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1. 发明授权

US07679831B2 Projection objective of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的投影目标
公开(公告)号：US07679831B2
公开(公告)日：2010-03-16
申请号：US11838995
申请日：2007-08-15
申请人： Daniel Kraehmer , Johannes Ruoff
发明人： Daniel Kraehmer , Johannes Ruoff
IPC分类号： G02B9/00
CPC分类号： G03F7/70966 , G02B13/143
摘要： Projection objectives of micro-lithographic projection exposure apparatuses, as well as related methods and components, are disclosed.
摘要翻译：公开了微光刻投影曝光装置的投影目标，以及相关方法和组件。

2. 发明申请

US20090306921A1 SPECIFICATION, OPTIMIZATION AND MATCHING OF OPTICAL SYSTEMS BY USE OF ORIENTATIONAL ZERNIKE POLYNOMIALS 有权
标题翻译：通过使用定向ZERNIKE POLYNOMIALS的光学系统的规格，优化和匹配
公开(公告)号：US20090306921A1
公开(公告)日：2009-12-10
申请号：US12421996
申请日：2009-04-10
申请人： Michael Totzeck , Daniel Kraehmer , Ralf Mueller , Johannes Ruoff , Vladan Blahnik
发明人： Michael Totzeck , Daniel Kraehmer , Ralf Mueller , Johannes Ruoff , Vladan Blahnik
IPC分类号： G01M11/02 , G06F19/00
CPC分类号： G01M11/0257
摘要： The present disclosure relates to specification, optimization and matching of optical systems by use of orientation Zernike polynomials. In some embodiments, a method for assessing the suitability of an optical system of a microlithographic projection exposure apparatus is provided. The method can include determining a Jones pupil of the optical system, at least approximately describing the Jones pupil using an expansion into orientation Zernike polynomials, and assessing the suitability of the optical system on the basis of the expansion coefficient of at least one of the orientation Zernike polynomials in the expansion.
摘要翻译：本公开涉及通过使用取向泽尔尼克多项式的光学系统的规范，优化和匹配。在一些实施例中，提供了一种用于评估微光刻投影曝光设备的光学系统的适用性的方法。该方法可以包括确定光学系统的琼斯光瞳，至少近似地使用扩展到定向泽尔尼克多项式来描述琼斯光瞳，并且基于至少一个取向的膨胀系数来评估光学系统的适用性 Zernike多项式在扩展中。

3. 发明申请

US20080043331A1 PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置的投影目标
公开(公告)号：US20080043331A1
公开(公告)日：2008-02-21
申请号：US11838995
申请日：2007-08-15
申请人： Daniel Kraehmer , Johannes Ruoff
发明人： Daniel Kraehmer , Johannes Ruoff
IPC分类号： G02B27/28 , G03B27/72
CPC分类号： G03F7/70966 , G02B13/143
摘要： Projection objectives of micro-lithographic projection exposure apparatuses, as well as related methods and components, are disclosed.
摘要翻译：公开了微光刻投影曝光装置的投影目标，以及相关方法和组件。

4. 发明授权

US08126669B2 Optimization and matching of optical systems by use of orientation Zernike polynomials 有权
标题翻译：通过使用方位泽尔尼克多项式优化和匹配光学系统
公开(公告)号：US08126669B2
公开(公告)日：2012-02-28
申请号：US12421996
申请日：2009-04-10
申请人： Michael Totzeck , Daniel Kraehmer , Ralf Mueller , Johannes Ruoff , Vladan Blahnik
发明人： Michael Totzeck , Daniel Kraehmer , Ralf Mueller , Johannes Ruoff , Vladan Blahnik
IPC分类号： G01D18/00 , G01B9/00
CPC分类号： G01M11/0257
摘要： The present disclosure relates to specification, optimization and matching of optical systems by use of orientation Zernike polynomials. In some embodiments, a method for assessing the suitability of an optical system of a microlithographic projection exposure apparatus is provided. The method can include determining a Jones pupil of the optical system, at least approximately describing the Jones pupil using an expansion into orientation Zernike polynomials, and assessing the suitability of the optical system on the basis of the expansion coefficient of at least one of the orientation Zernike polynomials in the expansion.
摘要翻译：本公开涉及通过使用取向泽尔尼克多项式的光学系统的规范，优化和匹配。在一些实施例中，提供了一种用于评估微光刻投影曝光设备的光学系统的适用性的方法。该方法可以包括确定光学系统的琼斯光瞳，至少近似地使用扩展到定向泽尔尼克多项式来描述琼斯光瞳，并且基于至少一个取向的膨胀系数来评估光学系统的适用性 Zernike多项式在扩展中。

