公告)号：US07736823B1
公开(公告)日：2010-06-15
申请号：US11801916
申请日：2007-05-11
申请人： Yizhong Wang , Hai Sun , Hongping Yuan , Winnie Yu
发明人： Yizhong Wang , Hai Sun , Hongping Yuan , Winnie Yu
IPC分类号： G03F1/00
CPC分类号： G11B5/3163 , G03F1/36 , G11B5/1278 , G11B5/3116
摘要： A mask for transferring a pattern for portion of a magnetic recording transducer is disclosed. The masks includes one corner corresponding to an angle of more than ninety degrees and less than one hundred eighty degrees. The mask also includes at least one rectangular serif residing at the corner.
摘要翻译：公开了用于传送磁记录换能器的一部分的图案的掩模。掩模包括对应于大于九十度且小于百八十度的角度的一个角。面罩还包括至少一个位于拐角处的矩形衬线。

8. 发明授权

US07248431B1 Method of fabricating a perpendicular recording write head having a gap with two portions 有权
标题翻译：制造具有两部分间隙的垂直记录写头的方法
公开(公告)号：US07248431B1
公开(公告)日：2007-07-24
申请号：US10837350
申请日：2004-04-30
申请人： Yinshi Liu , Benjamin Chen , Kyusik Sin , Hongping Yuan
发明人： Yinshi Liu , Benjamin Chen , Kyusik Sin , Hongping Yuan
IPC分类号： G11B5/127 , G11B5/187 , G11B5/147
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/235 , G11B5/3163 , Y10T29/49039 , Y10T29/49043 , Y10T29/49052
摘要： A method of fabricating a write head for perpendicular recording is provided. The write head has a pole, a shield in proximity to the pole, and a gap between the pole and the shield. The method includes forming a pole layer on an undercoat layer, forming a mask over at least a portion of the pole layer, and forming the pole by removing material from the pole layer. The pole has a top surface, a first side, and a second side. The method further includes forming a first gap portion of the gap along the first side and along the second side of the pole, forming a protective layer over at least a portion of the first gap portion, removing the mask, and removing the protective layer. The method further includes forming a second gap portion of the gap over at least the top surface of the pole and forming the shield over at least the second gap portion.
摘要翻译：提供一种制造用于垂直记录的写入头的方法。写头具有极，靠近极的屏蔽，以及极与屏蔽之间的间隙。该方法包括在底涂层上形成极层，在极层的至少一部分上形成掩模，并通过从极层去除材料形成极。极具有顶表面，第一侧和第二侧。该方法还包括沿着第一侧沿着极的第二侧形成间隙的第一间隙部分，在第一间隙部分的至少一部分上形成保护层，去除掩模，以及去除保护层。所述方法还包括在至少所述极的顶表面上形成所述间隙的第二间隙部分，并在至少所述第二间隙部分上形成所述屏蔽。

9. 发明授权

US09202480B2 Double patterning hard mask for damascene perpendicular magnetic recording (PMR) writer 有权
标题翻译：用于大马士革垂直磁记录（PMR）作者的双重图案化硬掩模
公开(公告)号：US09202480B2
公开(公告)日：2015-12-01
申请号：US12579316
申请日：2009-10-14
申请人： Xiaohai Xiang , Yun-Fei Li , Jinqiu Zhang , Hongping Yuan , Xianzhong Zeng , Hai Sun
发明人： Xiaohai Xiang , Yun-Fei Li , Jinqiu Zhang , Hongping Yuan , Xianzhong Zeng , Hai Sun
IPC分类号： B44C1/22 , C03C15/00 , H01L21/4763 , G11B5/31 , G11B5/127
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3163 , Y10T428/11
摘要： Various embodiments of the subject disclosure provide a double patterning process that uses two patterning steps to produce a write structure having a nose shape with sharp corners. In one embodiment, a method for forming a write structure on a multi-layer structure comprising a substrate and an insulator layer on the substrate is provided. The method comprises forming a hard mask layer over the insulator layer, performing a first patterning process to form a pole and yoke opening in the hard mask layer, performing a second patterning process to remove rounded corners of the pole and yoke opening in the hard mask layer, removing a portion of the insulator layer corresponding to the pole and yoke opening in the hard mask layer to form a trench in the insulator layer, and filling the trench with a magnetic material.
摘要翻译：本发明公开的各种实施例提供一种双重图案化工艺，其使用两个图案化步骤来产生具有尖角的鼻子形状的写入结构。在一个实施例中，提供了一种用于在包括衬底和衬底上的绝缘体层的多层结构上形成写结构的方法。该方法包括在绝缘体层上形成硬掩模层，执行第一图案化工艺以在硬掩模层中形成极和轭开口，执行第二图案化处理以去除硬掩模中的极和轭开口的圆角去除与硬掩模层中的极和轭开口相对应的绝缘体层的一部分，以在绝缘体层中形成沟槽，并用磁性材料填充沟槽。

10. 发明授权

US08394280B1 Resist pattern protection technique for double patterning application 有权
标题翻译：用于双重图案化应用的抗蚀图案保护技术
公开(公告)号：US08394280B1
公开(公告)日：2013-03-12
申请号：US12614210
申请日：2009-11-06
申请人： Dujiang Wan , Hai Sun , Hongping Yuan , Ling Wang , Xianzhong Zeng
发明人： Dujiang Wan , Hai Sun , Hongping Yuan , Ling Wang , Xianzhong Zeng
IPC分类号： B44C1/22
CPC分类号： G11B5/3163 , G11B5/1278 , H01L21/0273 , H01L21/0332 , H01L21/0337
摘要： Methods of patterning a material are disclosed. A first resist pattern is formed on a field. A protective layer is formed over the first resist pattern and at least a portion of the field. A second resist pattern is formed over a portion of the protective layer. A portion of a material to be patterned deposited adjacent to the first and second resist patterns is removed.
摘要翻译：公开了图案化材料的方法。在场上形成第一抗蚀剂图案。在第一抗蚀剂图案和场的至少一部分上形成保护层。在保护层的一部分上形成第二抗蚀剂图案。除去与第一和第二抗蚀剂图案相邻的被图案化沉积的材料的一部分。

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