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1. 发明授权

US08802226B2 Manufacturing process for coated polyester film 有权
标题翻译：涂层聚酯薄膜的制造工艺
公开(公告)号：US08802226B2
公开(公告)日：2014-08-12
申请号：US12278819
申请日：2007-02-09
申请人： Robert William Eveson , Andrew Nathan Hodgson , Duncan Henry MacKerron , Katsuyuki Hashimoto
发明人： Robert William Eveson , Andrew Nathan Hodgson , Duncan Henry MacKerron , Katsuyuki Hashimoto
IPC分类号： B05D3/02 , C08G63/183 , C08G63/189 , C08J7/04 , B29C71/02 , B29K67/00
CPC分类号： C08J7/047 , B29C71/02 , B29C2071/022 , B29K2067/00 , B29K2995/0048 , C08J7/04 , C08J7/045 , C08J2367/02 , Y10S428/91 , Y10T428/263 , Y10T428/264 , Y10T428/265 , Y10T428/266 , Y10T428/31663 , Y10T428/31736 , Y10T428/31786 , Y10T428/31797
摘要： A method of preventing or minimizing the formation of haze in a biaxially oriented polyester film during the annealing of said film above its glass transition temperature, said method comprising: (a) selecting a biaxially oriented polyester film having glass transition temperature (Tg (° C.)); (b) disposing a coating on one or both surfaces of said biaxially oriented film; (c) annealing said coated biaxially oriented polyester film at a temperature above its glass transition temperature, wherein said coating composition is selected from: (i) an organic coating comprising a low molecular weight reactive diluent; an unsaturated oligomer; a solvent; and a photoinitiator; (ii) an organic/inorganic hybrid coating comprising a low molecular weight reactive component and/or an unsaturated oligomeric component; a solvent; and inorganic particles, and optionally further comprising a photoinitiator; (iii) a predominantly inorganic hardcoat comprising inorganic particles contained in a polymerisable predominantly inorganic matrix; and (iv) a composition comprising a cross-linkable organic polymer selected from polyethylene imine (PEI), polyester and polyinylalcohol (PVOH), and a cross-linking agent.
摘要翻译：一种防止或最小化在所述膜退火温度以上的玻璃化转变温度下在双轴取向聚酯膜中形成雾度的方法，所述方法包括：（a）选择具有玻璃化转变温度（Tg（℃）。））; （b）在所述双轴取向膜的一个或两个表面上设置涂层; （c）在高于其玻璃化转变温度的温度下退火所述涂覆的双轴取向聚酯膜，其中所述涂料组合物选自：（i）包含低分子量反应性稀释剂的有机涂层; 不饱和低聚物溶剂; 和光引发剂; （ii）包含低分子量反应性组分和/或不饱和低聚组分的有机/无机混合涂层; 溶剂; 和无机颗粒，并且任选地还包含光引发剂; （iii）主要为无机硬质涂层，其包含可聚合的主要为无机基质中的无机颗粒; 和（iv）包含选自聚乙烯亚胺（PEI），聚酯和聚乙烯醇（PVOH））和交联剂的可交联有机聚合物的组合物。

