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    • 4. 发明申请
    • PHOTOELECTRIC CONVERSION DEVICE MANUFACTURING METHOD, PHOTOELECTRIC CONVERSION DEVICE, AND IMAGING SYSTEM
    • 光电转换装置制造方法,光电转换装置和成象系统
    • US20150001377A1
    • 2015-01-01
    • US14316369
    • 2014-06-26
    • CANON KABUSHIKI KAISHA
    • Koichi TazoeYu ArishimaAkira OkitaKazuki OhshitanaiYasuharu Ota
    • H01L27/146H01L21/8234H01L31/18
    • H01L31/18H01L27/14603H01L27/14609H01L27/1461H01L27/14612H01L27/14641H01L27/14689
    • A method comprises preparing a semiconductor substrate having a first portion, and a second portion including a first region and a second region; forming an active region in the first portion, and an isolating portion of an insulator defining the active region in the second portion; forming a first semiconductor region of a first conductivity type configuring a first photoelectric conversion element, a second semiconductor region of first conductivity type configuring a second photoelectric conversion element, a third semiconductor region of first conductivity type, a fourth semiconductor region of the conductivity type, a first gate electrode configuring a first transfer transistor, and a second gate electrode configuring a second transfer; exposing the first region of the semiconductor substrate, and performing ion implantation masked by a first photoresist pattern covering the second region of the semiconductor substrate, thus forming a fifth semiconductor region of a second conductivity type.
    • 一种方法包括制备具有第一部分的半导体衬底和包括第一区域和第二区域的第二部分; 在第一部分中形成有源区,以及在第二部分中限定有源区的绝缘体的隔离部分; 形成构成第一光电转换元件的第一导电类型的第一半导体区域,构成第二光电转换元件的第一导电类型的第二半导体区域,第一导电类型的第三半导体区域,导电类型的第四半导体区域, 构成第一转移晶体管的第一栅电极和构成第二转移的第二栅电极; 暴露半导体衬底的第一区域,并执行由覆盖半导体衬底的第二区域的第一光刻胶图案掩蔽的离子注入,从而形成第二导电类型的第五半导体区域。