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    • 8. 发明申请
    • Vertical PN Silicon Modulator
    • 垂直PN硅调制器
    • US20160299363A1
    • 2016-10-13
    • US14680823
    • 2015-04-07
    • Futurewei Technologies, Inc.
    • Hongzhen WeiLi YangQianfan XuXiao Shen
    • G02F1/025H01L21/3215H01L21/306H01L21/225
    • G02F1/025G02F2001/0151G02F2001/0152H01L21/2253H01L21/30604H01L21/3215
    • A silicon waveguide comprising a waveguide core that comprises a first positively doped (P1) region vertically adjacent to a second positively doped (P2) region. The P2 region is more heavily positively doped than the P1 region. A first negatively doped (N1) region is vertically adjacent to a second negatively doped (N2) region. The N2 region is more heavily negatively doped than the N1 region. The N2 region and the P2 region are positioned vertically adjacent to form a positive-negative (PN) junction. The N1 region, the N2 region, the P1 region, and the P2 region are positioned as a vertical PN junction and configured to completely deplete the P2 region of positive ions and completely deplete the N2 region of negative ions when a voltage drop is applied across the N1 region, the N2 region, the P1 region, and the P2 region.
    • 一种硅波导,包括波导芯,该波导芯包括与第二正掺杂(P2)区垂直相邻的第一正掺杂(P1)区。 P2区域比P1区域更重的正掺杂。 第一负掺杂(N1)区域与第二负掺杂(N2)区域垂直相邻。 N2区域比N1区域负掺杂。 N2区域和P2区域垂直相邻地形成正负(PN)结。 N1区域,N2区域,P1区域和P2区域被定位为垂直PN结,并且被配置为当施加电压降时,完全耗尽正离子的P2区域并且完全耗尽负离子的N 2区域 N1区域,N2区域,P1区域和P2区域。