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    • 10. 发明申请
    • UNDERLAYER COMPOSITION AND METHOD OF IMAGING UNDERLAYER
    • 底层组合物和成像方法
    • US20140335454A1
    • 2014-11-13
    • US14340938
    • 2014-07-25
    • ROHM AND HAAS ELECTRONIC MATERIALS LLCDOW GLOBAL TECHNOLOGIES LLC
    • Peter Trefonas, IIIPhillip Dene HustadCynthia Pierre
    • G03F7/038
    • G03F7/0388G03F7/0392G03F7/162G03F7/165G03F7/168G03F7/40
    • A method of forming a pattern comprises diffusing an acid, generated by irradiating a portion of a photosensitive layer, into an underlayer comprising an acid sensitive copolymer comprising an acid decomposable group and an attachment group, to form an interpolymer crosslink and/or covalently bonded to the surface of the substrate. Diffusing comprises heating the underlayer and photosensitive layer. The acid sensitive group reacts with the diffused acid to form a polar region at the surface, in the shape of the pattern. The photosensitive layer is removed to forming a self-assembling layer comprising a block copolymer having a block with an affinity for the polar region, and a block having less affinity than the first. The first block forms a domain aligned to the polar region, and the second block forms a domain aligned to the first. Removing either the first or second domain exposes a portion of the underlayer.
    • 形成图案的方法包括将通过照射感光层的一部分产生的酸扩散到包含可酸分解基团和连接基团的酸敏感共聚物的底层中,以形成交联和/或共价键合到 衬底的表面。 扩散包括加热底层和感光层。 酸敏感基团与扩散的酸反应,形成表面形状的极性区域。 去除感光层以形成包含具有对极性区域具有亲和性的嵌段的嵌段共聚物的自组装层,以及具有比第一嵌段共聚物亲和性小的嵌段。 第一块形成与极性区对准的域,并且第二块形成与第一块对准的域。 移除第一或第二域暴露底层的一部分。