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1. 发明授权

US08865582B2 Method for producing a floating gate memory structure 有权
标题翻译：浮栅存储器结构的制造方法
公开(公告)号：US08865582B2
公开(公告)日：2014-10-21
申请号：US13280546
申请日：2011-10-25
申请人： Roger Loo , Matty Caymax , Pieter Blomme , Geert Van den Bosch
发明人： Roger Loo , Matty Caymax , Pieter Blomme , Geert Van den Bosch
IPC分类号： H01L29/788 , H01L21/336 , H01L27/115 , H01L29/423 , H01L21/28 , H01L29/49
CPC分类号： H01L27/11521 , H01L21/28273 , H01L29/42324 , H01L29/4916
摘要： Disclosed are methods for manufacturing floating gate memory devices and the floating gate memory devices thus manufactured. In one embodiment, the method comprises providing a monocrystalline semiconductor substrate, forming a tunnel oxide layer on the substrate, and depositing a protective layer on the tunnel oxide layer to form a stack of the tunnel oxide layer and the protective layer. The method further includes forming at least one opening in the stack, thereby exposing at least one portion of the substrate, and cleaning the at least one exposed portion with a cleaning liquid. The method still further includes loading the substrate comprising the stack into a reactor and, thereafter, performing an in-situ etch to remove the protective layer, using the at least one exposed portion as a source to epitaxially grow a layer comprising the monocrystalline semiconductor material, and forming the layer into at least one columnar floating gate structure.
摘要翻译：公开了用于制造如此制造的浮动栅极存储器件和浮动栅极存储器件的方法。在一个实施例中，该方法包括提供单晶半导体衬底，在衬底上形成隧道氧化物层，以及在隧道氧化物层上沉积保护层以形成隧道氧化物层和保护层的堆叠。该方法还包括在堆叠中形成至少一个开口，从而暴露基板的至少一部分，以及用清洗液清洁至少一个暴露部分。该方法还包括将包含该叠层的衬底加载到反应器中，此后，使用至少一个暴露部分作为源外延生长包含单晶半导体材料的层，然后进行原位蚀刻以去除保护层，并且将该层形成至少一个柱状浮栅结构。

2. 发明申请

US20120112262A1 Method for producing a floating gate memory structure 有权
标题翻译：浮栅存储器结构的制造方法
公开(公告)号：US20120112262A1
公开(公告)日：2012-05-10
申请号：US13280546
申请日：2011-10-25
申请人： Roger Loo , Matty Caymax , Pieter Blomme , Geert Van den Bosch
发明人： Roger Loo , Matty Caymax , Pieter Blomme , Geert Van den Bosch
IPC分类号： H01L29/788 , H01L21/336
CPC分类号： H01L27/11521 , H01L21/28273 , H01L29/42324 , H01L29/4916
摘要： Disclosed are methods for manufacturing floating gate memory devices and the floating gate memory devices thus manufactured. In one embodiment, the method comprises providing a monocrystalline semiconductor substrate, forming a tunnel oxide layer on the substrate, and depositing a protective layer on the tunnel oxide layer to form a stack of the tunnel oxide layer and the protective layer. The method further includes forming at least one opening in the stack, thereby exposing at least one portion of the substrate, and cleaning the at least one exposed portion with a cleaning liquid. The method still further includes loading the substrate comprising the stack into a reactor and, thereafter, performing an in-situ etch to remove the protective layer, using the at least one exposed portion as a source to epitaxially grow a layer comprising the monocrystalline semiconductor material, and forming the layer into at least one columnar floating gate structure.
摘要翻译：公开了用于制造如此制造的浮动栅极存储器件和浮动栅极存储器件的方法。在一个实施例中，该方法包括提供单晶半导体衬底，在衬底上形成隧道氧化物层，以及在隧道氧化物层上沉积保护层以形成隧道氧化物层和保护层的堆叠。该方法还包括在堆叠中形成至少一个开口，从而暴露基板的至少一部分，以及用清洗液清洁至少一个暴露部分。该方法还包括将包含该叠层的衬底加载到反应器中，此后，使用至少一个暴露部分作为源外延生长包含单晶半导体材料的层，然后进行原位蚀刻以去除保护层，并且将该层形成至少一个柱状浮栅结构。

