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    • 2. 发明授权
    • Optimization method of deposition time and an optimization system of deposition time
    • 沉积时间的优化方法和沉积时间优化系统
    • US07280884B2
    • 2007-10-09
    • US10785711
    • 2004-02-23
    • Akira TadanoYusuke InoueIsao Yokoyama
    • Akira TadanoYusuke InoueIsao Yokoyama
    • G06F19/00
    • H01L22/20
    • An optimum method for deposition time is provided that can improve uniformity of processing time of oxidation thickness. When starting a heat oxidation process, a time for optimum oxidation processing in the process management system is calculated based on atmospheric pressure data, a target thickness of that process, oxidization time, thickness data and atmospheric pressure data in the immediately preceding process under the same oxidization processing job. The optimum system comprises a process management system such as a host computer, a device having a barometer, a heat oxidation-processing device and a thickness-measuring device. The host computer, the barometer, the heat oxidation processing device and the thickness-measuring device are connected via a network so as to transmit data to and from each device.
    • 提供了一种最佳的沉积时间方法,可以提高氧化厚度的处理时间的均匀性。 当开始热氧化过程时,基于大气压力数据,该过程的目标厚度,氧化时间,厚度数据和大气压力数据,在相同的前一过程中计算过程管理系统中最佳氧化处理的时间 氧化处理工作。 最佳系统包括诸如主计算机,具有气压计的装置,热氧化处理装置和厚度测量装置之类的过程管理系统。 主计算机,气压计,热氧化处理装置和厚度测量装置经由网络连接,以便从每个装置传送数据。
    • 5. 发明授权
    • Combined dipole and ferrite antenna
    • 组合偶极和铁氧体天线
    • US4407000A
    • 1983-09-27
    • US277100
    • 1981-06-25
    • Masanori SasakiIsao Yokoyama
    • Masanori SasakiIsao Yokoyama
    • H01Q1/36H01Q3/02H01Q7/00H01Q7/08H01Q9/04H01Q9/14H01Q9/16H01Q21/29
    • H01Q9/16H01Q1/36H01Q21/29H01Q3/02H01Q7/005H01Q7/08H01Q9/04H01Q9/145
    • A small sized reception antenna for VHF and/or UHF band for the use in a room has been found. The antenna has a horizontal dipole type first antenna portion having a folded elongated conductor, and a vertical second antenna portion having a ferrite pole electromagnetically coupled with said horizontal first antenna portion. Said horizontal first antenna portion is rotatable in a horizontal plane, while the second antenna portion is fixed vertically. A tank circuit with a tank coil wound on the ferrite pole and a variable capacitor is provided to resonate the antenna with the reception frequency. An output coil is wound on the ferrite pole, and said output coil provides the output signal of the present antenna. Means for sliding the output coil along the ferrite pole is provided to adjust the output impedance of the present antenna for each of the reception frequencies.
    • 已经发现用于VHF和/或UHF频带的小型接收天线用于房间中。 天线具有水平偶极型第一天线部分,其具有折叠的细长导体和垂直第二天线部分,其具有与所述水平第一天线部分电磁耦合的铁氧体磁极。 所述水平的第一天线部分可在水平面上旋转,而第二天线部分垂直固定。 提供一个卷绕在铁氧体磁极上的储能线圈和可变电容器的储能电路,以使天线以接收频率谐振。 输出线圈缠绕在铁氧体磁极上,所述输出线圈提供本天线的输出信号。 提供了用于沿着铁氧体磁极滑动输出线圈的装置,用于针对每个接收频率调整本天线的输出阻抗。
    • 6. 发明申请
    • OPTIMIZATION METHOD OF DEPOSITION TIME AND AN OPTIMIZATION SYSTEM OF DEPOSITION TIME
    • 沉积时间的优化方法和沉积时间的优化系统
    • US20090192641A1
    • 2009-07-30
    • US11862705
    • 2007-09-27
    • Akira TADANOYusuke INOUEIsao YOKOYAMA
    • Akira TADANOYusuke INOUEIsao YOKOYAMA
    • G05B13/04G06F17/30G06F17/00G06F19/00
    • H01L22/20
    • A semiconductor manufacturing method and apparatus is provided that can improve uniformity of processing time of oxidation thickness. When starting a heat oxidation process, a time for optimum oxidation processing in the process management system is calculated based on atmospheric pressure data, a target thickness of that process, oxidization time, thickness data and atmospheric pressure data in the immediately preceding process under the same oxidization processing job. The optimum system comprises a process management system such as a host computer, a device having a barometer, a heat oxidation-processing device and a thickness-measuring device. The host computer, the barometer, the heat oxidation processing device and the thickness-measuring device are connected via a network so as to transmit data to and from each device.
    • 提供了可以提高氧化厚度的处理时间的均匀性的半导体制造方法和装置。 当开始热氧化过程时,根据大气压力数据,该过程的目标厚度,氧化时间,厚度数据和大气压力数据在相同的前一过程中计算过程管理系统中最佳氧化处理的时间 氧化处理工作。 最佳系统包括诸如主计算机,具有气压计的装置,热氧化处理装置和厚度测量装置之类的过程管理系统。 主计算机,气压计,热氧化处理装置和厚度测量装置经由网络连接,以便从每个装置传送数据。
    • 9. 发明授权
    • Optimization method of deposition time and an optimization system of deposition time
    • 沉积时间的优化方法和沉积时间优化系统
    • US07831329B2
    • 2010-11-09
    • US11862705
    • 2007-09-27
    • Akira TadanoYusuke InoueIsao Yokoyama
    • Akira TadanoYusuke InoueIsao Yokoyama
    • G06F19/00H01L21/00
    • H01L22/20
    • A semiconductor manufacturing method and apparatus is provided that can improve uniformity of processing time of oxidation thickness. When starting a heat oxidation process, a time for optimum oxidation processing in the process management system is calculated based on atmospheric pressure data, a target thickness of that process, oxidization time, thickness data and atmospheric pressure data in the immediately preceding process under the same oxidization processing job. The optimum system comprises a process management system such as a host computer, a device having a barometer, a heat oxidation-processing device and a thickness-measuring device. The host computer, the barometer, the heat oxidation processing device and the thickness-measuring device are connected via a network so as to transmit data to and from each device.
    • 提供了可以提高氧化厚度的处理时间的均匀性的半导体制造方法和装置。 当开始热氧化过程时,基于大气压力数据,该过程的目标厚度,氧化时间,厚度数据和大气压力数据,在相同的前一过程中计算过程管理系统中最佳氧化处理的时间 氧化处理工作。 最佳系统包括诸如主计算机,具有气压计的装置,热氧化处理装置和厚度测量装置之类的过程管理系统。 主计算机,气压计,热氧化处理装置和厚度测量装置经由网络连接,以便从每个装置传送数据。