专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20090112876A1 METHOD AND SYSTEM FOR PROVIDING DYNAMIC BRANDING IN A COMPUTER PROGRAM OR SUITE 有权
标题翻译：在计算机程序或套件中提供动态品牌的方法和系统
公开(公告)号：US20090112876A1
公开(公告)日：2009-04-30
申请号：US11928489
申请日：2007-10-30
申请人： CUNEYT KARUL , KUN XU
发明人： CUNEYT KARUL , KUN XU
IPC分类号： G06F17/30
CPC分类号： G06Q30/02 , G06F2221/2101 , G06F2221/2151
摘要： A method and system for providing dynamic branding for a computer program or suite having windows, screens, display elements in a graphical interface. The system comprises a branding service module and a branding files database. The database includes a schema for storing and accessing the branding files. The branding files comprise graphical elements and/or textual elements, which can be modified and updated.
摘要翻译：一种用于为具有图形界面中的窗口，屏幕，显示元素的计算机程序或套件提供动态品牌的方法和系统。该系统包括品牌服务模块和品牌文件数据库。数据库包括用于存储和访问品牌文件的模式。品牌文件包括可以修改和更新的图形元素和/或文本元素。

2. 发明申请

US20140004626A1 TEMPERATURE CONTROL OF CHEMICAL MECHANICAL POLISHING 有权
标题翻译：化学机械抛光温度控制
公开(公告)号：US20140004626A1
公开(公告)日：2014-01-02
申请号：US13539344
申请日：2012-06-30
申请人： KUN XU , Jimin Zhang , David H. Mai , Stephen Jew , Shih-Haur Walters Shen , Zhihong Wang , Thomas H. Osterheld , Wen-Chiang Tu , Gary Ka Ho Lam , Tomohiko Kitajima
发明人： KUN XU , Jimin Zhang , David H. Mai , Stephen Jew , Shih-Haur Walters Shen , Zhihong Wang , Thomas H. Osterheld , Wen-Chiang Tu , Gary Ka Ho Lam , Tomohiko Kitajima
IPC分类号： H01L21/66
CPC分类号： H01L21/302 , B24B37/015 , H01L21/304
摘要： Methods for chemical mechanical polishing (CMP) of semiconductor substrates, and more particularly to temperature control during such chemical mechanical polishing are provided. In one aspect, the method comprises polishing the substrate with a polishing surface during a polishing process to remove a portion of the conductive material, repeatedly monitoring a temperature of the polishing surface during the polishing process, and exposing the polishing surface to a rate quench process in response to the monitored temperature so as to achieve a target value for the monitored temperature during the polishing process.
摘要翻译：提供半导体衬底的化学机械抛光（CMP）的方法，更具体地说，涉及这种化学机械抛光时的温度控制。一方面，该方法包括在抛光过程中用抛光表面抛光衬底以去除导电材料的一部分，在抛光过程中反复监测抛光表面的温度，并将抛光表面暴露于速率骤冷过程响应于所监测的温度，以便在抛光过程中达到监测温度的目标值。

3. 发明申请

US20130138841A1 MESSAGE PASSING USING DIRECT MEMORY ACCESS UNIT IN A DATA PROCESSING SYSTEM 有权
标题翻译：在数据处理系统中使用直接存储器访问单元进行消息传递
公开(公告)号：US20130138841A1
公开(公告)日：2013-05-30
申请号：US13307271
申请日：2011-11-30
申请人： KUN XU , TOMMI M. JOKINEN , DAVID B. KRAMER
发明人： KUN XU , TOMMI M. JOKINEN , DAVID B. KRAMER
IPC分类号： G06F13/28
CPC分类号： G06F13/28
摘要： A method includes generating, by a first software process of the data processing system, a source partition descriptor for a DMA job which requires access to a first partition of a memory which is assigned to a second software process of the data processing system and not assigned to the first software process. The source partition descriptor comprises a partition identifier which identifies the first partition of the memory. The DMA unit receives the source partition descriptor and generates a destination partition descriptor for the DMA job. Generating the destination partition descriptor includes translating, by the DMA unit, the partition identifier to a buffer pool identifier which identifies a physical address within the first partition of the memory which is assigned to the second software process; and storing, by the DMA unit, the buffer pool identifier in the destination partition descriptor.
摘要翻译：一种方法包括通过数据处理系统的第一软件过程生成用于DMA作业的源分区描述符，其需要访问分配给数据处理系统的第二软件处理并且未分配的存储器的第一分区到第一个软件过程。源分区描述符包括标识存储器的第一分区的分区标识符。 DMA单元接收源分区描述符，并为DMA作业生成目标分区描述符。生成目的地分区描述符包括由DMA单元将分区标识符转换为标识分配给第二软件进程的存储器的第一分区内的物理地址的缓冲池标识符; 并且由DMA单元将缓冲池标识符存储在目的地分区描述符中。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式