专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20120072298A1 Method and System for Facilitating Automated Real Time Negotiating and Bargaining Followed by Purchase of Merchandize 审中-公开
标题翻译：促进自动实时谈判和谈判的方法和制度，随后购买商品
公开(公告)号：US20120072298A1
公开(公告)日：2012-03-22
申请号：US13214075
申请日：2011-08-19
申请人： Srinivasan Ramanujam , Devendra Joshi
发明人： Srinivasan Ramanujam , Devendra Joshi
IPC分类号： G06Q30/00
CPC分类号： G06Q10/101 , G06Q10/02 , G06Q30/06 , G06Q30/0601 , G06Q30/0641 , G06Q30/08
摘要： The preferred embodiment of the present invention is directed to a method, and system to automate real time price negotiation and bargaining followed by actual purchase of merchandize or service at a retail location. The merchandize can range from real goods and/or service(s) available at any store or retail outlet to entertainment such as movies, concerts, sporting events and others.
摘要翻译：本发明的优选实施例涉及一种方法和系统，用于使实时价格谈判和议价自动化，随后在零售点实际购买商品或服务。商品的范围可以从任何商店或零售商处的实际商品和/或服务到电影，音乐会，体育赛事等娱乐活动。

2. 发明申请

US20060143589A1 Method and system for reticle-wide hierarchy management for representational and computational reuse in integrated circuit layout design 有权
标题翻译：集成电路布图设计中代表性和计算复用的光罩级层次管理方法与系统
公开(公告)号：US20060143589A1
公开(公告)日：2006-06-29
申请号：US11021783
申请日：2004-12-23
申请人： Chi-Song Horng , Devendra Joshi , Anwei Liu
发明人： Chi-Song Horng , Devendra Joshi , Anwei Liu
IPC分类号： G06F17/50
CPC分类号： G06F17/5072 , G06F2217/12 , Y02P90/265
摘要： A hierarchical representation encapsulates the detailed internal composition of a sub-circuit using the notion of a cell definition (a CellDef). The CellDef serves as a natural unit for operational reuse. If the computation required for the analysis or manipulation (e.g. parasitic extraction, RET, design rule confirmation (DRC), or OPC) based on a CellDef or one cell instance can be applied, with no or minimal additional effort, to all or a significant subset of other instances of the cell, very substantial reduction in computational effort may be realized. Furthermore, a hierarchical representation also allows for the partitioning of the overall analysis/manipulation task into a collection of subtasks, e.g. one per CellDef. Multiple jobs may then be distributed across a large number of computational nodes on a network for concurrent execution. While this may not reduce the aggregate computational time, a major reduction in the overall turnaround time (TAT) is in itself extremely beneficial.
摘要翻译：分层表示使用单元定义（CellDef）的概念来封装子电路的详细内部组成。 CellDef作为操作重用的自然单元。如果基于CellDef或一个单元实例的分析或操作所需的计算（例如寄生提取，RET，设计规则确认（DRC）或OPC））可以无需或最小的额外努力应用于所有或重要的单元的其他实例的子集可以实现计算量的非常大的减少。此外，分层表示还允许将整个分析/操作任务划分成子任务的集合，例如子集。每个CellDef一个。然后可以将多个作业分布在网络上的大量计算节点上以用于并发执行。虽然这可能不会减少总体计算时间，但总体周转时间（TAT）的大幅减少本身就是非常有益的。

3. 发明授权

US08161423B1 Defect filtering optical verification process 有权
标题翻译：缺陷过滤光学验证过程
公开(公告)号：US08161423B1
公开(公告)日：2012-04-17
申请号：US12407718
申请日：2009-03-19
申请人： Devendra Joshi
发明人： Devendra Joshi
IPC分类号： G06F17/50
CPC分类号： G03F7/70441 , G03F1/36 , G03F7/705
摘要： An apparatus and method for optical lithography verification includes filtering a lithography simulation of proposed sub-lightwave pattern formations during at feast one design phase or manufacturing phase of an article of manufacture having sub-lightwave structures and then detecting design phase or manufacturing phase defects in response to the filtering of the lithography simulation.
摘要翻译：用于光学光刻验证的装置和方法包括：在具有亚光波结构的制造物品的一个设计阶段或制造阶段期间过滤所提出的亚光波形图形的光刻模拟，然后检测响应中的设计阶段或制造阶段缺陷对光刻模拟的滤波。

