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    • 1. 发明申请
    • Method and apparatus for monitoring, dosing and distribution of chemical solutions
    • 用于监测,配量和分配化学溶液的方法和设备
    • US20050051433A1
    • 2005-03-10
    • US10827596
    • 2004-04-19
    • Alan ZdunekOmar GermouniAlejandro Barajas
    • Alan ZdunekOmar GermouniAlejandro Barajas
    • C25D7/12C25D21/14H01L21/288C25D21/12
    • H01L21/2885C25D17/001C25D21/14
    • It is an object of the present invention to provide a system and method for monitoring, dosing and distribution of a chemical composition in a material treatment process, the chemical composition containing at least one additive for maintaining quality of the chemical treatment process. The system and method include: at least one chemical containing unit configured to contain the chemical composition for the chemical treatment process; a dosing unit fluidly communicating with the at least one chemical containing unit configured to receive the chemical composition therefrom and to add a selected dose of the at least one additive to the chemical composition therein; an online monitor configured to monitor a property of the chemical composition at the dosing unit and to transmit a signal corresponding to the monitored property; and a controller programmed and configured to receive the signal from the online monitor and send a signal to the dosing system to add the selected dose to the chemical composition therein in response to the monitored property.
    • 本发明的目的是提供一种用于在材料处理过程中监测,计量和分配化学组合物的系统和方法,所述化学组合物含有至少一种用于维持化学处理过程质量的添加剂。 该系统和方法包括:至少一种含化学物质的单元,其构造成含有用于化学处理过程的化学组成; 与所述至少一个化学容纳单元流体连通的配量单元,其被配置为从其接收化学组合物,并向其中的化学组合物中加入选定剂量的至少一种添加剂; 在线监视器,其被配置为监视在所述计量单元处的化学成分的属性并传送对应于所监视的属性的信号; 以及控制器,其被编程和配置成从在线监视器接收信号,并且向所述计量系统发送信号,以响应所监视的属性将所选择的剂量添加到其中的化学成分。