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    • 1. 发明授权
    • Ultra-slow down and storage of light pulses, and altering of pulse spectrum
    • 光脉冲的超慢减速和脉冲光谱的改变
    • US07269313B2
    • 2007-09-11
    • US11001492
    • 2004-11-30
    • Mehmet Fatih YanikShanhui Fan
    • Mehmet Fatih YanikShanhui Fan
    • G02B6/26G02F1/295
    • B82Y20/00G02B6/1225
    • Light pulses can be stopped and stored coherently, with an all-optical process that involves an adiabatic and reversible pulse bandwidth compression occurring entirely in the optical domain. Such a process overcomes the fundamental bandwidth-delay constraint in optics, and can generate arbitrarily small group velocities for light pulses with a given bandwidth, without the use of any coherent or resonant light-matter interactions. This is accomplished only by small refractive index modulations performed at moderate speeds and has applications ranging from quantum communications and computing to coherent all-optical memory devices. A complete time reversal and/or temporal/spectral compression and expansion operation on any electromagnetic field is accomplished using only small refractive index modulations and linear optical elements. This process does not require any nonlinear multi-photon processes such as four-wave mixing and thus can be implemented using on-chip tunable microcavity complexes in photonic crystals. The tuning process requires only small refractive index modulations, and moderate modulation speeds without requiring any high-speed electronic sampling.
    • 光脉冲可以被停止并相干地存储,其全光学过程涉及完全在光学域中发生的绝热和可逆的脉冲带宽压缩。 这种过程克服了光学中的基本带宽延迟约束,并且可以为具有给定带宽的光脉冲产生任意小的组速度,而不使用任何相干或共振的光物质相互作用。 这仅通过在中等速度下执行的小折射率调制来实现,并且具有从量子通信和计算到相干全光存储器件的应用。 在任何电磁场上的完全时间反转和/或时间/频谱压缩和扩展操作仅使用小的折射率调制和线性光学元件来实现。 该过程不需要诸如四波混频的任何非线性多光子过程,因此可以使用光子晶体中的片上可调谐微腔复合体来实现。 调谐过程只需要较小的折射率调制和适度的调制速度,而不需要任何高速电子采样。
    • 8. 发明授权
    • Multilevel imprint lithography
    • 多层压印光刻
    • US07256435B1
    • 2007-08-14
    • US10453329
    • 2003-06-02
    • Pavel KornilovichYong ChenDuncan StewartR. Stanley WilliamsPhilip J. KuekesMehmet Fatih Yanik
    • Pavel KornilovichYong ChenDuncan StewartR. Stanley WilliamsPhilip J. KuekesMehmet Fatih Yanik
    • H01L27/10
    • H01L21/76838B81C99/009B81C2201/0153B82Y10/00B82Y40/00G03F7/0002
    • A mold with a protruding pattern is provided that is pressed into a thin polymer film via an imprinting process. Controlled connections between nanowires and microwires and other lithographically-made elements of electronic circuitry are provided. An imprint stamp is configured to form arrays of approximately parallel nanowires which have (1) micro dimensions in the X direction, (2) nano dimensions and nano spacing in the Y direction, and three or more distinct heights in the Z direction. The stamp thus formed can be used to connect specific individual nanowires to specific microscopic regions of microscopic wires or pads. The protruding pattern in the mold creates recesses in the thin polymer film, so the polymer layer acquires the reverse of the pattern on the mold. After the mold is removed, the film is processed such that the polymer pattern can be transferred on a metal/semiconductor pattern on the substrate.
    • 提供具有突出图案的模具,其通过压印过程被压入薄聚合物膜。 提供了纳米线和微丝之间的控制连接以及电子电路的其它光刻元件。 打印印记被配置成形成大致平行的纳米线的阵列,其具有(1)X方向上的微尺寸,(2)在Y方向上的纳米尺寸和纳米间距,以及Z方向上的三个或更多个不同的高度。 如此形成的印章可以用于将特定的单个纳米线连接到微细线或垫的特定微观区域。 模具中的突出图案在薄聚合物膜中产生凹陷,因此聚合物层获得模具上图案的相反。 在除去模具之后,处理膜,使得聚合物图案可以在基底上的金属/半导体图案上转印。