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    • 5. 发明申请
    • CUFF FOR A BLOOD PRESSURE METER
    • 血压计CUFF
    • US20130102910A1
    • 2013-04-25
    • US13808082
    • 2011-07-05
    • Jong-Eun ParkJae-Soon Cha
    • Jong-Eun ParkJae-Soon Cha
    • A61B5/022
    • A61B5/02233A61B5/022
    • A cuff for a blood pressure meter which is jointed to a blood pressure for measuring blood pressure and is worn on the body to compress a blood pressure measurement site, and which comprises: a cuff band which is worn around the blood pressure measurement site of the body and is provided with an expansion bladder that expands on the inside; a fluid supply apparatus which is connected to the cuff band and supplies a fluid so as to make the expansion bladder expand; and a bladder separator which is provided in the cuff band and splits the expansion bladder, that is expanded by means of the fluid supply apparatus, into at least two or more pats so as to effect split expansion of the same. When the present invention is employed, because the expansion bladder which compresses the blood pressure measurement site is split by means of the ladder separator, there is the advantageous effect that it expands and contracts to a length and width that match the firth of the blood pressure measurement site and accurate blood pressure measurement can be taken.
    • 一种用于血压计的袖带,其连接到用于测量血压的血压并佩戴在身体上以压缩血压测量部位,并且包括:围绕血压测量部位周围的袖带, 并且设置有在内侧膨胀的膨胀囊; 流体供应装置,其连接到袖带并且供应流体以使膨胀囊膨胀; 以及膀胱分离器,其设置在所述袖带中,并且将所述膨胀囊分离成膨胀囊,所述膨胀囊通过所述流体供给装置膨胀成至少两个或更多个,以实现所述膨胀囊的分裂膨胀。 当采用本发明时,由于压缩血压测量部位的膨胀囊通过梯形分离器分离,所以有利的效果是它膨胀并收缩到与血压的比例相匹配的长度和宽度 可以进行测量部位和精确的血压测量。
    • 10. 发明申请
    • METHODS OF FABRICATING CMOS IMAGE SENSORS
    • 制作CMOS图像传感器的方法
    • US20080182354A1
    • 2008-07-31
    • US11950249
    • 2007-12-04
    • Jong-Jin LeeJu-Hyun KoJong-Eun ParkHyun-Suk KimDong-Yoon Jang
    • Jong-Jin LeeJu-Hyun KoJong-Eun ParkHyun-Suk KimDong-Yoon Jang
    • H01L31/18
    • H01L27/14643H01L27/14603H01L27/1463H01L27/14681H01L27/14689
    • CMOS image sensors and related methods of fabricating CMOS image sensors are disclosed. Fabrication of a CMOS image sensor can include forming a first impurity region having a first conductivity type in a semiconductor substrate. A second impurity region having a second conductivity type is formed in the semiconductor substrate adjacent to the first impurity region. A third impurity region having the first conductivity type is formed in the semiconductor substrate and located below the second impurity region. A transfer gate is formed on the semiconductor substrate and at least partially overlaps the first, second, and third impurity regions. A photo sensitive device is formed in the semiconductor substrate and adjacent to one side of the transfer gate. A floating diffusion region is formed in the semiconductor substrate and located adjacent to an opposite side of the transfer gate from the photosensitive device.
    • 公开了CMOS图像传感器和制造CMOS图像传感器的相关方法。 CMOS图像传感器的制造可以包括在半导体衬底中形成具有第一导电类型的第一杂质区域。 在与第一杂质区相邻的半导体衬底中形成具有第二导电类型的第二杂质区。 具有第一导电类型的第三杂质区形成在半导体衬底中并位于第二杂质区的下方。 传输栅极形成在半导体衬底上并且至少部分地与第一,第二和第三杂质区重叠。 光敏元件形成在半导体衬底中并与传输门的一侧相邻。 浮动扩散区域形成在半导体衬底中并且位于与传感栅极的与光敏器件相反的一侧。