专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07988130B2 Valve for vacuum exhaustion system 有权
标题翻译：真空排气系统阀门
公开(公告)号：US07988130B2
公开(公告)日：2011-08-02
申请号：US12208949
申请日：2008-09-11
申请人： Tadahiro Ohmi , Nobukazu Ikeda , Michio Yamaji , Masafumi Kitano , Akihiro Morimoto
发明人： Tadahiro Ohmi , Nobukazu Ikeda , Michio Yamaji , Masafumi Kitano , Akihiro Morimoto
IPC分类号： F16K7/17
CPC分类号： F16K7/14 , F16K27/003 , F16K51/02
摘要： The invention provides a valve and a method of operating the valve that makes it possible to reduce the diameter of the vacuum exhaustion pipings to make the facility for the vacuum exhaustion system small, which results in lower costs and shortens vacuum exhaustion time, and also which can prevent corrosion, cloggings, and seal leakages inside the piping system caused by the accumulation of substances produced by the decomposition of gas flowing through the pipings. In particular, in accordance with the present invention, an aluminum passivation is applied on the piping parts, i.e. the valve and others, that are used in the vacuum exhaustion system so as to inhibit gas decomposition caused by temperature rise at the time of baking so that components for reduction in the diameter size in the vacuum exhaustion system are provided. Thus, corrosion, cloggings and seat leakages caused by gas decomposition are prevented.
摘要翻译：本发明提供了一种操作阀门的阀门和方法，其使得可以减小真空排气管道的直径，从而使得真空耗尽系统的设备较小，这导致降低成本并缩短真空耗尽时间，以及哪些可以防止由流经管道的气体分解产生的物质积聚引起的管道系统内的腐蚀，堵塞和密封泄漏。特别地，根据本发明，在真空耗尽系统中使用的管道部件即阀等上施加铝钝化，以便抑制由于烘烤时由温度升高引起的气体分解提供了用于减小真空排气系统中的直径尺寸的部件。因此，防止由气体分解引起的腐蚀，堵塞和座椅泄漏。

2. 发明申请

US20110177355A1 AL ALLOY MEMBER, ELECTRONIC DEVICE MANUFACTURING APPARATUS, AND METHOD OF MANUFACTURING AN ANODIC OXIDE FILM COATED AL ALLOY MEMBER 有权
标题翻译： AL合金会员，电子设备制造设备及制造阳极氧化膜涂层合金成员的方法
公开(公告)号：US20110177355A1
公开(公告)日：2011-07-21
申请号：US13055582
申请日：2009-07-28
申请人： Tadahiro Ohmi , Masafumi Kitano , Minoru Tahara , Hisakazu Ito , Kota Shirai , Masayuki Saeki
发明人： Tadahiro Ohmi , Masafumi Kitano , Minoru Tahara , Hisakazu Ito , Kota Shirai , Masayuki Saeki
IPC分类号： B32B1/02 , C25D11/04 , C25D11/06 , C22C21/00
CPC分类号： C25D11/04 , C22C21/00 , H05K1/053 , H05K2203/0315 , Y10T428/12
摘要： Provided is an Al alloy member with an excellent mechanical strength that is sufficient for use in large-scale manufacturing apparatuses. The Al alloy member is characterized in that, in mass %, Mg concentration is 5.0% or less, Ce concentration is 15% or less, Zr concentration is 0.15% or less, the balance comprises Al and unavoidable impurities, the elements of the unavoidable impurities are respectively 0.01% or less, and the Vickers hardness of the Al alloy member is greater than 30.
摘要翻译：提供具有优异的机械强度的Al合金构件，其足以用于大规模制造装置。 Al合金构件的特征在于，以质量％计，Mg浓度为5.0％以下，Ce浓度为15％以下，Zr浓度为0.15％以下，余量由Al和不可避免的杂质构成，不可避免的元素杂质分别为0.01％以下，Al合金构件的维氏硬度大于30。

