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    • 2. 发明授权
    • Method for encoding a mesh model, encoded mesh model and method for decoding a mesh model
    • 编码网格模型,编码网格模型和解码网格模型的方法的方法
    • US09348860B2
    • 2016-05-24
    • US14111171
    • 2011-04-12
    • Kangying CaiJiang TianWei Liang Meng
    • Kangying CaiJiang TianWei Liang Meng
    • G06T15/00G06F17/30G06T17/00G06T9/00G06T9/40
    • G06F17/30371G06T9/005G06T9/40G06T17/005
    • Many 3D mesh models have a large number of small connected components that are repeated in various positions, scales and orientations. The respective positions are defined by the position of at least one reference point per component. For an enhanced encoding of the positions of the respective reference points, a given space is divided into segments and the number of points lying in each particular segment is determined. When a cell with at least n points is subdivided into child cells, an indication is added indicating if all points of a parent are in only one child cell. If so, the index of the only non-empty child node is encoded, while otherwise the number of points in one of the two child cells is decremented and encoded. The invention avoids non-effective subdivisions of a cell, and therefore improves the compression efficiency.
    • 许多3D网格模型具有大量的小型连接部件,可以在各种位置,尺度和方向上重复使用。 各个位置由每个组件至少一个参考点的位置定义。 对于各个参考点的位置的增强编码,给定空间被划分成段,并且确定位于每个特定段中的点的数量。 当具有至少n个点的小区被细分为子小区时,添加指示,指示父节点的所有点是否仅在一个子小区中。 如果是这样,唯一的非空子节点的索引被编码,否则两个子单元之一中的点的数量被递减并被编码。 本发明避免了电池的非有效细分,从而提高了压缩效率。
    • 4. 发明申请
    • ILLUMINATING DEVICE AND METHOD FOR MANUFACTURING THE SAME
    • 照明装置及其制造方法
    • US20140098537A1
    • 2014-04-10
    • US14102325
    • 2013-12-10
    • Liang Meng Plastic Share Co., Ltd.
    • Kuang-Chu LAI
    • F21V21/00
    • H01L33/00F21K9/00F21V21/00F21V29/70F21V29/713F21V31/04F21Y2105/10F21Y2115/10
    • A method for manufacturing an illuminating device includes steps of: forming an electrical conductive circuit on a metallic substrate, arranging light-emitting elements on the metallic substrate to be electrically connected with the electrical conductive circuit, covering a transparent cap on each of the light-emitting elements, fixing an electrical connector to the metallic substrate to be electrically connected to the electrical conductive circuit, forming a transparent body outside the transparent caps, the metallic substrate and the electrical conductive circuit by means of an over-molding process; forming a lamp cover outside the transparent body, the metallic substrate and the electrical connector by means of an over-molding process. An illuminating device is further provided, thereby prevents the light-emitting elements from suffering damage due to the temperature and pressure of the over-molding process, and increasing the brightness of the light emitted by the light-emitting elements.
    • 一种制造照明装置的方法,包括以下步骤:在金属基板上形成导电电路,在金属基板上排列与导电电路电连接的发光元件,在发光元件的每一个上覆盖透明盖, 将电连接器固定到金属基板上以与导电电路电连接,通过过度成型工艺在透明盖,金属基板和导电电路外部形成透明体; 通过超模制工艺在透明体外部,金属基底和电连接器上形成灯罩。 还提供一种照明装置,从而防止发光元件由于过度模制过程的温度和压力而受到损坏,并且增加了由发光元件发射的光的亮度。
    • 9. 发明授权
    • Method of fabricating shallow trench isolation structure
    • 制造浅沟槽隔离结构的方法
    • US06225189B1
    • 2001-05-01
    • US09282019
    • 1999-03-29
    • Chun-Liang LiuHsien-Liang Meng
    • Chun-Liang LiuHsien-Liang Meng
    • H01L21762
    • H01L21/76224
    • A method of fabricating a shallow trench isolation structure is described. A mask layer is formed on a substrate. The mask layer and the substrate are patterned to form a trench in the substrate. A first deposition step and a second deposition step are performed to form a first isolation layer over the substrate. A third deposition step is performed to form a second isolation layer on the first isolation layer. The second isolation layer has a greater fluidity than the first isolation layer has. A planarization process is performed with the mask layer serving as a stop layer. A portion of the first isolation layer and the mask layer are removed to form the shallow trench isolation structure.
    • 描述了制造浅沟槽隔离结构的方法。 在基板上形成掩模层。 掩模层和衬底被图案化以在衬底中形成沟槽。 执行第一沉积步骤和第二沉积步骤以在衬底上形成第一隔离层。 执行第三沉积步骤以在第一隔离层上形成第二隔离层。 第二隔离层具有比第一隔离层更大的流动性。 在掩模层用作停止层的情况下进行平坦化处理。 去除第一隔离层和掩模层的一部分以形成浅沟槽隔离结构。