5. 发明授权

US09063439B2 Projection objective for microlithography with stray light compensation and related methods 有权
标题翻译：具有杂散光补偿和相关方法的微光刻的投影目标
公开(公告)号：US09063439B2
公开(公告)日：2015-06-23
申请号：US12624993
申请日：2009-11-24
申请人： Aksel Goehnermeier , Daniel Kraehmer , Vladimir Kamenov , Michael Totzeck
发明人： Aksel Goehnermeier , Daniel Kraehmer , Vladimir Kamenov , Michael Totzeck
IPC分类号： G03B27/68 , G03F7/20
CPC分类号： G03F7/70958 , G03F7/70308 , G03F7/70341 , G03F7/70591 , G03F7/70941
摘要： A projection objective for applications in microlithography, a microlithography projection exposure apparatus with a projection objective, a microlithographic manufacturing method for microstructured components, and a component manufactured using such a manufacturing method are disclosed. The projection objective includes an optical component configured so that, during use of the projection objective, the optical component generates a stray light component in the exposure field of the projection objective which adapts a parameter of the projection objective to a parameter of a second projection objective. The parameter is the stray light component at the exposure field of the projection objective and/or a variation of the stray light component at the exposure field of the projection objective. The parameter of the second projection objective is a stray light component at an exposure field of the second projection objective and/or a variation of the stray light component at the exposure field of the second projection objective. The second projection objective is different from the projection objective.
摘要翻译：公开了一种用于微光刻的投影物镜，具有投影物镜的微光刻投影曝光设备，微结构元件的微光刻制造方法以及使用这种制造方法制造的元件。投影物镜包括一个光学元件，其被构造成使得在投影物镜的使用期间，光学元件在投影物镜的曝光区域中产生杂散光分量，该投射物镜将投射物镜的参数适应于第二投影物镜的参数。该参数是在投影物镜的曝光场处的杂散光分量和/或投影物镜的曝光场处的杂散光分量的变化。第二投影物镜的参数是在第二投影物镜的曝光场处的杂散光分量和/或第二投影物镜的曝光场处的杂散光分量的变化。第二个投影目标与投影目标不同。

6. 发明授权

US08213079B2 Polarization-modulating optical element and method for manufacturing thereof 有权
标题翻译：极化调制光学元件及其制造方法
公开(公告)号：US08213079B2
公开(公告)日：2012-07-03
申请号：US13008282
申请日：2011-01-18
申请人： Daniel Kraehmer , Ralf Mueller
发明人： Daniel Kraehmer , Ralf Mueller
IPC分类号： G02B13/14
CPC分类号： G03F7/70966 , G02B5/3083 , G03F7/70566 , Y10S359/90 , Y10T29/49908
摘要： A method of manufacturing a polarization-modulating optical element is provided. The element causes, for light passing through the element and due to stress-induced birefringence, a distribution of retardation between orthogonal states of polarization. The method includes joining a first component and a second component. A non-plane surface of the first component is provided with a defined height profile is joined with a plane surface of the second component. A mechanical stress causing the stress-induced birefringence is produced in the such formed polarization-modulating optical element.
摘要翻译：提供了一种制造偏振调制光学元件的方法。该元件对于通过元件的光并由于应力诱导的双折射引起正交偏振态之间的延迟分布。该方法包括连接第一部件和第二部件。第一部件的非平面表面设置有限定的高度轮廓，与第二部件的平面连接。在这种形成的偏振调制光学元件中产生引起应力引起的双折射的机械应力。

7. 发明授权

US08054557B2 Lithography projection objective, and a method for correcting image defects of the same 有权
标题翻译：平版印刷投影物镜，以及用于校正图像缺陷的方法
公开(公告)号：US08054557B2
公开(公告)日：2011-11-08
申请号：US12715473
申请日：2010-03-02
申请人： Ulrich Loering , Vladan Blahnik , Wilhelm Ulrich , Daniel Kraehmer , Norbert Wabra
发明人： Ulrich Loering , Vladan Blahnik , Wilhelm Ulrich , Daniel Kraehmer , Norbert Wabra
IPC分类号： G02B9/00 , G03B27/42 , G03F7/00
CPC分类号： G03F7/70341 , G03F7/7015
摘要： Projection objectives, as well as related components, systems and methods, are disclosed. In general, a projection objective is configured to image radiation from an object plane to an image plane. A projection objective can include a plurality of optical elements along the optical axis. The plurality of optical elements can include a group of optical elements and a last optical element which is closest to the image plane, and a positioning device configured to move the last optical element relative to the image plane. Typically, a projection objective is configured to be used in a microlithography projection exposure machine.
摘要翻译：公开了投影目标以及相关组件，系统和方法。通常，投影物镜被配置成将来自物体平面的辐射图像到图像平面。投影物镜可以包括沿着光轴的多个光学元件。多个光学元件可以包括一组光学元件和最靠近图像平面的最后一个光学元件，以及被配置为相对于图像平面移动最后一个光学元件的定位装置。通常，投影物镜被配置为用于微光刻投影曝光机。

