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1. 发明授权

US11587772B2 Multi-layer protective coating 有权
公开(公告)号：US11587772B2
公开(公告)日：2023-02-21
申请号：US17653401
申请日：2022-03-03
申请人： Jiangsu Favored Nanotechnology Co., LTD
发明人： Jian Zong
IPC分类号： C23C16/50 , H01J37/32 , C23C16/52 , C23C16/02 , C23C16/458
摘要： Methods and apparatus for preparing a protective coating are described. In one example aspect, an apparatus for preparing a protective coating includes a chamber, a substrate positioned within the chamber configured to hold at least a target object, an inlet pipe configured to direct a monomer vapor into the chamber, and one or more electrodes configured to perform a chemical vapor deposition process to produce a multi-layer coating. The chemical vapor deposition process comprises multiple cycles, each cycle comprising a pretreatment phase and a coating phase to produce a layer of the multi-layer coating.

2. 发明授权

US11332829B2 Plasma polymerization coating with uniformity control 有权
公开(公告)号：US11332829B2
公开(公告)日：2022-05-17
申请号：US16427199
申请日：2019-05-30
申请人： Jiangsu Favored Nanotechnology Co., Ltd.
发明人： Jian Zong
IPC分类号： C23C16/50 , H01J37/32 , C23C16/458 , B05D1/00 , C23C16/44 , C23C16/455
摘要： Introduced here is a plasma polymerization apparatus and process. Example embodiments include a vacuum chamber in a substantially symmetrical shape relative to a central axis. A primary rotation shaft may be operable to rotate about the central axis of the vacuum chamber and a secondary rotation shaft may be operable to rotate about a secondary axis distal to the central axis. The primary and secondary rotation shafts may be mechanically connected, and one or more devices may be secured on a platform that rotates along both shafts. Additionally, reactive species discharge mechanisms positioned around a perimeter of the vacuum chamber may be configured to disperse reactive species into the vacuum chamber. The reactive species may form a uniform polymeric multi-layer coating on the surface of the one or more devices.

3. 发明授权

US10934623B2 Nano-coating protection method for electrical connectors 有权
公开(公告)号：US10934623B2
公开(公告)日：2021-03-02
申请号：US16882100
申请日：2020-05-22
申请人： Jiangsu Favored Nanotechnology Co., Ltd.
发明人： Jian Zong
IPC分类号： C23C16/50 , C23C16/52 , B05D1/00 , C23C16/458 , B05D3/14 , H01J37/32 , H01B7/28 , H01R13/03 , H01R43/00
摘要： Introduced here is a plasma polymerization apparatus and process. Example embodiments include a vacuum chamber in a substantially symmetrical shape to a central axis. A rotation rack may be operable to rotate about the central axis of the vacuum chamber. Additionally, reactive species discharge mechanisms positioned around a perimeter of the vacuum chamber in a substantially symmetrical manner from the outer perimeter of the vacuum chamber may be configured to disperse reactive species into the vacuum chamber. The reactive species may form a polymeric multi-layer coating on surfaces of the one or more devices. Each layer may have a different composition of atoms to enhance the water resistance, corrosion resistance, and fiction resistance of the polymeric multi-layer coating.

4. 发明申请

US20200368776A1 APPARATUS AND METHOD FOR SURFACE COATING BY MEANS OF GRID CONTROL AND PLASMA-INITIATED GAS-PHASE POLYMERIZATION 审中-公开
公开(公告)号：US20200368776A1
公开(公告)日：2020-11-26
申请号：US16992574
申请日：2020-08-13
申请人： Jiangsu Favored Nanotechnology Co., Ltd.
发明人： Jian ZONG ZONG
IPC分类号： B05D1/00 , H01J37/32 , C23C16/50
摘要： An apparatus and a method for surface coating by means of grid control and plasma-initiated gas-phase polymerization. The method comprises: dividing a vacuum chamber into a discharging cavity (2) and a processing chamber (3) by using a metal grid mesh (1), the metal grid mesh (1) being insulated from the vacuum chamber; separately feeding carrier gas and monomer steam into the discharging cavity (2) and the processing chamber (3) through different pipes (4, 5), putting a substrate to be processed (11) in the processing chamber (3), and generating in the discharging cavity (2) plasma that continuously discharges; and applying pulse positive bias to the metal grid mesh (1), to release the plasma into the processing chamber (3) to initiate monomer polymerization.

