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1. 发明申请

US20220326485A1 IMAGING OPTICAL SYSTEM 有权
公开(公告)号：US20220326485A1
公开(公告)日：2022-10-13
申请号：US17708843
申请日：2022-03-30
申请人： Keiji IKEMORI , NALUX CO., LTD.
发明人： Keiji IKEMORI , Chang SHIH-YUAN , Tetsuya ZENKO , Kenta ISHII , Daisuke SEKI
IPC分类号： G02B13/00 , G02B9/34 , G02B9/60 , G02B9/62 , G02B9/64
摘要： An imaging optical system wherein the number of lenses is three to seven, one to four lenses, each of which is an aspheric lens in which radius of curvature of each of both surfaces is infinity in the paraxial region and which has a power of the third-order aberration region in the peripheral area are provided, the first lens from the object side is a negative lens or the aspheric lens, the relationship 0 . 1 ⁢ 8

2. 发明授权

US11248770B2 Illumination optical system 有权
公开(公告)号：US11248770B2
公开(公告)日：2022-02-15
申请号：US17105001
申请日：2020-11-25
申请人： STANLEY ELECTRIC CO., LTD. , NALUX CO., LTD.
发明人： Sadayuki Konishi , Kayuri Kinoshita , Kenta Ishii , Norihisa Sakagami , Daisuke Seki
IPC分类号： F21V5/04 , G02B5/18 , G02B13/18 , G02B19/00 , G02B27/42
摘要： An illumination optical system having a light source and a single convex lens with a diffractive structure, wherein the phase function of the diffractive structure is represented by ϕ ⁡ ( r ) = ∑ i = 1 N ⁢ ⁢ β 2 ⁢ i ⁢ r 2 ⁢ i where r represents distance from the central axis of the lens, the relationship |β2|·(0.3R)2

3. 发明申请

US20220013369A1 METHOD FOR PRODUCING PLASTIC ELEMENT PROVIDED WITH FINE SURFACE ROUGHNESS 有权
公开(公告)号：US20220013369A1
公开(公告)日：2022-01-13
申请号：US17486057
申请日：2021-09-27
申请人： NALUX CO., LTD.
发明人： Kenji TANIBE , Kazuya YAMAMOTO
IPC分类号： H01L21/3213 , H01J37/32 , G02B1/11 , B29C33/42
摘要： A method for producing a plastic element provided with fine surface roughness is provided. In the method, etching of a surface of the plastic element is performed separately in a first step and in a second step, in the first step, fine roughness having a predetermined average value of pitch in the range from 0.05 to 1 micrometer is generated on the surface through reactive ion etching in an atmosphere of a first gas; and in the second step, an average value of depth of the fine roughness generated in the first step is adjusted to a predetermined value in the range from 0.15 to 1.5 micrometers while the predetermined average value of pitch is substantially maintained through reactive ion etching in an atmosphere of a second gas, reactivity to the plastic element of the second gas being lower than reactivity to the plastic element of the first gas.

4. 发明授权

US10831001B2 Imaging optical system 有权
公开(公告)号：US10831001B2
公开(公告)日：2020-11-10
申请号：US16164038
申请日：2018-10-18
申请人： NALUX CO., LTD.
发明人： Kenta Ishii , Daisuke Seki
IPC分类号： G02B13/04 , A61B1/00 , G02B9/12 , G02B13/00 , G02B23/24
摘要： The imaging optical system is provided with a first lens having a negative refractive power, a second lens having a positive refractive power, an aperture stop, and a third lens having a positive refractive power, disposed from the object side to the image side. With |d| being the distance between the image-side principal point of the first lens and the object-side principal point of the second lens, d=−|d| being the signed distance between the image-side principal point of the first lens and the object-side principal point of the second lens when the image-side principal point of the first lens is further towards the image side than the object-side principal point of the second lens, and f12 being the composite focal length of the first lens and the second lens, the relationships d

