专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08629064B2 Multiple patterning lithography using spacer and self-aligned assist patterns 有权
标题翻译：使用间隔物和自对准辅助图案进行多重图案化光刻
公开(公告)号：US08629064B2
公开(公告)日：2014-01-14
申请号：US13167681
申请日：2011-06-23
申请人： Xiaoyang Li , Duan-Fu Stephen Hsu
发明人： Xiaoyang Li , Duan-Fu Stephen Hsu
IPC分类号： H01L21/311
CPC分类号： G03F1/36 , G03F7/70466 , G03F7/70633
摘要： The present invention relates to lithographic apparatuses and processes, and more particularly to multiple patterning lithography for printing target patterns beyond the limits of resolution of the lithographic apparatus. Self-aligned assist pattern (SAP) is derived from original design layout in an automated manner using geometric Boolean operations based on some predefined design rules, and are included in the mask layout for efficient self-alignment of various sub-layouts of the target pattern during a multiple patterning lithography process. SAP can be of any shape and size, and can have continuous features (e.g., a ring), or discontinuous (e.g., bars not connected to each other) features. An end-to-end multiple patterning lithography using spacer and SAP may use positive tone lithography, and/or negative tone lithography for line and/or space printing.
摘要翻译：本发明涉及光刻设备和工艺，更具体地涉及用于将目标图案打印超出光刻设备的分辨率限制的多重图形化光刻技术。自对准辅助图案（SAP）以原始设计布局从自动化方式导出，使用基于某些预定义设计规则的几何布尔运算，并且包括在掩模布局中以用于目标图案的各种子布局的有效自对准在多重图案化光刻工艺期间。 SAP可以具有任何形状和尺寸，并且可以具有连续特征（例如，环）或不连续的（例如，彼此不连接的条）特征。使用间隔物和SAP的端到端多重图案化光刻可以使用正色调光刻，和/或负色调光刻用于线和/或空间印刷。

2. 发明申请

US20110318927A1 Multiple Patterning Lithography Using Spacer and Self-Aligned Assist Patterns 有权
标题翻译：使用间隔和自对准辅助模式进行多重图案化光刻
公开(公告)号：US20110318927A1
公开(公告)日：2011-12-29
申请号：US13167681
申请日：2011-06-23
申请人： Xiaoyang Li , Duan-Fu Stephen Hsu
发明人： Xiaoyang Li , Duan-Fu Stephen Hsu
IPC分类号： H01L21/306 , G06F17/50
CPC分类号： G03F1/36 , G03F7/70466 , G03F7/70633
摘要： The present invention relates to lithographic apparatuses and processes, and more particularly to multiple patterning lithography for printing target patterns beyond the limits of resolution of the lithographic apparatus. Self-aligned assist pattern (SAP) is derived from original design layout in an automated manner using geometric Boolean operations based on some predefined design rules, and are included in the mask layout for efficient self-alignment of various sub-layouts of the target pattern during a multiple patterning lithography process. SAP can be of any shape and size, and can have continuous features (e.g., a ring), or discontinuous (e.g., bars not connected to each other) features. An end-to-end multiple patterning lithography using spacer and SAP may use positive tone lithography, and/or negative tone lithography for line and/or space printing.
摘要翻译：本发明涉及光刻设备和工艺，更具体地涉及用于将目标图案打印超出光刻设备的分辨率限制的多重图形化光刻技术。自对准辅助图案（SAP）以原始设计布局从自动化方式导出，使用基于某些预定义设计规则的几何布尔运算，并且包括在掩模布局中以用于目标图案的各种子布局的有效自对准在多重图案化光刻工艺期间。 SAP可以具有任何形状和尺寸，并且可以具有连续特征（例如，环）或不连续的（例如，彼此不连接的条）特征。使用间隔物和SAP的端到端多重图案化光刻可以使用正色调光刻，和/或负色调光刻用于线和/或空间印刷。

3. 发明授权

US07149998B2 Lithography process modeling of asymmetric patterns 有权
标题翻译：非对称图案的平版印刷过程建模
公开(公告)号：US07149998B2
公开(公告)日：2006-12-12
申请号：US10335513
申请日：2002-12-30
申请人： Xiaoyang Li
发明人： Xiaoyang Li
IPC分类号： G06F17/50
CPC分类号： G03F1/68 , G03F1/26
摘要： A lithography process model is generated to account for asymmetric printing of a feature of a target pattern to help better predict how the target pattern will print. The process model for one embodiment may be generated based on data generated from measurements of spacings between symmetrically defined features of printed test patterns to help predict edge offsets of the feature relative to the target pattern when printed and/or to help predict a dimension of the feature when printed. The process model may be used to help design, manufacture, and/or inspect a mask to help print the target pattern more accurately and therefore help manufacture an integrated circuit (IC), for example, that more accurately matches its intended layout.
摘要翻译：生成光刻过程模型以解决目标图案的特征的不对称打印，以帮助更好地预测目标图案将如何打印。一个实施例的过程模型可以基于由打印测试图案的对称定义的特征之间的间隔的测量产生的数据来产生，以帮助预测当打印时相对于目标图案的特征的边缘偏移和/或帮助预测功能打印时。过程模型可用于帮助设计，制造和/或检查掩模以帮助更准确地印刷目标图案，并且因此有助于制造例如更准确地匹配其预期布局的集成电路（IC）。