5. 发明授权

US10541116B2 Multi-source low-power low-temperature plasma polymerized coating device and method 有权
公开(公告)号：US10541116B2
公开(公告)日：2020-01-21
申请号：US16095179
申请日：2017-04-25
申请人： Jiangsu Favored Nanotechnology Co., Ltd.
发明人： Jian Zong
IPC分类号： H01J37/32 , B05B5/08 , B05B5/10
摘要： A multi-source low-power low-temperature plasma polymerized coating device and method belong to the technical field of plasma. In the device, a plurality of discharge cavities are mounted on the wall of a main vacuum chamber; a plane grounding grid mesh and a porous electrode plate are mounted in each discharge cavity; and the porous electrode plate is parallel to the grid mesh, keeps a gap with the grid mesh and is connected with a low-power high-frequency power source. A carrier gas pipeline and a monomer steam pipeline are respectively connected to each discharge cavity. To-be-treated base material is placed in the main vacuum chamber. The vacuum pump is started to feed carrier gas and monomer steam. The wall of the discharge cavity is discharged by the porous electrode plate; the monomer steam is polymerized; and the polymerisate passes through small holes and the grid mesh successively in the porous electrode plate to enter the vacuum chamber and deposit on the surface of the base material to form a polymer coating. The device of the present invention has the advantages of even spatial distribution of plasma, good quality uniformity of products under batch treatment, low plasma energy and density, difficult in excessively destroying a chemical monomer structure and good quality of the formed polymer coating.

6. 发明申请

US20190148117A1 MULTI-SOURCE LOW-POWER LOW-TEMPERATURE PLASMA POLYMERIZED COATING DEVICE AND METHOD 审中-公开
公开(公告)号：US20190148117A1
公开(公告)日：2019-05-16
申请号：US16095179
申请日：2017-04-25
申请人： Jiangsu Favored Nanotechnology Co., Ltd.
发明人： Jian ZONG
IPC分类号： H01J37/32
摘要： A multi-source low-power low-temperature plasma polymerized coating device and method belong to the technical field of plasma. In the device, a plurality of discharge cavities are mounted on the wall of a main vacuum chamber; a plane grounding grid mesh and a porous electrode plate are mounted in each discharge cavity; and the porous electrode plate is parallel to the grid mesh, keeps a gap with the grid mesh and is connected with a low-power high-frequency power source. A carrier gas pipeline and a monomer steam pipeline are respectively connected to each discharge cavity. To-be-treated base material is placed in the main vacuum chamber. The vacuum pump is started to feed carrier gas and monomer steam. The wall of the discharge cavity is discharged by the porous electrode plate; the monomer steam is polymerized; and the polymerisate passes through small holes and the grid mesh successively in the porous electrode plate to enter the vacuum chamber and deposit on the surface of the base material to form a polymer coating. The device of the present invention has the advantages of even spatial distribution of plasma, good quality uniformity of products under batch treatment, low plasma energy and density, difficult in excessively destroying a chemical monomer structure and good quality of the formed polymer coating.

7. 发明申请

US20180174803A1 PLASMA POLYMERIZATION COATING APPARATUS 审中-公开
公开(公告)号：US20180174803A1
公开(公告)日：2018-06-21
申请号：US15890476
申请日：2018-02-07
申请人： Jiangsu Favored Nanotechnology Co., LTD
发明人： Jian Zong
IPC分类号： H01J37/32
摘要： Introduced here is a plasma polymerization apparatus. Example embodiments include a reaction chamber in a shape substantially symmetrical to a central axis. Some examples further include a rotation rack in the reaction chamber. The rotation rack may be operable to rotate relative to the reaction chamber about the central axis of the reaction chamber. Examples may further include two reactive species discharge mechanisms positioned around a perimeter of the reaction chamber and configured to disperse reactive species into the reaction chamber in a substantially symmetrical manner from the outer perimeter of the reaction chamber toward the central axis of the reaction chamber, such that the reactive species form a polymeric coating on surfaces of the one or more substrates during said dispersion of the reactive species, and a collecting tube positioned along the central axis of the reaction chamber and having an air pressure lower than the reaction chamber.

