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    • 7. 发明授权
    • Method and apparatus for filing high aspect patterns with metal
    • 用金属填充高方向图案的方法和装置
    • US5302266A
    • 1994-04-12
    • US951924
    • 1992-09-25
    • Henry J. GrabarzAlfred GrillWilliam M. HolberJoseph S. LoganJames T. C. Yeh
    • Henry J. GrabarzAlfred GrillWilliam M. HolberJoseph S. LoganJames T. C. Yeh
    • C23C14/34C23C14/04C23C14/32C23C14/35H01J37/32H01L21/285H01L21/768H05H1/18
    • C23C14/046C23C14/32C23C14/357H01J37/32009H01J37/32623H01J37/32678H01L21/76877H01J2237/3327
    • An electron cyclotron resonance plasma heating apparatus system and process in which microwave energy is transmitted directly in an axial direction through an evacuated chamber to generate energetic electrons. These energetic electrons spiral around the magnetic field lines formed by the solenoid and spiral substantially parallel to the axis. A metal atom vapor source transmits the metal atom vapor into the chamber through a housing port in the chamber wall. The metal atom vapor source in the housing is out of the line of sight of the substrate. The metal atoms are ionized by the energized electrons, and these ionized metal atoms are confined to the plasma column substantially free of neutral atoms as such ionized metal approaches and contacts the substrate in said evacuated chamber. In this way, the ionized metal atoms substantially avoid contact with the wall of chamber. A sputter target of a second metal may be placed in the plane of the substrate and a bias voltage applied to the target. Atoms of the second metal are then sputtered off and ionized by the plasma and are deposited on the substrate with the first metal ions.
    • 电子回旋共振等离子体加热装置系统和微波能量通过真空室沿轴向直接传递以产生高能电子的过程。 这些高能电子围绕由螺线管形成的磁场线与螺旋线基本平行。 金属原子蒸汽源通过室壁中的壳体端口将金属原子蒸气传输到室中。 壳体中的金属原子蒸汽源不在衬底的视线之内。 金属原子被激发电子电离,这些离子化的金属原子被限制在基本上不含中性原子的等离子体柱上,因为这样的电离金属靠近并接触所述真空室中的衬底。 以这种方式,电离金属原子基本上避免与室的壁接触。 可以将第二金属的溅射靶放置在基板的平面中,并将偏置电压施加到靶。 然后将第二金属的原子溅射并通过等离子体离子化,并用第一金属离子沉积在基底上。