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    • 1. 发明授权
    • Semiconductor wafer, and semiconductor device formed therefrom
    • 半导体晶片和由其形成的半导体器件
    • US08164164B2
    • 2012-04-24
    • US12887798
    • 2010-09-22
    • Takashi Ohsumi
    • Takashi Ohsumi
    • H01L23/544H01L23/48H01L23/29
    • H01L23/585H01L23/3114H01L23/3192H01L2924/0002H01L2924/00
    • A semiconductor wafer has a substrate, and a plurality of active areas formed on the substrate. Integrated circuits are formed in the active areas. The semiconductor wafer also has dicing areas formed between the adjacent active areas. A seal ring is formed along the edge (periphery) of each active area. The semiconductor wafer also has interconnects formed closely to the inside of the seal ring. A protective layer covers the active areas. A protective film is formed on the protective layer at the locations of the active areas. The semiconductor wafer also has other interconnects formed on the protective film for electrical connection to the integrated circuits. Preferably, when the aspect ratio of a groove formed in the protective layer between the seal ring and the interconnect is 0.5 or more, this groove is covered with the protective film.
    • 半导体晶片具有基板和形成在基板上的多个有源区域。 集成电路形成在有源区。 半导体晶片还具有形成在相邻的有源区域之间的切割区域。 沿着每个活动区域的边缘(周边)形成密封环。 半导体晶片还具有与密封环的内部紧密相连的互连。 保护层覆盖有源区域。 在有源区域的位置上的保护层上形成保护膜。 半导体晶片还具有形成在保护膜上的用于与集成电路电连接的其它互连。 优选地,当形成在密封环和互连件之间的保护层中的槽的纵横比为0.5或更大时,该槽被保护膜覆盖。