会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明申请
    • Method for forming a micro fuel cell
    • 微型燃料电池的形成方法
    • US20080118815A1
    • 2008-05-22
    • US11604035
    • 2006-11-20
    • John J. D'UrsoChowdary R. Koripella
    • John J. D'UrsoChowdary R. Koripella
    • H01M4/86B01J19/08H01M8/02
    • H01M8/1097H01M8/0232H01M8/1004H01M8/1023H01M8/1041H01M8/1048H01M2300/0045Y10T29/49108
    • A method is provided for fabricating a fuel cell wherein corrosion of metal diffusion layers or catalysts supports is avoided. The method comprises forming first and second electrical conductors (22, 42) accessible at a surface of a substrate (12). The substrate (12) is etched to provide a channel (34, 36), and a multi-metal layer (82) is deposited on the surface of the substrate (12). At least one metal is etched from the multi-metal layer (82) forming a porous metal layer therefrom. A portion of the porous metal layer is etched resulting in an anode portion (89) aligned with the channel (34, 36) and coupled to the first electrical conductor (22), and a cathode portion (90) coupled to the second electrical conductor (42) and separated from the anode portion by a cavity (91). A first bi-continuous material (97) is formed over the porous metal layer (82) within at least one of the anode (89) and oxidant (90) portions. An electrocatalyst (94) is formed over the bi-continous material (97), the cavity (91) is filled with an electrolyte; and the center anode portion (89) and the cavity (91) are covered with a capping layer (98).
    • 提供了一种用于制造燃料电池的方法,其中避免了金属扩散层或催化剂载体的腐蚀。 该方法包括形成可在衬底(12)的表面处接近的第一和第二电导体(22,42)。 蚀刻衬底(12)以提供通道(34,36),并且在衬底(12)的表面上沉积多金属层(82)。 从多金属层(82)蚀刻至少一种金属,从而形成多孔金属层。 多孔金属层的一部分被蚀刻,导致阳极部分(89)与沟道(34,36)对齐并且耦合到第一电导体(22),并且阴极部分(90)耦合到第二电导体 (42),并且通过空腔(91)与阳极部分分离。 第一双连续材料(97)在阳极(89)和氧化剂(90)部分中的至少一个内形成在多孔金属层(82)上。 在双连续材料(97)上形成电催化剂(94),空腔(91)填充有电解质; 并且中心阳极部分(89)和空腔(91)被覆盖层(98)覆盖。
    • 5. 发明授权
    • Electrodeposition chemistry for filling of apertures with reflective metal
    • 用反射金属填充孔的电沉积化学
    • US06379522B1
    • 2002-04-30
    • US09227957
    • 1999-01-11
    • Uziel LandauJohn J. D'Urso
    • Uziel LandauJohn J. D'Urso
    • C25D338
    • C25D3/38C25D7/12
    • The present invention provides plating solutions, particularly metal plating solutions, designed to provide uniform coatings on substrates and to provide substantially defect free filling of small features formed on substrates with none or low supporting electrolyte, i.e., which include no acid, low acid, no base, or no conducting salts, and/or high metal ion, e.g., copper, concentration. Defect free filling of features is enhanced by a plating solution containing blends of polyalkylene glycols (“carrier”) and organic divalent sulfur compounds (“accelerator”), wherein the concentration of the carrier ranges from about 10 ppm to about 2000 ppm of the plating solution, and the concentration of the accelerator ranges from about 0.1 ppm to about 1000 ppm of the plating solution. The plating solution may be further improved by adding 2-amino-5-methyl-1,3,4-thiadiazole which is used at concentrations from 0 ppm to about 20 ppm of the plating solution.
