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    • 4. 发明申请
    • MASK CLEANING APPARATUS AND MASK CLEANING METHOD
    • 面罩清洁装置和面膜清洁方法
    • US20160214149A1
    • 2016-07-28
    • US14904221
    • 2015-04-24
    • BOE TECHNOLOGY GROUP CO., LTD.
    • Kelvin ChiangPeng Zhang
    • B08B7/00
    • B08B7/0021B08B7/028B24C1/00B24C1/003B24C1/086B24C3/32
    • A mask cleaning apparatus and a mask cleaning method are provided. The mask cleaning method comprises: placing a mask (100) on a stage (20); and ejecting a dry ice particle group including a plurality of dry ice particles (101) toward a surface of the mask (100) at a speed of 340 m/s to 1000 m/s, within a cleaning time, wherein the plurality of dry ice particles (101) impact the surface of the mask (100) so as to remove a contaminant on the surface of the mask. Thereby, the mask cleaning apparatus and the mask cleaning method provided by embodiments of the present disclosure can remove the contaminant on the mask, without increasing a contamination medium and damaging the surface of the mask.
    • 提供了面罩清洁装置和面罩清洁方法。 面罩清洗方法包括:将掩模(100)放置在台(20)上; 并且在清洁时间内以340m / s至1000m / s的速度向面罩(100)的表面喷射包括多个干冰颗粒(101)的干冰颗粒组,其中所述多个干燥 冰颗粒(101)冲击掩模(100)的表面,以去除掩模表面上的污染物。 因此,本公开的实施方式提供的面膜清洁装置和面膜清洁方法可以除去掩模上的污染物,而不增加污染介质并损害掩模的表面。
    • 8. 发明申请
    • Metal Mask
    • 金属面膜
    • US20160281208A1
    • 2016-09-29
    • US14443020
    • 2014-09-30
    • BOE TECHNOLOGY GROUP CO., LTD.
    • Peng Zhang
    • C23C14/04C23C14/24
    • C23C14/04C23C14/042C23C14/24H01L51/0011H01L51/56
    • Disclosed is a metal mask configured to act as a mask of a substrate in a vacuum evaporation process. The metal mask comprises a mask pattern and a plurality of alignment openings, wherein an extending direction of the alignment openings in the metal mask is not coincident with a perpendicular direction (M) of a plane where the metal mask is located, and the alignment openings do not penetrate through the metal mask (100). Since the light is reflected for several times and partly absorbed within the alignment openings, images as generated by the CCD system according to the alignment openings of the metal mask and the alignment mark of the substrate have significant color contrast therebetween, thus, they are easily distinguished, which may reduce the alignment difficulty and alignment error.
    • 公开了一种金属掩模,其构造成在真空蒸发处理中用作基板的掩模。 金属掩模包括掩模图案和多个对准开口,其中金属掩模中的对准开口的延伸方向与金属掩模所在的平面的垂直方向(M)不一致,并且对准开口 不要穿过金属面罩(100)。 由于光被反射多次并部分地被吸收在对准开口内,所以由CCD系统根据金属掩模的对准开口和基板的对准标记产生的图像在它们之间具有显着的颜色对比,因此它们很容易 区分,这可能会降低对准难度和对准误差。