3. 发明申请

US20110041768A1 HEAT EQUALIZER AND ORGANIC FILM FORMING APPARATUS 有权
标题翻译：热平衡器和有机膜成型设备
公开(公告)号：US20110041768A1
公开(公告)日：2011-02-24
申请号：US12934190
申请日：2008-04-11
申请人： Tadahiro Ohmi , Masafumi Kitano , Hisaaki Yamakage , Yoshihito Yamada
发明人： Tadahiro Ohmi , Masafumi Kitano , Hisaaki Yamakage , Yoshihito Yamada
IPC分类号： C23C16/00 , F28D15/00
CPC分类号： C23C14/243 , C23C14/12 , C23C14/228
摘要： A heat equalizer includes a container structure having a heating block in which a working fluid is held for heating and vaporizing a material to be heated, a heater placed at the bottom of the container structure, and a material feed pipe allowing the outside and the inside of the container structure to communicate with each other. In the heating block, as a flow path in which the material to be heated flows, a main header pipe connected to the material feed pipe and extending in the horizontally, and a riser pipe branching from the main header pipe and extending vertically are formed. As a condensation path in which the working fluid is cooled and condensed, condensation holes formed respectively on the opposite sides of the riser pipe and extending horizontally, and a condensation pit formed under the riser pipe are formed. Between the condensation holes and the condensation pit, the main header pipe is placed.
摘要翻译：热均衡器包括具有加热块的容器结构，其中保持工作流体用于加热和汽化待加热材料，放置在容器结构底部的加热器和允许外部和内部的材料供给管的容器结构相互通信。在加热块中，作为被加热材料流动的流路，形成有连接于原料供给管并在水平方向延伸的主集管，以及从主集管分支并竖直延伸的立管。作为其中工作流体被冷却和冷凝的冷凝路径，分别形成在提升管的相对侧并水平延伸的冷凝孔，以及形成在提升管下方的冷凝坑。在冷凝孔和冷凝槽之间，放置主集管。

4. 发明申请

US20090020721A1 Valve for Vacuum Exhaustion System 有权
标题翻译：真空耗尽阀系统
公开(公告)号：US20090020721A1
公开(公告)日：2009-01-22
申请号：US12208949
申请日：2008-09-11
申请人： Tadahiro Ohmi , Nobukazu Ikeda , Michio Yamaji , Masafumi Kitano , Akihiro Morimoto
发明人： Tadahiro Ohmi , Nobukazu Ikeda , Michio Yamaji , Masafumi Kitano , Akihiro Morimoto
IPC分类号： F16K1/00
CPC分类号： F16K7/14 , F16K27/003 , F16K51/02
摘要： The invention provides a valve and a method of operating the valve that makes it possible to reduce the diameter of the vacuum exhaustion pipings to make the facility for the vacuum exhaustion system small, which results in lower costs and shortens vacuum exhaustion time, and also which can prevent corrosion, cloggings, and seal leakages inside the piping system caused by the accumulation of substances produced by the decomposition of gas flowing through the pipings. In particular, in accordance with the present invention, an aluminum passivation is applied on the piping parts, i.e. the valve and others, that are used in the vacuum exhaustion system so as to inhibit gas decomposition caused by temperature rise at the time of baking so that components for reduction in the diameter size in the vacuum exhaustion system are provided. Thus, corrosion, cloggings and seat leakages caused by gas decomposition are prevented.
摘要翻译：本发明提供了一种操作阀门的阀门和方法，其可以减小真空排气管道的直径，使得真空耗尽系统的设备变小，这导致降低成本并缩短真空耗尽时间，以及哪些可以防止由流经管道的气体分解产生的物质积聚引起的管道系统内的腐蚀，堵塞和密封泄漏。特别地，根据本发明，在真空耗尽系统中使用的管道部件即阀等上施加铝钝化，以便抑制由于烘烤时由温度升高引起的气体分解提供了用于减小真空排气系统中的直径尺寸的部件。因此，防止由气体分解引起的腐蚀，堵塞和座椅泄漏。

5. 发明授权

US08691017B2 Heat equalizer and organic film forming apparatus 有权
标题翻译：热均衡器和有机成膜装置
公开(公告)号：US08691017B2
公开(公告)日：2014-04-08
申请号：US12934190
申请日：2008-04-11
申请人： Tadahiro Ohmi , Masafumi Kitano , Hisaaki Yamakage , Yoshihito Yamada
发明人： Tadahiro Ohmi , Masafumi Kitano , Hisaaki Yamakage , Yoshihito Yamada
IPC分类号： C23C16/00 , F22B1/02 , F02B75/00 , F27D11/00 , A01G13/06 , A01M13/00 , A01M19/00 , A61B16/00 , A61L9/03 , B01B1/00 , F02M15/04 , F02M31/12 , F22B1/20 , B01D7/00 , C23C14/00 , A61H33/06 , B01D1/00 , B01D3/00 , B05B1/24 , F22B1/28 , F24F6/00 , A61H33/12 , D06F75/00 , F17C7/04
CPC分类号： C23C14/243 , C23C14/12 , C23C14/228
摘要： A heat equalizer includes a container structure having a heating block in which a working fluid is held for heating and vaporizing a material to be heated, a heater placed at the bottom of the container structure, and a material feed pipe allowing the outside and the inside of the container structure to communicate with each other. In the heating block, as a flow path in which the material to be heated flows, a main header pipe connected to the material feed pipe and extending in the horizontally, and a riser pipe branching from the main header pipe and extending vertically are formed. As a condensation path in which the working fluid is cooled and condensed, condensation holes formed respectively on the opposite sides of the riser pipe and extending horizontally, and a condensation pit formed under the riser pipe are formed. Between the condensation holes and the condensation pit, the main header pipe is placed.
摘要翻译：热均衡器包括具有加热块的容器结构，其中保持工作流体用于加热和汽化待加热材料，放置在容器结构底部的加热器和允许外部和内部的材料供给管的容器结构相互通信。在加热块中，作为被加热材料流动的流路，形成有连接于原料供给管并在水平方向延伸的主集管，以及从主集管分支并竖直延伸的立管。作为其中工作流体被冷却和冷凝的冷凝路径，分别形成在提升管的相对侧并水平延伸的冷凝孔，以及形成在提升管下方的冷凝坑。在冷凝孔和冷凝槽之间，放置主集管。

