专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20110007293A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置
公开(公告)号：US20110007293A1
公开(公告)日：2011-01-13
申请号：US12884485
申请日：2010-09-17
申请人： Damian Fiolka , Michael Totzeck , Alexandra Pazidis , Michael Ricker
发明人： Damian Fiolka , Michael Totzeck , Alexandra Pazidis , Michael Ricker
IPC分类号： G03B27/72 , G03F7/20
CPC分类号： G03F7/70083 , G03F7/70566
摘要： The disclosure relates to a microlithographic projection exposure apparatus, as well as related components and methods. In some embodiments, a microlithographic projection exposure apparatus includes an illumination system and a projection objective, where the illumination system can illuminate an object plane of the projection objective and the projection objective can produce the image of the object plane on an image plane. A polarization-dependent transmission can be produced in the illumination system such that, for at least one polarization distribution in respect of the light impinging on the object plane, a non-homogeneous intensity distribution in the object plane is obtained. The non-homogeneous intensity distribution can afford a homogeneous intensity distribution in the image plane by virtue of polarization-dependent transmission properties of the projection objective.
摘要翻译：本公开涉及微光刻投影曝光装置，以及相关的部件和方法。在一些实施例中，微光刻投影曝光装置包括照明系统和投影物镜，其中照明系统可照亮投影物镜的物平面，并且投影物镜可以在像平面上产生物平面的图像。可以在照明系统中产生偏振相关的透射，使得对于相对于物体平面上的光的至少一个偏振分布，获得物平面中的非均匀强度分布。非均匀强度分布可以通过投影物镜的偏振依赖透射特性在图像平面中提供均匀的强度分布。

2. 发明授权

US07817250B2 Microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置
公开(公告)号：US07817250B2
公开(公告)日：2010-10-19
申请号：US12146200
申请日：2008-06-25
申请人： Damian Fiolka , Michael Totzeck , Alexandra Pazidis , Michael Ricker
发明人： Damian Fiolka , Michael Totzeck , Alexandra Pazidis , Michael Ricker
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/70083 , G03F7/70566
摘要： The disclosure relates to a microlithographic projection exposure apparatus, as well as related components and methods. In some embodiments, a microlithographic projection exposure apparatus includes an illumination system and a projection objective, where the illumination system can illuminate an object plane of the projection objective and the projection objective can produce the image of the object plane on an image plane. A polarization-dependent transmission can be produced in the illumination system such that, for at least one polarization distribution in respect of the light impinging on the object plane, a non-homogeneous intensity distribution in the object plane is obtained. The non-homogeneous intensity distribution can afford a homogeneous intensity distribution in the image plane by virtue of polarization-dependent transmission properties of the projection objective.
摘要翻译：本公开涉及微光刻投影曝光装置，以及相关的部件和方法。在一些实施例中，微光刻投影曝光装置包括照明系统和投影物镜，其中照明系统可照亮投影物镜的物平面，并且投影物镜可以在像平面上产生物平面的图像。可以在照明系统中产生偏振相关的透射，使得对于相对于物体平面上的光的至少一个偏振分布，获得物平面中的非均匀强度分布。非均匀强度分布可以通过投影物镜的偏振依赖透射特性在图像平面中提供均匀的强度分布。

3. 发明授权

US08395753B2 Microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置
公开(公告)号：US08395753B2
公开(公告)日：2013-03-12
申请号：US12884485
申请日：2010-09-17
申请人： Damian Fiolka , Michael Totzeck , Alexandra Pazidis , Michael Ricker
发明人： Damian Fiolka , Michael Totzeck , Alexandra Pazidis , Michael Ricker
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/70083 , G03F7/70566
摘要： The disclosure relates to a microlithographic projection exposure apparatus, as well as related components and methods. In some embodiments, a microlithographic projection exposure apparatus includes an illumination system and a projection objective, where the illumination system can illuminate an object plane of the projection objective and the projection objective can produce the image of the object plane on an image plane. A polarization-dependent transmission can be produced in the illumination system such that, for at least one polarization distribution in respect of the light impinging on the object plane, a non-homogeneous intensity distribution in the object plane is obtained. The non-homogeneous intensity distribution can afford a homogeneous intensity distribution in the image plane by virtue of polarization-dependent transmission properties of the projection objective.
摘要翻译：本公开涉及微光刻投影曝光装置，以及相关的部件和方法。在一些实施例中，微光刻投影曝光装置包括照明系统和投影物镜，其中照明系统可照亮投影物镜的物平面，并且投影物镜可以在像平面上产生物平面的图像。可以在照明系统中产生偏振相关的透射，使得对于相对于物体平面上的光的至少一个偏振分布，获得物平面中的非均匀强度分布。非均匀强度分布可以通过投影物镜的偏振依赖透射特性在图像平面中提供均匀的强度分布。