8. 发明申请

US20220290295A1 COATING METHOD AND FILM LAYER THEREOF, AND COATING FIXTURE AND APPLICATION THEREOF 有权
公开(公告)号：US20220290295A1
公开(公告)日：2022-09-15
申请号：US17770599
申请日：2020-10-21
申请人： JIANGSU FAVORED NANOTECHNOLOGY CO., LTD.
发明人： Jian ZONG , Ji PENG , Yingjing DAI , Wei SHAN , Zhuyao LAN
IPC分类号： C23C16/04 , C23C16/458 , C23C16/52 , C23C16/56
摘要： Provided in the present disclosure are a coating method and a film layer thereof, and a coating chucking appliance and an application thereof. The coating method comprises the steps of: forming a normal film layer on a first component on a substrate surface, and forming at least a thinner film layer on a second component on the substrate surface, wherein the thickness of the normal film layer is greater than the thickness of the thinner film layer. The coating method can prepare a thinner film layer on the surface of some portions or parts on the substrate surface, and prepare a thicker film layer on the surface of other portions or parts, thereby satisfying the requirements of coating a thinner film layer on some electronic components of the substrate, such as circuit interface components, ensuring data transmission performance.

9. 发明申请

US20220259728A1 PLASMA POLYMERIZATION COATING WITH UNIFORMITY CONTROL 有权
公开(公告)号：US20220259728A1
公开(公告)日：2022-08-18
申请号：US17662611
申请日：2022-05-09
申请人： Jiangsu Favored Nanotechnology Co., Ltd.
发明人： Jian Zong
IPC分类号： C23C16/458 , B05D1/00 , C23C16/44 , C23C16/50 , C23C16/455 , H01J37/32
摘要： Introduced here is a plasma polymerization apparatus and process. Example embodiments include a vacuum chamber in a substantially symmetrical shape relative to a central axis. A primary rotation shaft may be operable to rotate about the central axis of the vacuum chamber and a secondary rotation shaft may be operable to rotate about a secondary axis distal to the central axis. The primary and secondary rotation shafts may be mechanically connected, and one or more devices may be secured on a platform that rotates along both shafts. Additionally, reactive species discharge mechanisms positioned around a perimeter of the vacuum chamber may be configured to disperse reactive species into the vacuum chamber. The reactive species may form a uniform polymeric multi-layer coating on the surface of the one or more devices.

10. 发明申请

US20220205103A1 NANO-COATING PROTECTION METHOD FOR ELECTRICAL DEVICES 有权
公开(公告)号：US20220205103A1
公开(公告)日：2022-06-30
申请号：US17655159
申请日：2022-03-16
申请人： Jiangsu Favored Nanotechnology Co., LTD
发明人： Jian Zong
IPC分类号： C23C16/50 , C23C16/52 , B05D1/00 , C23C16/458 , B05D3/14 , H01J37/32
摘要： Introduced here is a plasma polymerization apparatus and process. Example embodiments include a vacuum chamber in a substantially symmetrical shape to a central axis. A rotation rack may be operable to rotate about the central axis of the vacuum chamber. Additionally, reactive species discharge mechanisms positioned around a perimeter of the vacuum chamber in a substantially symmetrical manner from the outer perimeter of the vacuum chamber may be configured to disperse reactive species into the vacuum chamber. The reactive species may form a polymeric multi-layer coating on surfaces of the one or more devices. Each layer may have a different composition of atoms to enhance the water resistance, corrosion resistance, and fiction resistance of the polymeric multi-layer coating.

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