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1. 发明授权

US09672300B2 Pattern generation method 有权
公开(公告)号：US09672300B2
公开(公告)日：2017-06-06
申请号：US13908773
申请日：2013-06-03
申请人： CANON KABUSHIKI KAISHA
发明人： Koji Mikami , Tadashi Arai , Hiroyuki Ishii
IPC分类号： G06F17/50 , G03F1/36 , G03F1/70
CPC分类号： G06F17/50 , G03F1/36 , G03F1/70
摘要： A pattern generation method for generating a pattern of a cell used to generate a pattern of a mask using a computer, includes obtaining data of pattern of the cell, calculating image of the pattern of the cell to obtain an evaluation value of the image by repeatedly changing a parameter value of an exposure condition when the mask which has the pattern of the cell is illuminated to project image of the pattern of the cell onto a substrate to expose the substrate, and a parameter value of the pattern of the cell, and determining parameter value of the pattern of the cell when the evaluation value satisfies a predetermined evaluation standard.

2. 发明申请

US20150213175A1 MASK DATA GENERATING METHOD, STORAGE MEDIUM STORING COMPUTER PROGRAM AND INFORMATION PROCESSING APPARATUS FOR EXECUTION OF THE SAME 有权
标题翻译：掩蔽数据生成方法，存储中央存储计算机程序和信息处理装置的执行
公开(公告)号：US20150213175A1
公开(公告)日：2015-07-30
申请号：US14416762
申请日：2013-09-03
申请人： CANON KABUSHIKI KAISHA
发明人： Tadashi Arai , Yuichi Gyoda
IPC分类号： G06F17/50
CPC分类号： G06F17/5068 , G03F1/70
摘要： A mask data generating method for generating data of a plurality of masks used in a plurality of exposures in which exposure light is irradiated onto a substrate using a mask, and then exposure light is irradiated onto the substrate using another mask. The method includes the steps of obtaining data for a pattern including a plurality of pattern elements, determining formulation of a disposition limitation condition for the pattern elements, analyzing the distance between the pattern elements, determining formulation of the distance limitation condition, and applying a first variable configured to express a number of pattern divisions and a second variable configured to express a distance related to all pattern elements in a cost function and thereby dividing the pattern.
摘要翻译：一种掩模数据产生方法，用于产生在多个曝光中使用的多个掩模的数据，其中使用掩模将曝光光照射到衬底上，然后使用另一个掩模将曝光光照射到衬底上。该方法包括以下步骤：获取包括多个图案元素的图案的数据，确定图案元素的配置限制条件的公式，分析图案元素之间的距离，确定距离限制条件的公式，以及应用第一变量，其被配置为表示多个模式划分，第二变量被配置为表示与成本函数中的所有模式元素相关的距离，从而划分模式。

3. 发明申请

US20150178431A1 MASK PATTERN GENERATION METHOD 有权
标题翻译：掩模图形生成方法
公开(公告)号：US20150178431A1
公开(公告)日：2015-06-25
申请号：US14579667
申请日：2014-12-22
申请人： CANON KABUSHIKI KAISHA
发明人： Tadashi Arai
IPC分类号： G06F17/50 , G03F7/30 , G03F1/00
CPC分类号： G03F7/30 , G03F1/00 , G03F1/36
摘要： A method for generating a pattern of a mask includes obtaining data of a plurality of polygons representing a plurality of pattern elements, grouping polygons which overlap or contact with each other among the plural polygons in one group, not setting an evaluation position for evaluating an image of a pattern of the one group on a line segment of sides which overlap or contact with each other among sides of the polygon of the one group, and setting an evaluation position at a portion except for the line segment, and repeating calculating the image of the pattern of the one group, evaluating the calculated image at the set evaluation position, and correcting the pattern based on a result of the evaluating, and generating the pattern of the mask based on a result of the repeating step.
摘要翻译：一种用于生成掩模图案的方法，包括：获取表示多个图案元素的多个多边形的数据，分组在一组中的多个多边形之间彼此重叠或接触的多边形，而不设置用于评估图像的评估位置在一组的多边形的侧面之间彼此重叠或接触的一侧的线段上的一组的图案，并且在除了该线段之外的部分设置评估位置，并且重复计算图像一组的图案，评估所设定的评估位置处的计算图像，并且基于评估结果校正图案，并且基于重复步骤的结果生成掩模的图案。

4. 发明授权

US09811623B2 Method for generating pattern, storage medium, and information processing apparatus 有权
公开(公告)号：US09811623B2
公开(公告)日：2017-11-07
申请号：US14802851
申请日：2015-07-17
申请人： CANON KABUSHIKI KAISHA
发明人： Hiroyuki Ishii , Ryo Nakayama , Tadashi Arai
IPC分类号： G06F17/50
CPC分类号： G06F17/5068
摘要： A method for generating a pattern includes defining a footprint of a main pattern in each cell, arranging a first cell and a second cell which has an auxiliary pattern outside the footprint of the main pattern, side by side in such a manner that the auxiliary pattern outside the footprint of the second cell is present in the footprint of the main pattern of the first cell, and generating the pattern of the mask by removing a pattern element of the auxiliary pattern outside the footprint of the second cell in a portion where the pattern element of the auxiliary pattern outside the footprint of the second cell is close to or overlaps with the main pattern in the first cell of the first cell and the second cell arranged side by side.