    • 本发明提供电镀溶液,特别是金属电镀溶液,其设计用于在基底上提供均匀的涂层,并且提供基本上无缺陷的填充形成在具有无或低的支持电解质的基底上的小特征,即不包括酸,低酸,无 碱,或不含导电盐,和/或高金属离子,例如铜,浓度。 通过含有聚亚烷基二醇(“载体”)和有机二价硫化合物(“促进剂”)的共混物的电镀液增强了特征的无缺陷填充,其中载体的浓度范围为约10ppm至约2000ppm的电镀 溶液,并且加速器的浓度范围为电镀液的约0.1ppm至约1000ppm。 通过加入2-氨基-5-甲基-1,3,4-噻二唑可以进一步改善电镀溶液,其浓度为电镀液的0ppm至约20ppm。
    • 7. 发明授权
    • Electro deposition chemistry
    • 电沉积化学
    • US06350366B1
    • 2002-02-26
    • US09484616
    • 2000-01-18
    • Uziel LandauJohn J. D'UrsoDavid B. Rear
    • Uziel LandauJohn J. D'UrsoDavid B. Rear
    • C25D712
    • C25D7/123C25D3/38
    • The present invention provides plating solutions, particularly metal plating solutions, designed to provide uniform coatings on substrates and to provide substantially defect free filling of small features, e.g., micron scale features and smaller, formed on substrates with none or low supporting electrolyte, ie., which include no acid, low acid, no base, or no conducting salts, and/or high metal ion, e.g., copper, concentration. Additionally, the plating solutions may contain small amounts of additives which enhance the plated film quality and performance by serving as brighteners, levelers, surfactants, grain refiners, stress reducers, etc.
    • 本发明提供了电镀溶液,特别是金属电镀溶液,其设计用于在衬底上提供均匀的涂层,并提供基本上无缺陷的填充小特征,例如微米级特征,并且在没有或低支持电解质的衬底上形成较小的特征。 ,其不包括酸,低酸,无碱或不导电盐,和/或高金属离子,例如铜,浓度。 此外,电镀液可以含有少量添加剂,其通过用作增白剂,整理剂,表面活性剂,晶粒细化剂,减压剂等来增强镀膜质量和性能。
    • 9. 发明申请
    • SMUDGE REMOVAL FROM ELECTRONIC DEVICE DISPLAYS
    • 从电子设备显示屏去除电源
    • US20080236632A1
    • 2008-10-02
    • US11693445
    • 2007-03-29
    • John J. D'UrsoSteven M. SmithSteven A. VoightSteve X. Dai
    • John J. D'UrsoSteven M. SmithSteven A. VoightSteve X. Dai
    • B08B7/02H05K5/03
    • B08B7/02B08B7/028
    • An apparatus and method is provided for removing smudges (506, 706, 806, 906) including oils and dust from portable electronic displays. The apparatus comprises a display device (110, 150, 500, 700, 800, 900, 1000) positioned within a housing (102, 104, 808), comprising a transparent cover (302, 502, 702, 802, 902, 1002) having a surface (508, 908) viewable through an opening in the housing (102, 104, 808) and a susceptibility to receiving contaminants (506, 706, 806, 906). A vibration device (504, 704, 804, 904, 1004) is positioned against the transparent cover (302, 502, 702, 802, 902, 1002) to provide motion (510) in a direction parallel to the surface, thereby causing the contaminants to move (708) across the surface (508, 908). The contaminants (506, 706, 806, 906) may then be hidden by the housing (102, 104, 808) or ejected by a motion (912) perpendicular to the surface by another vibrating device (911). Electronic circuitry (505) is provided for activating the vibration device (504, 704, 804, 904, 1004) either during normal operation of the electronic device or as selected by the user.
    • 提供了一种用于从便携式电子显示器去除包括油和灰尘的污迹(506,706,806,906)的设备和方法。 该装置包括位于壳体(102,104,808)内的显示装置(110,150,500,700,800,900,1000),包括透明盖(302,502,702,802,902,1002) 具有通过壳体(102,104,808)中的开口可视的表面(508,908)和对接收污染物(506,706,806,906)的敏感性。 振动装置(504,704,804,904,1004)抵靠透明盖(302,502,702,802,902,1002)定位,以在平行于表面的方向上提供运动(510),从而使 污染物移动(708)穿过表面(508,908)。 然后污染物(506,706,806,906)可以由壳体(102,104,808)隐藏或者被垂直于表面的另一个振动装置(911)的运动(912)排出。 电子电路(505)被提供用于在电子设备的正常操作期间或由用户选择的情况下启动振动装置(504,704,804,904,1004)。