5. 发明授权

US10353119B2 Method for manufacturing mold or optical element 有权
公开(公告)号：US10353119B2
公开(公告)日：2019-07-16
申请号：US15808321
申请日：2017-11-09
申请人： NALUX CO., LTD.
发明人： Kazuya Yamamoto , Takeshi Yamamoto
IPC分类号： G02B5/02 , H01L21/3213 , H01L21/02 , B29C33/42 , C23F4/00 , G02B1/118 , B29C33/56
摘要： A method for manufacturing a mold or an optical element provided with a fine surface roughness for anti-reflection or for diffusing, may include placing a substrate or a film made of a semiconductor or a metal into a reacting etching apparatus, introducing a mixed gas of sulfur hexafluoride and oxygen into the etching apparatus with the substrate or the film, tuning the mixed gas into plasma such that oxides are made to be scattered on a surface of the substrate or the film, and etching the surface of the substrate of the film by the sulfur hexafluoride while the oxides function as an etching mask to form the fine surface roughness on the surface of the substrate or the film. Further, etching conditions may be determined such that the pitch of the fine surface roughness is made from 3 to 18 micrometers.

6. 发明申请

US20180274972A1 LIGHT-RECEIVING OPTICAL SYSTEM 审中-公开
公开(公告)号：US20180274972A1
公开(公告)日：2018-09-27
申请号：US15924808
申请日：2018-03-19
申请人： NALUX CO., LTD. , HONDA MOTOR CO., LTD.
发明人： Yosuke SAKOHIRA , Kayoko FUJIMURA , Satoshi KOMURO
IPC分类号： G01J1/04 , G02B3/08 , G02B26/08 , G02B5/18
摘要： A light-receiving optical system includes a rotating mirror configured to rotate around a rotation axis and having a reflection plane arranged at an angle with the rotation axis; an imaging optical system having an optical axis that coincides with the rotation axis; a multifocal Fresnel lens having sections formed concentrically around the optical axis; and light-receiving elements, wherein the imaging optical system is configured such that rays of light that enter the rotating mirror are converged onto one of the sections depending on an angle of the rays with the optical axis, and the multifocal Fresnel lens is configured such that the rays reach one of the light-receiving elements, which corresponds to the one of the sections so that a light-receiving element that the rays reach is determined depending on the angle of the rays with the optical axis independently of a rotational position of the rotating mirror.

7. 发明授权

US09861996B2 Deposition apparatus and tray holder 有权
公开(公告)号：US09861996B2
公开(公告)日：2018-01-09
申请号：US14620433
申请日：2015-02-12
申请人： NALUX CO., LTD.
发明人： Toshiro Higuchi , Hiroshi Ueno , Hitoshi Kimura
IPC分类号： C23C16/00 , B05B13/02 , H01L21/687 , C23C14/50 , B05B12/08
CPC分类号： B05B13/0242 , B05B12/08 , C23C14/505 , H01L21/68764
摘要： A deposition apparatus includes a deposition source; a rotatable dome provided with an opening which covers the source; a first lever provided outside of the dome; and a tray holder including a frame including a first rotating member and a rotating part including a second rotating member and being attached to the frame such that the rotating part rotates with the second rotating member around an axis supported by the frame. The rotating part includes work-holding trays arranged around the axis, the tray holder is installed on the dome such that a side of one of the trays covers the opening, the first rotating member is rotated by the first lever during rotation of the dome, and the second rotating member is rotated with the rotating part by the first rotating member so as to change the tray a side of which covers the opening to another one.

8. 发明授权

US09551866B1 Optical scanning system and scanning lens 有权
标题翻译：光学扫描系统和扫描镜头
公开(公告)号：US09551866B1
公开(公告)日：2017-01-24
申请号：US15139815
申请日：2016-04-27
申请人： NALUX CO., LTD.
发明人： Tomohito Kuwagaito
IPC分类号： G02B26/08 , G02B26/12 , G02B27/30 , G02B3/06
CPC分类号： G02B26/125 , G02B3/06 , G02B26/123 , G02B26/124 , G02B27/30
摘要： In an optical scanning system, each of plural light beams is reflected at a point on a deflector in a sub-scanning cross section, a point of reflection on the deflector of the principal ray of each beam in the case that the principal ray is incident normally to a scanning surface in a main scanning cross section is designated as a fiducial point, distance from the fiducial point to the scanning surface is designated as L, distance from the center of curvature of the exit surface of one of the second scanning lenses for a light beam i to the scanning surface is designated as BFi, refractive powers of the first scanning lens and one of the second scanning lenses are designated as φ1si and φ2si, and then the following expressions are satisfied. 0.15≦BFi/L≦0.2 (1) 0.4≦φ1si/φ2si≦1 (2)

