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    • 3. 发明申请
    • UNIVERSAL POLISHING SOLUTIONS
    • 通用抛光解决方案
    • US20150119313A1
    • 2015-04-30
    • US14530674
    • 2014-10-31
    • Michael Connelly
    • Michael Connelly
    • C11D17/00C11D11/00C11D1/29
    • C09G1/08
    • A liquid solution for polishing has been discovered which is particularly effective on smooth, solid surfaces. The solution may be embodied as a concentrate that is dissolved in water, which consist of, by volume at room temperature, 9.375 percent wax enhancer, 0.782 percent polydimethlsiloxanne solution, 15.625 percent methanol-propylene glycol, 0.132 percent anionic surfactant, and 70.31 percent water. Various ranges of concentrations for the composition components have been discovered, and the concentration ranges featuring various advantages and disadvantages are disclosed herein. The composition may be applied to various surfaces to be polished in a number of ways as disclosed herein.
    • 已经发现用于抛光的液体溶液在光滑的,固体表面上特别有效。 该溶液可以体现为溶解在水中的浓缩物,其由室温下的体积为9.375%的蜡增强剂,0.782%的聚二甲基硅氧烷溶液,15.625%的甲醇 - 丙二醇,0.132%的阴离子表面活性剂和70.31%的水 。 已经发现组合物组分的各种浓度范围,并且本文公开了具有各种优点和缺点的浓度范围。 组合物可以以如本文所公开的多种方式施加到待抛光的各种表面上。