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    • 1. 发明授权
    • Nonvolatile memory device, and its manufacturing method
    • 非易失存储器件及其制造方法
    • US07307879B2
    • 2007-12-11
    • US11291048
    • 2005-11-29
    • Atsushi YokoiMasao Nakano
    • Atsushi YokoiMasao Nakano
    • G11C16/04H01L29/788H01L29/792
    • G11C16/0475G11C11/5621G11C2211/5611H01L21/28273H01L27/115H01L27/11521H01L29/42328H01L29/42344H01L29/42348H01L29/66825H01L29/7887H01L29/7923
    • On a channel region enclosed by a pair of diffusion layers 13A, 13B, a first insulating layer 15, a charge accumulative layer 17, and a second insulating layer 19 are stacked up in this order, and on the second insulating layer 19, two control gate layers 21A, 21B spaced across a gap G1 are disposed in the middle of the channel width direction. The charge accumulative layer 17 has discrete charge traps, and, accordingly, movement of charge in the layer is limited. In the charge accumulative layer 17, the charges injected depend on the writing voltage applied in control gate layers 21A, 21B and can be localized beneath the control gate layers 21A, 21B through which a writing voltage is applied. The presence or absence of charges can be controlled in every charge accumulative region beneath the control gate layers 21A, 21B, so that multi-value storage in the memory cell can be realized.
    • 在由一对扩散层13A,13B,第一绝缘层15,电荷累积层17和第二绝缘层19围绕的沟道区域上依次层叠,在第二绝缘层19上, 在间隙G 1间隔开的两个控制栅极层21A,21B设置在沟道宽度方向的中间。 电荷累积层17具有离散的电荷陷阱,因此层中的电荷的移动受到限制。 在电荷累积层17中,注入的电荷取决于施加在控制栅极层21A,21B中的写入电压,并且可以位于施加写入电压的控制栅极层21A,21B的下方。 可以在控制栅极层21A,21B下方的每个电荷累积区域中控制电荷的存在或不存在,从而可以实现存储单元中的多值存储。
    • 5. 发明授权
    • Nonvolatile memory device and method to control the same
    • 非易失存储器件及其控制方法相同
    • US07660148B2
    • 2010-02-09
    • US12060710
    • 2008-04-01
    • Atsushi Yokoi
    • Atsushi Yokoi
    • G11C11/00
    • G11C13/003G11C13/0004G11C2213/75G11C2213/76G11C2213/79
    • A nonvolatile memory device is disclosed. The nonvolatile memory device includes a source selector transistor connected at one end thereof to a source line, a plurality of cell selector transistors connected in series with each other and to the other end of said source selector transistor and a basic memory unit including a variable resistor element which is constituted as a memory element to store bit information and is provided for each of said cell selector transistors, being connected at one end thereof to the drain terminal of said cell selector transistor and connected at the other end thereof to the bit line. The source selector transistor and said cell selector transistor provided between one end of said variable resistor element to be accessed and said source line are controlled to turn on.
    • 公开了非易失性存储器件。 非易失性存储器件包括:源极选择晶体管,其一端连接到源极线,多个单元选择晶体管彼此串联连接,并连接到所述源选择晶体管的另一端;以及基本存储单元,包括可变电阻器 元件,其构成为用于存储位信息的存储元件,并且为每个所述单元选择晶体管提供,其一端连接到所述单元选择晶体管的漏极端子,并在其另一端连接到位线。 设置在要访问的可变电阻元件的一端和所述源极线之间的源选择器晶体管和所述单元选择晶体管被控制为导通。
    • 6. 发明申请
    • Nonvolatile memory device, and its manufacturing method
    • 非易失存储器件及其制造方法
    • US20060114722A1
    • 2006-06-01
    • US11291048
    • 2005-11-29
    • Atsushi YokoiMasao Nakano
    • Atsushi YokoiMasao Nakano
    • G11C16/04
    • G11C16/0475G11C11/5621G11C2211/5611H01L21/28273H01L27/115H01L27/11521H01L29/42328H01L29/42344H01L29/42348H01L29/66825H01L29/7887H01L29/7923
    • On a channel region enclosed by a pair of diffusion layers 13A, 13B, a first insulating layer 15, a charge accumulative layer 17, and a second insulating layer 19 are stacked up in this order, and on the second insulating layer 19, two control gate layers 21A, 21B spaced across a gap G1 are disposed in the middle of the channel width direction. The charge accumulative layer 17 has discrete charge traps, and, accordingly, movement of charge in the layer is limited. In the charge accumulative layer 17, the charges injected depend on the writing voltage applied in control gate layers 21A, 21B and can be localized beneath the control gate layers 21A, 21B through which a writing voltage is applied. The presence or absence of charges can be controlled in every charge accumulative region beneath the control gate layers 21A, 21B, so that multi-value storage in the memory cell can be realized.