3. 发明授权

US07332768B2 Non-volatile memory devices 失效
标题翻译：非易失性存储器件
公开(公告)号：US07332768B2
公开(公告)日：2008-02-19
申请号：US11367288
申请日：2006-03-02
申请人： Bogdan Govoreanu , Maarten Rosmeulen , Pieter Blomme
发明人： Bogdan Govoreanu , Maarten Rosmeulen , Pieter Blomme
IPC分类号： H01L29/788
CPC分类号： H01L21/28282 , B82Y10/00 , H01L21/28194 , H01L21/28202 , H01L21/28273 , H01L29/513 , H01L29/517 , H01L29/518 , H01L29/7883 , H01L29/7885 , H01L29/792
摘要： Non-volatile memory devices are disclosed. In a first example non-volatile memory device, programming and erasing of the memory device is performed through the same insulating barrier without the use of a complex symmetrical structure. In the example device, programming is accomplished by tunneling negative charge carriers from a charge supply region to a charge storage region. Further in the example device, erasing is accomplished by tunneling positive carriers from the charge supply region to the charge storage region. In a second example non-volatile memory device, a charge storage region with spatially distributed charge storage region is included. Such a charge storage region may be implemented in the first example memory device or may be implemented in other memory devices. In the second example device, programming is accomplished by tunneling negative charge carriers from a charge supply region to the charge storage region. In the second example device, the tunneled negative charge carriers are stored in the discrete storage sites.
摘要翻译：公开了非易失性存储器件。在第一示例性非易失性存储器件中，通过相同的绝缘屏障执行存储器件的编程和擦除，而不使用复杂的对称结构。在示例性装置中，通过将负电荷载体从电荷供应区域隧穿到电荷存储区域来实现编程。此外，在示例性装置中，通过将正载流子从电荷供应区域隧穿到电荷存储区域来实现擦除。在第二示例性非易失性存储器件中，包括具有空间分布电荷存储区域的电荷存储区域。这样的电荷存储区域可以在第一示例存储器件中实现，或者可以在其他存储器件中实现。在第二示例性装置中，通过将负电荷载体从电荷供应区域隧穿到电荷存储区域来实现编程。在第二示例性装置中，隧道式负电荷载体被存储在离散存储位置。

4. 发明申请

US20130341701A1 Vertical Semiconductor Memory Device and Manufacturing Method Thereof 审中-公开
标题翻译：垂直半导体存储器件及其制造方法
公开(公告)号：US20130341701A1
公开(公告)日：2013-12-26
申请号：US13877616
申请日：2011-10-06
申请人： Pieter Blomme , Gouri Sankar Kar
发明人： Pieter Blomme , Gouri Sankar Kar
IPC分类号： H01L29/792 , H01L29/66
CPC分类号： H01L29/792 , H01L21/764 , H01L27/11551 , H01L27/11556 , H01L27/11578 , H01L29/66825 , H01L29/66833 , H01L29/7889 , H01L29/7926
摘要： Disclosed are vertical semiconductor devices and methods of manufacturing vertical semiconductor devices. An example method includes providing a semiconductor substrate, and forming a stack of horizontal layers on the semiconductor substrate, where the horizontal layers are substantially parallel to a surface of the semiconductor substrate, and the horizontal layers comprise alternating conductive layers and dielectric layers. The method further includes forming a vertical channel region through the stack of horizontal layers, where the vertical channel region is substantially perpendicular to a surface of the semiconductor substrate, and the vertical channel region comprises sidewall surfaces. The method further includes forming a charge storage layer on regions of the sidewall surfaces of the vertical channel region that are in direct contact with conductive layers in the stack of horizontal layers and, at a distance from the vertical channel region, forming a vertical dielectric region through the stack of horizontal layers.
摘要翻译：公开了垂直半导体器件和制造垂直半导体器件的方法。示例性方法包括提供半导体衬底，并且在半导体衬底上形成水平层堆叠，其中水平层基本上平行于半导体衬底的表面，并且水平层包括交替的导电层和电介质层。该方法还包括通过水平层的堆叠形成垂直沟道区域，其中垂直沟道区域基本上垂直于半导体衬底的表面，并且垂直沟道区域包括侧壁表面。该方法还包括在垂直沟道区域的侧壁表面的与水平层堆叠中的导电层直接接触的区域上形成电荷存储层，并且在与垂直沟道区一定距离处形成垂直电介质区域通过堆叠的水平层。