4. 发明申请

US20090021719A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置
公开(公告)号：US20090021719A1
公开(公告)日：2009-01-22
申请号：US12146200
申请日：2008-06-25
申请人： Damian Fiolka , Michael Totzeck , Alexandra Pazidis , Michael Ricker
发明人： Damian Fiolka , Michael Totzeck , Alexandra Pazidis , Michael Ricker
IPC分类号： G03B27/72
CPC分类号： G03F7/70083 , G03F7/70566
摘要： The disclosure relates to a microlithographic projection exposure apparatus, as well as related components and methods. In some embodiments, a microlithographic projection exposure apparatus includes an illumination system and a projection objective, where the illumination system can illuminate an object plane of the projection objective and the projection objective can produce the image of the object plane on an image plane. A polarization-dependent transmission can be produced in the illumination system such that, for at least one polarization distribution in respect of the light impinging on the object plane, a non-homogeneous intensity distribution in the object plane is obtained. The non-homogeneous intensity distribution can afford a homogeneous intensity distribution in the image plane by virtue of polarization-dependent transmission properties of the projection objective.
摘要翻译：本公开涉及微光刻投影曝光装置，以及相关的部件和方法。在一些实施例中，微光刻投影曝光装置包括照明系统和投影物镜，其中照明系统可照亮投影物镜的物平面，并且投影物镜可在像平面上产生物平面的图像。可以在照明系统中产生偏振相关的透射，使得对于相对于物体平面上的光的至少一个偏振分布，获得物平面中的非均匀强度分布。非均匀强度分布可以通过投影物镜的偏振依赖透射特性在图像平面中提供均匀的强度分布。

5. 发明授权

US08605257B2 Projection system with compensation of intensity variations and compensation element therefor 有权
标题翻译：具有强度变化补偿和补偿要素的投影系统
公开(公告)号：US08605257B2
公开(公告)日：2013-12-10
申请号：US11628356
申请日：2005-06-03
申请人： Alexandra Pazidis , Reiner Garreis , Michael Totzeck , Heiko Feldmann , Paul Graeupner , Hans-Juergen Rostalski , Wolfgang Singer , Guenter Scheible , Sigrid Scheible
发明人： Patrick Scheible , Alexandra Pazidis , Reiner Garreis , Michael Totzeck , Heiko Feldmann , Paul Graeupner , Hans-Juergen Rostalski , Wolfgang Singer
IPC分类号： G03B27/72 , G03B27/68
CPC分类号： G02B13/02 , G02B17/0812 , G02B17/0892 , G03F7/70308
摘要： In a projection objective for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, at least one optical component is provided which has a substrate in which at least one substrate surface is covered with an interference layer system having a great spatial modulation of the reflectance and/or of the transmittance over a usable cross section of the optical component, the modulation being adapted to a spatial transmission distribution of the remaining components of the projection objective in such a way that an intensity distribution of the radiation that is measured in a pupil surface has a substantially reduced spatial modulation in comparison with a projection objective without the interference layer system.
摘要翻译：在将投影物镜的物平面中布置的图案成像到投影物镜的像平面中的投影物镜中，提供至少一个光学部件，该光学元件具有基板，其中至少一个基板表面被干涉层覆盖系统具有在光学部件的可用横截面上的反射率和/或透射率的大的空间调制，该调制适于投射物镜的其余部件的空间传输分布，使得强度分布与没有干涉层系统的投射物镜相比，在瞳孔表面中测量的辐射具有显着降低的空间调制。

6. 发明申请

US20080094599A1 Projection System with Compensation of Intensity Variations and Compensation Element Therefor 有权
标题翻译：具有强度变化和补偿要素补偿的投影系统
公开(公告)号：US20080094599A1
公开(公告)日：2008-04-24
申请号：US11628356
申请日：2005-06-03
申请人： Patrick Scheible , Alexandra Pazidis , Reiner Garreis , Michael Totzeck , Heiko Feldmann , Paul Graeupner , Hans-Juergen Rostalski , Wolfgang Singer
发明人： Patrick Scheible , Alexandra Pazidis , Reiner Garreis , Michael Totzeck , Heiko Feldmann , Paul Graeupner , Hans-Juergen Rostalski , Wolfgang Singer
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G02B13/02 , G02B17/0812 , G02B17/0892 , G03F7/70308
摘要： In a projection objective for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, at least one optical component is provided which has a substrate in which at least one substrate surface is covered with an interference layer system having a great spatial modulation of the reflectance and/or of the transmittance over a usable cross section of the optical component, the modulation being adapted to a spatial transmission distribution of the remaining components of the projection objective in such a way that an intensity distribution of the radiation that is measured in a pupil surface has a substantially reduced spatial modulation in comparison with a projection objective without the interference layer system.
摘要翻译：在将投影物镜的物平面中布置的图案成像到投影物镜的像平面中的投影物镜中，提供至少一个光学部件，该光学元件具有基板，其中至少一个基板表面被干涉层覆盖系统具有在光学部件的可用横截面上的反射率和/或透射率的大的空间调制，该调制适于投射物镜的其余部件的空间传输分布，使得强度分布与没有干涉层系统的投射物镜相比，在瞳孔表面中测量的辐射具有显着降低的空间调制。

