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    • 1. 发明授权
    • Image projector and image projecting method
    • 图像投影仪和图像投影方法
    • US07364309B2
    • 2008-04-29
    • US10486055
    • 2003-06-10
    • Yutaka SugawaraNaoya Eguchi
    • Yutaka SugawaraNaoya Eguchi
    • G03B21/14
    • H04N9/3179G03B21/005G03B21/2086H04N5/57H04N5/74H04N9/3129
    • In an image projection on a screen, an image projection apparatus improves the safety of entry into a projection region by the human body and does not bring about the increase of complexity of the configuration thereof owing to the improvement of the safety. A monitoring area is regulated on the outside of the projection area (3) of the screen (2). A detection wave such as infrared rays is emitted from a detection wave source (1c) of the image projection apparatus (1). A reflection wave from the monitoring area is detected by reflection wave detection means (1d) such as a CCD sensor. Whether the human body or an obstacle enters the monitoring space, which is surrounded by a detection wave (4) between the main body unit of the image projection apparatus (1) and the screen (2), or not is detected. Once the entry is detected, the intensity of the radiation light traveling toward the projection area (3) is reduced or cut off according to the situation or the degree of the entry.
    • 在屏幕上的图像投影中,图像投影装置提高了人体进入投影区域的安全性,并且由于安全性的提高,不会导致其配置的复杂性的增加。 监视区域在屏幕(2)的投影区域(3)的外侧被调节。 从图像投影装置(1)的检测波源(1C)发射诸如红外线的检测波。 来自监视区域的反射波由诸如CCD传感器的反射波检测装置(1d)检测。 检测人体或障碍物是否进入由图像投影装置(1)的主体单元和屏幕(2)之间的检测波(4)包围的监视空间。 一旦检测到入口,根据情况或进入程度减小或切断朝向投影区域(3)行进的辐射光的强度。
    • 2. 发明授权
    • Inspection equipment
    • 检验设备
    • US06937754B1
    • 2005-08-30
    • US09588292
    • 2000-06-07
    • Naoya Eguchi
    • Naoya Eguchi
    • G01B11/24G01B11/245G01B11/30G01M11/00G01N21/88G01N21/94G01N21/956H01L21/66G06K9/00H04N7/18
    • G01N21/956
    • To inspect a finer device pattern formed in a semiconductor wafer, there is provided an inspection equipment including means for supporting a semiconductor wafer as a specimen and moving it to a predetermined position of inspection, means for projecting an ultraviolet light onto the specimen supported on the specimen supporting means, an ultraviolet imaging means for detecting a reflected light or transmitted light from the specimen illuminated by the ultraviolet light projecting means and picking up an image of the specimen, means for processing the image picked up by the ultraviolet imaging means. The image picked up by the imaging means is processed and analyzed by the image processing means to inspect the specimen.
    • 为了检查形成在半导体晶片中的更精细的器件图案,提供了一种检查设备,包括用于支撑半导体晶片作为样本并将其移动到预定的检查位置的装置,用于将紫外光投射到支撑在 试样支撑装置,用于检测由紫外光投射装置照射的试样的反射光或透射光并拾取试样的图像的紫外线成像装置,用于处理由紫外线成像装置拾取的图像的装置。 由成像装置拍摄的图像由图像处理装置进行处理和分析,以检查样本。
    • 3. 发明授权
    • Laser annealing apparatus and method of fabricating thin film transistor
    • 激光退火装置及制造薄膜晶体管的方法
    • US06780692B2
    • 2004-08-24
    • US10215049
    • 2002-08-08
    • Koichi TatsukiKoichi TsukiharaNaoya Eguchi
    • Koichi TatsukiKoichi TsukiharaNaoya Eguchi
    • H01L2100
    • H01L29/66765H01L29/78636H01L29/78678
    • In a method of fabricating a thin film transistor through conversion of an amorphous silicon film into a polysilicon film to be an active layer of the thin film transistor by a laser annealing treatment, a laser annealing apparatus comprising a plurality of semiconductor laser devices arranged performs the laser annealing treatment by irradiating the surface of the amorphous silicon film with laser light uniformized in the light intensity of the laser light radiated onto the surface of the amorphous silicon film, whereby the crystal grain diameter of the polysilicon film obtained through recrystallization is uniformized, and it is possible to obtain a thin film transistor with transistor characteristics enhanced by using the polysilicon film as the active layer.