4. 发明授权

US07246343B2 Method for correcting position-dependent distortions in patterning of integrated circuits 有权
标题翻译：用于校正集成电路图案化中的位置相关失真的方法
公开(公告)号：US07246343B2
公开(公告)日：2007-07-17
申请号：US10933192
申请日：2004-09-01
申请人： Devendra Joshi , Abdurrahman Sezginer , Franz X. Zach
发明人： Devendra Joshi , Abdurrahman Sezginer , Franz X. Zach
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： A method and system for reducing the computation time required to apply position-dependent corrections to lithography, usually mask, data is disclosed. Optical proximity or process corrections are determined for a few instances of a repeating cluster or object, usually at widely separated locations and then interpolating the corrections to the other instances of the repeating cluster based on their positions in the exposure field. Or, optical proximity corrections can be applied to the repeating cluster of objects for different values of flare intensity, or another parameter of patterning imperfection, such as by calculating the value of the flare at the location of each instance of the repeating cluster, and interpolating the optical proximity corrections to those values of flare.
摘要翻译：公开了一种用于减少对光刻应用位置相关校正所需的计算时间的方法和系统，通常是屏蔽数据。通常在广泛分离的位置处对重复的簇或对象的几个实例确定光学邻近度或过程校正，然后基于它们在曝光区域中的位置将校正内插到重复簇的其他实例。或者，可以将光学邻近校正应用于不同的闪光强度值的对象的重复簇或者图案化缺陷的另一参数，例如通过计算重复簇的每个实例的位置处的闪光的值，以及内插光学接近度校正到这些闪光值。

5. 发明申请

US20060228041A1 Optical lithography verification process 有权
标题翻译：光刻光刻验证过程
公开(公告)号：US20060228041A1
公开(公告)日：2006-10-12
申请号：US11102206
申请日：2005-04-09
申请人： Devendra Joshi
发明人： Devendra Joshi
IPC分类号： G06K9/40
CPC分类号： G03F7/70441 , G03F1/36 , G03F7/705
摘要： An apparatus and method for optical lithography verification includes filtering a lithography simulation of proposed sub-lightwave pattern formations during at least one design phase or manufacturing phase of an article of manufacture having sub-lightwave structures and then detecting design phase or manufacturing phase defects in response to the filtering of the lithography simulation.
摘要翻译：用于光学光刻验证的装置和方法包括在具有亚光波结构的制品的至少一个设计阶段或制造阶段过滤提出的亚光波形图形的光刻模拟，然后检测响应中的设计阶段或制造阶段缺陷对光刻模拟的滤波。

6. 发明申请

US20060048091A1 Method for correcting position-dependent distortions in patterning of integrated circuits 有权
标题翻译：用于校正集成电路图案化中的位置相关失真的方法
公开(公告)号：US20060048091A1
公开(公告)日：2006-03-02
申请号：US10933192
申请日：2004-09-01
申请人： Devendra Joshi , Abdurrahman Sezginer , Franz Zach
发明人： Devendra Joshi , Abdurrahman Sezginer , Franz Zach
IPC分类号： G06F17/50 , G03F1/00 , G21K5/00
CPC分类号： G03F1/36
摘要： A method and system for reducing the computation time required to apply position-dependent corrections to lithography, usually mask, data is disclosed. Optical proximity or process corrections are determined for a few instances of a repeating cluster or object, usually at widely separated locations and then interpolating the corrections to the other instances of the repeating cluster based on their positions in the exposure field. Or, optical proximity corrections can be applied to the repeating cluster of objects for different values of flare intensity, or another parameter of patterning imperfection, such as by calculating the value of the flare at the location of each instance of the repeating cluster, and interpolating the optical proximity corrections to those values of flare.
摘要翻译：公开了一种用于减少对光刻应用位置相关校正所需的计算时间的方法和系统，通常是屏蔽数据。通常在广泛分离的位置处对重复的簇或对象的几个实例确定光学邻近度或过程校正，然后基于它们在曝光区域中的位置将校正内插到重复簇的其他实例。或者，可以将光学邻近校正应用于不同的闪光强度值的对象的重复簇或者图案化缺陷的另一参数，例如通过计算重复簇的每个实例的位置处的闪光的值，以及内插光学接近度校正到这些闪光值。

7. 发明申请

US20120290340A1 METHOD, SYSTEM, AND APPARATUS FOR FACILITATING CONCURRENT PURCHASE OF ANY COMBINATION OF TICKETS, CONCESSIONS AND MERCHANDIZE FOR ENTERTAINMENT AND SPORTING EVENTS LEVERAGING WEB, MOBILE DEVICES AND SOCIAL MEDIA TOOLS 审中-公开
标题翻译：方法，系统和装置，用于促进采购任何组合的门票，会议和商品，用于娱乐和体育活动，涉及网络，移动设备和社会媒体工具
公开(公告)号：US20120290340A1
公开(公告)日：2012-11-15
申请号：US13489889
申请日：2012-06-06
申请人： SRINIVASAN RAMANUJAM , Devendra Joshi
发明人： SRINIVASAN RAMANUJAM , Devendra Joshi
IPC分类号： G06Q10/02
CPC分类号： G06Q10/101 , G06Q10/02 , G06Q30/06 , G06Q30/0601 , G06Q30/0641 , G06Q30/08
摘要： The preferred embodiment of the present invention is directed to a method, system and apparatus to automate the sale and purchase of entertainment tickets along with concessions and/or merchandize, individually or as a package, in the electronic media comprising web, mobile apps and social media channels.
摘要翻译：本发明的优选实施例涉及一种方法，系统和装置，用于在包括网络，移动应用和社交的电子媒体中单独地或作为包裹自由化销售和购买娱乐票据以及让步和/或商品化媒体渠道

