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1. 发明授权

US08407630B1 Modeling and cross correlation of design predicted criticalities for optimization of semiconductor manufacturing 有权
标题翻译：半导体制造优化设计预测临界值的建模与互相关
公开(公告)号：US08407630B1
公开(公告)日：2013-03-26
申请号：US12644478
申请日：2009-12-22
申请人： Kevin Chan , Emmanuel Drege , Nickhil Jakatdar , Svetlana Litvintseva , Mark A. Miller , Francis Raquel
发明人： Kevin Chan , Emmanuel Drege , Nickhil Jakatdar , Svetlana Litvintseva , Mark A. Miller , Francis Raquel
IPC分类号： G06F17/50
CPC分类号： G06F17/5022 , G06F17/5031
摘要： A method and apparatus for modeling and cross correlation of design predicted criticalities include a feedback loop where information from the manufacturing process is provided to cross correlation engine for optimization of semiconductor manufacturing. The information may include parametric information, functional information, and hot spots determination. The sharing of information allows for design intent to be reflected in manufacturing metrology space; thus, allowing for more intelligent metrology and reduces cycle time.
摘要翻译：用于设计预测临界的建模和互相关的方法和装置包括反馈回路，其中来自制造过程的信息被提供给用于优化半导体制造的互相关引擎。该信息可以包括参数信息，功能信息和热点确定。信息共享允许设计意图反映在制造计量空间中; 因此，允许更智能的计量和减少循环时间。

2. 发明授权

US07505153B2 Model and parameter selection for optical metrology 有权
标题翻译：光学计量学的模型和参数选择
公开(公告)号：US07505153B2
公开(公告)日：2009-03-17
申请号：US12030166
申请日：2008-02-12
申请人： Vi Vuong , Emmanuel Drege , Junwei Bao , Srinivas Doddi , Xinhui Niu , Nickhil Jakatdar
发明人： Vi Vuong , Emmanuel Drege , Junwei Bao , Srinivas Doddi , Xinhui Niu , Nickhil Jakatdar
IPC分类号： G01B11/14 , G01B15/00 , G01B7/00 , G01N21/86 , G01V8/00 , G06F15/00 , G01R31/26 , H01L21/66
CPC分类号： G03F7/70616 , G03F7/705 , G03F7/70625
摘要： A profile model for use in optical metrology of structures in a wafer is selected, the profile model having a set of geometric parameters associated with the dimensions of the structure. The set of geometric parameters is selected to a set of optimization parameters. The number of optimization parameters within the set of optimization parameters is less than the number of geometric parameters within the set of geometric parameters. A set of selected optimization parameters is selected from the set of optimization parameters. The parameters of the set of selected geometric parameters are used as parameters of the selected profile model. The selected profile model is tested against one or more termination criteria.
摘要翻译：选择用于晶片中结构的光学测量的轮廓模型，轮廓模型具有与结构的尺寸相关联的一组几何参数。选择几组参数集合到一组优化参数中。该组优化参数内的优化参数的数量小于该组几何参数内的几何参数的数量。从一组优化参数中选择一组选定的优化参数。所选择的几何参数集合中的参数被用作所选轮廓模型的参数。根据一个或多个终止标准测试所选的配置文件模型。