4. 发明授权

US06813759B2 Hybrid optical proximity correction for alternating aperture phase shifting designs 有权
公开(公告)号：US06813759B2
公开(公告)日：2004-11-02
申请号：US10237883
申请日：2002-09-09
申请人： Hua-yu Liu , Weinong Lai , Xiaoyang Li
发明人： Hua-yu Liu , Weinong Lai , Xiaoyang Li
IPC分类号： G06F1750
CPC分类号： G03F1/30 , G03F1/36 , G03F1/70 , G03F7/70441
摘要： One embodiment of the invention provides a system that facilitates optical proximity correction for alternating aperture phase shifting designs. During operation, the system receives a layout, which includes a complementary mask and a phase shifting mask. A subset of trim features on the complementary mask that are designed to protect the dark areas left unexposed by the phase shifting mask are adjusted first using a rules-based optical proximity correction process. This is then supplemented by a model-based correction to the phase shifters, Additionally, the portions of the trim that are co-extensive with the original layout can be corrected, e.g. at the time of the correction of the complementary mask using either rule or model based corrections.

5. 发明申请

US20090079987A1 Photodiode-based Bi-Directional Reflectance Distribution Function (BRDF) Measurement 有权
标题翻译：基于光电二极管的双向反射分布函数（BRDF）测量
公开(公告)号：US20090079987A1
公开(公告)日：2009-03-26
申请号：US12173655
申请日：2008-07-15
申请人： Moshe Ben-Ezra , Yasuyuki Matsushita , Bennett S. Wilburn , Xiaoyang Li
发明人： Moshe Ben-Ezra , Yasuyuki Matsushita , Bennett S. Wilburn , Xiaoyang Li
IPC分类号： G01N21/55
CPC分类号： G01N21/474
摘要： Photodiode-based bi-directional reflectance distribution function (BRDF) measurement is described. Multiple photodiodes are distributed approximately symmetrically at a fixed distance from a surface to be measured. One or more of the photodiodes are directed to emit light, while readings are gathered from the other photodiodes that are not emitting light. The readings are processed based on previously measured calibration data to generate BRDF values.
摘要翻译：描述基于光电二极管的双向反射分布函数（BRDF）测量。多个光电二极管大致对称地分布在距待测表面的固定距离处。一个或多个光电二极管被引导以发光，而从其他不发光的光电二极管收集读数。基于先前测量的校准数据处理读数以产生BRDF值。

6. 发明授权

US5878153A Method for monitoring coating adhesion propensity based on surface morphology 失效
标题翻译：基于表面形态监测涂层粘附倾向的方法
公开(公告)号：US5878153A
公开(公告)日：1999-03-02
申请号：US709947
申请日：1996-09-09
申请人： Michelle Jarmilla Mikulec , John Xiaoyang Li , Mark Paul Everson
发明人： Michelle Jarmilla Mikulec , John Xiaoyang Li , Mark Paul Everson
IPC分类号： G06K9/00
CPC分类号： G06K9/00 , G01N13/00 , G01N19/04 , G01N21/88
摘要： A method for monitoring process parameters in a multiple step process for an article molded from a plastic material containing at least two constituents to determine propensity for adhesion of a subsequently applied coating includes imaging at least one region of the article to examine surface morphology and analyzing the surface morphology to identify one of the constituents. In a preferred embodiment, the method is applied to monitor a manufacturing process for a molded plastic bumper to determine adhesion propensity of a subsequently applied adhesion promoter or paint based on surface morphology of the component. Analysis of the surface morphology includes identifying the presence of rubber globules near the surface layer or skin.
摘要翻译：用于监测由含有至少两种成分的塑料材料模制的制品的多步骤过程中的工艺参数的方法，以确定随后施加的涂层的粘附倾向，包括成像制品的至少一个区域以检查表面形态并分析表面形态鉴别其中的一个成分。在优选的实施方案中，该方法用于监测模塑塑料缓冲剂的制造过程，以基于组分的表面形态确定随后施加的粘合促进剂或涂料的粘合倾向。表面形态的分析包括鉴定表面层或皮肤附近的橡胶球的存在。

7. 发明授权

US07929142B2 Photodiode-based bi-directional reflectance distribution function (BRDF) measurement 有权
标题翻译：基于光电二极管的双向反射分布函数（BRDF）测量
公开(公告)号：US07929142B2
公开(公告)日：2011-04-19
申请号：US12173655
申请日：2008-07-15
申请人： Moshe Ben-Ezra , Yasuyuki Matsushita , Bennett S Wilburn , Xiaoyang Li
发明人： Moshe Ben-Ezra , Yasuyuki Matsushita , Bennett S Wilburn , Xiaoyang Li
IPC分类号： G01N21/55
CPC分类号： G01N21/474
摘要： Photodiode-based bi-directional reflectance distribution function (BRDF) measurement is described. Multiple photodiodes are distributed approximately symmetrically at a fixed distance from a surface to be measured. One or more of the photodiodes are directed to emit light, while readings are gathered from the other photodiodes that are not emitting light. The readings are processed based on previously measured calibration data to generate BRDF values.
摘要翻译：描述基于光电二极管的双向反射分布函数（BRDF）测量。多个光电二极管大致对称地分布在距待测表面的固定距离处。一个或多个光电二极管被引导以发光，而从其他不发光的光电二极管收集读数。基于先前测量的校准数据处理读数以产生BRDF值。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式