5. 发明申请

US20120223378A1 Floating Gate Semiconductor Memory Device and Method for Producing Such a Device 有权
标题翻译：浮栅半导体存储器件及其制造方法
公开(公告)号：US20120223378A1
公开(公告)日：2012-09-06
申请号：US13410843
申请日：2012-03-02
申请人： Pieter Blomme , Antonino Cacciato , Gouri Sankar Kar
发明人： Pieter Blomme , Antonino Cacciato , Gouri Sankar Kar
IPC分类号： H01L29/788 , H01L21/336
CPC分类号： H01L27/11521 , H01L29/42324 , H01L29/66825
摘要： Disclosed are methods for manufacturing a floating gate memory device and the floating gate memory device thus obtained. In one embodiment, a method is disclosed that includes providing a semiconductor-on-insulator substrate, forming at least two trenches in the semiconductor-on-insulator substrate, and, as a result of forming the at least two trenches, forming at least one elevated structure. The method further includes forming isolation regions at a bottom of the at least two trenches by partially filling the at least two trenches, thermally oxidizing sidewall surfaces of at least a top portion of the at least one elevated structure, thereby providing a gate dielectric layer on at least the exposed sidewall surfaces; and forming a conductive layer over the at least one elevated structure, the gate dielectric layer, and the isolation regions to form at least one floating gate semiconductor memory device.
摘要翻译：公开了用于制造如此获得的浮动栅极存储器件和浮动栅极存储器件的方法。在一个实施例中，公开了一种方法，其包括提供绝缘体上半导体衬底，在绝缘体上半导体衬底中形成至少两个沟槽，并且作为形成至少两个沟槽的结果，形成至少一个升高的结构。该方法还包括通过部分地填充至少两个沟槽，热氧化至少一个升高结构的顶部的侧壁表面，从而在至少两个沟槽的底部形成隔离区，从而在至少暴露的侧壁表面; 以及在所述至少一个升高的结构，所述栅极介电层和所述隔离区域上形成导电层，以形成至少一个浮置栅极半导体存储器件。

6. 发明授权

US07026686B2 Insulating barrier, NVM bandgap design 有权
公开(公告)号：US07026686B2
公开(公告)日：2006-04-11
申请号：US10880415
申请日：2004-06-28
申请人： Pieter Blomme , Bogdan Govoreanu , Maarten Rosmeulen
发明人： Pieter Blomme , Bogdan Govoreanu , Maarten Rosmeulen
IPC分类号： H01L29/792
CPC分类号： H01L29/513 , B82Y10/00 , H01L21/28194 , H01L21/28202 , H01L21/28273 , H01L29/517 , H01L29/518 , H01L29/7883 , H01L29/7885
摘要： An insulating barrier extending between a first conductive region and a second conductive region is disclosed. The insulating barrier is provided for tunnelling charge carriers from the first to the second region, the insulating barrier comprising a first portion contacting the first region and a second portion contacting the first portion and extending towards the second region, the first portion being substantially thinner than the second portion, the first portion being constructed in a first dielectric and the second portion being constructed in a second dielectric different from the first dielectric, the first dielectric having a lower dielectric constant than the second dielectric.

7. 发明申请

US20050017288A1 Insulating barrier, NVM bandgap design 有权
标题翻译：绝缘屏障，NVM带隙设计
公开(公告)号：US20050017288A1
公开(公告)日：2005-01-27
申请号：US10880415
申请日：2004-06-28
申请人： Pieter Blomme , Bogdan Govoreanu , Maarten Rosmeulen
发明人： Pieter Blomme , Bogdan Govoreanu , Maarten Rosmeulen
IPC分类号： H01L21/28 , H01L29/51 , H01L29/788 , H01L29/792
CPC分类号： H01L29/513 , B82Y10/00 , H01L21/28194 , H01L21/28202 , H01L21/28273 , H01L29/517 , H01L29/518 , H01L29/7883 , H01L29/7885
摘要： An insulating barrier extending between a first conductive region and a second conductive region is disclosed. The insulating barrier is provided for tunnelling charge carriers from the first to the second region, the insulating barrier comprising a first portion contacting the first region and a second portion contacting the first portion and extending towards the second region, the first portion being substantially thinner than the second portion, the first portion being constructed in a first dielectric and the second portion being constructed in a second dielectric different from the first dielectric, the first dielectric having a lower dielectric constant than the second dielectric.
摘要翻译：公开了在第一导电区域和第二导电区域之间延伸的绝缘屏障。提供绝缘屏障用于将电荷载体从第一区域延伸到第二区域，绝缘屏障包括接触第一区域的第一部分和接触第一部分并朝第二区域延伸的第二部分，第一部分基本上比第二部分，第一部分构造在第一电介质中，第二部分构造在不同于第一电介质的第二电介质中，第一电介质具有比第二电介质低的介电常数。

