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    • 7. 发明申请
    • SYSTEMS AND METHODS OF FACILITATING DIGITAL RATINGS AND SECURED SALES OF DIGITAL WORKS OF ART
    • US20230092738A1
    • 2023-03-23
    • US17883658
    • 2022-08-09
    • Danny RittmanMo Jacob
    • Danny RittmanMo Jacob
    • G06Q50/00G06Q30/08
    • Blockchain systems and methods for digital ratings and secured sales of digital works of art are provided. The systems include a platform for posting art, an interface, an auction module, and an artificial intelligence unit. The platform enables artists to post digital works of art on their personal pages. The interface enables users to become followers of the digital works of art and post likes or dislikes for the digital works of art, and the platform assigns a monetary value to the like. Each digital work of art is assigned a purchase price equal to the monetary value assigned to the like multiplied by the number of likes for the first digital work of art. When a user offers the purchase price the auction module transfers payment to the first artist and the first work of art to the user. A public censure system enables deletion of the first digital work of art if the first digital work of art is determined to be offensive or inappropriate based on a pre-determined percentage of dislikes posted. If a dislike is posted for the first digital work of art, a supervisory system automatically monitors the first digital work of art and user comments related thereto, and if an inappropriate or offensive comment is detected, the supervisory system removes it.
    • 9. 发明授权
    • Photomask for eliminating antenna effects in an integrated circuit and integrated circuit manufacture with same
    • 用于消除集成电路中的天线效应的光掩模和具有相同功能的集成电路制造
    • US06978437B1
    • 2005-12-20
    • US10393687
    • 2003-03-20
    • Danny RittmanMicha Oren
    • Danny RittmanMicha Oren
    • G03F1/14G06F17/50G06F19/00G21K5/00
    • G06F17/5081G03F1/36
    • A photomask for eliminating antenna effects in an integrated circuit and integrated circuit manufactured with the photomask are disclosed. The photomask includes a substrate and a patterned layer formed on at least a portion of the substrate. The patterned layer may be formed using a mask pattern file created by analyzing a pattern in a mask layout file to identify a region including an antenna ratio less than a first design rule. A feature located in the identified region is moved based on a second design rule from a first position to a second position in the mask layout file to create a space in the identified region. A grounding feature is placed in the space and automatically connected to a gate feature in the mask layout file such that the antenna ratio is increased to greater than or approximately equal to the first design rule.
    • 公开了一种用于消除集成电路中的天线效应的光掩模和用光掩模制造的集成电路。 光掩模包括基板和形成在基板的至少一部分上的图案层。 可以使用通过分析掩模布局文件中的图案而创建的掩模图案文件来形成图案化层,以识别包括小于第一设计规则的天线比率的区域。 位于识别区域中的特征基于第二设计规则从掩模布局文件中的第一位置移动到第二位置,以在识别的区域中创建空间。 接地特征放置在空间中并自动连接到掩模布局文件中的栅极特征,使得天线比率增加到大于或近似等于第一设计规则。