会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Laser system
    • US11350515B2
    • 2022-05-31
    • US16919216
    • 2020-07-02
    • Gigaphoton Inc.The University of Tokyo
    • Hironori IgarashiKouji KakizakiYohei KobayashiShuntaro Tani
    • H05G2/00
    • A laser system includes A. a laser apparatus configured to output pulsed laser light; B. a rare gas chamber; C. a light focusing optical system configured to focus the pulsed laser light in the rare gas chamber to excite the rare gas; D. a filter chamber configured to selectively transmit EUV light contained in harmonic light produced in the rare gas chamber; E. an exhauster connected to the filter chamber; F. at least one through hole disposed in the optical path between the rare gas chamber and the filter chamber; G. a rare gas supplier; H. a flow rate control valve configured to control the flow rate of the rare gas flowing from the rare gas supplier into the rare gas chamber; I. a first pressure sensor configured to detect the pressure of the rare gas in the rare gas chamber; J. a first controller configured to control the flow rate control valve in such a way that the pressure detected with the first pressure sensor falls within a reference range; and K. a second controller configured to control the pulse energy of the pulsed laser light outputted from the laser apparatus based at least on the pressure detected with the first pressure sensor.