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    • 4. 发明授权
    • Carbon-chalcogenide variable resistance memory device
    • 碳硫族化物可变电阻记忆装置
    • US09118006B1
    • 2015-08-25
    • US14457400
    • 2014-08-12
    • Boise State University
    • Kristy A. Campbell
    • H01L45/00
    • H01L45/143H01L45/085H01L45/1233H01L45/149H01L45/1625
    • A variable resistance memory device that includes a first electrode, a second electrode, and a first chalcogenide material layer between the first and second electrodes, the chalcogenide layer including carbon incorporated into germanium selenide chalcogenide glass. The variable resistance memory device may include a second chalcogenide material layer between the first chalcogenide material layer and the second electrode. The variable resistance memory device may include a first metallic layer between the second chalcogenide material layer and the second electrode. The variable resistance memory device may include a third chalcogenide material layer between the first metallic layer and the second electrode. The variable resistance memory device may include a fourth chalcogenide material layer between the first chalcogenide material layer and the first electrode. The first chalcogenide layer may be formed by co-sputtering carbon with Ge40Se60.
    • 一种可变电阻存储器件,包括在第一和第二电极之间的第一电极,第二电极和第一硫族化物材料层,所述硫族化物层包括掺入硒化锗硫化物玻璃中的碳。 可变电阻存储器件可以包括在第一硫族化物材料层和第二电极之间的第二硫族化物材料层。 可变电阻存储器件可以包括在第二硫族化物材料层和第二电极之间的第一金属层。 可变电阻存储器件可以包括在第一金属层和第二电极之间的第三硫族化物材料层。 可变电阻存储器件可以包括在第一硫族化物材料层和第一电极之间的第四硫族化物材料层。 第一种硫族化物层可以通过与Ge40Se60共溅射碳来形成。
    • 8. 发明申请
    • Forced Ion Migration for Chalcogenide Phase Change Memory Device
    • 硫族化物相变存储器件的强制离子迁移
    • US20130119336A1
    • 2013-05-16
    • US13657495
    • 2012-10-22
    • BOISE STATE UNIVERSITY
    • Kristy A. Campbell
    • H01L45/00
    • H01L45/06H01L45/1233H01L45/143H01L45/144H01L45/1625H01L45/1641H01L45/1683Y10S977/754
    • Non-volatile memory devices with two stacked layers of chalcogenide materials comprising the active memory device have been investigated for their potential as phase-change memories. The devices tested included GeTe/SnTe, Ge2Se3/SnTe, and Ge2Se3/SnSe stacks. All devices exhibited resistance switching behavior. The polarity of the applied voltage with respect to the SnTe or SnSe layer was critical to the memory switching properties, due to the electric field induced movement of either Sn or Te into the Ge-chalcogenide layer. One embodiment of the invention is a device comprising a stack of chalcogenide-containing layers which exhibit phase-change switching only after a reverse polarity voltage potential is applied across the stack causing ion movement into an adjacent layer and thus “activating” the device to act as a phase-change random access memory device or a reconfigurable electronics device when the applied voltage potential is returned to the normal polarity. Another embodiment of the invention is a device that is capable of exhibiting more than two data states.
    • 已经研究了包括有源存储器件的具有两层叠层的硫族化物材料的非易失性存储器件作为相变存储器的潜力。 测试的器件包括GeTe / SnTe,Ge2Se3 / SnTe和Ge2Se3 / SnSe堆叠。 所有器件表现出电阻切换行为。 由于电场引起的Sn或Te向Ge-硫族化物层的移动,相对于SnTe或SnSe层的施加电压的极性对于存储器开关特性至关重要。 本发明的一个实施方案是包含含硫族化物的层的堆叠的装置,其仅在反向极性电压电位施加到堆叠之后才显示相变开关,导致离子移动到相邻层中并且因此“激活”该装置以起作用 当施加的电压电位恢复到正常极性时,作为相变随机存取存储器件或可重新配置的电子器件。 本发明的另一实施例是能够呈现多于两个数据状态的装置。