8. 发明申请

US20110039380A1 Method for Forming a Floating Gate Non-Volatile Memory Cell 有权
标题翻译：浮动门非易失性记忆体的形成方法
公开(公告)号：US20110039380A1
公开(公告)日：2011-02-17
申请号：US12836545
申请日：2010-07-14
申请人： Pieter Blomme
发明人： Pieter Blomme
IPC分类号： H01L21/336
CPC分类号： H01L21/28273 , H01L27/115 , H01L27/11521
摘要： Method for manufacturing a non-volatile memory comprising at least one array of memory cells on a substrate of a semiconductor material, the memory cells being self-aligned to and separated from each other by STI structures, the memory cells comprising a floating gate having an inverted-T shape in a cross section along the array of memory cells, wherein the inverted T shape is formed by oxidizing an upper part of the sidewalls of the floating gates thereby forming sacrificial oxide, and subsequently removing the sacrificial oxide simultaneously with further etching back the STI structures.
摘要翻译：一种用于制造非易失性存储器的方法，所述非易失性存储器包括半导体材料的衬底上的至少一个存储单元阵列，所述存储器单元通过STI结构自对准并且彼此分离，所述存储单元包括具有沿着存储器单元阵列的横截面中的倒T形，其中通过氧化浮置栅极的侧壁的上部部分形成反向T形，从而形成牺牲氧化物，随后在进一步蚀刻回时同时去除牺牲氧化物 STI结构。

9. 发明申请

US20080185632A1 Method for improving erase saturation in non-volatile memory devices and devices obtained thereof 有权
标题翻译：用于改善非易失性存储器件及其获得的器件中的擦除饱和度的方法
公开(公告)号：US20080185632A1
公开(公告)日：2008-08-07
申请号：US11976976
申请日：2007-10-29
申请人： Bogdan Govoreanu , Maarten Rosmeulen , Pieter Blomme
发明人： Bogdan Govoreanu , Maarten Rosmeulen , Pieter Blomme
IPC分类号： H01L29/788 , H01L29/792
CPC分类号： H01L21/28282 , B82Y10/00 , H01L21/28194 , H01L21/28202 , H01L21/28273 , H01L29/513 , H01L29/517 , H01L29/518 , H01L29/7883 , H01L29/7885 , H01L29/792
摘要： Non-volatile memory devices are disclosed. In a first example non-volatile memory device, programming and erasing of the memory device is performed through the same insulating barrier without the use of a complex symmetrical structure. In the example device, programming is accomplished by tunneling negative charge carriers from a charge supply region to a charge storage region. Further in the example device, erasing is accomplished by tunneling positive carriers from the charge supply region to the charge storage region. In a second example non-volatile memory device, a charge storage region with spatially distributed charge storage region is included. Such a charge storage region may be implemented in the first example memory device or may be implemented in other memory devices. In the second example device, programming is accomplished by tunneling negative charge carriers from a charge supply region to the charge storage region. In the second example device, the tunneled negative charge carriers are stored in the discrete storage sites.
摘要翻译：公开了非易失性存储器件。在第一示例性非易失性存储器件中，通过相同的绝缘屏障执行存储器件的编程和擦除，而不使用复杂的对称结构。在示例性装置中，通过将负电荷载体从电荷供应区域隧穿到电荷存储区域来实现编程。此外，在示例性装置中，通过将正载流子从电荷供应区域隧穿到电荷存储区域来实现擦除。在第二示例性非易失性存储器件中，包括具有空间分布电荷存储区域的电荷存储区域。这样的电荷存储区域可以在第一示例存储器件中实现，或者可以在其他存储器件中实现。在第二示例性装置中，通过将负电荷载体从电荷供应区域隧穿到电荷存储区域来实现编程。在第二示例性装置中，隧道式负电荷载体被存储在离散存储位置。

10. 发明授权

US06784484B2 Insulating barrier, NVM bandgap design 有权
标题翻译：绝缘屏障，NVM带隙设计
公开(公告)号：US06784484B2
公开(公告)日：2004-08-31
申请号：US10131923
申请日：2002-04-25
申请人： Pieter Blomme , Bogdan Govoreanu , Maarten Rosmeulen
发明人： Pieter Blomme , Bogdan Govoreanu , Maarten Rosmeulen
IPC分类号： H01L29788
CPC分类号： H01L29/513 , B82Y10/00 , H01L21/28194 , H01L21/28202 , H01L21/28273 , H01L29/517 , H01L29/518 , H01L29/7883 , H01L29/7885
摘要： An insulating barrier extending between a first conductive region and a second conductive region is disclosed. The insulating barrier is provided for tunnelling charge carriers from the first to the second region, the insulating barrier comprising a first portion contacting the first region and a second portion contacting the first portion and extending towards the second region, the first portion being substantially thinner than the second portion, the first portion being constructed in a first dielectric and the second portion being constructed in a second dielectric different from the first dielectric, the first dielectric having a lower dielectric constant than the second dielectric.
摘要翻译：公开了在第一导电区域和第二导电区域之间延伸的绝缘屏障。提供绝缘屏障用于将电荷载体从第一区域延伸到第二区域，绝缘屏障包括接触第一区域的第一部分和接触第一部分并朝第二区域延伸的第二部分，第一部分基本上比第二部分，第一部分构造在第一电介质中，第二部分构造在不同于第一电介质的第二电介质中，第一电介质具有比第二电介质低的介电常数。

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