3. 发明授权

US07450232B2 Generic interface for an optical metrology system 失效
标题翻译：光学测量系统的通用接口
公开(公告)号：US07450232B2
公开(公告)日：2008-11-11
申请号：US11856651
申请日：2007-09-17
申请人： Shifang Li , Junwei Bao , Nickhil Jakatdar , Xinhui Niu
发明人： Shifang Li , Junwei Bao , Nickhil Jakatdar , Xinhui Niu
IPC分类号： G01J4/00 , G01B11/24 , G01B11/30 , G01B11/14 , G01B7/00 , G01B15/00 , G01N21/86 , G01V8/00 , G06F15/00
CPC分类号： G03F7/70625 , G01B11/24 , G01B11/30 , G01N21/211 , G01N21/4788 , G01N21/956
摘要： An optical metrology system includes a photometric device with a source configured to generate and direct light onto a structure, and a detector configured to detect light diffracted from the structure and to convert the detected light into a measured diffraction signal. A processing module of the optical metrology system is configured to receive the measured diffraction signal from the detector to analyze the structure. The optical metrology system also includes a generic interface disposed between the photometric device and the processing module. The generic interface is configured to provide the measured diffraction signal to the processing module using a standard set of signal parameters. The standard set of signal parameters includes a reflectance parameter, a first polarization parameter, a second polarization parameter, and a third polarization parameter.
摘要翻译：光学测量系统包括具有被配置为将光引导到结构上的源的测光装置，以及被配置为检测从该结构衍射的光并将检测到的光转换成测量的衍射信号的检测器。光学计量系统的处理模块被配置为从检测器接收测量的衍射信号以分析结构。光学测量系统还包括设置在测光装置和处理模块之间的通用接口。通用接口被配置为使用标准的信号参数集来将测量的衍射信号提供给处理模块。标准的信号参数组包括反射参数，第一偏振参数，第二偏振参数和第三偏振参数。

4. 发明申请

US20080148216A1 METHOD AND SYSTEM FOR MASK OPTIMIZATION 有权
标题翻译：用于掩蔽优化的方法和系统
公开(公告)号：US20080148216A1
公开(公告)日：2008-06-19
申请号：US11612422
申请日：2006-12-18
申请人： Kevin Chan , Emmanuel Drege , Nickhil Jakatdar , Svetlana Litvintseva , Mark A. Miller , Francis Raquel
发明人： Kevin Chan , Emmanuel Drege , Nickhil Jakatdar , Svetlana Litvintseva , Mark A. Miller , Francis Raquel
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G03F1/36
摘要： A method and apparatus for mask optimization is provided. Mask design and production is optimized by providing proper weighting parameters for critical features. The parameters may include information such as parametric information, functional information, and hot spots determination.
摘要翻译：提供了一种用于掩模优化的方法和装置。通过为关键功能提供适当的加权参数来优化面罩设计和生产。这些参数可以包括参数信息，功能信息和热点确定等信息。

5. 发明申请

US20080037017A1 GENERIC INTERFACE FOR AN OPTICAL METROLOGY SYSTEM 失效
标题翻译：光学计量系统的通用接口
公开(公告)号：US20080037017A1
公开(公告)日：2008-02-14
申请号：US11856651
申请日：2007-09-17
申请人： Shifang Li , Junwei Bao , Nickhil Jakatdar , Xinhui Niu
发明人： Shifang Li , Junwei Bao , Nickhil Jakatdar , Xinhui Niu
IPC分类号： G01J4/00 , G01B11/24 , G01N21/86 , G06F15/00
CPC分类号： G03F7/70625 , G01B11/24 , G01B11/30 , G01N21/211 , G01N21/4788 , G01N21/956
摘要： An optical metrology system includes a photometric device with a source configured to generate and direct light onto a structure, and a detector configured to detect light diffracted from the structure and to convert the detected light into a measured diffraction signal. A processing module of the optical metrology system is configured to receive the measured diffraction signal from the detector to analyze the structure. The optical metrology system also includes a generic interface disposed between the photometric device and the processing module. The generic interface is configured to provide the measured diffraction signal to the processing module using a standard set of signal parameters. The standard set of signal parameters includes a reflectance parameter, a first polarization parameter, a second polarization parameter, and a third polarization parameter.
摘要翻译：光学测量系统包括具有被配置为将光引导到结构上的源的测光装置，以及被配置为检测从该结构衍射的光并将检测到的光转换成测量的衍射信号的检测器。光学计量系统的处理模块被配置为从检测器接收测量的衍射信号以分析结构。光学测量系统还包括设置在测光装置和处理模块之间的通用接口。通用接口被配置为使用标准的信号参数集来将测量的衍射信号提供给处理模块。标准的信号参数组包括反射参数，第一偏振参数，第二偏振参数和第三偏振参数。