8. 发明授权

US07849423B1 Method of verifying photomask data based on models of etch and lithography processes 有权
标题翻译：基于蚀刻和光刻工艺的模型验证光掩模数据的方法
公开(公告)号：US07849423B1
公开(公告)日：2010-12-07
申请号：US11781108
申请日：2007-07-20
申请人： Bayram Yenikaya , Devendra Joshi , Paul A. Fornari , Jesus O. Carrero , Abdurrahman Sezginer
发明人： Bayram Yenikaya , Devendra Joshi , Paul A. Fornari , Jesus O. Carrero , Abdurrahman Sezginer
IPC分类号： G06F17/50 , G06F9/45
CPC分类号： G03F1/36
摘要： A photomask dataset corresponding to a target-pattern is verified by simulating a resist-pattern that will be formed in a resist layer by a lithography process, simulating an etched-pattern that will be etched in a layer by a plasma process wherein said simulation comprises calculating a flux of particles impacting a feature, and determining whether the etched-pattern substantially conforms to the target-pattern.
摘要翻译：通过模拟通过光刻工艺在抗蚀剂层中形成的抗蚀剂图案来模拟对应于目标图案的光掩模数据集，模拟将通过等离子体工艺在层中蚀刻的蚀刻图案，其中所述模拟包括计算影响特征的颗粒的通量，以及确定蚀刻图案是否基本上符合目标图案。

9. 发明授权

US07530048B2 Defect filtering optical lithography verification process 有权
标题翻译：缺陷过滤光刻光刻验证过程
公开(公告)号：US07530048B2
公开(公告)日：2009-05-05
申请号：US11102206
申请日：2005-04-09
申请人： Devendra Joshi
发明人： Devendra Joshi
IPC分类号： G06F17/50
CPC分类号： G03F7/70441 , G03F1/36 , G03F7/705
摘要： An apparatus and method for optical lithography verification includes filtering a lithography simulation of proposed sub-lightwave pattern formations during at least one design phase or manufacturing phase of an article of manufacture having sub-lightwave structures and then detecting design phase or manufacturing phase defects in response to the filtering of the lithography simulation.
摘要翻译：用于光学光刻验证的装置和方法包括在具有亚光波结构的制品的至少一个设计阶段或制造阶段过滤提出的亚光波形图形的光刻模拟，然后检测响应中的设计阶段或制造阶段缺陷对光刻模拟的滤波。

10. 发明授权

US07401319B2 Method and system for reticle-wide hierarchy management for representational and computational reuse in integrated circuit layout design 有权
标题翻译：集成电路布图设计中代表性和计算复用的光罩级层次管理方法与系统
公开(公告)号：US07401319B2
公开(公告)日：2008-07-15
申请号：US11021783
申请日：2004-12-23
申请人： Chi-Song Horng , Devendra Joshi , Anwei Liu
发明人： Chi-Song Horng , Devendra Joshi , Anwei Liu
IPC分类号： G06F17/50 , G06F19/00 , G03F1/00 , G21K5/00
CPC分类号： G06F17/5072 , G06F2217/12 , Y02P90/265
摘要： A hierarchical representation encapsulates the detailed internal composition of a sub-circuit using the notion of a cell definition (a CellDef). The CellDef serves as a natural unit for operational reuse. If the computation required for the analysis or manipulation (e.g. parasitic extraction, RET, design rule confirmation (DRC), or OPC) based on a CellDef or one cell instance can be applied, with no or minimal additional effort, to all or a significant subset of other instances of the cell, very substantial reduction in computational effort may be realized. Furthermore, a hierarchical representation also allows for the partitioning of the overall analysis/manipulation task into a collection of subtasks, e.g. one per CellDef. Multiple jobs may then be distributed across a large number of computational nodes on a network for concurrent execution. While this may not reduce the aggregate computational time, a major reduction in the overall turnaround time (TAT) is in itself extremely beneficial.
摘要翻译：分层表示使用单元定义（CellDef）的概念来封装子电路的详细内部组成。 CellDef作为操作重用的自然单元。如果基于CellDef或一个单元实例的分析或操作所需的计算（例如寄生提取，RET，设计规则确认（DRC）或OPC））可以无需或最小的额外努力应用于所有或重要的单元的其他实例的子集可以实现计算量的非常大的减少。此外，分层表示还允许将整个分析/操作任务划分成子任务的集合，例如子集。每个CellDef一个。然后可以将多个作业分布在网络上的大量计算节点上以用于并发执行。虽然这可能不会减少总体计算时间，但总体周转时间（TAT）的大幅减少本身就是非常有益的。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式