6. 发明授权

US08679640B2 Al alloy member, electronic device manufacturing apparatus, and method of manufacturing an anodic oxide film coated al alloy member 有权
标题翻译：铝合金构件，电子器件制造装置以及阳极氧化膜被覆铝合金构件的制造方法
公开(公告)号：US08679640B2
公开(公告)日：2014-03-25
申请号：US13055582
申请日：2009-07-28
申请人： Tadahiro Ohmi , Masafumi Kitano , Minoru Tahara , Hisakazu Ito , Kota Shirai , Masayuki Saeki
发明人： Tadahiro Ohmi , Masafumi Kitano , Minoru Tahara , Hisakazu Ito , Kota Shirai , Masayuki Saeki
IPC分类号： B32B1/02 , C25D11/04 , C25D11/06 , C22C21/00
CPC分类号： C25D11/04 , C22C21/00 , H05K1/053 , H05K2203/0315 , Y10T428/12
摘要： Provided is an Al alloy member with an excellent mechanical strength that is sufficient for use in large-scale manufacturing apparatuses. The Al alloy member is characterized in that, in mass %, Mg concentration is 5.0% or less, Ce concentration is 15% or less, Zr concentration is 0.15% or less, the balance comprises Al and unavoidable impurities, the elements of the unavoidable impurities are respectively 0.01% or less, and the Vickers hardness of the Al alloy member is greater than 30.
摘要翻译：提供具有优异的机械强度的Al合金构件，其足以用于大规模制造装置。 Al合金构件的特征在于，以质量％计，Mg浓度为5.0％以下，Ce浓度为15％以下，Zr浓度为0.15％以下，余量由Al和不可避免的杂质构成，不可避免的元素杂质分别为0.01％以下，Al合金构件的维氏硬度大于30。

7. 发明授权

US08206833B2 Metal oxide film, laminate, metal member and process for producing the same 有权
标题翻译：金属氧化物膜，层压体，金属构件及其制造方法
公开(公告)号：US08206833B2
公开(公告)日：2012-06-26
申请号：US11917614
申请日：2006-05-09
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa
IPC分类号： B32B9/00
CPC分类号： C25D11/06 , C25D11/18 , Y10T428/265
摘要： A metal oxide film suitable for protection of metals, composed mainly of aluminum. A metal oxide film includes a film of an oxide of a metal composed mainly of aluminum, having a thickness of 10 nm or greater, and exhibiting a moisture release rate from the film of 1E18 mol./cm2 or less. Further, there is provided a process for producing a metal oxide film, wherein a metal composed mainly of aluminum is subjected to anodic oxidation in a chemical solution of 4 to 10 pH value so as to obtain a metal oxide film.
摘要翻译：适用于主要由铝组成的金属保护金属氧化物膜。金属氧化物膜包括厚度为10nm以上的主要由铝构成的金属的氧化物的膜，并且具有1E18mol / cm 2以下的膜的水分释放率。此外，提供了一种制造金属氧化物膜的方法，其中主要由铝组成的金属在pH值为4至10的化学溶液中进行阳极氧化，以获得金属氧化物膜。