6. 发明授权

US07041515B2 Balancing planarization of layers and the effect of underlying structure on the metrology signal 失效
公开(公告)号：US07041515B2
公开(公告)日：2006-05-09
申请号：US10757689
申请日：2004-01-13
申请人： Nickhil Jakatdar , Xinhui Niu
发明人： Nickhil Jakatdar , Xinhui Niu
IPC分类号： H01L21/66 , G01L31/26 , G01L4/00 , G01N21/55 , G01R31/26
CPC分类号： H01L22/32 , G01N21/4788 , G01N21/9501 , G01N21/956 , H01L21/31053
摘要： The present invention includes a method and system for identifying an underlying structure that achieves improved planarization characteristics of layers while minimizing introduction of random and/or systematic noise to the reflected metrology signal.One embodiment of the present invention is a method of designing underlying structures in a wafer with pads of varying sizes and varying loading factors, and selecting the design of pads that yield a reflected metrology signal closest to the calibration metrology signal and that meet preset standard planarization characteristics. Another embodiment is a method of designing underlying structures with random shapes of varying sizes and varying loading factors. Still another embodiment is the use of periodic structures of varying line-to-space ratios in one or more underlying layers of a wafer, the periodicity of the underlying periodic structure being positioned at an angle relative to the direction of periodicity of the target periodic structure of the wafer. The present invention also includes a system for selecting an underlying structure design that balances planarization and optical metrology objectives for a target structure comprising a wafer fabricator, a planarizer, a layer profiler, an optical metrology device, and a selector for the selecting the design of underlying structure that yields a reflected metrology signal closest to the calibration metrology signal and where the planarized surfaces meet preset standard planarization characteristics.

7. 发明授权

US06961679B2 Method and system of dynamic learning through a regression-based library generation process 有权
标题翻译：通过基于回归的图书馆生成过程进行动态学习的方法和系统
公开(公告)号：US06961679B2
公开(公告)日：2005-11-01
申请号：US10857002
申请日：2004-05-27
申请人： Xinhui Niu , Nickhil Jakatdar
发明人： Xinhui Niu , Nickhil Jakatdar
IPC分类号： G01B11/06 , G01B11/24 , G01J4/00 , G01N21/21 , G06F20060101 , G06F7/60 , G06F17/10 , G06F19/00 , H03F1/26
CPC分类号： G01B11/24 , G01N21/211
摘要： The present invention relates to a method and system for efficiently determining grating profiles using dynamic learning in a library generation process. The present invention also relates to a method and system for searching and matching trial grating profiles to determine shape, profile, and spectrum data information associated with an actual grating profile.
摘要翻译：本发明涉及一种利用图书馆生成过程中的动态学习有效地确定光栅轮廓的方法和系统。本发明还涉及一种用于搜索和匹配试验光栅轮廓以确定与实际光栅轮廓相关联的形状，轮廓和频谱数据信息的方法和系统。

8. 发明授权

US06943900B2 Generation of a library of periodic grating diffraction signals 有权
$Generation of a library of periodic grating diffraction signals$
标题翻译：生成周期性光栅衍射信号库
公开(公告)号：US06943900B2
公开(公告)日：2005-09-13
申请号：US09907488
申请日：2001-07-16
申请人： Xinhui Niu , Nickhil Jakatdar
发明人： Xinhui Niu , Nickhil Jakatdar
IPC分类号： G01N21/00 , G01B11/24 , G01N23/20 , G02B5/18 , G03F9/00 , H01L21/027 , H01L21/66 , G06B11/14
CPC分类号： G03F7/70625 , G01N23/20 , G02B5/18 , G03F7/705
摘要： A method of generating a library of simulated-diffraction signals (simulated signals) of a periodic grating includes obtaining a measured-diffraction signal (measured signal). Hypothetical parameters are associated with a hypothetical profile. The hypothetical parameters are varied within a range to generate a set of hypothetical profiles. The range to vary the hypothetical parameters is adjusted based on the measured signal. A set of simulated signals is generated from the set of hypothetical profiles.
摘要翻译：产生周期性光栅的模拟衍射信号（模拟信号）的库的方法包括获得测得的衍射信号（测量信号）。假设参数与假设剖面相关联。假设参数在一个范围内变化以产生一组假设曲线。根据测量的信号调整改变假设参数的范围。从一组假设轮廓产生一组模拟信号。