2. 发明授权

US08067105B2 Biaxially oriented film 有权
标题翻译：双轴取向薄膜
公开(公告)号：US08067105B2
公开(公告)日：2011-11-29
申请号：US10587392
申请日：2005-01-28
申请人： Tetsuo Yoshida , Katsuyuki Hashimoto , Ieyasu Kobayashi , Shinji Muro , Takeshi Ishida
发明人： Tetsuo Yoshida , Katsuyuki Hashimoto , Ieyasu Kobayashi , Shinji Muro , Takeshi Ishida
IPC分类号： B32B27/08 , B32B27/32 , B32B27/36
CPC分类号： C08J5/18 , B32B5/142 , B32B15/08 , B32B27/08 , B32B27/302 , B32B27/306 , B32B27/308 , B32B27/32 , B32B27/36 , B32B2250/24 , B32B2270/00 , B32B2274/00 , B32B2307/204 , B32B2307/306 , B32B2307/518 , B32B2307/54 , B32B2307/702 , B32B2307/734 , B32B2457/16 , C08J2367/02 , C08L23/02 , C08L25/06 , C08L67/02 , Y10S428/91 , Y10T428/254 , Y10T428/26 , Y10T428/263 , Y10T428/264 , Y10T428/265 , Y10T428/266 , Y10T428/268 , Y10T428/269 , Y10T428/31678 , Y10T428/31681 , Y10T428/31692 , Y10T428/31786 , Y10T428/31797 , Y10T428/31855 , Y10T428/31909 , Y10T428/31938 , C08L2666/18 , C08L2666/06 , C08L2666/04
摘要： A thin biaxially oriented film excellent in dimensional stability against humidity change, as well as a magnetic recording medium and a film capacitor using the same. The present invention provides a laminated biaxially oriented film comprising: at least one layer comprising an aromatic polyester (a); and at least one layer of a polyolefin (b) having a melting point of from 230 to 280° C.; wherein the ratio of the polyolefin (b) is from 2 to 60% based on the entire weight of the film, and the film thickness is from 1 to 10 μm.
摘要翻译：对湿度变化的尺寸稳定性优异的薄双轴取向膜以及使用其的磁记录介质和薄膜电容器。本发明提供层压双轴取向膜，其包含：至少一层包含芳族聚酯（a）; 和至少一层熔点为230〜280℃的聚烯烃（b）。其中聚烯烃（b）的比例相对于膜的总重量为2〜60％，膜厚为1〜10μm。

3. 发明申请

US20070222976A1 Visual inspection apparatus 审中-公开
标题翻译：目视检查仪器
公开(公告)号：US20070222976A1
公开(公告)日：2007-09-27
申请号：US11728292
申请日：2007-03-23
申请人： Katsuyuki Hashimoto
发明人： Katsuyuki Hashimoto
IPC分类号： G01N21/88
CPC分类号： G01N21/8803 , H01L21/67207 , H01L21/67288
摘要： A visual inspection apparatus includes: at least two inspection object transfer portions that transfer inspection objects to and from storage cassettes; at least two inspection portions that are located in different inspection positions from each other in order to inspect the inspection objects; an inspection object moving portion that moves the inspection objects that have been transferred to a main body of the apparatus between the inspection object transfer portions and the inspection portions, or between two of the inspection portions; and an inspection object transporting portion that transfers the inspection objects between the inspection object transfer portions and the storage cassettes.
摘要翻译：视觉检查装置包括：至少两个检查对象传送部分，用于将检查对象传送到存储盒和从存储盒传送; 至少两个检查部分彼此位于不同的检查位置以便检查检查对象; 检查对象移动部，其使已经被传送到检查对象传送部和检查部之间的设备的主体的检查对象或两个检查部之间移动; 以及检查对象传送部，其在检查对象传送部和存储盒之间传送检查对象。

4. 发明授权

US07102743B2 Semiconductor wafer inspection apparatus 有权
标题翻译：半导体晶圆检查装置
公开(公告)号：US07102743B2
公开(公告)日：2006-09-05
申请号：US10978059
申请日：2004-10-28
申请人： Haruyuki Tsuji , Yasutoshi Kitahara , Katsuyuki Hashimoto , Yasunori Ikeno , Shunsuke Kurata , Masahiko Yazawa
发明人： Haruyuki Tsuji , Yasutoshi Kitahara , Katsuyuki Hashimoto , Yasunori Ikeno , Shunsuke Kurata , Masahiko Yazawa
IPC分类号： G01N21/00
CPC分类号： G01N21/9503
摘要： A semiconductor wafer inspection apparatus is provided with a rotatable table on which a semiconductor wafer is held by suction, an illuminating device which illuminates at least an edge portion of the semiconductor wafer held on the rotatable table, an imaging device which captures an image of the edge portion of the semiconductor wafer when the edge portion is illuminated by the illuminating device, an image processing device which detects at least an edge cut amount or a crack by acquiring the image of the edge portion which is captured by the imaging device, and a display section which displays an image of the edge portion subjected to image processing by the image processing device.
摘要翻译：半导体晶片检查装置设置有可旋转工作台，其上通过抽吸保持半导体晶片;照明装置，其照亮保持在可旋转工作台上的半导体晶片的至少边缘部分;摄像装置，其捕获图像边缘部分被照明装置照射时的半导体晶片的边缘部分，通过获取由成像装置捕获的边缘部分的图像，至少检测边缘切割量或裂纹的图像处理装置，以及显示部分，其显示由图像处理装置进行图像处理的边缘部分的图像。