5. 发明授权

US09569576B2 Mask pattern generating method, storage medium, information processing apparatus for execution of the same, mask manufacturing method and device manufacturing method 有权
标题翻译：掩模图案生成方法，存储介质，用于执行其的信息处理装置，掩模制造方法和装置制造方法
公开(公告)号：US09569576B2
公开(公告)日：2017-02-14
申请号：US14416762
申请日：2013-09-03
申请人： CANON KABUSHIKI KAISHA
发明人： Tadashi Arai , Yuichi Gyoda
IPC分类号： G06F17/50 , G03F1/70
CPC分类号： G06F17/5068 , G03F1/70
摘要： A mask data generating method for generating data of a plurality of masks used in a plurality of exposures in which exposure light is irradiated onto a substrate using a mask, and then exposure light is irradiated onto the substrate using another mask. The method includes the steps of obtaining data for a pattern including a plurality of pattern elements, determining formulation of a disposition limitation condition for the pattern elements, analyzing the distance between the pattern elements, determining formulation of the distance limitation condition, and applying a first variable configured to express a number of pattern divisions and a second variable configured to express a distance related to all pattern elements in a cost function and thereby dividing the pattern.
摘要翻译：一种掩模数据产生方法，用于产生在多个曝光中使用的多个掩模的数据，其中使用掩模将曝光光照射到衬底上，然后使用另一个掩模将曝光光照射到衬底上。该方法包括以下步骤：获取包括多个图案元素的图案的数据，确定图案元素的配置限制条件的公式，分析图案元素之间的距离，确定距离限制条件的公式，以及应用第一变量，其被配置为表示多个模式划分，第二变量被配置为表示与成本函数中的所有模式元素相关的距离，从而划分模式。

6. 发明申请

US20150177609A1 METHOD FOR EVALUATING OPTICAL IMAGE OF PATTERN, RECORDING MEDIUM, AND INFORMATION PROCESSING APPARATUS 有权
标题翻译：评估图形光学图像，记录介质和信息处理装置的方法
公开(公告)号：US20150177609A1
公开(公告)日：2015-06-25
申请号：US14572651
申请日：2014-12-16
申请人： CANON KABUSHIKI KAISHA
发明人： Koji Mikami , Tadashi Arai
IPC分类号： G03F1/36 , G06F17/50
CPC分类号： G03F1/36
摘要： A method being performed by a processor includes, acquiring data of patterns of a plurality of cells that include an identified pattern for which an evaluation value of an optical image falls outside a first allowable range among patterns in which each a pattern being single cell alone, creating the pattern of a mask by arranging the patterns of the plurality of cells that include the identified pattern, and evaluating an optical image of the identified pattern in the created pattern of the mask.
摘要翻译：由处理器执行的方法包括：获取多个单元的图案的数据，所述多个单元的图案包括在其中每个图案是单个单元的图案中的光学图像的评估值落在第一允许范围之外的识别图案，通过布置包括所识别的图案的多个单元格的图案，并且在所创建的图案的图案中评估所识别的图案的光学图像来创建掩模的图案。

7. 发明授权

US09502306B2 Pattern formation method that includes partially removing line and space pattern 有权
标题翻译：模式形成方法包括部分去除线和空格
公开(公告)号：US09502306B2
公开(公告)日：2016-11-22
申请号：US14799897
申请日：2015-07-15
申请人： CANON KABUSHIKI KAISHA
发明人： Koichiro Tsujita , Tadashi Arai
IPC分类号： H01L21/027 , H01L21/8238 , H01L29/06 , H01L21/3213 , H01L21/311 , H01L21/308 , H01L27/02
CPC分类号： H01L21/823828 , H01L21/0273 , H01L21/0337 , H01L21/3088 , H01L21/31144 , H01L21/32139 , H01L27/0207 , H01L29/0642
摘要： The present invention provides a pattern formation method of forming a pattern on a substrate by partially removing a line and space pattern formed on the substrate, comprising a first formation step of forming a first layer including a plurality of first openings on the line and space pattern, a second step of forming, on the first layer, a second layer including a second opening for exposing one or more first openings, which are used to partially remove the line and space pattern, among the plurality of first openings, and a removing step of partially removing the line and space pattern through the second opening and the first opening, wherein the plurality of first openings are located on a plurality of lines of the line and space pattern.
摘要翻译：本发明提供一种图案形成方法，其通过部分地去除在基板上形成的线和空间图案而在基板上形成图案，包括：第一形成步骤，形成包括在线上的多个第一开口的第一层和空间图案在所述第一层上形成第二层的第二层，所述第二层包括用于暴露所述多个第一开口中用于部分地去除所述线和间隔图案的一个或多个第一开口的第二开口，以及去除步骤通过所述第二开口和所述第一开口部分地去除所述线和空间图案，其中所述多个第一开口位于所述线和空间图案的多条线上。