7. 发明申请

US20080291419A1 PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHY 审中-公开
公开(公告)号：US20080291419A1
公开(公告)日：2008-11-27
申请号：US12187116
申请日：2008-08-06
申请人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Guenter Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Sigrid Scheible
发明人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Guenter Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Sigrid Scheible
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G03F7/70983 , G03F7/70341
摘要： In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.

8. 发明申请

US20050225737A1 Projection objective for immersion lithography 有权
标题翻译：浸没光刻的投影目标
公开(公告)号：US20050225737A1
公开(公告)日：2005-10-13
申请号：US11015553
申请日：2004-12-20
申请人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Guenter Scheible
发明人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Guenter Scheible
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/70983 , G03F7/70341
摘要： In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.
摘要翻译：在投影物镜中，借助于设置在光路中的投影物镜的最后一个光学元件与图像之间的浸没介质，将布置在投影物镜的物平面中的图案成像到投影物镜的像平面中平面，最后一个光学元件具有透明基板和与基板相配合的保护层系统，用于与浸没介质接触，用于增加最后一个光学元件对浸入介质引起的劣化的电阻。

9. 发明授权

US07738187B2 Optical element, projection lens and associated projection exposure apparatus 有权
标题翻译：光学元件，投影透镜及相关投影曝光装置
公开(公告)号：US07738187B2
公开(公告)日：2010-06-15
申请号：US12134062
申请日：2008-06-05
申请人： Alexandra Pazidis , Stephan Six , Ruediger Duesing , Gennady Fedosenko
发明人： Alexandra Pazidis , Stephan Six , Ruediger Duesing , Gennady Fedosenko
IPC分类号： G02B13/14
CPC分类号： G02B21/33 , G03F7/70341 , G03F7/70958
摘要： An optical element (1) made of a material that is transparent to wavelengths in the UV region, which optical element (1) includes an oleophobic coating (6, 7) outside of its optically free diameter whose disperse component of the surface energy is preferably 25 mN/m or less, particularly preferably 20 mN/m or less, in particular 15 mN/m or less. In addition or as an alternative, the optical element (1) within its optically free diameter comprises an oleophilic coating (9b, 9c) that is transparent to wavelengths in the UV region, with the disperse component of the surface energy of this coating preferably being more than 25 mN/m, particularly preferably more than 30 mN/m, in particular more than 40 mN/m. The optical element may be provided in an arrangement in which it dips at least partially into an organic liquid.
摘要翻译：一种光学元件（1），其由对UV区域中的波长透明的材料制成，该光学元件（1）包括其光学自由直径外的疏油涂层（6,7），其表面能的分散分量优选为 25mN / m以下，特别优选为20mN / m以下，特别优选为15mN / m以下。另外或作为替代，光学元件（1）在其光学自由直径内包括对UV区域中的波长透明的亲油涂层（9b，9c），该涂层的表面能的分散组分优选为超过25mN / m，特别优选大于30mN / m，特别是大于40mN / m。光学元件可以以其至少部分地浸入有机液体的布置来设置。

10. 发明申请

US20090059189A1 PELLICLE FOR USE IN A MICROLITHOGRAPHIC EXPOSURE APPARATUS 审中-公开
标题翻译：用于微波曝光装置的胶囊
公开(公告)号：US20090059189A1
公开(公告)日：2009-03-05
申请号：US11994747
申请日：2006-06-19
申请人： Aksel Goehnermeier , Alexandra Pazidis
发明人： Aksel Goehnermeier , Alexandra Pazidis
IPC分类号： G03B27/52 , F21V9/06 , G03B27/72
CPC分类号： G03F1/62 , G03F7/70308 , G03F7/70341
摘要： A pellicle for use in microlithographic exposure apparatus (10) has, for an operating wavelength of the apparatus, a maximum transmittance for light rays (56) that obliquely impinge on the pellicle (34; 134; 234). This ensures smaller variations of the transmittance over a broad range of angles of incidence, as it occurs in very high numerical aperture projection lenses.
摘要翻译：在微光刻曝光设备（10）中使用的防护薄膜组件对于设备的工作波长具有倾斜地撞击防护薄膜组件（34; 134; 234）上的光线（56）的最大透射率。这确保了在宽的入射角范围内的透射率的变化较小，因为它在非常高的数值孔径投影透镜中出现。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式