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1. 发明申请

US20120216169A1 DESIGN BASED DEVICE RISK ASSESSMENT 有权
标题翻译：基于设计的设备风险评估
公开(公告)号：US20120216169A1
公开(公告)日：2012-08-23
申请号：US13399805
申请日：2012-02-17
申请人： Allen Park , Youseung Jin , SungChan Cho , Barry Saville
发明人： Allen Park , Youseung Jin , SungChan Cho , Barry Saville
IPC分类号： G06F17/50
CPC分类号： H01L22/12 , G01N21/95607 , G01N2021/8883 , G05B19/41875 , G05B2219/32182 , H01L22/20 , H01L2924/0002 , Y02P90/22 , Y02P90/265 , H01L2924/00
摘要： The present invention includes defining a multiple patterns of interest utilizing design data of the device; generating a design based classification database, the DBC database including design data associated with each of the POIs; receiving one or more inspection results; comparing the inspection results to each of the plurality of POIs in order to identify an occurrence of at least one of the POIs in the inspection results; determining yield impact of each POI utilizing process yield data; monitoring a frequency of occurrence of each of the POIs and the criticality of the POIs in order to identify process excursions of the device; and determining a device risk level by calculating a normalized polygon frequency for the device utilizing a frequency of occurrence for each of the critical polygons and a criticality for each of the critical polygons, the critical polygons defined utilizing design data of the device.
摘要翻译：本发明包括使用设备的设计数据定义多个感兴趣的图案; 生成基于设计的分类数据库，DBC数据库包括与每个POI相关联的设计数据; 接收一个或多个检验结果; 将检查结果与多个POI中的每一个比较，以便识别检查结果中的至少一个POI的发生; 使用过程产量数据确定每个POI的产量影响; 监测每个POI的发生频率和POI的临界性，以便识别该设备的过程偏移; 以及通过使用所述关键多边形中的每个关键多边形的出现频率以及所述关键多边形的关键性计算所述设备的归一化多边形频率来确定设备风险级别，所述关键多边形利用所述设备的设计数据来定义。

2. 发明授权

US08656323B2 Based device risk assessment 有权
标题翻译：基于设备风险评估
公开(公告)号：US08656323B2
公开(公告)日：2014-02-18
申请号：US13399805
申请日：2012-02-17
申请人： Allen Park , Youseung Jin , SungChan Cho , Barry Saville
发明人： Allen Park , Youseung Jin , SungChan Cho , Barry Saville
IPC分类号： G06F17/50
CPC分类号： H01L22/12 , G01N21/95607 , G01N2021/8883 , G05B19/41875 , G05B2219/32182 , H01L22/20 , H01L2924/0002 , Y02P90/22 , Y02P90/265 , H01L2924/00
摘要： The process for designed based assessment includes the following steps. First, the process defines multiple patterns of interest (POIs) utilizing design data of a device and then generates a design based classification database. Further, the process receives one or more inspection results. Then, the process compares the inspection results to each of the plurality of POIs in order to identify occurrences of the POIs in the inspection results. In turn, the process determines yield impact of each POI utilizing process yield data and monitors a frequency of occurrence of each of the POIs and the criticality of the POIs in order to identify process excursions of the device. Finally, the process determines a device risk level by calculating a normalized polygon frequency for the device utilizing a frequency of occurrence for each of the critical polygons and a criticality for each of the critical polygons.
摘要翻译：基于设计的评估过程包括以下步骤。首先，该过程使用设备的设计数据定义多个兴趣模式（POI），然后生成基于设计的分类数据库。此外，该过程接收一个或多个检查结果。然后，该过程将检查结果与多个POI中的每一个进行比较，以便识别检查结果中POI的出现。反过来，该过程确定每个POI利用过程产出数据的收益率影响，并且监视每个POI的出现频率和POI的临界性，以便识别该设备的过程偏移。最后，该过程通过使用针对每个临界多边形的出现频率以及每个关键多边形的临界值来计算设备的归一化多边形频率来确定设备风险等级。

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