8. 发明申请

US20130329202A1 PATTERN GENERATION METHOD 有权
标题翻译：图案生成方法
公开(公告)号：US20130329202A1
公开(公告)日：2013-12-12
申请号：US13908773
申请日：2013-06-03
申请人： CANON KABUSHIKI KAISHA
发明人： Koji Mikami , Tadashi Arai , Hiroyuki Ishii
IPC分类号： G06F17/50
CPC分类号： G06F17/50 , G03F1/36 , G03F1/70
摘要： A pattern generation method for generating a pattern of a cell used to generate a pattern of a mask using a computer, includes obtaining data of pattern of the cell, calculating image of the pattern of the cell to obtain an evaluation value of the image by repeatedly changing a parameter value of an exposure condition when the mask which has the pattern of the cell is illuminated to project image of the pattern of the cell onto a substrate to expose the substrate, and a parameter value of the pattern of the cell, and determining parameter value of the pattern of the cell when the evaluation value satisfies a predetermined evaluation standard.
摘要翻译：一种用于使用计算机生成用于生成掩模图案的单元的图案的图案生成方法，包括获得单元图案的数据，计算单元图案的图像，以反复地获得图像的评估值当具有单元格图案的掩模被照亮以将单元格图案的图像投影到衬底上以暴露衬底时，改变曝光条件的参数值，以及单元的图案的参数值，以及确定当评估值满足预定评价标准时，单元格图案的参数值。

9. 发明申请

US20130246982A1 GENERATION METHOD, STORAGE MEDIUM, AND INFORMATION PROCESSING APPARATUS 有权
标题翻译：生成方法，存储介质和信息处理设备
公开(公告)号：US20130246982A1
公开(公告)日：2013-09-19
申请号：US13781873
申请日：2013-03-01
申请人： CANON KABUSHIKI KAISHA
发明人： Tadashi Arai
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G03F1/0069 , G03F1/0092 , G03F1/36 , G03F1/38 , G06F17/50 , G06F19/00 , G06F2217/12 , G06F2217/14 , G06K9/00 , G21K5/00
摘要： The present invention provides a generation method of generating data for a mask pattern to be used for an exposure apparatus including a projection optical system for projecting a mask pattern including a main pattern and auxiliary pattern onto a substrate, including a step of setting a generation condition under which the auxiliary pattern is generated, and a step of determining whether a value of an evaluation function describing an index which indicates a quality of an image of the mask pattern calculated, wherein if it is determined that the value of the evaluation function falls outside a tolerance range, the generation condition is changed to set a new generation condition.
摘要翻译：本发明提供了一种用于生成用于曝光设备的掩模图案的数据生成方法，该曝光设备包括用于将包括主图案和辅助图案的掩模图案投影到基板上的投影光学系统，包括设置发生条件生成辅助图案的步骤，以及确定描述指示所计算的掩模图案的图像的质量的指标的评价函数的值是否确定的步骤，其中如果确定评估函数的值在外部公差范围内，生成条件被改变以设定新一代条件。

10. 发明授权

US10282487B2 Mask data generation method 有权
公开(公告)号：US10282487B2
公开(公告)日：2019-05-07
申请号：US13906142
申请日：2013-05-30
申请人： CANON KABUSHIKI KAISHA
发明人： Tadashi Arai
IPC分类号： G03F7/20 , G03F1/44 , G06F17/50
摘要： A mask data generation method includes obtaining data of a pattern including a plurality of pattern elements, dividing a region of the pattern into a plurality of sections so that each pattern element is arranged in each section by using the obtained data of the pattern and generating map data including information indicative of presence or absence of the pattern element in each section, setting one piece of mask individual information out of a plurality pieces of mask individual information for each section including the pattern element by using a constraint condition, which inhibits setting of same mask individual information in a constraint region including one section and surrounding sections thereof, and the map data, and generating the data of the plurality of masks corresponding to the plurality pieces of mask individual information by using the set mask individual information.

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