    • 在通过激光退火处理将非晶硅膜转换为多晶硅膜以成为薄膜晶体管的有源层来制造薄膜晶体管的方法中,包括布置的多个半导体激光器件的激光退火装置执行 通过以照射到非晶硅膜的表面上的激光的光强度均匀化的激光照射非晶硅膜的表面的激光退火处理,由此通过重结晶获得的多晶硅膜的晶粒粒径均匀化,并且 可以通过使用多晶硅膜作为有源层来获得具有增强的晶体管特性的薄膜晶体管。
    • 4. 发明授权
    • Image display apparatus
    • 图像显示装置
    • US06220714B1
    • 2001-04-24
    • US09308594
    • 1999-07-16
    • Naoya Eguchi
    • Naoya Eguchi
    • G03B2114
    • G02B19/0014G02B19/0066G02B27/0961G02F2001/133607H04N9/3105H04N9/3164
    • The present invention provides an image display apparatus comprising a light source, a coupling lens, an integrator and a light valve. If &thgr;LV1 is the largest value that can be taken by the angle formed by light irradiating said light valve and the optical axis as viewed along the short edges of said light valve, &thgr;LV2 is the largest value that can be taken by the angle formed by light irradiating said light valve and the optical axis as viewed along the long edges of said light valve, LLV1 is the length of the short edges of said light valve, LLV2 is the length of the long edge of said light valve and NALED is the effective numerical aperture of said coupling lens, then, the surface area of the light emitting region of said light source is not greater than (LLV1×&thgr;LV1/NALED)×(LLV2×&thgr;LV2/NALED). Such an image display apparatus is adapted to evenly and uniformly irradiate the light valve of the apparatus with rays of light emitted from the light source with an improved light irradiation efficiency.
    • 本发明提供了一种包括光源,耦合透镜,积分器和光阀的图像显示装置。 如果θLV1是由沿着所述光阀的短边缘观察的照射所述光阀和光轴所形成的角度的最大值,则θLV2是由光形成的角度可以采取的最大值 沿所述光阀的长边观察照射所述光阀和光轴,LLV1是所述光阀的短边的长度,LLV2是所述光阀的长边的长度,NALED是有效数值 所述耦合透镜的孔径,则所述光源的发光区域的表面积不大于(LLV1xthetaLV1 / NALED)×(LLV2xthetaLV2 / NALED)。 这种图像显示装置适用于以更好的光照射效率,均匀且均匀地照射装置的光阀,其光线从光源射出。
    • 7. 发明授权
    • Apparatus for measuring surface form
    • 用于测量表面形状的装置
    • US06459493B1
    • 2002-10-01
    • US08663742
    • 1996-06-14
    • Minako SugiuraShigeo KubotaNaoya Eguchi
    • Minako SugiuraShigeo KubotaNaoya Eguchi
    • G01B1124
    • G01B11/06
    • A second harmonic generating element radiates a laser beam having a wavelength of 532 nm onto a substrate surface. The laser beam corresponds to the second harmonic beam of a fundamental laser beam having a wavelength of 1064 nm. An emitting optical system emits the laser beam vertically to the substrate surface so that the laser beam is made linear. An observing means has a optical axis Lo oriented in a different direction from a optical axis Li of the emitting optical system and provides a CCD image sensor served as a two-dimensional imaging device located in conjugation with the height or thickness of the substrate surface. The observing means operates to observe a light section image formed by the linear beam fired by the emitting optical system onto the substrate surface. Then, an image processing means precisely measures the form of the surface of an object to be measured as suppressing degrade of an S/N ratio, on the basis of the image data of the light section image observed by the observing means.
    • 二次谐波发生元件将具有532nm波长的激光束辐射到衬底表面上。 激光束对应于波长为1064nm的基本激光束的二次谐波。 发射光学系统将激光束垂直地发射到衬底表面,使得激光束被线性化。 观察装置具有沿与发射光学系统的光轴Li不同的方向定向的光轴Lo,并且提供用作与基板表面的高度或厚度共轭的二维成像装置的CCD图像传感器。 观察装置用于观察由发射光学系统激发的线性光束形成的光线图像到基板表面上。 然后,图像处理装置基于由观察装置观察到的光截面图像的图像数据,精确地测量待测物体的表面的形状,以抑制S / N比的降低。