5. 发明申请

US20060121299A1 Laminate film 有权
标题翻译：层压膜
公开(公告)号：US20060121299A1
公开(公告)日：2006-06-08
申请号：US10542802
申请日：2004-01-20
申请人： Katsuyuki Hashimoto , Makoto Handa
发明人： Katsuyuki Hashimoto , Makoto Handa
IPC分类号： B32B27/36 , B32B27/30 , B32B27/06
CPC分类号： C09D5/32 , C08J5/04 , C08J2367/02 , Y10T428/24942 , Y10T428/25 , Y10T428/31786 , Y10T428/31797 , Y10T428/31935
摘要： The object of the present invention is to provide a laminated film excellent in light resistance, scratch resistance, transparency, dimensional stability and adhesion to a hard coating layer. The present invention is a laminated film comprising a base material layer, an easily adhering layer and a hard coating layer, wherein the easily adhering layer is formed on the base material layer and the hard coating layer is formed on the easily adhering layer, and further wherein (1) the base material layer is formed of a polyester resin formed from naphthalenedicarboxylic acid as a main dicarboxylic acid component and ethylene glycol as a main glycol component, (2) the hard coating layer has an ultraviolet absorbing function and has a pencil hardness of H or higher on the hard coating layer surface, and (3) said laminated film has a variation (Δb*) of less than 2.0 between transmittance b* values obtained before and after a 300 hours' xenon arc test of said laminated film.
摘要翻译：本发明的目的是提供耐光性，耐刮擦性，透明性，尺寸稳定性和对硬涂层的粘附性优异的层压膜。本发明是一种层叠膜，其包括基材层，易粘合层和硬涂层，其中容易粘附层形成在基材层上，并且硬涂层形成在易粘附层上，并且进一步其特征在于，（1）基材层由作为主要二羧酸成分的萘二羧酸和作为主要二醇成分的乙二醇形成的聚酯树脂形成，（2）硬涂层具有紫外线吸收功能，并具有铅笔硬度（3）所述层压膜在所述层叠膜的300小时氙弧试验前后的透射率b *值之间的变化（Deltab *）小于2.0。

6. 发明授权

US07022388B2 Laminated polyester film and laminated film 有权
标题翻译：层压聚酯薄膜和层压薄膜
公开(公告)号：US07022388B2
公开(公告)日：2006-04-04
申请号：US10491921
申请日：2003-06-02
申请人： Katsuyuki Hashimoto , Makoto Handa , Shinji Yano , Koji Kubo
发明人： Katsuyuki Hashimoto , Makoto Handa , Shinji Yano , Koji Kubo
IPC分类号： B32B7/02 , B32B27/08 , B32B27/18 , B32B27/30 , B32B27/36
CPC分类号： C08J7/047 , C08J7/04 , C08J2367/02 , Y10S428/91 , Y10T428/1328 , Y10T428/1379 , Y10T428/1383 , Y10T428/24355 , Y10T428/24942 , Y10T428/31681 , Y10T428/31786 , Y10T428/31797
摘要： There is provided a laminated polyester film which is improved in lubricity, transparency, dimensional stability, shock resistance and adhesion, and which comprises a polyester base film comprising polyester and to at least one direction, and a coating layer provided on at least one surface of the base film, wherein said coating layer contains polymer binder and inert particles, the refractive index of the inert particles being substantially same as that of the polymer binder, and wherein the laminated polyester film has a haze of 1.5% or less, a total light transmittance of 85% or more, 50% destructing energy per 100 μm film thickness of 0.3 J or more, and a thermal shrinkage at 230° C. for 30 minutes of 4% or less.
摘要翻译：提供了一种提高了润滑性，透明性，尺寸稳定性，抗冲击性和粘附性的层压聚酯膜，并且包括聚酯基膜，其包含聚酯和至少一个方向，并且涂层设置在至少一个表面上所述基膜，其中所述涂层含有聚合物粘合剂和惰性颗粒，所述惰性颗粒的折射率基本上与所述聚合物粘合剂的折射率相同，并且其中所述层压聚酯膜的雾度为1.5％以下，总光透光率为85％以上，每100μm薄膜厚度为30％以上的破坏能量为50％，230℃下30分钟的热收缩率为4％以下。