8. 发明申请

US20110222043A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置
公开(公告)号：US20110222043A1
公开(公告)日：2011-09-15
申请号：US13112357
申请日：2011-05-20
申请人： Vladimir Kamenov , Daniel Kraehmer , Toralf Gruner , Karl-Stefan Weissenrieder , Heiko Feldmann , Achim Zirkel , Alexandra Pazidis , Bruno Thome , Stephan Six
发明人： Vladimir Kamenov , Daniel Kraehmer , Toralf Gruner , Karl-Stefan Weissenrieder , Heiko Feldmann , Achim Zirkel , Alexandra Pazidis , Bruno Thome , Stephan Six
IPC分类号： G03B27/72
CPC分类号： G02B1/11 , G03F7/70191 , G03F7/70308 , G03F7/70958
摘要： The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.
摘要翻译：本公开涉及一种微光刻投影曝光装置，例如用于生产大型集成电路和其它微结构元件的微光投影曝光装置。本公开特别涉及光学元件的涂层以增加或降低反射率。

9. 发明授权

US07692868B2 Lithography projection objective, and a method for correcting image defects of the same 有权
标题翻译：平版印刷投影物镜，以及用于校正图像缺陷的方法
公开(公告)号：US07692868B2
公开(公告)日：2010-04-06
申请号：US12265090
申请日：2008-11-05
申请人： Ulrich Loering , Vladan Blahnik , Wilhelm Ulrich , Daniel Kraehmer , Norbert Wabra
发明人： Ulrich Loering , Vladan Blahnik , Wilhelm Ulrich , Daniel Kraehmer , Norbert Wabra
IPC分类号： G02B9/00 , G03B27/42 , G03F7/00
CPC分类号： G03F7/70341 , G03F7/7015
摘要： Projection objectives, as well as related components, systems and methods, are disclosed. In general, a projection objective is configured to image radiation from an object plane to an image plane. A projection objective can include a plurality of optical elements along the optical axis. The plurality of optical elements can include a group of optical elements and a last optical element which is closest to the image plane, and a positioning device configured to move the last optical element relative to the image plane. Typically, a projection objective is configured to be used in a microlithography projection exposure machine.
摘要翻译：公开了投影目标以及相关组件，系统和方法。通常，投影物镜被配置成将来自物体平面的辐射图像到图像平面。投影物镜可以包括沿着光轴的多个光学元件。多个光学元件可以包括一组光学元件和最靠近图像平面的最后一个光学元件，以及被配置为相对于图像平面移动最后一个光学元件的定位装置。通常，投影物镜被配置为用于微光刻投影曝光机。

10. 发明申请

US20090284831A1 PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置的投影目标
公开(公告)号：US20090284831A1
公开(公告)日：2009-11-19
申请号：US12330980
申请日：2008-12-09
申请人： Karl-Heinz Schuster , Heiko Feldmann , Toralf Gruner , Michael Totzeck , Wilfried Clauss , Susanne Beder , Daniel Kraehmer , Olaf Dittmann
发明人： Karl-Heinz Schuster , Heiko Feldmann , Toralf Gruner , Michael Totzeck , Wilfried Clauss , Susanne Beder , Daniel Kraehmer , Olaf Dittmann
IPC分类号： G02B13/14 , G02B27/28 , G02B3/00
CPC分类号： G03F7/70341 , G02B5/3091 , G02B27/0025 , G03F7/70308
摘要： A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element (L3) with an index of refraction greater than 1.6. This element (L3) has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume (L3′) which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.
摘要翻译：微光刻投影曝光装置的投影物镜具有折射率大于1.6的高折射率折射光学元件（L3）。该元件（L3）具有在体积上变化的体积和材料相关的光学性质。该光学特性的变化导致物镜的像差。在一个实施例中，提供至少4个光学表面，其布置在与折射光学元件的体积光学共轭的至少一个体积（L3'）中。每个光学表面包括至少一个校正装置，例如具有局部变化特性的表面变形或双折射层，其至少部分地校正由光学性质的变化引起的像差。

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