9. 发明授权

US06768983B1 System and method for real-time library generation of grating profiles 有权
标题翻译：用于光栅轮廓的实时图像库生成的系统和方法
公开(公告)号：US06768983B1
公开(公告)日：2004-07-27
申请号：US09727530
申请日：2000-11-28
申请人： Nickhil Jakatdar , Michael Laughery
发明人： Nickhil Jakatdar , Michael Laughery
IPC分类号： G06N502
CPC分类号： G02B5/1847
摘要： The present invention provides a method and a system for a real-time configurable definition and generation of grating profile libraries. A parameter set is used to specify the ranges of grating dimensions and resolutions of the profile library to be generated. In one embodiment, a compiler creates subsets of a large profile library, the subset designed to enable rapid search and validation of real-time data. In another embodiment, an automatic process generates a new parameter set and a new subset of the library when trigger conditions are met. Subsets of the profile library may be used to check if grating spectrum data are within the ranges established for an application and if the dimensions are within the process averages established for a manufacturing run. The system for generation of grating profile libraries is scalable, operable in a distributed environment, and includes application specific items that can be selected or determined by the client.
摘要翻译：本发明提供了一种用于实时配置定义和生成光栅轮廓库的方法和系统。参数集用于指定要生成的轮廓库的光栅尺寸和分辨率的范围。在一个实施例中，编译器创建大型简档库的子集，该子集旨在实现对实时数据的快速搜索和验证。在另一实施例中，当满足触发条件时，自动处理生成新的参数集和库的新子集。轮廓库的子集可用于检查光栅光谱数据是否在为应用建立的范围内，以及尺寸是否在为制造运行建立的过程平均值内。用于生成光栅简档库的系统是可扩展的，在分布式环境中可操作，并且包括可由客户端选择或确定的应用程序特定项目。

10. 发明授权

US06743646B2 Balancing planarization of layers and the effect of underlying structure on the metrology signal 有权
标题翻译：平衡层的平面化和底层结构对计量信号的影响
公开(公告)号：US06743646B2
公开(公告)日：2004-06-01
申请号：US10035925
申请日：2001-10-22
申请人： Nickhil Jakatdar , Xinhui Niu
发明人： Nickhil Jakatdar , Xinhui Niu
IPC分类号： H01L2166
CPC分类号： H01L22/32 , G01N21/4788 , G01N21/9501 , G01N21/956 , H01L21/31053
摘要： One embodiment of the present invention is a method of designing underlying structures in a wafer with pads of varying sizes and varying loading factors, and selecting the design of pads that yield a reflected metrology signal closest to the calibration metrology signal and that meet preset standard planarization characteristics. Another embodiment is a method of designing underlying structures with random shapes of varying sizes and varying loading factors. Still another embodiment is the use of periodic structures of varying line-to-space ratios in one or more underlying layers of a wafer, the periodicity of the underlying periodic structure being positioned at an angle relative to the direction of periodicity of the target periodic structure of the wafer.
摘要翻译：本发明的一个实施例是一种在具有不同尺寸和不同负载系数的焊盘的晶片中设计底层结构的方法，并且选择产生最接近校准度量信号的反射测量信号并且满足预设标准平面化的焊盘的设计特点另一个实施例是设计具有不同尺寸和变化的负载因子的随机形状的底层结构的方法。另一个实施例是使用在晶片的一个或多个下层中具有不同的线间空间比的周期性结构，下面周期性结构的周期性相对于目标周期结构的周期方向定位成一定角度的晶片。

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