    • 在由一对扩散层13A,13B,第一绝缘层15,电荷累积层17和第二绝缘层19围绕的沟道区域上依次层叠,在第二绝缘层19上, 在间隙G 1间隔开的两个控制栅极层21A,21B设置在沟道宽度方向的中间。 电荷累积层17具有离散的电荷陷阱,因此层中的电荷的移动受到限制。 在电荷累积层17中,注入的电荷取决于施加在控制栅极层21A,21B中的写入电压,并且可以位于施加写入电压的控制栅极层21A,21B的下方。 可以在控制栅极层21A,21B下方的每个电荷累积区域中控制电荷的存在或不存在,从而可以实现存储单元中的多值存储。
    • 7. 发明授权
    • Method and apparatus for designing semiconductor device
    • 用于设计半导体器件的方法和设备
    • US5566080A
    • 1996-10-15
    • US297101
    • 1994-08-29
    • Atsushi Yokoi
    • Atsushi Yokoi
    • G06F17/50
    • G06F17/5068
    • Disclosed is a method of designing a semiconductor device including a plurality of elements, using a computer-aided design (CAD) apparatus. Data about the basic design of each cell is stored as a cell in a library of the CAD apparatus. In each cell, a plurality of connecting terminal regions for connecting an associated element to an external interconnection are provided as electrically disconnected from an internal circuit forming area of this element. This cell is laid at a desired position in a semiconductor device that is being designed. After the necessary cells are laid out, one of the connecting terminals is selected for each cell from a plurality of connecting terminal regions. Then, an interconnection for connecting the internal circuit forming area to the selected connecting terminal region is designed.
    • 公开了使用计算机辅助设计(CAD)设备来设计包括多个元件的半导体器件的方法。 关于每个单元的基本设计的数据作为单元存储在CAD设备的库中。 在每个单元中,用于将相关元件连接到外部互连件的多个连接端子区域被设置为与该元件的内部电路形成区域电气断开。 将该电池放置在正在设计的半导体器件中的期望位置。 在布置必要的单元之后,从多个连接端子区域为每个单元选择一个连接端子。 然后,设计用于将内部电路形成区域连接到所选择的连接端子区域的互连。
    • 10. 发明申请
    • NONVOLATILE MEMORY DEVICE AND METHOD TO CONTROL THE SAME
    • 非易失性存储器件及其控制方法
    • US20080266934A1
    • 2008-10-30
    • US12060710
    • 2008-04-01
    • Atsushi Yokoi
    • Atsushi Yokoi
    • G11C11/00
    • G11C13/003G11C13/0004G11C2213/75G11C2213/76G11C2213/79
    • A nonvolatile memory device is disclosed. The nonvolatile memory device includes a source selector transistor connected at one end thereof to a source line, a plurality of cell selector transistors connected in series with each other and to the other end of said source selector transistor and a basic memory unit including a variable resistor element which is constituted as a memory element to store bit information and is provided for each of said cell selector transistors, being connected at one end thereof to the drain terminal of said cell selector transistor and connected at the other end thereof to the bit line. The source selector transistor and said cell selector transistor provided between one end of said variable resistor element to be accessed and said source line are controlled to turn on.
    • 公开了非易失性存储器件。 非易失性存储器件包括:源极选择晶体管,其一端连接到源极线,多个单元选择晶体管彼此串联连接,并连接到所述源选择晶体管的另一端;以及基本存储单元,包括可变电阻器 元件,其构成为用于存储位信息的存储元件,并且为每个所述单元选择晶体管提供,其一端连接到所述单元选择晶体管的漏极端子,并在其另一端连接到位线。 设置在要访问的可变电阻元件的一端和所述源极线之间的源选择器晶体管和所述单元选择晶体管被控制为导通。