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1. 发明申请

US20120075603A1 PROCESS TUNING WITH POLARIZATION 有权
标题翻译：过程调整与偏振
公开(公告)号：US20120075603A1
公开(公告)日：2012-03-29
申请号：US13239034
申请日：2011-09-21
申请人： George Steven HANSEN , Melle Heine Mulder , Tsann-Bim Chiou
发明人： George Steven HANSEN , Melle Heine Mulder , Tsann-Bim Chiou
IPC分类号： G03B27/54
CPC分类号： G03F7/70566 , G03F7/7005 , G03F7/70625
摘要： A method for configuring an illumination source of a lithographic apparatus, the method including dividing the illumination source into pixel groups, each pixel group including one or more illumination source points in a pupil plane of the illumination source; changing a polarization state of each pixel group and determining an incremental effect on each of the plurality of critical dimensions resulting from the change of polarization state; calculating a first plurality of sensitivity coefficients for each of the plurality of critical dimensions using the determined incremental effects; selecting an initial illumination source; iteratively calculating a lithographic metric as a result of a change of polarization state using the calculated first plurality of sensitivity coefficients, the change of the polarization state of the pixel group in the initial illumination source creating a modified illumination source; and adjusting the initial illumination source based on the iterative results of calculations.
摘要翻译：一种用于配置光刻设备的照明源的方法，所述方法包括将照明源分为像素组，每个像素组包括照明源的光瞳平面中的一个或多个照明源点; 改变每个像素组的偏振态，并确定由偏振状态改变导致的多个临界尺度中的每一个的增量效应; 使用所确定的增量效应来计算所述多个关键尺寸中的每一个的第一多个灵敏度系数; 选择初始照明源; 使用所计算的第一多个灵敏度系数来迭代地计算作为偏振态的变化的结果的光刻度量，所述初始照明源中的像素组的偏振状态的改变创建修改的照明源; 并根据迭代计算结果调整初始照明源。

2. 发明申请

US20140051016A1 METHOD OF PREPARING A PATTERN, METHOD OF FORMING A MASK SET, DEVICE MANUFACTURING METHOD AND COMPUTER PROGRAM 有权
标题翻译：制作图案的方法，形成镶嵌方法，装置制造方法和计算机程序
公开(公告)号：US20140051016A1
公开(公告)日：2014-02-20
申请号：US13965103
申请日：2013-08-12
申请人： Tsann-Bim CHIOU , Mircea DUSA , Alek Chi-Heng CHEN
发明人： Tsann-Bim CHIOU , Mircea DUSA , Alek Chi-Heng CHEN
IPC分类号： G03F1/22 , G06F17/50
CPC分类号： G03F1/22 , G03F1/00 , G03F1/68 , G03F1/70 , G03F7/70341 , G03F7/70433 , G03F7/70466 , G06F17/5068
摘要： In a multiple patterning techniques, where two or more exposures are used to form a single layer of a device, the splitting of features in a single layer between the multiple exposures is carried out additionally with reference to features of another associated layer and the splitting of that layer into two or more sets of features for separate exposure. The multiple exposure process can be a process involving repeated litho-etch steps desirably, the alignment scheme utilized during exposure of the split layers is optimized with reference to the splitting approach.
摘要翻译：在使用两个或多个曝光来形成设备的单层的多重图案化技术中，在多个曝光之间的单个层中的特征的分割是通过参考另一个相关层的特征进行的，并且分割该层分为两组或多组功能，用于单独曝光。多次曝光过程可以是涉及重复光刻蚀步骤的过程，期望地，参考分割方法优化在分离层的曝光期间使用的对准方案。

3. 发明授权

US09563135B2 Process tuning with polarization 有权
标题翻译：极化过程调谐
公开(公告)号：US09563135B2
公开(公告)日：2017-02-07
申请号：US13239034
申请日：2011-09-21
申请人： Steven George Hansen , Heine Melle Mulder , Tsann-Bim Chiou
发明人： Steven George Hansen , Heine Melle Mulder , Tsann-Bim Chiou
IPC分类号： G03B27/68 , G03B27/54 , G03B27/32 , G03F7/20
CPC分类号： G03F7/70566 , G03F7/7005 , G03F7/70625
摘要： A method for configuring an illumination source of a lithographic apparatus, the method including dividing the illumination source into pixel groups, each pixel group including one or more illumination source points in a pupil plane of the illumination source; changing a polarization state of each pixel group and determining an incremental effect on each of the plurality of critical dimensions resulting from the change of polarization state; calculating a first plurality of sensitivity coefficients for each of the plurality of critical dimensions using the determined incremental effects; selecting an initial illumination source; iteratively calculating a lithographic metric as a result of a change of polarization state using the calculated first plurality of sensitivity coefficients, the change of the polarization state of the pixel group in the initial illumination source creating a modified illumination source; and adjusting the initial illumination source based on the iterative results of calculations.
摘要翻译：一种用于配置光刻设备的照明源的方法，所述方法包括将照明源分为像素组，每个像素组包括照明源的光瞳平面中的一个或多个照明源点; 改变每个像素组的偏振态，并确定由偏振状态改变导致的多个临界尺度中的每一个的增量效应; 使用所确定的增量效应来计算所述多个关键尺寸中的每一个的第一多个灵敏度系数; 选择初始照明源; 使用所计算的第一多个灵敏度系数来迭代地计算作为偏振态的变化的结果的光刻度量，所述初始照明源中的像素组的偏振状态的改变创建修改的照明源; 并根据迭代计算结果调整初始照明源。

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