7. 发明授权

US07369237B2 Substrate processing apparatus and substrate processing system 有权
标题翻译：基板加工装置及基板处理系统
公开(公告)号：US07369237B2
公开(公告)日：2008-05-06
申请号：US11120296
申请日：2005-05-02
申请人： Yasunori Ikeno , Shunsuke Kurata , Katsuyuki Hashimoto , Masahiko Yazawa
发明人： Yasunori Ikeno , Shunsuke Kurata , Katsuyuki Hashimoto , Masahiko Yazawa
IPC分类号： G01B11/00
CPC分类号： H01L21/67745 , H01L21/67161
摘要： It is an object of the present invention to provide a substrate processing apparatus, comprising a housing body mounting unit that is capable of mounting a plurality of housing bodies which can house a plurality of substrates, a processing apparatus main body for processing a substrate extracted from the housing body, a transportation unit for transporting the substrate between the housing body and the processing apparatus main body, a processing control unit for controlling the transportation unit and making it transport the substrate between the housing body and the processing apparatus main body, and a transportation control unit for controlling the transportation unit and making it transport the substrate from one housing body to another housing body without passing through the processing apparatus main body.
摘要翻译：本发明的目的是提供一种基板处理装置，其包括：壳体安装单元，其能够安装可容纳多个基板的多个壳体;处理装置主体，用于处理从壳体，用于在壳体和处理装置主体之间输送基板的运送单元，用于控制运输单元并使其在壳体和处理装置主体之间运送基板的处理控制单元，以及运输控制单元，用于控制运输单元并使其从一个壳体运送到另一壳体而不通过处理设备主体。

8. 发明授权

US08367199B2 Biaxially oriented film 有权
标题翻译：双轴取向薄膜
公开(公告)号：US08367199B2
公开(公告)日：2013-02-05
申请号：US13276465
申请日：2011-10-19
申请人： Tetsuo Yoshida , Katsuyuki Hashimoto , Ieyasu Kobayashi , Shinji Muro , Takeshi Ishida
发明人： Tetsuo Yoshida , Katsuyuki Hashimoto , Ieyasu Kobayashi , Shinji Muro , Takeshi Ishida
IPC分类号： B32B15/085 , B32B15/09 , B32B27/08 , B32B27/32 , B32B27/36
CPC分类号： C08J5/18 , B32B5/142 , B32B15/08 , B32B27/08 , B32B27/302 , B32B27/306 , B32B27/308 , B32B27/32 , B32B27/36 , B32B2250/24 , B32B2270/00 , B32B2274/00 , B32B2307/204 , B32B2307/306 , B32B2307/518 , B32B2307/54 , B32B2307/702 , B32B2307/734 , B32B2457/16 , C08J2367/02 , C08L23/02 , C08L25/06 , C08L67/02 , Y10S428/91 , Y10T428/254 , Y10T428/26 , Y10T428/263 , Y10T428/264 , Y10T428/265 , Y10T428/266 , Y10T428/268 , Y10T428/269 , Y10T428/31678 , Y10T428/31681 , Y10T428/31692 , Y10T428/31786 , Y10T428/31797 , Y10T428/31855 , Y10T428/31909 , Y10T428/31938 , C08L2666/18 , C08L2666/06 , C08L2666/04
摘要： An object of the present invention is to provide a thin biaxially oriented film excellent in dimensional stability against humidity change, as well as a magnetic recording medium and a film capacitor using the same. The present invention provides a single layered or laminated biaxially oriented film comprising an aromatic polyester (a) and a polyolefin (b) having a melting point of from 230 to 280° C., wherein the ratio of the polyolefin (b) is from 5 to 30% based on the entire weight of the film, and the film thickness is from 1 to 10 μm.
摘要翻译：本发明的一个目的是提供一种在湿度变化方面尺寸稳定性优异的薄双轴取向薄膜以及使用其的磁记录介质和薄膜电容器。本发明提供了包含芳族聚酯（a）和熔点为230至280℃的聚烯烃（b））的单层或层压双轴取向膜，其中聚烯烃（b）的比例为5 至30重量％，膜厚为1〜10μm。