8. 发明授权

US08124240B2 Protective film structure of metal member, metal component employing protective film structure, and equipment for producing semiconductor or flat-plate display employing protective film structure 有权
标题翻译：金属构件的保护膜结构，采用保护膜结构的金属成分，以及使用保护膜结构制造半导体或平板显示器的设备
公开(公告)号：US08124240B2
公开(公告)日：2012-02-28
申请号：US11917633
申请日：2006-06-16
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa , Yukio Kishi
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa , Yukio Kishi
IPC分类号： B32B9/00
CPC分类号： C23C4/02 , C23C8/80 , C23C28/00 , C23C28/042 , C25D11/02 , C25D11/04 , C25D11/08 , C25D11/10 , C25D11/16 , C25D11/18 , Y10T428/26 , Y10T428/265 , Y10T428/31678
摘要： A protective film structure of a metal member for use in an apparatus for manufacturing a semiconductor or the like, the protective film structure including a first coating layer of faultless aluminum oxide formed by direct anodic oxidation of a base-material metal of an aluminum alloy; and a second coating layer formed on the first coating layer and made of yttrium oxide by a plasma spraying method.
摘要翻译：一种用于半导体制造装置的金属构件的保护膜结构，所述保护膜结构包括由铝合金的基材金属的直接阳极氧化形成的无缺陷氧化铝的第一涂层; 以及通过等离子喷涂法形成在第一涂层上并由氧化钇制成的第二涂层。

9. 发明申请

US20110300422A1 LIQUID SODIUM BATTERY 审中-公开
标题翻译：液体钠电池
公开(公告)号：US20110300422A1
公开(公告)日：2011-12-08
申请号：US13202109
申请日：2010-02-15
申请人： Tadahiro Ohmi , Tetsuya Goto , Masafumi Kitano
发明人： Tadahiro Ohmi , Tetsuya Goto , Masafumi Kitano
IPC分类号： H01M10/39
CPC分类号： H01M10/3909 , H01M4/661 , H01M4/664 , H01M10/3945
摘要： A liquid sodium battery in which two electrode members sandwiching a partition wall formed of a Na-ion conducting solid substance are constructed by a metal having a work function whose absolute value is smaller than that of a work function of sodium and a metal having a work function whose absolute value is greater than that of the work function of sodium.
摘要翻译：一种液体钠电池，其中夹有由Na离子导电固体形成的分隔壁的两个电极构件由具有绝对值小于钠功函数和具有工作的金属的功函数的金属构成函数的绝对值大于钠的功函数。

10. 发明申请

US20090142588A1 Protective Film Structure of Metal Member, Metal Component Employing Protective Film Structure, and Equipment for Producing Semiconductor or Flat-Plate Display Employing Protective Film Structure 有权
标题翻译：金属部件的保护膜结构，使用保护膜结构的金属部件以及使用保护膜结构的半导体或平板显示器的生产设备
公开(公告)号：US20090142588A1
公开(公告)日：2009-06-04
申请号：US11917633
申请日：2006-06-16
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa , Yukio Kishi
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa , Yukio Kishi
IPC分类号： B32B15/00
CPC分类号： C23C4/02 , C23C8/80 , C23C28/00 , C23C28/042 , C25D11/02 , C25D11/04 , C25D11/08 , C25D11/10 , C25D11/16 , C25D11/18 , Y10T428/26 , Y10T428/265 , Y10T428/31678
摘要： Multifunction production equipment enabling a plurality of processes in which deposition of reaction products on the inner wall of the processing chamber of equipment for producing a semiconductor or a flat-plate display, metal contamination due to corrosion of the inner wall, or the like, and fluctuation of the process due to discharged gas are suppressed, and a protective film structure for use therein. On the surface of a metal material, a first coating layer having an oxide coating of 1μ thick or less formed as an underlying layer by direct oxidation of a parent material, and a second coating layer of about 200 μm thick are formed. With such an arrangement, corrosion resistance against irradiation with ions or radicals can be imparted to a second layer protective film, and the effect of a protective layer for preventing corrosion of the surface of parent metal caused by diffusing molecules or ions into the second layer protective film can be imparted to the first layer oxide film. Consequently, contamination of the substrate with metals generated from each metal member and the inner surface of the process chamber is reduced, and stripping of the second layer protective film due to lowering in adhesion of the second layer protective film due to corrosion of the interface between the parent material and the second layer protective film can be suppressed.
摘要翻译：多功能生产设备能够实现多个工艺，其中在用于制造半导体或平板显示器的设备的处理室的内壁上沉积反应产物，由于内壁的腐蚀而引起的金属污染等，以及排出气体的处理的波动被抑制，以及用于其中的保护膜结构。在金属材料的表面上，形成通过母材直接氧化形成作为下层的1μm厚以下的氧化物被膜的第1被覆层和200μm厚的第2被覆层。通过这样的布置，可以对第二层保护膜赋予对离子或自由基的照射的耐腐蚀性，以及用于防止母体金属表面由于扩散分子或离子而导致的第二层保护层的腐蚀的保护层的效果可以将膜施加到第一层氧化物膜。因此，由金属构件和处理室的内表面产生的金属对衬底的污染减少，并且由于第二层保护膜的粘附性的降低而导致的第二层保护膜的剥离可以抑制母材和第二层保护膜。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式