9. 发明申请

US20160303607A1 DEPOSITION APPARATUS AND MANUFACTURING PROCESS INCLUDING FILM FORMING STEP BY DEPOSITION APPARATUS 审中-公开
标题翻译：沉积装置和制造工艺，包括通过沉积装置形成薄膜
公开(公告)号：US20160303607A1
公开(公告)日：2016-10-20
申请号：US15095325
申请日：2016-04-11
申请人： NALUX CO., LTD.
发明人： Toshiro HIGUCHI , Hiroshi UENO , Hitoshi KIMURA
IPC分类号： B05D1/00 , B05C13/00
摘要： A deposition apparatus includes a dome rotatable around the central axis; a loop chain surrounding the central axis on the dome; a power transmission shaft transmitting rotational motion of the dome; a first gear section transforming the rotational motion of the dome to rotational motion of the shaft; a second gear section provided with a chain-driving sprocket and configured to transform the rotational motion of the shaft to rotational motion of the sprocket; and a tray holder located beside the loop chain, the tray holder including a first internal power transmission shaft and a rotating portion holding a tray. The sprocket is rotated through the rotation of the dome to drive the loop chain, the first internal power transmission shaft of the tray holder is rotated by motion of the loop chain, and the rotating portion is rotated through rotation of the first internal power transmission shaft.
摘要翻译：沉积设备包括可围绕中心轴线旋转的圆顶; 围绕圆顶上的中心轴的环链; 传递圆顶的旋转运动的动力传递轴; 将所述圆顶的旋转运动转换成所述轴的旋转运动的第一齿轮部; 第二齿轮部分，其设置有链条驱动链轮并且构造成将轴的旋转运动转换成链轮的旋转运动; 以及位于环链旁边的托盘支架，托盘保持器包括第一内部动力传递轴和保持托盘的旋转部分。链轮通过圆顶的旋转旋转以驱动环链，托盘保持架的第一内部动力传递轴通过环链的运动而旋转，并且旋转部分通过第一内部动力传递轴的旋转而旋转。

10. 发明授权

US09404638B2 Optical element and illumination unit 有权
标题翻译：光学元件和照明单元
公开(公告)号：US09404638B2
公开(公告)日：2016-08-02
申请号：US14034600
申请日：2013-09-24
申请人： NALUX CO., LTD.
发明人： Daisuke Seki , Katsumoto Ikeda
IPC分类号： F21V13/04 , F21V5/04 , F21V7/00 , F21Y101/02 , H01L33/58
CPC分类号： F21V13/04 , F21V5/04 , F21V5/046 , F21V7/0091 , F21Y2115/10 , H01L33/58
摘要： An optical element according to the present invention includes a light receiving surface which is designed to cover an emitting surface of a planar light source device, a reflecting surface, a light exit surface which is contiguous to the periphery of the reflecting surface. When the center of the emitting surface is designated as a point O and an axis which passes through the point O and is perpendicular to the emitting surface is designated as an optical axis of the optical element, the reflecting surface has a concave portion around the optical axis and an outer edge surrounding the concave portion.
摘要翻译：根据本发明的光学元件包括被设计成覆盖平面光源装置的发射表面的光接收表面，反射表面，与反射表面的周边邻接的光出射表面。当发光表面的中心被指定为点O，并且通过点O并且垂直于发射表面的轴被指定为光学元件的光轴时，反射表面具有围绕光学元件的凹部并且包围凹部的外缘。

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