9. 发明申请

US20100189998A1 MANUFACTURING PROCESS FOR POLYESTER FILM EXHIBITING LOW THERMAL SHRINKAGE 有权
标题翻译：聚酯薄膜的制造工艺展示低热收缩
公开(公告)号：US20100189998A1
公开(公告)日：2010-07-29
申请号：US12278820
申请日：2007-02-09
申请人： Duncan Henry MacKerron , Katsuyuki Hashimoto
发明人： Duncan Henry MacKerron , Katsuyuki Hashimoto
IPC分类号： B32B27/36 , C08G63/183
CPC分类号： C08J7/047 , B29C71/02 , B29C2071/022 , B29K2067/00 , B29K2995/0048 , C08J7/04 , C08J7/045 , C08J2367/02 , Y10S428/91 , Y10T428/263 , Y10T428/264 , Y10T428/265 , Y10T428/266 , Y10T428/31663 , Y10T428/31736 , Y10T428/31786 , Y10T428/31797
摘要： A process in which a wound roll of biaxially oriented polyester film having a glass transition temperature (Tg (° C.)) is annealed at a temperature Ta (° C.) above Tg where Tg
摘要翻译：将具有玻璃化转变温度（Tg（℃））的双轴取向聚酯膜的卷绕辊在Tg（℃）以上Tg（Ta℃）下Tg（Ta + NlE; Tg + 100℃）退火的方法）在热平衡后一段时间t，其中1小时＆小时; t＆nlE; 72小时并冷却，目的是改善所述聚酯膜的收缩率。

10. 发明授权

US07747343B2 Substrate processing apparatus and substrate housing method 有权
标题翻译：基板加工装置及基板收纳方法
公开(公告)号：US07747343B2
公开(公告)日：2010-06-29
申请号：US11377509
申请日：2006-03-16
申请人： Katsuyuki Hashimoto
发明人： Katsuyuki Hashimoto
IPC分类号： G06G7/00
CPC分类号： H01L21/681 , Y10S414/135
摘要： A substrate housing method for a substrate processing apparatus, including: a first step of transporting the substrate taken out from a housing case to the substrate processing apparatus by a transport means; a third step of processing the substrate at the substrate processing apparatus; a fourth step of returning the substrate after the third step to the housing case by the transport means; a second step of calculating a difference in amount in relation to a normal position of the substrate at the transport means from the first step and before the fourth step; and a fifth step of adjusting a returning position of the substrate in the housing case after the third step and until the fourth step.
摘要翻译：一种用于基板处理装置的基板收纳方法，包括：第一步骤，通过传送装置将从壳体取出的基板输送到基板处理装置; 在基板处理装置处理基板的第三步骤; 第四步骤，通过传送装置将第三步骤之后的衬底返回到壳体; 第二步骤，从第一步骤和第四步骤计算相对于输送装置处的基板的正常位置的量的差异; 以及第五步骤，在第三步骤之后调整基板在壳体中的返回位置，直到第四步骤。

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